JP2014193450A - Light radiation device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To block vortex airflow formed in a space formed among a gas outlet, a lamp, and a radiated surface and thereby prevent powder flown by the vortex airflow from adhering to the lamp.SOLUTION: A light radiation device includes: a lamp 4 which radiates light toward a radiated surface Wa; a gas supply part 5 having a gas outlet 51x which is disposed at the lateral side of the lamp 4 and blows out a gas to side surfaces 41c, 41d of the lamp 4; and a shield body 6 which is provided between the gas outlet 51x and the lamp 4 so as to be located close to the radiated surface Wa side than the gas outlet 51x.

Description

  The present invention relates to a light irradiation apparatus such as an ultraviolet irradiation apparatus.

  Conventionally, for example, an ultraviolet irradiation device is used for irradiating a processing object with ultraviolet light of, for example, 172 nm and cleaning the processing object. When ultraviolet rays exist in the atmosphere, such ultraviolet rays are absorbed by the oxygen and significantly attenuated. For this reason, as shown in Patent Document 1, an inert gas such as nitrogen gas is supplied to the space between the ultraviolet lamp and the object to be processed to suppress ultraviolet attenuation.

  As a method of supplying the inert gas to the space between the ultraviolet lamp and the object to be processed, the ultraviolet lamp and the object to be processed located below the ultraviolet lamp are arranged above the ultraviolet lamp. For example, a method of supplying an inert gas in a down flow from a gas outlet has been considered.

  However, in the method of supplying an inert gas by downflow, a so-called white powder called powdery substance may adhere to the surface of the ultraviolet lamp. This white powder is converted into an oxide by reacting with the ultraviolet rays emitted from the ultraviolet lamp when Si-based suspended substances existing in the atmosphere where the ultraviolet irradiation device sublimated from the processing object is installed enter the ultraviolet irradiation device. It is thought that

  Specifically, in the configuration in which jetting is performed by downflow, a vertical vortex turbulent flow that is wound up above the ultraviolet lamp is generated in the flow of gas jetted from the gas outlet. And the said powdery substance is wound up to the upper part of an ultraviolet lamp by this vortex-like turbulent flow, and the wound-up powdery substance will be further blown on a ultraviolet lamp on the downflow of gas. In this way, the above-mentioned white powder adheres to the ultraviolet lamp. If the white powder adheres to the surface of the ultraviolet lamp in this way, the white powder absorbs the ultraviolet light, thereby reducing the amount of ultraviolet radiation emitted from the ultraviolet lamp and causing particles that are a cause of defective processing objects. There is.

  For this reason, as shown in Patent Document 2, gas is supplied in a conventional downflow by arranging a gas outlet on the side of the lamp and supplying gas from the gas outlet to the side of the lamp. The generation of the vortex-like turbulence generated in the above is suppressed, and the powdery substance is prevented from being wound up and sprayed onto the ultraviolet lamp.

JP 2005-197291 A International Publication No. 2010/32852

  However, even when the inventor of the present application has a configuration in which the gas outlet is arranged on the side of the lamp as described above, as shown in FIG. 7, the gas outlet, the ultraviolet lamp, the irradiated surface of the processing object, It was found that a vortex was generated in the space between. Then, the inventor of the present application, the sublimation powder generated on the irradiated surface is irradiated with ultraviolet rays soars on the vortex and blows to the side of the lamp, and the powder adheres to the side of the lamp. As a result, it has been found that the distortion of the discharge tube of the ultraviolet lamp increases, causing damage and the like.

  Therefore, the present invention has been made to solve the above-described problems, and by blocking the vortex airflow formed in the space between the gas outlet, the lamp and the irradiated surface, The main problem is to prevent the body from adhering to the lamp.

  That is, the light irradiation apparatus according to the present invention is disposed on a side that is orthogonal to the lamp that irradiates light toward the surface to be irradiated, and the facing direction of the lamp and the surface to be irradiated, and gas is supplied to the side surface of the lamp. A gas supply unit having a gas outlet to be blown out, and disposed between the gas outlet and the lamp, and shields a vortex airflow formed in a space between the gas outlet, the lamp and the irradiated surface. And a shielding plate.

With such a light irradiation device, it is possible to suppress the powder from adhering to the lamp, and it is possible to suppress the contamination of the lamp and the distortion and damage caused by adhering to the discharge tube of the lamp.
In addition, a gas outlet is arranged on the side of the lamp so that gas is blown directly onto the side of the lamp, so that the lamp can be cooled accurately with a relatively small gas flow rate, and the light intensity accompanying the temperature rise of the lamp Can be suppressed, and running costs can be reduced. Here, the configuration in which the gas is directly blown onto the lamp is preferably that the gas is blown onto the lamp surface so that the gas forms a laminar flow along the lamp surface. Thereby, adhesion of white powder to the lamp surface can be sufficiently suppressed.

It is desirable that the lamp has a straight tube shape, and a plurality of the gas outlets are provided on the side of the lamp along the longitudinal direction of the lamp.
In this case, a uniform cooling effect and powder adhesion suppressing effect can be obtained in the lamp longitudinal direction.

  In this configuration, it is desirable that the shielding plate is provided along the lamp longitudinal direction corresponding to each of the plurality of gas outlets. That is, by providing a shielding plate corresponding to each of the plurality of gas outlets, it is possible to block the vortex airflow formed in the spaces between all the gas outlets, the lamp, and the irradiated surface. In particular, in the case where the plurality of gas outlets are respectively disposed on both sides of the lamp, it is desirable to provide the shielding plates on both sides of the lamp.

  Here, on one side of the lamp, the configuration in which the shielding plate is provided corresponding to each of the plurality of gas outlets is as follows: (1) It has a plurality of shielding plates, and one shielding plate has one Configuration provided corresponding to the gas outlets, (2) Configuration including a plurality of shielding plates and corresponding to two or more gas outlets where one shielding plate is continuously arranged, (3 ) A configuration in which one shielding plate is provided and the one shielding plate is provided corresponding to all of the plurality of gas outlets is conceivable. In addition, if it is the structure which provides one shielding board like said (3), the airflow in each part of a lamp | ramp longitudinal direction can be made substantially the same, and generation | occurrence | production of an excess turbulent flow can be prevented.

The lamp has a flat shape that is long in one direction and has a smooth curved shape at an end in a short side direction, and the gas blower discharges the gas toward an end in the short side direction of the lamp. It is desirable that a plurality of lamps are arranged side by side so as to blow out.
In this case, the gas blown out from the gas outlet toward the end of the lamp in the short side direction flows along the smooth curved shape of the end and gently spreads on the flat surface to form a laminar flow. To do. As a result, the gas flow gradually spreads on the flat surface of the lamp, and thus the generation of vortices due to the gas flow is further suppressed.

It is desirable that a cover body that covers the space surrounding the lamp is provided on the side opposite to the irradiated surface with respect to the lamp, and the shielding plate is provided on the cover body.
By covering the surrounding space of the lamp with the cover body in this way, the volume of the surrounding space of the lamp to be replaced with gas can be reduced, and the gas purge efficiency can be increased. Further, by providing the shielding plate on the cover body, not only the device configuration around the lamp can be simplified, but also the lamp and the shielding plate can be positioned only by positioning the cover body and the lamp.

  Moreover, what integrally formed the cover body and the shielding board is desirable. Specifically, it is conceivable to form the shielding plate by bending an opening side wall portion on the irradiated surface side in the cover body to the lamp side.

Specifically, the shielding plate extends in a direction parallel to the irradiated surface, extends inclined toward the irradiated surface side toward the side surface direction of the lamp, or the surface on the irradiated surface side. It is more preferable to make it into the shape which has an unevenness | corrugation.
The effect mentioned above can be acquired more reliably by setting it as such a shape.

  According to the present invention configured as described above, since the shielding body is provided between the gas outlet and the lamp on the irradiated surface side of the gas outlet, the gap between the gas outlet and the lamp and the irradiated surface is provided. The eddy current formed in the space can be blocked. As a result, the powder can be prevented from rising due to the vortex air flow, and the powder can be prevented from adhering to the lamp, and the lamp can be prevented from being stained or damaged.

The schematic diagram which shows the structure of the washing | cleaning apparatus using the ultraviolet irradiation device of this embodiment. Sectional drawing which shows the principal part structure of the embodiment. The perspective view which shows the principal part structure of the embodiment. The top view which shows the principal part structure of the embodiment. The expanded sectional view which shows typically the flow of the inert gas of the embodiment. The schematic diagram which shows the principal part structure of the ultraviolet irradiation device of deformation | transformation embodiment. The schematic diagram which shows the eddy current of the conventional ultraviolet irradiation device.

  Hereinafter, an embodiment in which an ultraviolet irradiation apparatus according to the present invention is applied to, for example, a glass substrate cleaning apparatus will be described with reference to the drawings.

  The cleaning apparatus 100 according to this embodiment irradiates a glass substrate W, which is a processing target of cleaning processing, with vacuum ultraviolet rays of 200 nm or less (specifically, ultraviolet rays having a wavelength of 172 nm), and is generated by the ultraviolet rays and the ultraviolet rays. This is an apparatus for decomposing and removing organic contaminants on the surface Wa (hereinafter, irradiated surface Wa) of the glass substrate W by the cleaning action of the active oxygen.

  Specifically, as shown in FIG. 1, the cleaning apparatus 100 includes a casing 2 having an introduction port 2 a through which a glass substrate W to be transported is introduced and a carry-out port 2 b through which the glass substrate W is unloaded, and the inside of the casing 2. And a plurality of direct mechanisms for irradiating the glass substrate W, which is provided in the casing 2 and is transported by the transport mechanism 3, with ultraviolet rays. And a tubular ultraviolet lamp 4.

  The cleaning apparatus 100 according to the present embodiment has a configuration in which only a gas is passed between the irradiated surface Wa side of the ultraviolet lamp 4 and the glass substrate W without using a glass window or the like. The space and the transport space such as the glass substrate W are continuous.

  In this cleaning apparatus 100, when the glass substrate W is carried in from the inlet 2a on the upstream side in the transport direction (right side in FIG. 1), the glass substrate W is transported to the downstream side in the transport direction by the transport mechanism 3 at a set speed, The ultraviolet lamp 4 irradiates the glass substrate W with ultraviolet rays. Since vacuum ultraviolet rays such as 172 nm irradiated by the ultraviolet lamp 4 are largely absorbed by oxygen in the air, the transport path and the vicinity of the glass substrate W in the casing 2 are replaced with clean inert gas supplied from the outside. The inert gas that has passed through the transfer path is discharged from an exhaust port 2c or the like at the bottom of the casing 2.

  In the present embodiment, nitrogen gas is used as the inert gas, but other inert gas may be used. Further, a gas (process gas) in which an inert gas is mixed with a small amount of air, oxygen or the like that can be substantially processed by irradiating ultraviolet rays according to the purpose may be used. Further, a mixture of two or more kinds of gases may be used.

  The plurality of ultraviolet lamps 4 are arranged in parallel so as to face the glass substrate W transported by the transport mechanism 3 and have, for example, equal intervals along the transport direction (left-right direction in FIG. 1 and the like). Further, each ultraviolet lamp 4 is arranged such that its longitudinal direction coincides with the conveyance lateral direction perpendicular to the conveyance direction by the conveyance mechanism 3. Note that the facing direction of the glass substrate W and the ultraviolet lamp 4 coincides with the vertical direction.

  As shown in FIG. 2, each ultraviolet lamp 4 is an excimer lamp that emits vacuum ultraviolet light having a wavelength of 172 nm, for example. Specifically, the ultraviolet lamp 4 includes a discharge tube 41 in which a discharge gas such as xenon gas is sealed, and a pair of electrodes (not shown) formed on the outer peripheral surface of the discharge tube 41. .

  The discharge tube 41 is made of synthetic quartz glass, has a flat shape that is long in one direction, and has a structure in which both ends in the longitudinal direction are closed. Further, the discharge tube 41 has a smooth curved shape at the end in the short side direction (conveyance direction). Specifically, the discharge tube 41 has flat surfaces (an upper flat surface 41a and a lower flat surface 41b) facing each other, and curved side surfaces 41c and 41d that connect the long sides of the flat surfaces 41a and 41b. The curved side surfaces 41c and 41d serve as end portions in the short side direction, and form a smooth curved shape rounded outwardly.

  The pair of electrodes are formed on flat surfaces 41 a and 41 b that form a pair of the discharge tube 41. The electrode formed on the flat surface 41a on the upper surface side of the discharge tube 41 is a solid electrode in which a metal film is uniformly formed on the flat surface 41a, and is formed on the flat surface 41b on the lower surface side of the discharge tube 41. The electrode is a mesh electrode in which a metal film is formed in a mesh shape on the flat surface 41b. When an alternating high voltage is applied to the pair of upper and lower electrodes, a so-called dielectric barrier discharge is generated in the inner space of the discharge tube 41 and acts on the sealed gas in the discharge tube 41. When the sealed gas is xenon, The ultraviolet light in the 172 nm band is generated. The generated ultraviolet light passes through the gap between the mesh electrodes on the lower surface side and is radiated to the outside (irradiated surface Wa).

  The ultraviolet lamp 4 configured in this manner is substantially parallel to the irradiated surface Wa of the glass substrate W on which the flat surface 41b that radiates ultraviolet rays is transported, and the longitudinal direction of the flat surface 41b coincides with the transport lateral width direction. It is installed to do. Thereby, it is possible to irradiate the glass substrate W to be conveyed with ultraviolet rays having a uniform intensity over a relatively long distance.

  As shown in FIGS. 2 and 3, the cleaning apparatus 100 according to this embodiment includes a gas supply unit 5 that supplies nitrogen gas to the vicinity of the ultraviolet lamp 4, particularly to the space between the ultraviolet lamp 4 and the irradiated surface Wa. have.

  The gas supply unit 5 includes a nozzle pipe 51 for blowing nitrogen gas to the ultraviolet lamp 4, and a supply pipe 52 for supplying nitrogen gas to the nozzle pipe 51 from a nitrogen gas source (not shown) provided outside the apparatus. It has. The supply pipe 52 is connected to the upper wall portion of the nozzle pipe 51, and a plurality of supply pipes 52 are connected to one nozzle pipe 51.

  The nozzle pipe 51 is provided substantially parallel to the ultraviolet lamp 4 so as to face the curved side surfaces 41 c and 41 d of the ultraviolet lamp 4. That is, the nozzle pipe 51 is provided to face the curved side surfaces 41c and 41d of the ultraviolet lamp 4 on the upstream side in the transport direction or the downstream side in the transport direction, and is provided along the transport lateral width direction.

  Specifically, as shown in FIG. 4, the nozzle pipe 51 has substantially the same length as the ultraviolet lamp 4 in the longitudinal direction of the ultraviolet lamp 4. On the side wall of the nozzle pipe 51 facing the ultraviolet lamp 4, as shown in FIGS. 2 and 3, along the longitudinal direction of the ultraviolet lamp 4, an inert gas is curved on the curved side surface 41c of the ultraviolet lamp 4. A plurality of gas outlets 51x for spraying toward 41d are formed.

  The gas outlet 51x is formed opposite to the curved side surfaces 41c and 41d of the ultraviolet lamp 4 on the upstream side in the transport direction or on the downstream side in the transport direction (that is, in the horizontal direction). The height position of the gas outlet 51x coincides with the vertical center position of the ultraviolet lamp 4. With such a configuration, the nitrogen gas blown out from the gas outlet 51x is blown out toward the tops of the curved side surfaces 41c and 41d along the horizontal direction.

  In the present embodiment, since one nozzle pipe 51 is provided for two ultraviolet lamps 4 adjacent to each other, an inert gas is blown to the ultraviolet lamp 4 on each of the left and right side walls of the nozzle pipe 51. A plurality of gas outlets 51x are formed. In addition, a plurality of gas outlets 51x are arranged on both sides of the single ultraviolet lamp 4 on the upstream side in the transport direction and on the downstream side in the transport direction. The plurality of gas outlets 51x are formed, for example, at equal intervals on the side wall of the nozzle pipe 51. Further, as shown in FIG. 4, the arrangement of the gas outlets 51x arranged at equal intervals on the upstream side in the transport direction and on the downstream side in the transport direction is shifted in a staggered manner with a ½ interval shift from each other. However, only the end portions of the gas outlets 51x arranged are arranged so that the upstream side and the downstream side face each other.

  And the washing | cleaning apparatus 100 of this embodiment is for interrupting the eddy current which arises in the space formed between the gas blower outlet 51x, the ultraviolet lamp 4, and the to-be-irradiated surface Wa, as shown in FIGS. A shielding plate 6 is provided.

The shielding plate 6 is disposed between the gas outlet 51x and the ultraviolet lamp 4, and generates a vortex airflow formed in a space between the gas outlet 51x, the ultraviolet lamp 4, and the irradiated surface Wa. Shield.
Specifically, between the gas outlet 51x and the ultraviolet lamp 4, it is provided closer to the irradiated surface Wa than the gas outlet 51x. Specifically, the shielding plate 6 is provided between the gas outlet 51x and the ultraviolet lamp 4 in a plan view (see FIG. 4), and is lower than the height position of the gas outlet 51x in a side view. Therefore, it is provided above the irradiated surface Wa (see FIGS. 2 and 5). Further, the shielding plate 6 extends along the transport direction, and the extension position of the shielding plate 6 from the gas outlet 51x is such that the ultraviolet rays emitted from the lower flat surface 41b of the ultraviolet lamp 4 are not blocked. It is preferable to extend to the curved side surfaces 41c and 41d side of the ultraviolet lamp 4.

  Further, the shielding plate 6 of the present embodiment is arranged in a direction in which the plurality of gas outlets 51x are arranged so as to partition the whole of the plurality of gas outlets 51x formed on the side wall of the nozzle pipe 51 and the irradiated surface Wa (that is, ultraviolet lamps). 4 in the longitudinal direction). In the present embodiment, since the plurality of gas outlets 51x are arranged on the left and right sides of the ultraviolet lamp 4, the shielding plates 6 are also arranged on the left and right sides of the ultraviolet lamp 4, respectively.

  The shielding plate 6 is provided on a cover body 7 that covers the space around the ultraviolet lamp 4 as shown in FIGS. The cover body 7 can reduce the volume of the space around the ultraviolet lamp 4 to be replaced with nitrogen gas, and can increase the nitrogen gas purge efficiency.

  Specifically, the shielding plate 6 extends in a direction parallel to the irradiated surface Wa, extends toward the irradiated surface Wa side toward the side surface direction of the ultraviolet lamp 4, or extends to the irradiated surface. It is more preferable that the surface on the irradiation surface Wa side has an uneven shape. The effect mentioned above can be acquired more reliably by setting it as such a shape.

  The cover body 7 is provided on the upper side that is opposite to the irradiated surface Wa with respect to the ultraviolet lamp 4. Specifically, the cover body 7 has a substantially U-shaped cross section when viewed from the longitudinal direction of the ultraviolet lamp 4, and the vicinity of the ultraviolet lamp 4 is viewed from the upper side with the U-shaped open side facing downward. Covering. Further, the cover body 7 is configured to cover the entire longitudinal direction of the ultraviolet lamp 4, and in the present embodiment, has a length substantially the same as that of the ultraviolet lamp 4 in the longitudinal direction of the ultraviolet lamp 4. .

  The lower end position of the cover body 7 is located below the lower end position of the nozzle pipe 51, and the shielding plate 6 is formed at the lower end position. Specifically, one flat shielding plate 6 is formed on one side of the ultraviolet lamp 4 by bending the lower end portion of the opening side wall portion 71 on the irradiated surface side in the cover body 7 toward the ultraviolet lamp 4 side (inner side). Has been. Since the shielding plate 6 is thus formed, the shielding plate 6 has substantially the same length as the ultraviolet lamp 4 in the longitudinal direction of the ultraviolet lamp 4. In addition, in this embodiment, since the several gas outlet 51x is arrange | positioned at the both right and left sides of the ultraviolet lamp 4, each opening side wall part 71 of the both sides in the cover body 7 is bent, and the shielding board 6 is formed. . By providing the shielding plate 6 on the cover body 7 in this way, not only the device configuration around the ultraviolet lamp 4 can be simplified, but also the ultraviolet lamp 4 can be shielded only by positioning the cover body 7 and the ultraviolet lamp 4. The plate 6 can be positioned.

  Further, the opening side wall 71 of the cover body 7 is disposed close to the side wall of the nozzle pipe 51 with a slight gap therebetween, and the gas opening 51x of the nozzle pipe 51 is not blocked by the opening side wall 71. Thus, the opening 71x larger than the gas outlet 51x is formed corresponding to each gas outlet 51x. The ultraviolet lamp 4 covered with the cover body 7 is attached to a central position by a support member (not shown) so as to be an equal distance with respect to the opening side wall portions 71 on both sides.

  In addition, a slit-like discharge port 72x for discharging an inert gas is formed in the upper wall portion 72 of the cover body 7. The discharge ports 72x are located immediately above the central position of the ultraviolet lamp 4, and are formed in a state in which a plurality of the outlets 72x are arranged in the longitudinal direction of the ultraviolet lamp 4 as indicated by a virtual line in FIG.

Next, the flow of nitrogen gas in the gas supply unit 5 will be described with reference to FIG.
The nitrogen gas ejected from the gas outlet 51x of the nozzle pipe 51 hits the apex of the curved side surfaces 41c and 41d of the ultraviolet lamp 4, and the upper surface side of the ultraviolet lamp 4 along the curved shapes of the curved side surfaces 41c and 41d of the ultraviolet lamp 4 And flows along the flat surfaces 41 a and 41 b above and below the ultraviolet lamp 4. Due to the flow along the surface of the ultraviolet lamp 4, a clean nitrogen gas layer is formed on the surface of the ultraviolet lamp 4. The nitrogen gas that has flowed along the flat surface 41a on the upper surface side of the ultraviolet lamp 4 further flows to the discharge port 72x and is discharged to the outside.

  On the other hand, the nitrogen gas that has flowed to the lower surface side of the ultraviolet lamp 4 hits the irradiated surface Wa and then flows toward the gas outlet 51x (the opening 71x of the opening side wall 71), but the gas outlet 51x (the opening side wall). The shielding plate 6 is provided below the opening 71x) of the portion 71. That is, the nitrogen gas flowing toward the gas outlet 51x (the opening 71x of the opening side wall 71) hits the lower surface of the shielding plate 6 and prevents the formation of a vortex airflow.

  The space between the lower surface side of the ultraviolet lamp 4 and the glass substrate W is accurately replaced with nitrogen gas by the nitrogen gas forming the flow path in this way. Further, the ultraviolet lamp 4 is effectively cooled with a relatively small flow rate of nitrogen gas, and the adhesion of white powder is effectively suppressed by the flow of clean nitrogen gas. Furthermore, since the nitrogen gas that has flowed upward is discharged through the discharge port 72x, the turbulence of the airflow that scatters the white powder can also be suppressed. The nitrogen gas that has flowed downward is discharged from the exhaust port 2c at the bottom of the casing 2, or flows to the outside together with the object to be processed from the outlet port 2b of the casing.

  According to the cleaning apparatus 100 using the ultraviolet irradiation device of the present embodiment configured as described above, the gas outlet 51x is disposed on the side of the ultraviolet lamp 4 so that the gas is directly applied to the side surfaces 41c and 41d of the ultraviolet lamp 4. In the structure to blow, since the shielding plate 6 is provided between the gas outlet 51x and the ultraviolet lamp 4 on the irradiated surface Wa side of the gas outlet 51x, the gas outlet 51x, the ultraviolet lamp 4, and the irradiated surface Wa. The eddy current formed in the space between can be blocked. Thereby, it is possible to suppress powder such as sublimate generated on the irradiated surface Wa from being swirled on the vortex and blown to the lamp side surfaces 41c and 41d. Therefore, it is possible to suppress the powder from adhering to the ultraviolet lamp 4, and it is possible to suppress the contamination of the ultraviolet lamp 4 and the distortion and breakage caused by adhering to the discharge tube 41 of the ultraviolet lamp 4.

The present invention is not limited to the above embodiment.
For example, in the said embodiment, although it has set as the structure which provides the shielding board 6 in the cover body 7 (the opening side wall part 71), it is good also as a structure which provides the shielding board 6 in the side wall of the nozzle piping 51, as shown in FIG. And it is good also as a structure which provides the shielding board 6 using another peripheral member.

  Moreover, in the said embodiment, although it has the cover body 7, it is good also as a structure which does not have a cover body.

  Furthermore, in the said embodiment, the shielding board 6 has the length substantially the same as the ultraviolet lamp 4 in the longitudinal direction of the ultraviolet lamp 4, and the structure which provides the shielding board 6 in the side of the ultraviolet lamp 4 is provided. However, a configuration in which a plurality of shielding plates 6 are provided, for example, a shielding plate 6 corresponding to each gas outlet 51x may be provided.

  In addition, in the above-described embodiment, one nozzle pipe is shared by the adjacent ultraviolet lamps 4, but a nozzle pipe dedicated to the ultraviolet lamp may be provided on both sides of each ultraviolet lamp.

  In addition, in the above-described embodiment, the gas is blown out from both sides of the single ultraviolet lamp 4, but the gas may be blown out collectively to a plurality of arranged ultraviolet lamps.

  In the above-described embodiment, the case where the ultraviolet irradiation apparatus of the present invention is applied to a cleaning apparatus has been described. However, the present invention can be applied to various processing apparatuses that use ultraviolet light. Further, the present invention is not limited to the ultraviolet irradiation device, and can be applied to a light irradiation device that irradiates light other than ultraviolet rays such as visible light.

  In addition, the present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present invention.

100 ... Cleaning device (light irradiation device)
Wa ... Irradiated surface 4 ... UV lamp 4c, 4d ... Lamp side surface 5 ... Gas supply part 51x ... Gas outlet 6 ... Shield plate 7 ... Cover body

Claims (8)

A lamp that emits light toward the irradiated surface;
A gas supply unit that is disposed on a side perpendicular to the facing direction of the lamp and the irradiated surface, and has a gas outlet that blows gas to the side surface of the lamp;
A light irradiation apparatus provided with the shielding board which is arrange | positioned between the said gas blower outlet and the said lamp | ramp, and shields the vortex | airflow formed in the space between the said gas blower outlet, the said lamp | ramp, and the said to-be-irradiated surface. The lamp has a straight tube shape;
A plurality of the gas outlets are provided on the side of the lamp along the longitudinal direction of the lamp,
The light irradiation apparatus according to claim 1, wherein the shielding plate is provided along the lamp longitudinal direction corresponding to each of the plurality of gas outlets. The lamp has a flat shape that is long in one direction and has a smooth curved shape at an end in a short side direction, and the gas blower discharges the gas toward an end in the short side direction of the lamp. The light irradiation apparatus according to claim 1, wherein a plurality of light irradiation apparatuses are arranged side by side on both sides of the lamp so as to blow out. The cover body which covers the surrounding space of the said lamp on the opposite side to the said to-be-irradiated surface with respect to the said lamp | ramp, The said shielding board is provided in the said cover body. Light irradiation device.   The light irradiation apparatus according to claim 1, wherein the shielding plate extends in a direction parallel to the irradiated surface.   The light irradiation apparatus according to claim 1, wherein the shielding plate extends while being inclined toward the irradiation surface toward the side surface of the lamp.   The light irradiation apparatus according to claim 1, wherein the shielding plate has irregularities on a surface on the irradiated surface side.   The light irradiation apparatus according to claim 1, wherein the lamp is an ultraviolet lamp that irradiates ultraviolet rays.