JP2014216630A5 - - Google Patents

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Publication number
JP2014216630A5
JP2014216630A5 JP2013095960A JP2013095960A JP2014216630A5 JP 2014216630 A5 JP2014216630 A5 JP 2014216630A5 JP 2013095960 A JP2013095960 A JP 2013095960A JP 2013095960 A JP2013095960 A JP 2013095960A JP 2014216630 A5 JP2014216630 A5 JP 2014216630A5
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JP
Japan
Prior art keywords
charged particle
shot
particle beams
substrate
stage
Prior art date
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Application number
JP2013095960A
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English (en)
Japanese (ja)
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JP2014216630A (ja
JP6193611B2 (ja
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Application filed filed Critical
Priority claimed from JP2013095960A external-priority patent/JP6193611B2/ja
Priority to JP2013095960A priority Critical patent/JP6193611B2/ja
Priority to TW103113857A priority patent/TWI516858B/zh
Priority to KR1020140047828A priority patent/KR101790829B1/ko
Priority to US14/260,052 priority patent/US9455124B2/en
Priority to CN201410169262.0A priority patent/CN104134605B/zh
Publication of JP2014216630A publication Critical patent/JP2014216630A/ja
Publication of JP2014216630A5 publication Critical patent/JP2014216630A5/ja
Publication of JP6193611B2 publication Critical patent/JP6193611B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013095960A 2013-04-30 2013-04-30 描画装置、及び物品の製造方法 Active JP6193611B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2013095960A JP6193611B2 (ja) 2013-04-30 2013-04-30 描画装置、及び物品の製造方法
TW103113857A TWI516858B (zh) 2013-04-30 2014-04-16 使用帶電粒子束在基板上實施繪圖的繪圖裝置及物件之製造方法
KR1020140047828A KR101790829B1 (ko) 2013-04-30 2014-04-22 묘화 장치 및 물품의 제조 방법
US14/260,052 US9455124B2 (en) 2013-04-30 2014-04-23 Drawing apparatus, and method of manufacturing article
CN201410169262.0A CN104134605B (zh) 2013-04-30 2014-04-25 绘制装置和半导体器件的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013095960A JP6193611B2 (ja) 2013-04-30 2013-04-30 描画装置、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2014216630A JP2014216630A (ja) 2014-11-17
JP2014216630A5 true JP2014216630A5 (https=) 2016-06-23
JP6193611B2 JP6193611B2 (ja) 2017-09-06

Family

ID=51789514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013095960A Active JP6193611B2 (ja) 2013-04-30 2013-04-30 描画装置、及び物品の製造方法

Country Status (5)

Country Link
US (1) US9455124B2 (https=)
JP (1) JP6193611B2 (https=)
KR (1) KR101790829B1 (https=)
CN (1) CN104134605B (https=)
TW (1) TWI516858B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6289181B2 (ja) * 2013-06-26 2018-03-07 キヤノン株式会社 描画装置、及び、物品の製造方法
US9984853B2 (en) 2014-11-28 2018-05-29 Nuflare Technology, Inc. Method for generating writing data
JP6548982B2 (ja) * 2014-11-28 2019-07-24 株式会社ニューフレアテクノロジー 描画データの作成方法
JP6593090B2 (ja) * 2015-10-20 2019-10-23 株式会社ニューフレアテクノロジー 支持ケース及びマルチ荷電粒子ビーム描画装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62144323A (ja) 1985-12-19 1987-06-27 Toshiba Corp 荷電ビ−ム露光装置
JP4818501B2 (ja) * 2000-09-12 2011-11-16 三菱電機株式会社 電子ビーム露光装置
TWI227814B (en) 2002-09-20 2005-02-11 Asml Netherlands Bv Alignment system and methods for lithographic systems using at least two wavelengths
CN101681809B (zh) 2007-12-28 2012-04-25 株式会社尼康 曝光装置、曝光方法以及器件制造方法
JP5480496B2 (ja) 2008-03-25 2014-04-23 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画方法及び荷電粒子ビーム描画装置
US8405923B2 (en) * 2008-08-01 2013-03-26 Pioneer Corporation Electron beam recording apparatus, controller for the same, and method for controlling same
EP2556527B1 (en) 2010-04-09 2017-03-22 Carl Zeiss Microscopy GmbH Charged particle detection system and multi-beamlet inspection system
JP5835892B2 (ja) * 2010-12-27 2015-12-24 キヤノン株式会社 荷電粒子線描画装置及びデバイス製造方法
JP5832141B2 (ja) 2011-05-16 2015-12-16 キヤノン株式会社 描画装置、および、物品の製造方法
JP5859778B2 (ja) * 2011-09-01 2016-02-16 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法

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