JP2014528146A5 - - Google Patents

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Publication number
JP2014528146A5
JP2014528146A5 JP2014531158A JP2014531158A JP2014528146A5 JP 2014528146 A5 JP2014528146 A5 JP 2014528146A5 JP 2014531158 A JP2014531158 A JP 2014531158A JP 2014531158 A JP2014531158 A JP 2014531158A JP 2014528146 A5 JP2014528146 A5 JP 2014528146A5
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JP
Japan
Prior art keywords
radiation
collector
laser radiation
assembly
radiation source
Prior art date
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Application number
JP2014531158A
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English (en)
Japanese (ja)
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JP2014528146A (ja
JP6122853B2 (ja
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Priority claimed from PCT/EP2012/066449 external-priority patent/WO2013041323A1/en
Publication of JP2014528146A publication Critical patent/JP2014528146A/ja
Publication of JP2014528146A5 publication Critical patent/JP2014528146A5/ja
Application granted granted Critical
Publication of JP6122853B2 publication Critical patent/JP6122853B2/ja
Active legal-status Critical Current
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JP2014531158A 2011-09-22 2012-08-23 放射源 Active JP6122853B2 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US201161538006P 2011-09-22 2011-09-22
US61/538,006 2011-09-22
US201261606715P 2012-03-05 2012-03-05
US61/606,715 2012-03-05
US201261635758P 2012-04-19 2012-04-19
US61/635,758 2012-04-19
US201261668474P 2012-07-06 2012-07-06
US61/668,474 2012-07-06
PCT/EP2012/066449 WO2013041323A1 (en) 2011-09-22 2012-08-23 Radiation source

Publications (3)

Publication Number Publication Date
JP2014528146A JP2014528146A (ja) 2014-10-23
JP2014528146A5 true JP2014528146A5 (enExample) 2015-09-24
JP6122853B2 JP6122853B2 (ja) 2017-04-26

Family

ID=46724440

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014531158A Active JP6122853B2 (ja) 2011-09-22 2012-08-23 放射源

Country Status (5)

Country Link
US (1) US9632419B2 (enExample)
JP (1) JP6122853B2 (enExample)
NL (1) NL2009352A (enExample)
TW (1) TW201316842A (enExample)
WO (1) WO2013041323A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013204444A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik
US9983482B2 (en) * 2013-03-27 2018-05-29 Asml Netherlands B.V. Radiation collector, radiation source and lithographic apparatus
US9989863B2 (en) 2014-02-24 2018-06-05 Asml Netherlands B.V. Lithographic system
US9826615B2 (en) * 2015-09-22 2017-11-21 Taiwan Semiconductor Manufacturing Co., Ltd. EUV collector with orientation to avoid contamination
US20170311429A1 (en) 2016-04-25 2017-10-26 Asml Netherlands B.V. Reducing the effect of plasma on an object in an extreme ultraviolet light source
US10149375B2 (en) * 2016-09-14 2018-12-04 Asml Netherlands B.V. Target trajectory metrology in an extreme ultraviolet light source
CN113396644B (zh) * 2019-02-08 2025-04-29 Asml荷兰有限公司 辐射系统
US11150559B2 (en) * 2019-12-30 2021-10-19 Taiwan Semiconductor Manufacturing Co., Ltd. Laser interference fringe control for higher EUV light source and EUV throughput
KR20230031288A (ko) * 2020-07-06 2023-03-07 에이에스엠엘 네델란즈 비.브이. 레이저-대-액적 정렬을 위한 시스템 및 방법
CN116195369B (zh) * 2020-09-04 2024-10-18 Isteq私人有限公司 具有多段式集光器模块的短波长辐射源和辐射收集方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7928416B2 (en) * 2006-12-22 2011-04-19 Cymer, Inc. Laser produced plasma EUV light source
US6973164B2 (en) * 2003-06-26 2005-12-06 University Of Central Florida Research Foundation, Inc. Laser-produced plasma EUV light source with pre-pulse enhancement
JP2008270149A (ja) * 2007-03-28 2008-11-06 Tokyo Institute Of Technology 極端紫外光光源装置および極端紫外光発生方法
US20080237501A1 (en) 2007-03-28 2008-10-02 Ushio Denki Kabushiki Kaisha Extreme ultraviolet light source device and extreme ultraviolet radiation generating method
EP2083328B1 (en) 2008-01-28 2013-06-19 Media Lario s.r.l. Grazing incidence collector for laser produced plasma sources
EP2159638B1 (en) * 2008-08-26 2015-06-17 ASML Netherlands BV Radiation source and lithographic apparatus
JP2010103499A (ja) 2008-09-29 2010-05-06 Komatsu Ltd 極端紫外光源装置および極端紫外光生成方法
JP5448775B2 (ja) * 2008-12-16 2014-03-19 ギガフォトン株式会社 極端紫外光源装置
NL2004417A (en) * 2009-04-22 2010-10-26 Asml Netherlands Bv Lithographic radiation source, collector, apparatus and method.
NL2004837A (en) * 2009-07-09 2011-01-10 Asml Netherlands Bv Radiation system and lithographic apparatus.
DE102009047712A1 (de) 2009-12-09 2011-06-16 Carl Zeiss Smt Gmbh EUV-Lichtquelle für eine Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
US8330131B2 (en) 2010-01-11 2012-12-11 Media Lario, S.R.L. Source-collector module with GIC mirror and LPP EUV light source
US9265136B2 (en) 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
JP5722061B2 (ja) 2010-02-19 2015-05-20 ギガフォトン株式会社 極端紫外光源装置及び極端紫外光の発生方法
US8643823B2 (en) 2010-02-23 2014-02-04 Media Lario S.R.L. Stress-decoupling devices and methods for cooled mirror systems
US9366967B2 (en) * 2011-09-02 2016-06-14 Asml Netherlands B.V. Radiation source
US8895946B2 (en) * 2012-02-11 2014-11-25 Media Lario S.R.L. Source-collector modules for EUV lithography employing a GIC mirror and a LPP source

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