JP2014529847A5 - - Google Patents

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Publication number
JP2014529847A5
JP2014529847A5 JP2014526191A JP2014526191A JP2014529847A5 JP 2014529847 A5 JP2014529847 A5 JP 2014529847A5 JP 2014526191 A JP2014526191 A JP 2014526191A JP 2014526191 A JP2014526191 A JP 2014526191A JP 2014529847 A5 JP2014529847 A5 JP 2014529847A5
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JP
Japan
Prior art keywords
heater zone
planar heater
temperature
current
power supply
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JP2014526191A
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English (en)
Japanese (ja)
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JP6067705B2 (ja
JP2014529847A (ja
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Priority claimed from PCT/US2012/051029 external-priority patent/WO2013025852A1/en
Publication of JP2014529847A publication Critical patent/JP2014529847A/ja
Publication of JP2014529847A5 publication Critical patent/JP2014529847A5/ja
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JP2014526191A 2011-08-17 2012-08-16 多重ヒータ配列の温度監視及び制御のためのシステムと方法 Active JP6067705B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161524546P 2011-08-17 2011-08-17
US61/524,546 2011-08-17
PCT/US2012/051029 WO2013025852A1 (en) 2011-08-17 2012-08-16 A system and method for monitoring temperatures of and controlling multiplexed heater array

Publications (3)

Publication Number Publication Date
JP2014529847A JP2014529847A (ja) 2014-11-13
JP2014529847A5 true JP2014529847A5 (enrdf_load_stackoverflow) 2015-10-08
JP6067705B2 JP6067705B2 (ja) 2017-01-25

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ID=47715468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014526191A Active JP6067705B2 (ja) 2011-08-17 2012-08-16 多重ヒータ配列の温度監視及び制御のためのシステムと方法

Country Status (5)

Country Link
JP (1) JP6067705B2 (enrdf_load_stackoverflow)
KR (1) KR102006508B1 (enrdf_load_stackoverflow)
CN (1) CN103828031B (enrdf_load_stackoverflow)
TW (2) TWI534941B (enrdf_load_stackoverflow)
WO (1) WO2013025852A1 (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
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US8791392B2 (en) * 2010-10-22 2014-07-29 Lam Research Corporation Methods of fault detection for multiplexed heater array
US9324589B2 (en) * 2012-02-28 2016-04-26 Lam Research Corporation Multiplexed heater array using AC drive for semiconductor processing
US8809747B2 (en) * 2012-04-13 2014-08-19 Lam Research Corporation Current peak spreading schemes for multiplexed heated array
KR102429619B1 (ko) 2015-11-18 2022-08-04 삼성전자주식회사 본딩 스테이지와 이를 포함하는 본딩 장치
US9812342B2 (en) * 2015-12-08 2017-11-07 Watlow Electric Manufacturing Company Reduced wire count heater array block
CN106920768A (zh) * 2015-12-24 2017-07-04 中微半导体设备(上海)有限公司 多区主动矩阵温控系统和温控方法及其适用的静电吸盘和等离子处理装置
US10366867B2 (en) * 2016-08-19 2019-07-30 Applied Materials, Inc. Temperature measurement for substrate carrier using a heater element array
WO2019140200A1 (en) 2018-01-15 2019-07-18 Applied Materials, Inc. Advanced temperature monitoring system and methods for semiconductor manufacture productivity
JP6971199B2 (ja) * 2018-05-31 2021-11-24 東京エレクトロン株式会社 基板処理方法および基板処理装置
JP7456951B2 (ja) * 2018-07-05 2024-03-27 ラム リサーチ コーポレーション 基板処理システムにおける基板支持体の動的温度制御
US11183400B2 (en) 2018-08-08 2021-11-23 Lam Research Corporation Progressive heating of components of substrate processing systems using TCR element-based heaters
CN111383891B (zh) * 2018-12-29 2023-03-10 中微半导体设备(上海)股份有限公司 用于半导体处理设备的温度控制装置及其温度控制方法
KR102722106B1 (ko) 2019-04-10 2024-10-28 엘에스일렉트릭(주) 파워 디바이스 모니터링 시스템 및 모니터링 방법
US12013291B2 (en) 2020-10-14 2024-06-18 Applied Materials, Inc. Advanced temperature monitoring system with expandable modular layout design
KR20220095612A (ko) * 2020-12-30 2022-07-07 세메스 주식회사 히터 어레이 및 히터 어레이를 포함하는 기판 처리 장치
CN112614771A (zh) * 2021-01-08 2021-04-06 上海谙邦半导体设备有限公司 一种反应腔装置及其工作方法
KR20230031569A (ko) * 2021-08-27 2023-03-07 세메스 주식회사 지지 유닛 및 기판 처리 장치
CN114499654B (zh) * 2022-04-01 2022-07-15 国开启科量子技术(北京)有限公司 用于校准不等臂干涉仪的电路装置和量子通信设备

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US3440883A (en) * 1966-12-01 1969-04-29 Monsanto Co Electronic semiconductor thermometer
JP2001045655A (ja) * 1999-07-28 2001-02-16 Fujitsu Ltd 温度スイッチ回路
KR20050053464A (ko) * 2003-12-01 2005-06-08 정준호 직렬 연결된 2개의 다이오드를 이용한 반도체 기억소자
US7141763B2 (en) * 2004-03-26 2006-11-28 Tokyo Electron Limited Method and apparatus for rapid temperature change and control
US7768286B2 (en) * 2005-08-25 2010-08-03 Advantest Corporation Electronic device testing apparatus and temperature control method in an electronic device testing apparatus
KR100849069B1 (ko) * 2007-04-20 2008-07-30 주식회사 하이닉스반도체 정전기 방전 보호 장치
US8092637B2 (en) * 2008-02-28 2012-01-10 Hitachi High-Technologies Corporation Manufacturing method in plasma processing apparatus
US8168923B2 (en) * 2008-10-14 2012-05-01 Chon Meng Wong System for heated food delivery and serving
JP2010153730A (ja) * 2008-12-26 2010-07-08 Omron Corp 配線構造、ヒータ駆動装置、計測装置および制御システム
US8637794B2 (en) * 2009-10-21 2014-01-28 Lam Research Corporation Heating plate with planar heating zones for semiconductor processing
CN201608925U (zh) * 2010-01-13 2010-10-13 张红中 一种用于感应加热电源的多区控制电路

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