JP2014510628A - 改善された炭化水素変換触媒 - Google Patents
改善された炭化水素変換触媒 Download PDFInfo
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Abstract
Description
(a)最大閾値(通常は80と105ミクロンの間)を超える粒子の大部分を、物理的スクリーニングプロセス、空気分級装置またこれら両方の組み合わせにより除去、
(b)最小閾値(通常は20と40ミクロンの間)を下回る粒子の大部分を、物理的スクリーンプロセス、空気分級装置またこれら両方の組み合わせにより除去、
(c)前記プロセスの一部として、前記除去された大きい粒子が、定められた最小閾値を下回る微粉粒子の生成を制御しつつ拡散特性が改善されるように粒子サイズを低減される。前記粒子サイズ低減は、最小10ミクロンとすべきであるが、好ましくは平均30ミクロンを超えるべきであり、一方で最小閾値(通常20と40ミクロンの間)を下回る微粒子形成は最小とする。
(d)前記プロセスのさらなる部分として、前記粒子サイズ低減から得られる最小閾値を下回る粒子は、原料中に含まれていた粒子と共に、回収されさらに粉砕工程に送られて10ミクロンを下回る平均粒子、好ましくは5ミクロンを下回る平均粒子サイズに粉砕され、スプレードライのためにこれを好適なバインダ及び他の通常の触媒成分と組み合わされる。
(e)加えて、同じプロセスのために好適と考えられる前記粉砕された粒子は、前記回収された微細粒子のスプレードライからの粒子同様に、最大回収のために前記原料又は他の類似の触媒と配合され得る。もちろん、前記説明は好ましい実施態様のみであり、本発明の他の好ましい実施態様は、上で列記された1又は複数のプロセスステップを省略することが可能である。
新しい触媒
通常粒子サイズ分布(PSD)を持つ新しい触媒は出発材料として使用された(APS68ミクロン)。
触媒の粗い粒子を、市販の95ミクロンスクリーンを用いて分離した。これは初めのサンプルの約35%を与えた。前記スクリーンプロセスをより速くするためにスクリーンに先立って微細粒子の空気分級が実施されてよい。
平衡触媒
平衡触媒が、95ミクロンスクリーンを用いてスクリーニングされて粗区分を除去された。この粗区分は次に、セラミック媒体を充填したUFG粉砕装置に入れた。生成物を異なる速度で再循環し、粉砕ステップの粉砕程度を変化させた。前記粉砕装置に供給された出発材料は平均粒子サイズ130ミクロンであった。
UFGのRPMは150から250rpm、
供給速度は84lb(ポンド)/時間から220lb/時間。
Claims (27)
- 改善されたスプレードライ流動触媒を製造するための方法であり、50%を超える、ひとつの閾値を超える粒子を除去する結果、前記除去が改善されたアクセス性又は拡散性を与える結果となる、プロセス。
- 請求項1に記載のプロセスであり、前記閾値が85ミクロンであり、前記閾値を超える前記触媒区分が、その平均粒子サイズが少なくとも10ミクロンまでに低減されるように処理される、方法。
- 請求項1に記載のプロセスでああり、前記閾値を超える触媒区分が、その平均粒子サイズが少なくとも10ミクロンまで低減されるように処理され、かつ前記処理された触媒が、他の触媒又は触媒区分と配合される、方法。
- 請求項2又は3のいずれか一項に記載のプロセスであり、前記粒子サイズ低減が、粉砕装置操作によりなされる、プロセス。
- 請求項2乃至4のいずれか一項に記載のプロセスであり、前記粉砕された生成物の全て又は部分が、最小値より小さい粒子を除去するために再分級される、プロセス。
- 請求項5に記載のプロセスであり、前記最小値ミクロンを下回る前記粉砕生成物の前記微粒子を、10ミクロンより小さく再粉砕し、続いて他の触媒成分と組わせて、平均粒子サイズが前記最小値よりも大きいスプレードライ生成物を生成する、プロセス。
- 改善されたスプレードライ流動触媒を製造するための方法であり、50%を超える、最小閾値を下回る粒子を除去し、及び50%を超える、最大閾値を超える粒子を除去して、改善された拡散制約を持つ触媒を作成し、及び市販サイクロンにより不十分に保持される粒子のほとんどを除去する、プロセス。
- 請求項7に記載されたプロセスであり、前記最小閾値が41ミクロン、好ましくは31ミクロン以下であり、前記最大閾値が70ミクロン、好ましくは89ミクロン以上である、プロセス。
- 請求項7又は8のいずれか一項に記載のプロセスであり、前記閾値を超える全ての粒子が、請求項2乃至4のいずれか一項に定められるように処理される、プロセス。
- 請求項9に記載のプロセスであり、前記粒子サイズ低減プロセスで生成された微粒子が、空気分級装置又はスクリーニング、又は類似のプロセスで除去される、プロセス。
- 請求項10に記載のプロセスであり、前記微粒子が再粉砕されて、有用な生成物に再スプレードライされる、プロセス。
- 改善された触媒を製造するためのプロセスであり、前記触媒は、物理的スクリーニングプロセスで分離される、プロセス。
- 改善された触媒を製造するためのプロセスであり、前記触媒が、最初に空気分級装置で分離され、次いでさらに物理的スクリーニングにより1又は複数の区分に分離される、プロセス。
- 請求項1に記載のプロセスであり、改善された「インシチュ」炭化水素変換触媒を得るために、「インシチュ」炭化水素処理触媒を製造するために使用されるスプレードライ触媒前駆体へ応用される、プロセス。
- 50%を超える、最小閾値を下回る粒子と、50%を超える、最大閾値を超える粒子を除去した成分の混合物をスプレードライすることで生成される改善された触媒組成物。
- 請求項15に記載の改善された触媒組成物であり、より経済的に価値の低い微粒子を、前記処方の流動特性を改善するために添加する、改善された触媒組成物。
- 請求項15又は16のいずれか一項に記載の改善された触媒組成物であり、前記最小閾値が20と50ミクロンの間であり、前記最大閾値が70と110ミクロンの間である、改善された触媒組成物。
- 請求項15又は16のいずれか一項に記載の改善された触媒組成物であり、前記最小閾値が40ミクロンであり、前記最大閾値が90ミクロンである、改善された触媒組成物。
- 請求項15又は16のいずれか一項に記載の改善された触媒組成物であり、前記最小閾値が好ましくは30ミクロンであり、前記最大閾値が好ましくは90ミクロンである、改善された触媒組成物。
- 請求項15又は16のいずれか一項に記載の改善された触媒組成物であり、前記最小閾値が好ましくは30ミクロンであり、前記最大閾値が好ましくは100ミクロンである、改善された触媒組成物。
- 請求項15乃至20のいずれか一項に記載の改善された触媒組成物であり、前記スプレードライされた中間物に応用され、次に改善されたインシチュ触媒を製造するために使用される、触媒組成物。
- 請求項1乃至6のいずれか一項に記載のプロセスの1又は複数のプロセスで生成される改善された触媒組成物。
- 請求項15乃至22のいずれか一項に記載の改善された触媒組成物を用いる炭化水素変換プロセス。
- 請求項15乃至22のいずれか一項に記載の改善された触媒組成物を用いる改善された流動触媒クラッキングプロセス。
- 請求項15乃至22のいずれか一項に記載の改善された触媒組成物を用いる改善されたディープ触媒クラッキングプロセス。
- 請求項15乃至22のいずれか一項に記載の改善された触媒組成物を用いる改善されたバイオマス変換プロセス。
- 請求項15乃至22のいずれか一項に記載の改善された触媒組成物を用いる改善されたナフサクラッキングプロセス。
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CN104785271B (zh) * | 2014-01-21 | 2017-02-22 | 万华化学集团股份有限公司 | 制氯气用催化剂的制法、该催化剂及制氯气的方法 |
WO2018039357A1 (en) * | 2016-08-23 | 2018-03-01 | Quanta Technologies, Llc | Improving the efficiency of refinery fccu additives |
CN111286359B (zh) * | 2018-12-07 | 2021-12-17 | 中国石油化工股份有限公司 | 一种加工重质烃油原料的方法 |
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AU2012231256A1 (en) | 2013-10-03 |
MX343480B (es) | 2016-11-07 |
BR112013024064B1 (pt) | 2020-03-03 |
US9393556B2 (en) | 2016-07-19 |
KR20140024864A (ko) | 2014-03-03 |
CA2830504C (en) | 2021-05-04 |
US20120238790A1 (en) | 2012-09-20 |
BR112013024064A2 (pt) | 2017-06-27 |
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MX2013010588A (es) | 2014-03-27 |
CN103547369A (zh) | 2014-01-29 |
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US10093866B2 (en) | 2018-10-09 |
WO2012129065A2 (en) | 2012-09-27 |
KR102010281B1 (ko) | 2019-08-13 |
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