TW201612648A - Method and device for producing photoresist pattern and pre-bake device of producing photoresist - Google Patents
Method and device for producing photoresist pattern and pre-bake device of producing photoresistInfo
- Publication number
- TW201612648A TW201612648A TW103138980A TW103138980A TW201612648A TW 201612648 A TW201612648 A TW 201612648A TW 103138980 A TW103138980 A TW 103138980A TW 103138980 A TW103138980 A TW 103138980A TW 201612648 A TW201612648 A TW 201612648A
- Authority
- TW
- Taiwan
- Prior art keywords
- heating
- photoresist
- heating plate
- plate
- support plate
- Prior art date
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Materials For Photolithography (AREA)
Abstract
The present invention relates to a method and device for producing photoresist pattern and a pre-bake device of producing photoresist, the pre-bake device comprises a heating plate, a heating controller, and a support plate. The heating controller is connected with the heating plate and controls temperature of the heating plate. The support plate is connected with the heating plate to form an angle via connecting components. A substrate coated with a photoresist film is placed on the support plate and is pre-baked by the heating plate. Since the heating plate and the support plate form an angle, the temperatures at the two ends of the substrate are different. By different heating temperatures, the evaporation rate of the photoresist solvent and the reaction rate between the developer and the photoresist is different. Thereby, the effect due to the coating time difference of the developer is reduced, so that the same line width of the photoresist pattern is made.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410499394.XA CN104199256A (en) | 2014-09-25 | 2014-09-25 | Method, device and preliminary drying device for producing photoresist patterns |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201612648A true TW201612648A (en) | 2016-04-01 |
TWI564668B TWI564668B (en) | 2017-01-01 |
Family
ID=52084561
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103138980A TWI564668B (en) | 2014-09-25 | 2014-11-11 | Method and device for producting photoresist pattern and pre-bake device of producting photoresist |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN104199256A (en) |
TW (1) | TWI564668B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107870687B (en) * | 2016-09-27 | 2021-04-06 | 上海和辉光电股份有限公司 | Display device and method for adjusting working temperature of touch screen of display device |
CN106597758B (en) * | 2017-01-03 | 2019-09-24 | 京东方科技集团股份有限公司 | Method and apparatus for handling photoresist component |
CN109870880A (en) * | 2019-04-09 | 2019-06-11 | 合肥京东方显示技术有限公司 | Automatic double surface gluer and glue spreading method |
CN114690472A (en) * | 2020-12-31 | 2022-07-01 | 上海仪电显示材料有限公司 | Method for forming color filter substrate and heating device |
CN113534616B (en) * | 2021-07-12 | 2024-03-26 | 长鑫存储技术有限公司 | Photoetching machine, control method and control system of photoetching machine and production equipment |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100393118B1 (en) * | 2001-02-22 | 2003-07-31 | 현만석 | A method of forming resist patterns in a semiconductor device and a semiconductor washing liquid used in said method |
TW527733B (en) * | 2002-04-01 | 2003-04-11 | Au Optronics Corp | Photoresist developing method for improving thin film transistor process |
JP2006179859A (en) * | 2004-11-29 | 2006-07-06 | Clean Technology Kk | Substrate heating device |
JP4654119B2 (en) * | 2005-11-29 | 2011-03-16 | 東京エレクトロン株式会社 | Coating / developing apparatus and coating / developing method |
US7964042B2 (en) * | 2007-07-30 | 2011-06-21 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing apparatus and substrate processing method |
JP4681662B2 (en) * | 2009-04-08 | 2011-05-11 | 積水化学工業株式会社 | Method for forming resist pattern |
CN103676470B (en) * | 2012-09-12 | 2017-03-08 | 中芯国际集成电路制造(上海)有限公司 | A kind of method and device forming photoetching agent pattern |
-
2014
- 2014-09-25 CN CN201410499394.XA patent/CN104199256A/en active Pending
- 2014-11-11 TW TW103138980A patent/TWI564668B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN104199256A (en) | 2014-12-10 |
TWI564668B (en) | 2017-01-01 |
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Legal Events
Date | Code | Title | Description |
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MM4A | Annulment or lapse of patent due to non-payment of fees |