JP6381188B2 - 露光装置およびデバイスの製造方法 - Google Patents

露光装置およびデバイスの製造方法 Download PDF

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Publication number
JP6381188B2
JP6381188B2 JP2013168336A JP2013168336A JP6381188B2 JP 6381188 B2 JP6381188 B2 JP 6381188B2 JP 2013168336 A JP2013168336 A JP 2013168336A JP 2013168336 A JP2013168336 A JP 2013168336A JP 6381188 B2 JP6381188 B2 JP 6381188B2
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Japan
Prior art keywords
exposure
optical system
exposure apparatus
projection optical
angle
Prior art date
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Expired - Fee Related
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JP2013168336A
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English (en)
Japanese (ja)
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JP2015037124A (ja
JP2015037124A5 (enExample
Inventor
友宏 星野
友宏 星野
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2013168336A priority Critical patent/JP6381188B2/ja
Priority to KR1020140100267A priority patent/KR101823725B1/ko
Priority to US14/453,944 priority patent/US9348235B2/en
Publication of JP2015037124A publication Critical patent/JP2015037124A/ja
Publication of JP2015037124A5 publication Critical patent/JP2015037124A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
JP2013168336A 2013-08-13 2013-08-13 露光装置およびデバイスの製造方法 Expired - Fee Related JP6381188B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013168336A JP6381188B2 (ja) 2013-08-13 2013-08-13 露光装置およびデバイスの製造方法
KR1020140100267A KR101823725B1 (ko) 2013-08-13 2014-08-05 노광 장치 및 디바이스의 제조 방법
US14/453,944 US9348235B2 (en) 2013-08-13 2014-08-07 Exposure apparatus and method of manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013168336A JP6381188B2 (ja) 2013-08-13 2013-08-13 露光装置およびデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2015037124A JP2015037124A (ja) 2015-02-23
JP2015037124A5 JP2015037124A5 (enExample) 2016-09-29
JP6381188B2 true JP6381188B2 (ja) 2018-08-29

Family

ID=52466620

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013168336A Expired - Fee Related JP6381188B2 (ja) 2013-08-13 2013-08-13 露光装置およびデバイスの製造方法

Country Status (3)

Country Link
US (1) US9348235B2 (enExample)
JP (1) JP6381188B2 (enExample)
KR (1) KR101823725B1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3745206A1 (en) 2019-05-31 2020-12-02 Canon Kabushiki Kaisha Exposure apparatus and article manufacturing method

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017538156A (ja) 2014-12-02 2017-12-21 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ方法及び装置
JP6613074B2 (ja) * 2015-08-20 2019-11-27 キヤノン株式会社 決定方法、露光装置、プログラム、および物品の製造方法
NL2017368A (en) * 2015-09-24 2017-03-30 Asml Netherlands Bv Method of reducing effects of reticle heating and/or cooling in a lithographic process, computer program, computer readable product, lithographic apparatus and device manufacturing method
JP6554141B2 (ja) * 2017-05-26 2019-07-31 キヤノン株式会社 決定方法、露光方法、情報処理装置、プログラム及び物品の製造方法
JP6944323B2 (ja) * 2017-09-21 2021-10-06 キヤノン株式会社 計算方法、露光方法、プログラム、露光装置、および物品の製造方法
JP7054365B2 (ja) * 2018-05-25 2022-04-13 キヤノン株式会社 評価方法、露光方法、および物品製造方法
EP3702839B1 (en) * 2019-02-27 2021-11-10 ASML Netherlands B.V. Method of reducing effects of lens heating and/or cooling in a lithographic process
JP2020187334A (ja) * 2019-05-17 2020-11-19 キヤノン株式会社 露光装置、および物品製造方法
JP7431694B2 (ja) * 2020-07-28 2024-02-15 キヤノン株式会社 情報処理装置、膜形成装置、物品の製造方法、およびプログラム

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58179834A (ja) 1982-04-14 1983-10-21 Canon Inc 投影露光装置及び方法
JP3720582B2 (ja) * 1998-06-04 2005-11-30 キヤノン株式会社 投影露光装置及び投影露光方法
TW500987B (en) 2000-06-14 2002-09-01 Asm Lithography Bv Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby
JP2002184687A (ja) * 2000-10-02 2002-06-28 Canon Inc 露光装置
JP2006019561A (ja) * 2004-07-02 2006-01-19 Canon Inc 露光方法
US7403264B2 (en) * 2004-07-08 2008-07-22 Asml Netherlands B.V. Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
JP5264116B2 (ja) * 2007-07-26 2013-08-14 キヤノン株式会社 結像特性変動予測方法、露光装置、並びにデバイス製造方法
JP2013115348A (ja) * 2011-11-30 2013-06-10 Canon Inc 投影光学系の結像特性の変動量の算出方法、露光装置およびデバイス製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3745206A1 (en) 2019-05-31 2020-12-02 Canon Kabushiki Kaisha Exposure apparatus and article manufacturing method
JP2020197609A (ja) * 2019-05-31 2020-12-10 キヤノン株式会社 露光装置、および物品製造方法
JP7213757B2 (ja) 2019-05-31 2023-01-27 キヤノン株式会社 露光装置、および物品製造方法

Also Published As

Publication number Publication date
US9348235B2 (en) 2016-05-24
KR20150020066A (ko) 2015-02-25
JP2015037124A (ja) 2015-02-23
US20150049315A1 (en) 2015-02-19
KR101823725B1 (ko) 2018-01-30

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