JP2014208469A5 - - Google Patents

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Publication number
JP2014208469A5
JP2014208469A5 JP2014062375A JP2014062375A JP2014208469A5 JP 2014208469 A5 JP2014208469 A5 JP 2014208469A5 JP 2014062375 A JP2014062375 A JP 2014062375A JP 2014062375 A JP2014062375 A JP 2014062375A JP 2014208469 A5 JP2014208469 A5 JP 2014208469A5
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JP
Japan
Prior art keywords
resin
transparent
substrate
conductive pattern
transparent conductive
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JP2014062375A
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English (en)
Japanese (ja)
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JP2014208469A (ja
JP6356453B2 (ja
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Publication of JP2014208469A5 publication Critical patent/JP2014208469A5/ja
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JP2014062375A 2013-03-29 2014-03-25 透明導電パターン形成用基板、透明導電パターン形成基板及び透明導電パターン形成基板の製造方法 Expired - Fee Related JP6356453B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014062375A JP6356453B2 (ja) 2013-03-29 2014-03-25 透明導電パターン形成用基板、透明導電パターン形成基板及び透明導電パターン形成基板の製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013074106 2013-03-29
JP2013074106 2013-03-29
JP2014062375A JP6356453B2 (ja) 2013-03-29 2014-03-25 透明導電パターン形成用基板、透明導電パターン形成基板及び透明導電パターン形成基板の製造方法

Publications (3)

Publication Number Publication Date
JP2014208469A JP2014208469A (ja) 2014-11-06
JP2014208469A5 true JP2014208469A5 (enrdf_load_stackoverflow) 2017-03-23
JP6356453B2 JP6356453B2 (ja) 2018-07-11

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Family Applications (1)

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JP2014062375A Expired - Fee Related JP6356453B2 (ja) 2013-03-29 2014-03-25 透明導電パターン形成用基板、透明導電パターン形成基板及び透明導電パターン形成基板の製造方法

Country Status (1)

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JP (1) JP6356453B2 (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6669443B2 (ja) * 2015-06-02 2020-03-18 昭和電工株式会社 金属ナノワイヤを用いた導電パターンの保護膜用樹脂組成物及び透明導電基板
JP6672819B2 (ja) * 2016-01-18 2020-03-25 東レ株式会社 ポリエステルフィルム
KR20170108612A (ko) * 2016-03-18 2017-09-27 한국과학기술원 빛을 이용한 박막 제조방법
JP6816435B2 (ja) * 2016-10-03 2021-01-20 凸版印刷株式会社 透明導電性フィルム
WO2019131679A1 (ja) * 2017-12-25 2019-07-04 大日本印刷株式会社 導電性フィルム、センサ、タッチパネル、画像表示装置、および保護フィルム付き導電性フィルム
JP7249430B2 (ja) * 2020-03-02 2023-03-30 株式会社東芝 透明電極および透明電極の製造方法、ならびに透明電極を具備した光電変換素子

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120128155A (ko) * 2005-08-12 2012-11-26 캄브리오스 테크놀로지즈 코포레이션 나노와이어 기반의 투명 도전체
JP2009094033A (ja) * 2007-10-12 2009-04-30 Konica Minolta Holdings Inc 透明導電材料その製造方法及びそれを用いた透明導電素子
JP5245110B2 (ja) * 2007-11-21 2013-07-24 コニカミノルタ株式会社 電極、透明導電膜、及びそれらの製造方法
GB0908300D0 (en) * 2009-05-14 2009-06-24 Dupont Teijin Films Us Ltd Polyester films
JP2014133356A (ja) * 2013-01-10 2014-07-24 Toray Ind Inc 導電積層体、パターン化導電積層体、その製造方法、および、それらを用いてなるタッチパネル

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