JP2014209482A5 - - Google Patents

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Publication number
JP2014209482A5
JP2014209482A5 JP2014083065A JP2014083065A JP2014209482A5 JP 2014209482 A5 JP2014209482 A5 JP 2014209482A5 JP 2014083065 A JP2014083065 A JP 2014083065A JP 2014083065 A JP2014083065 A JP 2014083065A JP 2014209482 A5 JP2014209482 A5 JP 2014209482A5
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JP
Japan
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field
particle beam
particle
beam microscope
grid electrode
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JP2014083065A
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English (en)
Japanese (ja)
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JP6286268B2 (ja
JP2014209482A (ja
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Priority claimed from DE102013006535.6A external-priority patent/DE102013006535B4/de
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JP2014083065A 2013-04-15 2014-04-14 エネルギー選択的検出器系を有する走査型粒子顕微鏡 Active JP6286268B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102013006535.6A DE102013006535B4 (de) 2013-04-15 2013-04-15 Raster-Partikelstrahlmikroskop mit energiefilterndem Detektorsystem
DE102013006535.6 2013-04-15

Publications (3)

Publication Number Publication Date
JP2014209482A JP2014209482A (ja) 2014-11-06
JP2014209482A5 true JP2014209482A5 (https=) 2017-06-15
JP6286268B2 JP6286268B2 (ja) 2018-02-28

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ID=50896418

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JP2014083065A Active JP6286268B2 (ja) 2013-04-15 2014-04-14 エネルギー選択的検出器系を有する走査型粒子顕微鏡

Country Status (5)

Country Link
US (1) US9653255B2 (https=)
JP (1) JP6286268B2 (https=)
CZ (1) CZ309577B6 (https=)
DE (1) DE102013006535B4 (https=)
NL (1) NL2012618B1 (https=)

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DE112017006846T5 (de) * 2017-02-22 2019-10-02 Hitachi High-Technologies Corporation Ladungspartikelstrahlvorrichtung
DE112017008344B4 (de) 2017-03-24 2024-05-29 Hitachi High-Tech Corporation Ladungsteilchenstrahl-vorrichtung
WO2018173242A1 (ja) 2017-03-24 2018-09-27 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
US11211224B2 (en) 2018-04-26 2021-12-28 Hitachi High-Tech Corporation Charged particle beam apparatus
US20200373115A1 (en) * 2019-05-23 2020-11-26 Fei Company Multi-beam scanning electron microscope
JP7294981B2 (ja) * 2019-10-18 2023-06-20 株式会社荏原製作所 電子線装置及び電極
JP7250661B2 (ja) 2019-10-31 2023-04-03 株式会社日立ハイテク 荷電粒子線装置
CN110927194B (zh) * 2019-12-11 2020-08-18 中国科学院地质与地球物理研究所 确定泥页岩有机孔含量和孔径分布的方法
US11508591B2 (en) 2021-02-08 2022-11-22 Kla Corporation High resolution electron beam apparatus with dual-aperture schemes

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