JP2014503805A - 電子射出窓箔 - Google Patents
電子射出窓箔 Download PDFInfo
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- JP2014503805A JP2014503805A JP2013541954A JP2013541954A JP2014503805A JP 2014503805 A JP2014503805 A JP 2014503805A JP 2013541954 A JP2013541954 A JP 2013541954A JP 2013541954 A JP2013541954 A JP 2013541954A JP 2014503805 A JP2014503805 A JP 2014503805A
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- 239000011888 foil Substances 0.000 title claims abstract description 86
- 238000010894 electron beam technology Methods 0.000 claims abstract description 43
- 239000000463 material Substances 0.000 claims abstract description 27
- 238000000576 coating method Methods 0.000 claims description 28
- 239000011248 coating agent Substances 0.000 claims description 24
- 230000004888 barrier function Effects 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 13
- 239000012528 membrane Substances 0.000 claims description 11
- 238000002347 injection Methods 0.000 claims description 10
- 239000007924 injection Substances 0.000 claims description 10
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 238000007493 shaping process Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 75
- 239000010936 titanium Substances 0.000 description 39
- 239000011241 protective layer Substances 0.000 description 32
- 239000010408 film Substances 0.000 description 28
- 238000005260 corrosion Methods 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 8
- 229910052726 zirconium Inorganic materials 0.000 description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 5
- 230000001954 sterilising effect Effects 0.000 description 5
- 238000004659 sterilization and disinfection Methods 0.000 description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 229910000765 intermetallic Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical group [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 239000000645 desinfectant Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- -1 oxide Substances 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000007704 wet chemistry method Methods 0.000 description 1
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- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/16—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with all layers existing as coherent layers before laminating
- B32B37/18—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with all layers existing as coherent layers before laminating involving the assembly of discrete sheets or panels only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
- C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/006—Arrangements for eliminating unwanted temperature effects
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/714—Inert, i.e. inert to chemical degradation, corrosion
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/04—Irradiation devices with beam-forming means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
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- H01J2237/16—Vessels
- H01J2237/164—Particle-permeable windows
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
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- Apparatus For Disinfection Or Sterilisation (AREA)
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Abstract
Description
102 チューブ筐体
103 アセンブリ
104 支持フランジ
106 電子射出窓箔
108 箔支持プレート
202 Ti膜
204 熱伝導層
206 保護層
Claims (15)
- 腐食環境において動作する高性能電子ビーム発生器で使用するための電子射出窓箔であって、
Tiの膜(202)と、
Tiよりも高い熱伝導率を有する物質の第一層(204)と、
前記膜(202)を前記腐食環境から保護する物質の第二層(206)とを有するサンドイッチ構造を備え、
前記第二層(206)が前記腐食環境に向けられる、電子射出窓箔。 - 前記第一層(204)が前記膜(202)と前記第二層(206)との間に配置されている、請求項1に記載の電子射出窓箔。
- 前記Tiの膜(202)が、前記第一層(204)と前記第二層(206)との間に配置されている、請求項1に記載の電子射出窓箔。
- 前記第一層が、Tiよりも高い熱伝導率と密度との間の比を有する複数の物質から成る群から選択されている、請求項1から3のいずれか一項に記載の電子射出窓箔。
- 前記第一層(204)が、Al、Cu、Ag、Au及びMoから成る群から選択されている、請求項1から4のいずれか一項に記載の電子射出窓箔。
- 前記第二層(206)が、Al2O3、Zr、Ta及びNbから成る群から選択されている、請求項1から5のいずれか一項に記載の電子射出窓箔。
- 前記Tiの膜(202)と前記第一層(204)及び/又は前記第二層(206)との間の少なくとも一つの接着バリアコーティングを更に備えた請求項1から6のいずれか一項に記載の電子射出窓箔。
- 前記第一層(204)及び前記第二層(206)が前記Tiの膜(202)の同じ側の上に配置されていて、前記第一層(204)と前記第二層(206)との間の少なくとも一つの接着バリアコーティングを更に備えた請求項1から7のいずれか一項に記載の電子射出窓箔。
- 前記接着バリアコーティングが、1nmから150nmの間の厚さを有するAl2O3又はZrO2の層である、請求項7又は8に記載の電子射出窓箔。
- 腐食環境で動作するように構成された電子ビーム発生器であって、
電子ビームを発生及び成形するアセンブリ(103)を収容及び保護する筐体(102)と、
前記電子ビームの出力に関する部品を有する支持体(104)とを備え、
前記支持体(104)が、請求項1から9のいずれか一項に記載の電子射出窓箔を備える、電子ビーム発生器。 - 腐食環境において動作する高性能電子ビーム発生器で使用するための電子射出窓箔を提供するための方法であって、
Tiの膜(202)を提供するステップと、
前記膜(202)の一方の側の上に、Tiよりも高い熱伝導率を有する物質の第一層(204)を提供するステップと、
前記膜(202)を前記腐食環境から保護する物質の柔軟な第二層(206)を提供するステップとを備え、
前記第二層(206)が前記腐食環境に向けられる、方法。 - 前記柔軟な第二層(206)を提供するステップが、前記膜(202)の他方の側の上に前記柔軟な第二層を配置することを備える、請求項11に記載の方法。
- 前記柔軟な第二層(206)を提供するステップが、前記第一層(204)の上に前記柔軟な第二層を配置することを備える、請求項11に記載の方法。
- 前記第一層(204)を提供するステップ及び前記柔軟な第二層(206)を提供するステップの少なくとも一方の前に、前記膜(202)の上に接着コーティングを提供するステップが行われる、請求項11から13のいずれか一項に記載の方法。
- 高性能電子ビームデバイスを提供するための方法であって、
フレームの上にTiの膜を取り付けるステップと、
前記膜(202)の一方の側の上にTiよりも高い熱伝導率を有する物質の第一層(204)を提供し、前記膜(202)を腐食環境から保護する物質の柔軟な第二層(206)を提供することによって、前記膜を処理するステップであって、前記第二層(206)が前記腐食環境に向けられる、ステップと、
電子ビームデバイスを密封するために該電子ビームデバイスのチューブ筐体に箔‐フレームサブアセンブリを取り付けるステップとを備えた方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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SE1051277-0 | 2010-12-02 | ||
SE1051277 | 2010-12-02 | ||
PCT/SE2011/051340 WO2012074453A1 (en) | 2010-12-02 | 2011-11-09 | An electron exit window foil |
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JP2016056637A Division JP6387364B2 (ja) | 2010-12-02 | 2016-03-22 | 電子射出窓箔、電子ビーム発生器、電子射出窓箔を提供するための方法及び高性能電子ビームデバイスを提供するための方法 |
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JP2014503805A true JP2014503805A (ja) | 2014-02-13 |
JP5908492B2 JP5908492B2 (ja) | 2016-04-26 |
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JP2016056637A Active JP6387364B2 (ja) | 2010-12-02 | 2016-03-22 | 電子射出窓箔、電子ビーム発生器、電子射出窓箔を提供するための方法及び高性能電子ビームデバイスを提供するための方法 |
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US (2) | US9384934B2 (ja) |
EP (1) | EP2647027B1 (ja) |
JP (2) | JP5908492B2 (ja) |
CN (2) | CN103229269B (ja) |
WO (1) | WO2012074453A1 (ja) |
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CN103229269B (zh) * | 2010-12-02 | 2016-09-07 | 利乐拉瓦尔集团及财务有限公司 | 电子出射窗箔 |
DE102013226594A1 (de) * | 2013-12-19 | 2015-06-25 | Robert Bosch Gmbh | Verfahren zum Herstellen eines Laufrads und eines Läufers |
US9820247B2 (en) * | 2014-07-30 | 2017-11-14 | Intel IP Corporation | Enhanced node B (ENB) and method for MTC coexistence |
JP6843023B2 (ja) * | 2017-09-12 | 2021-03-17 | 日立造船株式会社 | 電子線照射装置およびその製造方法 |
CN108257705A (zh) * | 2018-03-16 | 2018-07-06 | 中广核达胜加速器技术有限公司 | 一种辐照工业废水用控制处理系统 |
DE102018108905A1 (de) * | 2018-04-16 | 2019-10-17 | Manroland Goss Web Systems Gmbh | Folienschutz bei EB-Trockner |
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CN106409637A (zh) | 2017-02-15 |
CN103229269A (zh) | 2013-07-31 |
EP2647027A1 (en) | 2013-10-09 |
JP6387364B2 (ja) | 2018-09-05 |
US20150028220A1 (en) | 2015-01-29 |
EP2647027A4 (en) | 2017-07-12 |
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EP2647027B1 (en) | 2018-12-26 |
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