JP2015012035A5 - - Google Patents
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- Publication number
- JP2015012035A5 JP2015012035A5 JP2013134210A JP2013134210A JP2015012035A5 JP 2015012035 A5 JP2015012035 A5 JP 2015012035A5 JP 2013134210 A JP2013134210 A JP 2013134210A JP 2013134210 A JP2013134210 A JP 2013134210A JP 2015012035 A5 JP2015012035 A5 JP 2015012035A5
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- particle optical
- substrate
- stage
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 claims description 26
- 230000003287 optical effect Effects 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013134210A JP6230295B2 (ja) | 2013-06-26 | 2013-06-26 | 描画装置及び物品の製造方法 |
| US14/302,885 US10361067B2 (en) | 2013-06-26 | 2014-06-12 | Drawing apparatus, and method of manufacturing article by controlling a plurality of charged particle optical systems based on respective sets of sub-drawing regions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013134210A JP6230295B2 (ja) | 2013-06-26 | 2013-06-26 | 描画装置及び物品の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015012035A JP2015012035A (ja) | 2015-01-19 |
| JP2015012035A5 true JP2015012035A5 (enExample) | 2016-08-12 |
| JP6230295B2 JP6230295B2 (ja) | 2017-11-15 |
Family
ID=52114669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013134210A Expired - Fee Related JP6230295B2 (ja) | 2013-06-26 | 2013-06-26 | 描画装置及び物品の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US10361067B2 (enExample) |
| JP (1) | JP6230295B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018041790A (ja) | 2016-09-06 | 2018-03-15 | 株式会社アドバンテスト | 露光装置および露光データ構造 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4694178A (en) * | 1985-06-28 | 1987-09-15 | Control Data Corporation | Multiple channel electron beam optical column lithography system and method of operation |
| DE69738276T2 (de) * | 1996-03-04 | 2008-04-03 | Canon K.K. | Elektronenstrahl-Belichtungsgerät, Belichtungsverfahren und Verfahren zur Erzeugung eines Objekts |
| JPH11329322A (ja) * | 1998-05-11 | 1999-11-30 | Advantest Corp | 電子ビーム露光方法及び電子ビーム露光装置 |
| US6313476B1 (en) * | 1998-12-14 | 2001-11-06 | Kabushiki Kaisha Toshiba | Charged beam lithography system |
| JP2000260686A (ja) * | 1999-03-08 | 2000-09-22 | Toshiba Corp | 露光方法及び露光装置 |
| US20040018863A1 (en) * | 2001-05-17 | 2004-01-29 | Engstrom G. Eric | Personalization of mobile electronic devices using smart accessory covers |
| JP4421836B2 (ja) * | 2003-03-28 | 2010-02-24 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| GB2408143B (en) | 2003-10-20 | 2006-11-15 | Ims Nanofabrication Gmbh | Charged-particle multi-beam exposure apparatus |
| JP4468752B2 (ja) * | 2004-06-30 | 2010-05-26 | キヤノン株式会社 | 荷電粒子線露光方法、荷電粒子線露光装置及びデバイス製造方法 |
| JP5020745B2 (ja) * | 2007-08-29 | 2012-09-05 | 株式会社ニューフレアテクノロジー | 描画データの作成方法及び荷電粒子ビーム描画装置 |
| JP5743886B2 (ja) * | 2008-06-04 | 2015-07-01 | マッパー・リソグラフィー・アイピー・ビー．ブイ． | ターゲットを露光するための方法およびシステム |
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2013
- 2013-06-26 JP JP2013134210A patent/JP6230295B2/ja not_active Expired - Fee Related
-
2014
- 2014-06-12 US US14/302,885 patent/US10361067B2/en not_active Expired - Fee Related