TW201612648A - Method and device for producing photoresist pattern and pre-bake device of producing photoresist - Google Patents

Method and device for producing photoresist pattern and pre-bake device of producing photoresist

Info

Publication number
TW201612648A
TW201612648A TW103138980A TW103138980A TW201612648A TW 201612648 A TW201612648 A TW 201612648A TW 103138980 A TW103138980 A TW 103138980A TW 103138980 A TW103138980 A TW 103138980A TW 201612648 A TW201612648 A TW 201612648A
Authority
TW
Taiwan
Prior art keywords
heating
photoresist
heating plate
plate
support plate
Prior art date
Application number
TW103138980A
Other languages
Chinese (zh)
Other versions
TWI564668B (en
Inventor
Yung-Fu Lin
Hsien-Hung Cheng
wei-liang Wu
Original Assignee
Everdisplay Optronics Shanghai Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Everdisplay Optronics Shanghai Ltd filed Critical Everdisplay Optronics Shanghai Ltd
Publication of TW201612648A publication Critical patent/TW201612648A/en
Application granted granted Critical
Publication of TWI564668B publication Critical patent/TWI564668B/en

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Materials For Photolithography (AREA)

Abstract

The present invention relates to a method and device for producing photoresist pattern and a pre-bake device of producing photoresist, the pre-bake device comprises a heating plate, a heating controller, and a support plate. The heating controller is connected with the heating plate and controls temperature of the heating plate. The support plate is connected with the heating plate to form an angle via connecting components. A substrate coated with a photoresist film is placed on the support plate and is pre-baked by the heating plate. Since the heating plate and the support plate form an angle, the temperatures at the two ends of the substrate are different. By different heating temperatures, the evaporation rate of the photoresist solvent and the reaction rate between the developer and the photoresist is different. Thereby, the effect due to the coating time difference of the developer is reduced, so that the same line width of the photoresist pattern is made.
TW103138980A 2014-09-25 2014-11-11 Method and device for producting photoresist pattern and pre-bake device of producting photoresist TWI564668B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410499394.XA CN104199256A (en) 2014-09-25 2014-09-25 Method, device and preliminary drying device for producing photoresist patterns

Publications (2)

Publication Number Publication Date
TW201612648A true TW201612648A (en) 2016-04-01
TWI564668B TWI564668B (en) 2017-01-01

Family

ID=52084561

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103138980A TWI564668B (en) 2014-09-25 2014-11-11 Method and device for producting photoresist pattern and pre-bake device of producting photoresist

Country Status (2)

Country Link
CN (1) CN104199256A (en)
TW (1) TWI564668B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107870687B (en) * 2016-09-27 2021-04-06 上海和辉光电股份有限公司 Display device and method for adjusting working temperature of touch screen of display device
CN106597758B (en) * 2017-01-03 2019-09-24 京东方科技集团股份有限公司 Method and apparatus for handling photoresist component
CN109870880A (en) * 2019-04-09 2019-06-11 合肥京东方显示技术有限公司 Automatic double surface gluer and glue spreading method
CN114690472A (en) * 2020-12-31 2022-07-01 上海仪电显示材料有限公司 Method for forming color filter substrate and heating device
CN113534616B (en) * 2021-07-12 2024-03-26 长鑫存储技术有限公司 Photoetching machine, control method and control system of photoetching machine and production equipment

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100393118B1 (en) * 2001-02-22 2003-07-31 현만석 A method of forming resist patterns in a semiconductor device and a semiconductor washing liquid used in said method
TW527733B (en) * 2002-04-01 2003-04-11 Au Optronics Corp Photoresist developing method for improving thin film transistor process
JP2006179859A (en) * 2004-11-29 2006-07-06 Clean Technology Kk Substrate heating device
JP4654119B2 (en) * 2005-11-29 2011-03-16 東京エレクトロン株式会社 Coating / developing apparatus and coating / developing method
US7964042B2 (en) * 2007-07-30 2011-06-21 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus and substrate processing method
JP4681662B2 (en) * 2009-04-08 2011-05-11 積水化学工業株式会社 Method for forming resist pattern
CN103676470B (en) * 2012-09-12 2017-03-08 中芯国际集成电路制造(上海)有限公司 A kind of method and device forming photoetching agent pattern

Also Published As

Publication number Publication date
CN104199256A (en) 2014-12-10
TWI564668B (en) 2017-01-01

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