JP2014528146A5 - - Google Patents
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- Publication number
- JP2014528146A5 JP2014528146A5 JP2014531158A JP2014531158A JP2014528146A5 JP 2014528146 A5 JP2014528146 A5 JP 2014528146A5 JP 2014531158 A JP2014531158 A JP 2014531158A JP 2014531158 A JP2014531158 A JP 2014531158A JP 2014528146 A5 JP2014528146 A5 JP 2014528146A5
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- collector
- laser radiation
- assembly
- radiation source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161538006P | 2011-09-22 | 2011-09-22 | |
| US61/538,006 | 2011-09-22 | ||
| US201261606715P | 2012-03-05 | 2012-03-05 | |
| US61/606,715 | 2012-03-05 | ||
| US201261635758P | 2012-04-19 | 2012-04-19 | |
| US61/635,758 | 2012-04-19 | ||
| US201261668474P | 2012-07-06 | 2012-07-06 | |
| US61/668,474 | 2012-07-06 | ||
| PCT/EP2012/066449 WO2013041323A1 (en) | 2011-09-22 | 2012-08-23 | Radiation source |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014528146A JP2014528146A (ja) | 2014-10-23 |
| JP2014528146A5 true JP2014528146A5 (enExample) | 2015-09-24 |
| JP6122853B2 JP6122853B2 (ja) | 2017-04-26 |
Family
ID=46724440
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014531158A Active JP6122853B2 (ja) | 2011-09-22 | 2012-08-23 | 放射源 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9632419B2 (enExample) |
| JP (1) | JP6122853B2 (enExample) |
| NL (1) | NL2009352A (enExample) |
| TW (1) | TW201316842A (enExample) |
| WO (1) | WO2013041323A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102013204444A1 (de) * | 2013-03-14 | 2014-09-18 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik |
| US9983482B2 (en) * | 2013-03-27 | 2018-05-29 | Asml Netherlands B.V. | Radiation collector, radiation source and lithographic apparatus |
| CN106062636B (zh) * | 2014-02-24 | 2018-11-30 | Asml荷兰有限公司 | 光刻系统 |
| US9826615B2 (en) * | 2015-09-22 | 2017-11-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | EUV collector with orientation to avoid contamination |
| US20170311429A1 (en) * | 2016-04-25 | 2017-10-26 | Asml Netherlands B.V. | Reducing the effect of plasma on an object in an extreme ultraviolet light source |
| US10149375B2 (en) * | 2016-09-14 | 2018-12-04 | Asml Netherlands B.V. | Target trajectory metrology in an extreme ultraviolet light source |
| CN113396644B (zh) * | 2019-02-08 | 2025-04-29 | Asml荷兰有限公司 | 辐射系统 |
| US11150559B2 (en) | 2019-12-30 | 2021-10-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Laser interference fringe control for higher EUV light source and EUV throughput |
| WO2022008145A1 (en) * | 2020-07-06 | 2022-01-13 | Asml Netherlands B.V. | Systems and methods for laser-to-droplet alignment |
| WO2022050875A1 (en) * | 2020-09-04 | 2022-03-10 | Rnd-Isan, Ltd | Short- wavelength radiation source with multisectional collector module |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7928416B2 (en) * | 2006-12-22 | 2011-04-19 | Cymer, Inc. | Laser produced plasma EUV light source |
| US7439530B2 (en) * | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
| US6973164B2 (en) * | 2003-06-26 | 2005-12-06 | University Of Central Florida Research Foundation, Inc. | Laser-produced plasma EUV light source with pre-pulse enhancement |
| JP2008270149A (ja) | 2007-03-28 | 2008-11-06 | Tokyo Institute Of Technology | 極端紫外光光源装置および極端紫外光発生方法 |
| US20080237501A1 (en) | 2007-03-28 | 2008-10-02 | Ushio Denki Kabushiki Kaisha | Extreme ultraviolet light source device and extreme ultraviolet radiation generating method |
| EP2083328B1 (en) | 2008-01-28 | 2013-06-19 | Media Lario s.r.l. | Grazing incidence collector for laser produced plasma sources |
| EP2159638B1 (en) | 2008-08-26 | 2015-06-17 | ASML Netherlands BV | Radiation source and lithographic apparatus |
| JP2010103499A (ja) * | 2008-09-29 | 2010-05-06 | Komatsu Ltd | 極端紫外光源装置および極端紫外光生成方法 |
| JP5448775B2 (ja) * | 2008-12-16 | 2014-03-19 | ギガフォトン株式会社 | 極端紫外光源装置 |
| NL2004417A (en) * | 2009-04-22 | 2010-10-26 | Asml Netherlands Bv | Lithographic radiation source, collector, apparatus and method. |
| NL2004837A (en) * | 2009-07-09 | 2011-01-10 | Asml Netherlands Bv | Radiation system and lithographic apparatus. |
| DE102009047712A1 (de) | 2009-12-09 | 2011-06-16 | Carl Zeiss Smt Gmbh | EUV-Lichtquelle für eine Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
| US8330131B2 (en) | 2010-01-11 | 2012-12-11 | Media Lario, S.R.L. | Source-collector module with GIC mirror and LPP EUV light source |
| US9265136B2 (en) | 2010-02-19 | 2016-02-16 | Gigaphoton Inc. | System and method for generating extreme ultraviolet light |
| JP5722061B2 (ja) | 2010-02-19 | 2015-05-20 | ギガフォトン株式会社 | 極端紫外光源装置及び極端紫外光の発生方法 |
| US8643823B2 (en) | 2010-02-23 | 2014-02-04 | Media Lario S.R.L. | Stress-decoupling devices and methods for cooled mirror systems |
| US9366967B2 (en) * | 2011-09-02 | 2016-06-14 | Asml Netherlands B.V. | Radiation source |
| NL2010274C2 (en) * | 2012-02-11 | 2015-02-26 | Media Lario Srl | Source-collector modules for euv lithography employing a gic mirror and a lpp source. |
-
2012
- 2012-08-23 US US14/346,530 patent/US9632419B2/en not_active Expired - Fee Related
- 2012-08-23 JP JP2014531158A patent/JP6122853B2/ja active Active
- 2012-08-23 NL NL2009352A patent/NL2009352A/en not_active Application Discontinuation
- 2012-08-23 WO PCT/EP2012/066449 patent/WO2013041323A1/en not_active Ceased
- 2012-09-06 TW TW101132596A patent/TW201316842A/zh unknown