JP2015029107A - 結像光学系 - Google Patents
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
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- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
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- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
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- G—PHYSICS
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- G02B21/04—Objectives involving mirrors
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- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
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- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
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- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
【解決手段】物体平面の物体視野を像平面の像視野内に結像する複数のミラーを有する結像光学系であって、物体平面に対して垂直であり、かつ空間的に物体視野に最も近く隣接するミラーM2の幾何学的中心点を通じて延びる接続軸32上で、該物体視野4に最も近く隣接する該ミラーM2が、結像光学系31の入射瞳平面30の間隔Bよりも大きい該物体視野4からの間隔Aで配置され、該瞳平面30は、該物体視野4から該物体視野4の上流の結像光3のビーム経路に位置することを特徴とする。
【選択図】図3
Description
5 物体平面
21 支持体
30 入射瞳平面
31 結像光学系
32 接続軸
Claims (17)
- 物体平面(5)の物体視野(4)を像平面(9)の像視野(8)内に結像する複数のミラー(M1からM6)を有する結像光学系(31)であって、
物体平面(5)に対して垂直であり、かつ空間的に物体視野(4)に最も近く隣接するミラー(M2)の幾何学的中心点を通じて延びる接続軸(32)上で、該物体視野(4)に最も近く隣接する該ミラー(M2)が、結像光学系(31)の入射瞳平面(30)の間隔(B)よりも大きい該物体視野(4)からの間隔(A)で配置され、該瞳平面(30)は、該物体視野(4)から該物体視野(4)の上流の結像光(3)のビーム経路に位置する、
ことを特徴とする結像光学系(31)。 - 物体平面(5)の物体視野(4)を像平面(9)の像視野(8)内に結像する複数のミラー(M1からM6)を有する結像光学系(31)であって、
物体平面(5)上で反射された結像光(3)のビーム経路内で物体視野(4)の上流に位置する入射瞳平面(30)を有し、
前記物体平面(5)に対して垂直であり、かつ入射瞳の幾何学的中心点を通じて延びる接続軸(32)を有し、
前記接続軸(32)と前記入射瞳平面(30)の交点(C)が、前記物体視野(4)の下流の前記結像光(3)の前記ビーム経路における中心物体視野点の主ビーム(33)と該接続軸(32)との第1の交点(D)よりも前記物体平面(5)に近く、
ミラー(M5,M6)の少なくとも一方が、結像光(3)が通過するための貫通開口部(18,19)を有する、
ことを特徴とする結像光学系(31)。 - 物体平面(5)の物体視野(4)を像平面(9)の像視野(8)内に結像する複数のミラー(M1からM6)を有する結像光学系(7;31)であって、
2つの視野(4,8)の一方に最も近く隣接して隣接ミラーと呼ばれる第1のミラー(M5)から離間し、結像光学系(7;31)内で該隣接ミラー(M5)の配列平面と光学的に共役な平面に配置された変形可能な更に別のミラー(M3)を有する、
ことを特徴とする結像光学系(7;31)。 - 物体平面(5)の物体視野(4)を像平面(9)の像視野(8)内に結像する複数のミラー(M1からM6)を有する結像光学系(7;31)であって、
2つの視野(4,8)の一方に最も近く隣接する隣接ミラーのミラー(M5)の支持体(21)が、他のミラー(M1からM4,M6)のうちの少なくとも1つの支持体(22)の材料の弾性率の少なくとも2倍大きい弾性率を有する材料で作られる、
ことを特徴とする結像光学系(7;31)。 - 前記隣接ミラー(M5)は、少なくとも150GPaの弾性率を有する材料から作られることを特徴とする請求項4に記載の結像光学系。
- 前記隣接ミラー(M5)は、炭化珪素で作られることを特徴とする請求項5に記載の結像光学系。
- 前記隣接ミラー(M5)から離間し、かつ変形可能ミラー(M3)を有することを特徴とする請求項4から請求項6のいずれか1項に記載の結像光学系。
- 前記変形可能ミラー(M3)は、結像光学系(7)内で前記隣接ミラー(M5)の前記配列平面に光学的に共役な平面に配置されることを特徴とする請求項7に記載の結像光学系。
- 結像光学系(7;31)が前記隣接ミラー(M5)に加えて有する前記ミラー(M1からM4,M6)は、最大で1×10-7m/m/Kである熱膨張係数を有する材料から構成されることを特徴とする請求項4から請求項8のいずれか1項に記載の結像光学系。
- 厳密に6つのミラー(M1からM6)を特徴とする請求項1から請求項9のいずれか1項に記載の結像光学系。
- 前記ミラー(M1からM6)の反射面の少なくとも1つが、回転対称非球面によって説明することができる面として構成されることを特徴とする請求項1から請求項10のいずれか1項に記載の結像光学系。
- 前記ミラー(M1からM6)の反射面の少なくとも1つが、回転対称関数によって説明することができない自由曲面として構成されることを特徴とする請求項1から請求項10のいずれか1項に記載の結像光学系。
- 前記ミラー(M5,M6)の少なくとも1つが、結像光(3)が通過するための貫通開口部(18,19)を有することを特徴とする請求項1又は請求項3から請求項12のいずれか1項に記載の結像光学系。
- マイクロリソグラフィのための投影露光系であって、
請求項1から請求項13のいずれか1項に記載の結像光学系(7;31)を有し、
照明及び結像光(3)のための光源(2)を有し、
前記照明光(2)を前記結像光学系(7;31)の物体視野(4)へ誘導するための光学照明系(6)を有する、
ことを特徴とする投影露光系。 - 前記光学照明系(6)の瞳ファセットミラー(29)が、前記結像光学系(31)の入射瞳平面(30)に配置されることを特徴とする請求項14に記載の投影露光系。
- 微細構造構成要素を生成する方法であって、
レチクル(10)及びウェーハ(11)を準備する段階と、
請求項14又は請求項15に記載の投影露光系を用いて、前記レチクル(10)上の構造を前記ウェーハ(11)の感光層上に投影する段階と、
前記ウェーハ(11)上に微細構造を生成する段階と、
を有することを特徴とする方法。 - 請求項16に記載の方法に従って生成された微細構造構成要素。
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Application Number | Priority Date | Filing Date | Title |
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US9568908P | 2008-09-10 | 2008-09-10 | |
DE102008046699.9A DE102008046699B4 (de) | 2008-09-10 | 2008-09-10 | Abbildende Optik |
DE102008046699.9 | 2008-09-10 | ||
US61/095,689 | 2008-09-10 |
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JP2011526392A Division JP5600680B2 (ja) | 2008-09-10 | 2009-08-26 | 結像光学系 |
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JP6103507B2 JP6103507B2 (ja) | 2017-03-29 |
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JP2014165998A Active JP6103507B2 (ja) | 2008-09-10 | 2014-08-18 | 結像光学系 |
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US (2) | US8873122B2 (ja) |
JP (2) | JP5600680B2 (ja) |
KR (1) | KR101656539B1 (ja) |
CN (2) | CN102150068B (ja) |
DE (1) | DE102008046699B4 (ja) |
TW (1) | TWI497219B (ja) |
WO (1) | WO2010028748A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108351499A (zh) * | 2015-11-09 | 2018-07-31 | 卡尔蔡司Smt有限责任公司 | 将物场成像到像场中的成像光学单元以及包括这样的成像光学单元的投射曝光设备 |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008046699B4 (de) | 2008-09-10 | 2014-03-13 | Carl Zeiss Smt Gmbh | Abbildende Optik |
DE102009045163B4 (de) | 2009-09-30 | 2017-04-06 | Carl Zeiss Smt Gmbh | Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage |
JP5469778B2 (ja) * | 2010-04-22 | 2014-04-16 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結像光学系及びそのような結像光学系を有するマイクロリソグラフィのための投影露光装置 |
KR102002269B1 (ko) | 2010-07-30 | 2019-07-19 | 칼 짜이스 에스엠티 게엠베하 | Euv 노광 장치 |
DE102011080649A1 (de) * | 2010-09-24 | 2012-03-29 | Carl Zeiss Smt Gmbh | Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage |
DE102010041623A1 (de) | 2010-09-29 | 2012-03-29 | Carl Zeiss Smt Gmbh | Spiegel |
DE102011006468B4 (de) | 2011-03-31 | 2014-08-28 | Carl Zeiss Smt Gmbh | Vermessung eines abbildenden optischen Systems durch Überlagerung von Mustern |
WO2013118615A1 (ja) | 2012-02-06 | 2013-08-15 | 株式会社ニコン | 反射結像光学系、露光装置、およびデバイス製造方法 |
KR20130092843A (ko) * | 2012-02-13 | 2013-08-21 | 삼성전자주식회사 | 빛의 인텐시티를 컨트롤할 수 있는 컨트롤 모듈 미러를 갖는 반사형 포토리소그래피 설비 |
DE102012212757A1 (de) * | 2012-07-20 | 2014-01-23 | Carl Zeiss Smt Gmbh | Verfahren zum betreiben einer mikrolithographischen projektionsbelichtungsanlage |
CN104641298B (zh) | 2012-09-21 | 2018-06-01 | Asml荷兰有限公司 | 光刻方法和设备 |
US9746654B2 (en) * | 2013-05-08 | 2017-08-29 | Ohio State Innovation Foundation | Optical delay elements created from variations of the robert cell |
JP6295517B2 (ja) * | 2013-05-15 | 2018-03-20 | 凸版印刷株式会社 | 反射型マスクブランク及び反射型マスク |
US8755114B1 (en) | 2013-06-14 | 2014-06-17 | Computer Power Supply, Inc. | Apparatus for aiding manual, mechanical alignment of optical equipment |
DE102013219986A1 (de) * | 2013-10-02 | 2015-04-02 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie |
DE102014216631A1 (de) * | 2014-08-21 | 2016-02-25 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsbelichtungsanlage, Spiegelmodul hierfür, sowie Verfahren zum Betrieb des Spiegelmoduls |
DE102014221175A1 (de) * | 2014-10-17 | 2016-04-21 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für ein Projektionsbelichtungssystem |
DE102014223452A1 (de) * | 2014-11-18 | 2016-05-19 | Carl Zeiss Smt Gmbh | Optisches Teilsystem für die Projektionslithographie sowie Beleuchtungsoptik für die Projektionslithographie |
DE102014224822A1 (de) | 2014-12-04 | 2016-06-09 | Carl Zeiss Smt Gmbh | Spiegel für eine lithographieanlage, projektionssystem für eine lithographieanlage und lithographieanlage |
NL2016248A (en) * | 2015-03-23 | 2016-09-30 | Asml Netherlands Bv | Radiation Beam Expander. |
KR101995657B1 (ko) * | 2015-03-27 | 2019-07-02 | 디알에스 네트워크 앤드 이미징 시스템즈, 엘엘씨 | 넓은 시야를 갖는 반사 망원경 |
WO2017092815A1 (en) | 2015-12-03 | 2017-06-08 | Carl Zeiss Smt Gmbh | Optical imaging arrangement with actively adjustable metrology support units |
DE102016108226A1 (de) * | 2016-05-03 | 2017-11-09 | Carl Zeiss Microscopy Gmbh | Mikroskop |
NL2020103A (en) * | 2017-01-17 | 2018-07-23 | Asml Netherlands Bv | Lithographic Apparatus and Method |
WO2019101887A1 (en) * | 2017-11-22 | 2019-05-31 | Alltec Angewandte Laserlicht Technologie Gmbh | Electromagnetic radiation steering mechanism |
JP7234498B2 (ja) * | 2018-03-19 | 2023-03-08 | 株式会社リコー | 投射光学系ユニット及び投射光学装置 |
CN110095858B (zh) * | 2018-12-12 | 2021-06-08 | 中国科学院紫金山天文台 | 自适应光学变形镜弹性模态像差表征方法 |
DE102019203423A1 (de) * | 2019-03-13 | 2020-01-16 | Carl Zeiss Smt Gmbh | Abbildende Optik |
US20230324663A1 (en) * | 2020-08-31 | 2023-10-12 | Arizona Board Of Regents On Behalf Of The University Of Arizona | All-reflective microscopy |
CN113938661B (zh) * | 2021-09-29 | 2024-05-07 | 漳州万利达科技有限公司 | 一种投影仪侧投校正方法、终端设备及存储介质 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0855789A (ja) * | 1994-06-09 | 1996-02-27 | Nikon Corp | 投影光学装置 |
JP2000100694A (ja) * | 1998-09-22 | 2000-04-07 | Nikon Corp | 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法 |
JP2001307366A (ja) * | 1999-08-02 | 2001-11-02 | Matsushita Electric Ind Co Ltd | 光ピックアップ装置 |
WO2010017952A2 (en) * | 2008-08-11 | 2010-02-18 | Carl Zeiss Smt Ag | Low-contamination optical arrangement |
JP2010045347A (ja) * | 2008-08-11 | 2010-02-25 | Nikon Corp | 変形可能なミラー、ミラー装置、及び露光装置 |
Family Cites Families (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6021004A (en) * | 1995-02-28 | 2000-02-01 | Canon Kabushiki Kaisha | Reflecting type of zoom lens |
US7186983B2 (en) * | 1998-05-05 | 2007-03-06 | Carl Zeiss Smt Ag | Illumination system particularly for microlithography |
EP1035445B1 (de) | 1999-02-15 | 2007-01-31 | Carl Zeiss SMT AG | Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage |
EP1093021A3 (en) * | 1999-10-15 | 2004-06-30 | Nikon Corporation | Projection optical system as well as equipment and methods making use of said system |
US6600608B1 (en) * | 1999-11-05 | 2003-07-29 | Carl-Zeiss-Stiftung | Catadioptric objective comprising two intermediate images |
JP2002116382A (ja) * | 2000-10-05 | 2002-04-19 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
US6766026B2 (en) * | 2000-12-15 | 2004-07-20 | Thomson Licensing, S.A. | Dynamic allocation of power supplied by a power supply and frequency agile spectral filtering of signals |
TW594847B (en) | 2001-07-27 | 2004-06-21 | Canon Kk | Illumination system, projection exposure apparatus and method for manufacturing a device provided with a pattern to be exposed |
JP2003045782A (ja) * | 2001-07-31 | 2003-02-14 | Canon Inc | 反射型縮小投影光学系及びそれを用いた露光装置 |
DE10139177A1 (de) | 2001-08-16 | 2003-02-27 | Zeiss Carl | Objektiv mit Pupillenobskuration |
JP2003233005A (ja) * | 2002-02-07 | 2003-08-22 | Canon Inc | 反射型投影光学系、露光装置及びデバイス製造方法 |
JP4298336B2 (ja) * | 2002-04-26 | 2009-07-15 | キヤノン株式会社 | 露光装置、光源装置及びデバイス製造方法 |
US6803994B2 (en) * | 2002-06-21 | 2004-10-12 | Nikon Corporation | Wavefront aberration correction system |
JP4068496B2 (ja) * | 2003-04-14 | 2008-03-26 | Nec東芝スペースシステム株式会社 | 鏡面母材及びそれを用いた鏡体及び、鏡体を用いた光学装置 |
JP2005072513A (ja) * | 2003-08-28 | 2005-03-17 | Nikon Corp | 露光装置および露光方法 |
KR101052386B1 (ko) * | 2003-09-27 | 2011-07-28 | 칼 짜이스 에스엠테 게엠베하 | 영점 교차 온도 근처에서 열팽창 계수의 온도에 따라, 상이한 기울기 부호를 갖는 재료로 구성된 미러들을 구비한 초단파 자외선 투영 광학계 |
US20080151365A1 (en) * | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
JP2005321565A (ja) * | 2004-05-07 | 2005-11-17 | Canon Inc | 光学素子の製造方法 |
US6970286B1 (en) * | 2004-06-23 | 2005-11-29 | Corning Incorporated | Multiple field of view reflective telescope |
CN101061409B (zh) * | 2004-10-08 | 2011-06-29 | 卡尔蔡司Smt有限责任公司 | 光学投影系统 |
JP5366405B2 (ja) * | 2004-12-23 | 2013-12-11 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 遮光瞳を有する高開口率対物光学系 |
CN100582861C (zh) * | 2004-12-23 | 2010-01-20 | 卡尔蔡司Smt股份公司 | 具有暗化光瞳的大孔径物镜 |
JP2006253486A (ja) * | 2005-03-11 | 2006-09-21 | Nikon Corp | 照明装置、投影露光方法、投影露光装置、及びマイクロデバイスの製造方法 |
EP1924888B1 (en) * | 2005-09-13 | 2013-07-24 | Carl Zeiss SMT GmbH | Microlithography projection optical system, method for manufacturing a device and method to design an optical surface |
US7397039B2 (en) * | 2005-09-30 | 2008-07-08 | Applied Materials, Inc. | Real-time compensation of mechanical position error in pattern generation or imaging applications |
JP2007103657A (ja) * | 2005-10-04 | 2007-04-19 | Canon Inc | 光学素子保持装置、露光装置およびデバイス製造方法 |
US7740634B2 (en) | 2006-03-20 | 2010-06-22 | Depuy Products, Inc. | Method of bone plate shaping |
DE102006014380A1 (de) * | 2006-03-27 | 2007-10-11 | Carl Zeiss Smt Ag | Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille |
CN100573229C (zh) * | 2006-07-17 | 2009-12-23 | 中国科学院光电技术研究所 | 基于共轭成像的组合式波前校正器 |
DE102006039760A1 (de) * | 2006-08-24 | 2008-03-13 | Carl Zeiss Smt Ag | Beleuchtungssystem mit einem Detektor zur Aufnahme einer Lichtintensität |
DE102006047387A1 (de) | 2006-10-06 | 2008-04-10 | Carl Zeiss Smt Ag | Kompaktes 3-Spiegel-Objektiv |
US20080118849A1 (en) * | 2006-11-21 | 2008-05-22 | Manish Chandhok | Reflective optical system for a photolithography scanner field projector |
JP2008153396A (ja) * | 2006-12-15 | 2008-07-03 | Nikon Corp | 照度均一化装置、露光装置、露光方法および半導体デバイスの製造方法 |
EP1950594A1 (de) * | 2007-01-17 | 2008-07-30 | Carl Zeiss SMT AG | Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik |
US20090040493A1 (en) * | 2007-08-09 | 2009-02-12 | Hideki Komatsuda | Illumination optical system, illumination optical apparatus, exposure apparatus, and device manufacturing method |
KR101501303B1 (ko) * | 2007-08-10 | 2015-03-10 | 가부시키가이샤 니콘 | 조명 광학 장치, 노광 장치, 및 디바이스 제조 방법 |
CN100565275C (zh) * | 2007-08-23 | 2009-12-02 | 蔡然 | 一种天基半导体列阵技术 |
US20090190117A1 (en) * | 2008-01-24 | 2009-07-30 | Nikon Corporation | Exposure apparatus, manufacturing method and supporting method thereof |
DE102008046699B4 (de) | 2008-09-10 | 2014-03-13 | Carl Zeiss Smt Gmbh | Abbildende Optik |
-
2008
- 2008-09-10 DE DE102008046699.9A patent/DE102008046699B4/de not_active Expired - Fee Related
-
2009
- 2009-08-26 KR KR1020117008141A patent/KR101656539B1/ko active IP Right Grant
- 2009-08-26 CN CN200980135379.4A patent/CN102150068B/zh active Active
- 2009-08-26 CN CN2012104697364A patent/CN102937742A/zh active Pending
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- 2009-08-26 JP JP2011526392A patent/JP5600680B2/ja not_active Expired - Fee Related
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- 2011-02-22 US US13/031,920 patent/US8873122B2/en active Active
-
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- 2014-08-18 JP JP2014165998A patent/JP6103507B2/ja active Active
- 2014-10-06 US US14/507,147 patent/US9195145B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0855789A (ja) * | 1994-06-09 | 1996-02-27 | Nikon Corp | 投影光学装置 |
JP2000100694A (ja) * | 1998-09-22 | 2000-04-07 | Nikon Corp | 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法 |
JP2001307366A (ja) * | 1999-08-02 | 2001-11-02 | Matsushita Electric Ind Co Ltd | 光ピックアップ装置 |
WO2010017952A2 (en) * | 2008-08-11 | 2010-02-18 | Carl Zeiss Smt Ag | Low-contamination optical arrangement |
JP2010045347A (ja) * | 2008-08-11 | 2010-02-25 | Nikon Corp | 変形可能なミラー、ミラー装置、及び露光装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108351499A (zh) * | 2015-11-09 | 2018-07-31 | 卡尔蔡司Smt有限责任公司 | 将物场成像到像场中的成像光学单元以及包括这样的成像光学单元的投射曝光设备 |
CN108351499B (zh) * | 2015-11-09 | 2021-04-09 | 卡尔蔡司Smt有限责任公司 | 将物场成像到像场中的成像光学单元以及包括这样的成像光学单元的投射曝光设备 |
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DE102008046699A1 (de) | 2010-03-11 |
DE102008046699B4 (de) | 2014-03-13 |
JP2012502490A (ja) | 2012-01-26 |
KR20110053273A (ko) | 2011-05-19 |
US20110165522A1 (en) | 2011-07-07 |
CN102150068A (zh) | 2011-08-10 |
JP5600680B2 (ja) | 2014-10-01 |
US9195145B2 (en) | 2015-11-24 |
JP6103507B2 (ja) | 2017-03-29 |
CN102150068B (zh) | 2015-07-08 |
KR101656539B1 (ko) | 2016-09-09 |
US8873122B2 (en) | 2014-10-28 |
TW201015235A (en) | 2010-04-16 |
WO2010028748A1 (en) | 2010-03-18 |
CN102937742A (zh) | 2013-02-20 |
US20150022799A1 (en) | 2015-01-22 |
TWI497219B (zh) | 2015-08-21 |
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