KR101823725B1 - 노광 장치 및 디바이스의 제조 방법 - Google Patents

노광 장치 및 디바이스의 제조 방법 Download PDF

Info

Publication number
KR101823725B1
KR101823725B1 KR1020140100267A KR20140100267A KR101823725B1 KR 101823725 B1 KR101823725 B1 KR 101823725B1 KR 1020140100267 A KR1020140100267 A KR 1020140100267A KR 20140100267 A KR20140100267 A KR 20140100267A KR 101823725 B1 KR101823725 B1 KR 101823725B1
Authority
KR
South Korea
Prior art keywords
exposure
variation
optical system
angle
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020140100267A
Other languages
English (en)
Korean (ko)
Other versions
KR20150020066A (ko
Inventor
도모히로 호시노
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20150020066A publication Critical patent/KR20150020066A/ko
Application granted granted Critical
Publication of KR101823725B1 publication Critical patent/KR101823725B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR1020140100267A 2013-08-13 2014-08-05 노광 장치 및 디바이스의 제조 방법 Active KR101823725B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013168336A JP6381188B2 (ja) 2013-08-13 2013-08-13 露光装置およびデバイスの製造方法
JPJP-P-2013-168336 2013-08-13

Publications (2)

Publication Number Publication Date
KR20150020066A KR20150020066A (ko) 2015-02-25
KR101823725B1 true KR101823725B1 (ko) 2018-01-30

Family

ID=52466620

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140100267A Active KR101823725B1 (ko) 2013-08-13 2014-08-05 노광 장치 및 디바이스의 제조 방법

Country Status (3)

Country Link
US (1) US9348235B2 (enExample)
JP (1) JP6381188B2 (enExample)
KR (1) KR101823725B1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017538156A (ja) 2014-12-02 2017-12-21 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ方法及び装置
JP6613074B2 (ja) * 2015-08-20 2019-11-27 キヤノン株式会社 決定方法、露光装置、プログラム、および物品の製造方法
CN108292105B (zh) * 2015-09-24 2021-03-26 Asml荷兰有限公司 减少光刻工艺中掩模版的加热和/或冷却的影响的方法
JP6554141B2 (ja) * 2017-05-26 2019-07-31 キヤノン株式会社 決定方法、露光方法、情報処理装置、プログラム及び物品の製造方法
JP6944323B2 (ja) * 2017-09-21 2021-10-06 キヤノン株式会社 計算方法、露光方法、プログラム、露光装置、および物品の製造方法
JP7054365B2 (ja) * 2018-05-25 2022-04-13 キヤノン株式会社 評価方法、露光方法、および物品製造方法
EP3702839B1 (en) * 2019-02-27 2021-11-10 ASML Netherlands B.V. Method of reducing effects of lens heating and/or cooling in a lithographic process
JP2020187334A (ja) * 2019-05-17 2020-11-19 キヤノン株式会社 露光装置、および物品製造方法
JP7213757B2 (ja) * 2019-05-31 2023-01-27 キヤノン株式会社 露光装置、および物品製造方法
JP7431694B2 (ja) * 2020-07-28 2024-02-15 キヤノン株式会社 情報処理装置、膜形成装置、物品の製造方法、およびプログラム

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013115348A (ja) * 2011-11-30 2013-06-10 Canon Inc 投影光学系の結像特性の変動量の算出方法、露光装置およびデバイス製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58179834A (ja) 1982-04-14 1983-10-21 Canon Inc 投影露光装置及び方法
JP3720582B2 (ja) * 1998-06-04 2005-11-30 キヤノン株式会社 投影露光装置及び投影露光方法
TW500987B (en) * 2000-06-14 2002-09-01 Asm Lithography Bv Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby
JP2002184687A (ja) * 2000-10-02 2002-06-28 Canon Inc 露光装置
JP2006019561A (ja) * 2004-07-02 2006-01-19 Canon Inc 露光方法
US7403264B2 (en) * 2004-07-08 2008-07-22 Asml Netherlands B.V. Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
JP5264116B2 (ja) * 2007-07-26 2013-08-14 キヤノン株式会社 結像特性変動予測方法、露光装置、並びにデバイス製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013115348A (ja) * 2011-11-30 2013-06-10 Canon Inc 投影光学系の結像特性の変動量の算出方法、露光装置およびデバイス製造方法

Also Published As

Publication number Publication date
JP6381188B2 (ja) 2018-08-29
JP2015037124A (ja) 2015-02-23
KR20150020066A (ko) 2015-02-25
US20150049315A1 (en) 2015-02-19
US9348235B2 (en) 2016-05-24

Similar Documents

Publication Publication Date Title
KR101823725B1 (ko) 노광 장치 및 디바이스의 제조 방법
KR100971561B1 (ko) 노광장치 및 디바이스의 제조방법
JP5264116B2 (ja) 結像特性変動予測方法、露光装置、並びにデバイス製造方法
JP6039932B2 (ja) 露光装置、露光方法及び物品の製造方法
US8741510B2 (en) Method of calculating amount of fluctuation of imaging characteristic of projection optical system, exposure apparatus, and method of fabricating device
US9513564B2 (en) Exposure method, exposure apparatus, and device manufacturing method
KR102300753B1 (ko) 결정방법, 노광방법, 정보 처리장치, 프로그램 및 물품의 제조방법
JP7022531B2 (ja) 露光方法、露光装置、および物品の製造方法
JP5094517B2 (ja) 露光装置、測定方法、安定化方法及びデバイスの製造方法
JP2001244182A (ja) 露光熱による投影光学系の結像特性変動の測定方法及び露光装置
JP7547185B2 (ja) 情報処理装置、露光装置、及び物品の製造方法。
KR101039288B1 (ko) 노광 장치, 측정 방법, 안정화 방법 및 디바이스의 제조 방법
JP2006019561A (ja) 露光方法
JP2024136393A (ja) 露光装置、及び物品の製造方法
JP5742385B2 (ja) 光学性能のシミュレーション方法、露光方法、及び記録媒体

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20140805

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20150805

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 20140805

Comment text: Patent Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20160819

Patent event code: PE09021S01D

E90F Notification of reason for final refusal
PE0902 Notice of grounds for rejection

Comment text: Final Notice of Reason for Refusal

Patent event date: 20170425

Patent event code: PE09021S02D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20171030

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20180124

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20180124

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
PR1001 Payment of annual fee

Payment date: 20210108

Start annual number: 4

End annual number: 4

PR1001 Payment of annual fee

Payment date: 20211221

Start annual number: 5

End annual number: 5

PR1001 Payment of annual fee

Payment date: 20231227

Start annual number: 7

End annual number: 7

PR1001 Payment of annual fee

Payment date: 20241224

Start annual number: 8

End annual number: 8