CN108687057B - Light irradiation device - Google Patents
Light irradiation device Download PDFInfo
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- CN108687057B CN108687057B CN201810289463.2A CN201810289463A CN108687057B CN 108687057 B CN108687057 B CN 108687057B CN 201810289463 A CN201810289463 A CN 201810289463A CN 108687057 B CN108687057 B CN 108687057B
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- irradiation device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67213—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one ion or electron beam chamber
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- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Cleaning In General (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Steering Control In Accordance With Driving Conditions (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
Abstract
Provided is a light irradiation device capable of performing light cleaning with high stability regardless of the conveying speed of a processed object. The light irradiation device irradiates ultraviolet light to one surface of a belt-shaped object to be processed conveyed along a conveying path, and is characterized by comprising: a lamp cover having an opening along a passing plane on one surface side of the object to be processed on the conveying path; an ultraviolet lamp provided in the lamp housing and extending in a width direction of the object to be processed; a gas supply unit for supplying an inert gas into the lamp housing; and an exhaust space forming member having an opening along a passage plane on the other surface side of the object to be processed on the conveyance path, wherein a shielding body is provided in the opening of the lamp cover, and the shielding body forms a gas flow resistance bottleneck between the shielding body and both side edge portions of the object to be processed.
Description
Technical Field
The present invention relates to a light irradiation device for irradiating one surface of a belt-shaped object to be processed conveyed along a conveyance path with ultraviolet light to perform optical cleaning.
Background
As a photo ashing treatment of a resist in a manufacturing process of a semiconductor, a liquid crystal, or the like, a removal of a resist adhering to a pattern surface of a template in a nanoimprint apparatus, a dry cleaning treatment of a glass substrate for a liquid crystal, a silicon wafer, or the like, and a cleaning treatment of a bonding surface of a sheet-like film wound around a roll, a photo cleaning (dry cleaning) method by irradiation with ultraviolet rays is known.
As a light irradiation apparatus for performing such light cleaning, for example, patent document 1 discloses the following technique: the glass substrate is irradiated with vacuum ultraviolet rays, and contaminants on the surface of the glass substrate are removed by the cleaning action of the vacuum ultraviolet rays and active oxygen generated by the vacuum ultraviolet rays.
Fig. 18 is a sectional view schematically showing an example of a conventional light irradiation device in a conveyance direction of an object to be processed, fig. 19 is a sectional view of the light irradiation device of fig. 18 in a width direction of the object to be processed, and fig. 20 is a perspective view schematically illustrating a main part of the light irradiation device of fig. 18.
The light irradiation apparatus carries the object W to be processed in from the carrying-in port 58 on the upstream side (right side in fig. 18) along the carrying path, irradiates one surface (upper surface in fig. 18) of the object W to be processed with ultraviolet light from the discharge lamp 51 in the processing region irradiated with ultraviolet light, and then carries out from the carrying-out port 59.
Vacuum ultraviolet rays have a property of being absorbed by oxygen in the atmosphere and greatly attenuated, and conventionally, in such a light irradiation device, an inert gas such as nitrogen gas is supplied from the outside into a globe 52 in which a discharge lamp 51 is disposed, and excess oxygen in an amount not less than an amount necessary for cleaning in an ultraviolet ray emission space between the discharge lamp 51 and an object to be treated is removed to suppress attenuation of the vacuum ultraviolet rays. It is known that when vacuum ultraviolet light is irradiated in an atmosphere having an extremely low oxygen concentration, the amount of ozone generated is extremely small, and therefore the activation action of the surface of the object to be treated by ozone does not work, and the effect of light cleaning is rather reduced. The inert gas is discharged from, for example, a gas supply port of a gas supply pipe 56 provided on the back side (upper surface side in fig. 18) of the discharge lamp 51 in the lamp housing 52 provided on one surface side (upper surface side in fig. 18) of the object W to be processed, and after replacing the ultraviolet radiation space in the lamp housing 52 with an inert gas atmosphere, the inert gas is mainly discharged from a gas discharge port 57 of the exhaust space forming member 53 provided on the other surface side (lower surface side in fig. 18) of the object W to be processed.
In fig. 18, reference numeral 55 denotes a sub-chamber having an exhaust portion 55A.
[ Prior Art document ]
[ patent document ]
[ patent document 1 ] Japanese patent application laid-open No. 2010-75888
The invention is to solve subject of (1)
In the light irradiation device, the object to be processed has a substantially belt-like structure, specifically, a plate-like structure, a sheet-like film, or other structures of various shapes or materials, and is a target of light cleaning. The speed of conveying the object to be processed to the processing area, for example, the speed of flowing the sheet-like film, is determined depending on the shape, material, surface condition, and the like of the object to be processed, and therefore differs for each object to be processed.
Further, since the amount of air introduced into the periphery of the processing region (ultraviolet radiation space) as the object to be processed is conveyed depends on the conveyance speed of the object to be processed, there is a problem that the oxygen concentration in the ultraviolet radiation space varies for each object to be processed, and as a result, the desired light cleaning effect cannot be stably obtained.
Disclosure of Invention
The present invention has been made in view of the above circumstances, and an object thereof is to provide a light irradiation device capable of performing light cleaning with high stability regardless of the conveyance speed of a subject to be processed.
[ MEANS FOR solving PROBLEMS ] A method for solving the problems
The light irradiation device according to the present invention irradiates one surface of a belt-shaped object to be processed conveyed along a conveying path with ultraviolet light, and is characterized by comprising:
a lamp cover having an opening along a passing plane on one surface side of the object to be processed on the conveying path;
an ultraviolet lamp provided in the lamp housing and extending in a width direction of the object to be processed;
a gas supply unit for supplying an inert gas into the lamp housing; and
an exhaust space forming member having an opening along a passage plane on the other surface side of the object to be processed on the conveying path,
the opening of the lamp cover is provided with a shielding body, and the shielding body forms a gas flow resistance choke between the shielding body and two side edges of the object to be processed.
In the light irradiation device according to the present invention, a side edge portion of the shielding body extending in the conveying direction of the object to be processed may be provided so as to cover another surface of the side edge portion of the object to be processed.
In the light irradiation device according to the present invention, it is preferable that the shielding body is provided so that a side edge portion extending in a conveying direction of the object to be processed is displaceable in a width direction of the object to be processed.
[ Effect of the invention ]
A light irradiation device is provided with a shielding body in an opening of a lamp cover, and the shielding body forms gas flow resistance bottlenecks between the shielding body and both side edge parts of an object to be processed. Further, the gas flow resistance is increased by forming a gas flow resistance choke path to block free gas flow between the space in the globe and the space in the exhaust space forming member, thereby improving the sealing performance in the globe. Therefore, regardless of the carrying speed determined based on the type and shape of the object to be treated, the oxygen concentration in the ultraviolet radiation space can be stably reduced by a smaller amount of inert gas than in the conventional art, and as a result, the occurrence of unevenness in the oxygen concentration in the ultraviolet radiation space can be suppressed, whereby the attenuation of ultraviolet rays in the ultraviolet radiation space can be stably suppressed, and oxygen serving as an ozone source is stably supplied in a small amount as air adhering to the object to be treated in association with the carrying of the object to be treated, and as a result, the light cleaning can be performed with high stability.
Drawings
Fig. 1 is a cross-sectional view schematically showing an example of a light irradiation device according to the present invention, in a conveyance direction of an object to be processed.
Fig. 2 is a cross-sectional view of the light irradiation device of fig. 1 in the width direction of the object to be processed.
Fig. 3 is a perspective view schematically illustrating a main part of the light irradiation device of fig. 1, as viewed from the exhaust space side.
Fig. 4 is a cross-sectional view schematically showing another example of the light irradiation device of the present invention, in the width direction of the object to be processed.
Fig. 5 is a cross-sectional view schematically showing another example of the light irradiation device of the present invention, in the width direction of the object to be processed.
Fig. 6 is a perspective view schematically illustrating a main part of the light irradiation device of fig. 5, as viewed from the exhaust space side.
Fig. 7 is a cross-sectional view schematically showing another example of the light irradiation device of the present invention, in the width direction of the object to be processed.
Fig. 8 is a perspective view schematically illustrating a main part of the light irradiation device of fig. 7, as viewed from the exhaust space side.
Fig. 9 is a cross-sectional view schematically showing a further example of the light irradiation device of the present invention, in the width direction of the object to be processed.
Fig. 10 is a perspective view schematically illustrating a main part of the light irradiation device of fig. 9, as viewed from the exhaust space side.
Fig. 11 is a cross-sectional view schematically showing a further example of the light irradiation device of the present invention, in the width direction of the object to be processed.
Fig. 12 is a perspective view schematically illustrating a main part of the light irradiation device of fig. 11, as viewed from the exhaust space side.
Fig. 13 is a cross-sectional view schematically showing still another example of the light irradiation device of the present invention, in a width direction of the object to be processed.
Fig. 14 is a perspective view schematically illustrating a main part of the light irradiation device of fig. 13 as viewed from the exhaust space side.
Fig. 15 is a cross-sectional view schematically showing still another example of the light irradiation device of the present invention, in a width direction of the object to be processed.
Fig. 16 is a perspective view schematically illustrating a main part of the light irradiation device of fig. 15, as viewed from the exhaust space side.
Fig. 17 is a graph showing the oxygen concentration on the surface of the object to be treated in examples and comparative examples.
Fig. 18 is a cross-sectional view schematically showing an example of a conventional light irradiation device, showing a conveyance direction of an object to be processed.
Fig. 19 is a cross-sectional view of the light irradiation device of fig. 18 in the width direction of the object to be processed.
Fig. 20 is a perspective view schematically illustrating a main part of the light irradiation device of fig. 18.
[ Mark Specification ]
10. Processing chamber
11. Ultraviolet lamp
12. Lamp shade
12A, 12B, 12C frame
12H opening
13. Exhaust space forming member
13H opening
15H opening
16. Gas supply pipe
17. Gas discharge port
18. Carrying-in port
19. Conveying outlet
21. 22 sub-chamber
21A, 21B, 22A, 22B exhaust part
24. 25, 26, 27, 28 screening element
24A, 25A base end
24B, 25B tip end
28h long hole
29. Screw nail
30. Wind shielding body
51. Discharge lamp with a discharge lamp
52. Lamp shade
53. Exhaust space forming member
55. Secondary chamber
55A exhaust part
56. Gas supply pipe
57. Gas discharge port
58. Carrying-in port
59. Conveying port
G. Choke for Gx gas flow resistance
W object to be processed
Wh well
Detailed Description
Hereinafter, embodiments of the present invention will be described.
Fig. 1 is a cross-sectional view of an object to be processed in a conveying direction schematically showing an example of a light irradiation apparatus according to the present invention, fig. 2 is a cross-sectional view of the light irradiation apparatus of fig. 1 in a width direction of the object to be processed, and fig. 3 is a perspective view schematically illustrating a main part of the light irradiation apparatus of fig. 1 as viewed from an exhaust space side.
The light irradiation apparatus of the present invention performs light cleaning by irradiating one surface (upper surface in fig. 1) of a belt-like object W to be processed, which is conveyed along a conveyance path from a conveyance inlet 18 on the upstream side (right side in fig. 1) of a process chamber 10, with ultraviolet light in a process region irradiated with the ultraviolet light from an ultraviolet lamp 11.
The strip-shaped object (workpiece) W to be subjected to light cleaning in the light irradiation device includes a plate-shaped body such as a glass substrate or a printed circuit board, a continuous sheet-shaped film, and the like.
The object W to be processed has a width of, for example, about 100 to 2000 mm.
The processing chamber 10 includes a casing-shaped lamp housing 12 having an opening 12H along a passage plane on one surface side (upper surface side in fig. 1) of the object W to be processed in the processing region of the transport path, and an exhaust space forming member 13 having an opening 13H along a passage plane on the other surface side (lower surface side in fig. 1) of the object W to be processed in the processing region. Thus, the processing chamber 10 is divided into a cleaning processing space formed in the lamp housing 12 and an exhaust space formed in the exhaust space forming member 13 via the processing region of the transfer path. A slit-shaped carrying-in port 18 and a slit-shaped carrying-out port 19 are formed in both end portions of the carrying path of the processing chamber 10 by the globe 12 and the exhaust space forming member 13, respectively.
In the housing 12, a plurality of ultraviolet lamps 11 extending in the width direction of the object W are provided on the same plane so as to be separated from each other in the conveyance direction of the object W, and a gas supply unit that supplies an inert gas into the housing 12 is provided on the back side (upper side in fig. 1) of the ultraviolet lamps 11.
The ultraviolet lamp 11 may be, for example, a xenon excimer lamp having a flat shape whose cross section extends in the transport direction of the object W to be processed, which emits vacuum ultraviolet rays having a central wavelength of about 172 to 380 nm.
Specifically, the gas supply unit includes a gas supply pipe 16 having a plurality of gas supply ports formed by holes or slits, and at least 1 gas supply pipe 16 is disposed in the vicinity of the transfer port 18 in the globe 12.
In the light irradiation device of fig. 1, the gas supply unit includes a plurality of gas supply pipes 16, and each of the gas supply pipes 16 extends parallel to the direction in which the ultraviolet lamp 11 extends, and is disposed on the back surface side of the ultraviolet lamp 11 at an equal distance from the adjacent ultraviolet lamp 11.
As the inert gas, for example, nitrogen gas is used.
A gas discharge port 17 for forcibly discharging the gas in the exhaust space forming member 13 to the outside is provided at the bottom (lower portion in fig. 1) of the exhaust space forming member 13.
In this light irradiation device, the amount of gas discharged from the gas discharge port 17 of the exhaust space forming member 13 is preferably larger than the amount of gas supplied from the gas supply pipe 16 of the gas supply means.
On the upstream side of the processing chamber 10 in the transfer path, a sub-chamber 21 is provided close to the transfer inlet 18. Further, it is preferable that the sub-chamber 22 is provided on the downstream side of the processing chamber 10 on the transfer path, in the vicinity of the transfer outlet 19.
The sub-chambers 21 and 22 are provided so as to face the exhaust portions 21A, 21B, 22A, and 22B, respectively, via the conveyance paths, and forcibly exhaust the gas leaking from the inside of the exhaust space forming member 13 and the inside of the globe 12 through the conveyance port 18 and the conveyance port 19 to the outside.
The amount of exhaust gas from the sub-chambers 21, 22 is preferably larger than the amount of gas supplied from the gas supply pipe 16 of the gas supply unit.
As the conveying means for conveying the object W along the conveying path, for example, a structure in which a plurality of conveying rollers are provided and the object W is conveyed on the conveying rollers may be used in the case where the object W is a plate-like body, or a structure in which a sheet-like film is laid between the unwinding roller and the winding roller and wound from the unwinding roller to the winding roller may be used in the case where the object W is a continuous sheet-like film.
In the light irradiation device of the present invention, the opening 12H of the globe 12 is provided with a shielding body that forms gas flow resistance bottlenecks G between the shielding body and both side edge portions in the width direction of the object W to be processed. Specifically, the shield body is constituted by a plate-shaped frame portion 12A having an opening 15H having a width allowing passage of the object W, which extends along the conveyance plane of the object W continuously from the peripheral edge of the opening 12H of the shade 12. Thus, a choke G for gas flow resistance is formed between the side edge of the opening 15H of the frame portion 12A extending parallel to the conveying direction of the object W and the side edge of the object W in the width direction. The frame 12A of the shade 12 is disposed at the same level as the processing region of the object W.
The distance (interval) between the gas flow resistance bottlenecks G is preferably so large that the pressure in the exhaust space forming member 13 is lower than the pressure in the globe 12 and the pressure state in both spaces can be maintained, and specifically, the differential pressure between the pressure in the globe 12 and the pressure in the exhaust space forming member 13 is preferably maintained at, for example, 1Pa or more. The smaller the distance of the gas flow resistance bottlenecks G, the larger the differential pressure.
In the case of illustrating an example of the size and the like of the light irradiation apparatus of the present invention, when the width of the object W to be processed is, for example, 500mm, the length of the processing chamber 10 in the direction of conveying the object W to be processed is 445mm, and the length of the object W to be processed in the direction of the width is 1090mm.
The distance (interval) between the processing region where the object to be processed W is to be disposed and the top surface (upper surface in fig. 1) of the globe 12 is 10mm, the distance between the processing region where the object to be processed W is to be disposed and the bottom surface (lower surface in fig. 1) of the exhaust space forming member 13 is 72mm, and the distance between the processing region where the object to be processed W is to be disposed and the bottom surface (lower surface in fig. 1) is 150mm.
The pressure inside the globe 12 is a positive pressure 2Pa higher than the outside atmosphere (atmospheric pressure), the pressure inside the exhaust space forming member 13 is a negative pressure 2Pa lower than the outside atmosphere (atmospheric pressure), and the differential pressure is 4Pa.
The length of the ultraviolet lamp 11 was 640mm, and the effective irradiation width of the ultraviolet lamp 11 was 510mm. The distance between the surface (lower surface in fig. 1) of the ultraviolet lamp 11 and the treatment region where the object to be treated W is to be disposed is 4mm.
The supply amount of the inert gas from the gas supply port was 100L/min, the discharge amount of the gas from the gas discharge port 17 of the discharge space forming member 13 was 200L/min, and the discharge amounts from the discharge portions 21A, 21B, 22A, 22B of the sub-chambers 21, 22 were 200L/min, respectively.
In the above-described light irradiation device, the light cleaning process is performed as follows. That is, the object W is carried into the processing area from the carrying-in port 18 of the processing chamber 10 along the carrying path by the carrying unit. Since the distance (distance of the gas flow resistance choke G) between the shielding body (frame portion 12A) provided in the opening 12H of the lamp house 12 and both side edges in the width direction of the object W is small, only a small amount of air adheres to the surface of the object W and is not taken into the periphery of the processing area as the object W is conveyed to the processing area. When ultraviolet rays from the ultraviolet lamp 11 are irradiated to one surface of the object W in the processing area, the one surface of the object W is subjected to the optical cleaning by the ultraviolet rays and ozone generated by the ultraviolet rays irradiated to the air which is brought in a trace amount along with the conveyance of the object W. The object W irradiated with the ultraviolet rays is then carried out from the carrying-out port 19 along the carrying path.
In the series of processes, an inert gas (nitrogen gas) is supplied from the gas supply port of the gas supply pipe 16 into the globe 12. The supplied inert gas is filled in the lamp housing 12, cools the ultraviolet lamp 11, and replaces air in the ultraviolet radiation space between the ultraviolet lamp 11 and the object W to be treated. The inert gas filled in the globe 12 flows out little by little from the gas flow resistance bottlenecks G provided between the shielding body (the frame portion 12A) of the opening 12H and the both side edges in the width direction of the object W to the exhaust space in the exhaust space forming member 13, and is forcibly exhausted from the gas exhaust port 17 of the exhaust space forming member 13 together with ozone generated in the globe 12 and the exhaust space. The inert gas supplied into the globe 12 and the ozone generated in the globe 12 and the exhaust space flow out in the direction of the sub-chambers 21 and 22 through the carrying-in port 18 and the carrying-out port 19 of the processing chamber 10, and are also forcibly exhausted from the exhaust portions 21A, 21B, 22A, and 22B of the sub-chambers 21 and 22.
For example, when the object W is a sheet-like film, the conveying speed of the object W is 0.5 to 40m/min, and when the object W is a plate-like glass substrate, the conveying speed of the object W is 0.5 to 9m/min.
According to the light irradiation device as described above, the opening of the cover 12 is provided with the shielding body that forms the gas flow resistance bottlenecks G with respect to the both side edge portions of the object W to be processed. Further, the gas flow resistance G is formed to block the free gas flow between the space in the globe 12 and the space in the exhaust space forming member 13, and the gas flow resistance is increased, thereby improving the sealing performance in the globe 12. Therefore, regardless of the conveyance speed determined based on the type and shape of the object to be treated W, the oxygen concentration in the ultraviolet radiation space can be stably reduced by a smaller amount of inert gas than in the conventional art, and as a result, the occurrence of unevenness in the oxygen concentration in the ultraviolet radiation space can be suppressed, whereby the attenuation of ultraviolet rays in the ultraviolet radiation space is stably suppressed, and oxygen serving as an ozone source is stably supplied in a small amount as air adhering to the object to be treated in association with the conveyance of the object to be treated, and as a result, the light cleaning can be performed with high stability.
The embodiments of the present invention have been described above, but the present invention is not limited to the above embodiments, and various modifications can be made.
For example, the front end of the side edge portion of the shielding body extending in the conveying direction of the object to be processed may be disposed in a state close to the side edge portion of the object to be processed.
Specifically, as shown in fig. 4, the shielding body may be constituted by a shielding member 24 having a base end portion 24A and a tip end portion 24B connected in a crank shape. The shielding member 24 has a base end portion 24A bonded to a lower surface side (lower surface side in fig. 4) of the frame portion 12A of the globe 12, a tip end portion 24B extending along a parallel plane at a horizontal position on the other surface side of the object W compared to the conveyance plane of the object W, and side edges (tip end edges) of the tip end portion 24B extending in the conveyance direction of the object W are close to both side edge portions in the width direction of the object W and protrude in a state of not covering the other surfaces of both side edge portions in the width direction of the object W. Thus, gas flow resistance bottlenecks G are formed between the both side edges of the object W and the side edges (front end edges) of the front end portion 24B of the shielding member 24 extending in the conveying direction of the object W. The distance d1 between the side edge (front end edge) of the front end portion 24B of the shielding member 24 extending in the conveying direction of the object W and the side edge in the width direction of the processing region in which the object W is to be disposed is 5 to 10mm. Further, a distance d2 in the width direction of the object W between a side edge (front end edge) of the front end portion 25B of the shielding member 25 extending in the conveying direction of the object W and a side edge in the width direction of a processing region in which the object W is to be disposed is 0 to 5mm. In the light irradiation device of this example, the distance between the frame portion 12A of the shade 12 and the both side edges in the width direction of the object W may be larger than that of the light irradiation device of fig. 1 to 3. In fig. 4, the same components as those of the light irradiation device of fig. 1 to 3 are denoted by the same reference numerals.
The shielding member may be configured such that a side edge portion extending in the conveyance direction of the object to be processed is provided so as to cover the other surface of the side edge portion of the object to be processed.
Specifically, as shown in fig. 5 and 6, the shielding body may be constituted by a shielding member 25 formed by connecting a base end portion 25A and a tip end portion 25B in a crank shape. The shielding member 25 has a base end portion 25A bonded to a lower surface side (lower surface side in fig. 5) of the frame portion 12A of the cover 12, and a tip end portion 25B protruding so as to cover the other surface (lower surface in fig. 5) of both side edge portions in the width direction of the object W without coming into contact therewith. Thereby, a gas flow resistance choke G is formed between the other surface (lower surface in fig. 5) of the object W and the upper surface (upper surface in fig. 5) of the front end portion 25B of the shielding member 25. The distance d3 in the width direction of the object W between the side edge of the front end portion 25B of the shielding member 25 extending in the conveying direction of the object W and the side edge in the width direction of the processing region in which the object W is to be disposed is 0 to 5mm, and the distance d4 in the height direction between the upper surface of the front end portion 25B of the shielding member 25 and the passage plane on the other surface side of the processing region in which the object W is to be disposed is 5 to 10mm. In the light irradiation device of this example, the distance between the frame portion 12A of the shade 12 and the both side edges in the width direction of the object W may be larger than that of the light irradiation device of fig. 1 to 3. Fig. 6 is a perspective view seen from the exhaust space side. In fig. 5 and 6, the same components as those of the light irradiation device of fig. 1 to 3 are denoted by the same reference numerals.
As shown in fig. 7 and 8, the shielding body may be formed of a plate-like shielding member 26. The plate-like shielding members 26 are disposed so as to support both ends in the conveyance direction of the object W so as to cover, without contact, the lower surfaces (lower surfaces in fig. 7) of both side edge portions of the frame portion 12A of the globe 12 extending in the conveyance direction of the object W and the other surfaces (lower surfaces in fig. 7) of both side edge portions in the width direction of the object W. Thus, gas flow resistance bottlenecks G are formed between the other surfaces of the widthwise both side edge portions of the object W and the upper surface (upper surface in fig. 7) of the shielding member 26, and between the lower surface of the side edge portion of the frame portion 12A of the cover 12 extending in the conveying direction of the object W and the upper surface of the shielding member 26. The distance in the width direction of the object W between the inner side edge of the shielding member 26 extending in the conveying direction of the object W and the side edge in the width direction of the processing region in which the object W is to be disposed is 0 to 5mm, and the distance in the height direction between the upper surface of the shielding member 26 and the passage plane on the other surface side of the processing region in which the object W is to be disposed is 5 to 10mm. The distance in the width direction of the object W between the outer side edge of the shielding member 26 extending in the conveyance direction of the object W and the side edge of the frame 12A of the shade 12 is 0 to 5mm, and the distance in the height direction between the upper surface of the shielding member 26 and the lower surface of the frame 12A of the shade 12 is 5 to 10mm. In the light irradiation device of this example, the distance between the frame portion 12A of the shade 12 and both side edges in the width direction of the object W to be processed may be larger than that in the light irradiation device of fig. 1 to 3. Fig. 8 is a perspective view seen from the exhaust space side. In fig. 7 and 8, the same components as those of the light irradiation device of fig. 1 to 3 are denoted by the same reference numerals.
As shown in fig. 9 and 10, the shielding body may be configured by a plate-shaped frame 12B connected to the opening 12H of the shade 12 and extending along a parallel plane at a position horizontal to the other surface side of the object W than the conveyance plane of the object W, and a side edge portion of the frame 12B extending in the conveyance direction of the object W may protrude so as not to contact the other surface of both side edge portions in the width direction of the object W. Thus, a gas flow resistance choke G is formed between the other surface (lower surface in fig. 9) of the object W and the upper surface (upper surface in fig. 9) of the frame portion 12B of the hood 12. The distance in the width direction of the object W between the side edge of the frame 12B extending in the conveying direction of the object W and the side edge in the width direction of the processing region in which the object W is to be disposed is 0 to 5mm, and the distance in the height direction between the upper surface of the frame 12B and the passage plane on the other surface side of the processing region in which the object W is to be disposed is 5 to 10mm. Fig. 10 is a perspective view seen from the exhaust space side. In fig. 9 and 10, the same components as those of the light irradiation device of fig. 1 to 3 are denoted by the same reference numerals.
For example, the shielding body may be provided so as to cover the entire surface of the other surface of the object to be processed.
Specifically, as shown in fig. 11 and 12, the shield member is constituted by a plate-like shield member 27. The shielding member 27 is disposed so as to cover the entire surfaces of the lower surface (lower surface in fig. 11) of both side edge portions of the frame portion 12A of the globe 12 extending in the conveying direction of the object W and the other surfaces of the object W without contact, and supports both end portions in the conveying direction of the object W. Thus, a choke G for gas flow resistance is formed between the lower surface of the side edge portion of the frame portion 12A of the globe 12 extending in the conveying direction of the object W and the upper surface (upper surface in fig. 11) of the shielding member 27. The distance in the width direction of the object W between the side edge of the shielding member 27 extending in the conveyance direction of the object W and the side edge of the frame 12A of the globe 12 is 0 to 5mm, and the distance in the height direction between the upper surface of the shielding member 27 and the lower surface of the frame 12A of the globe 12 is 5 to 10mm. In the light irradiation device of this example, the distance between the frame portion 12A of the shade 12 and the both side edges in the width direction of the object W may be larger than that of the light irradiation device of fig. 1 to 3. Fig. 12 is a perspective view seen from the exhaust space side. In fig. 11 and 12, the same components as those of the light irradiation device of fig. 1 to 3 are denoted by the same reference numerals.
For example, the shielding body may be provided so that both side edge portions extending in the conveying direction of the object can be displaced in the width direction of the object.
Specifically, as shown in fig. 13 and 14, the shielding body is constituted by a plate-shaped shielding member 28, and the shielding member 28 is supported on the other surface (lower surface in fig. 13) of a plate-shaped frame portion 12C which is connected to the opening 12H of the cover 12 and extends along a parallel plane at a position horizontal to the other surface side of the object W compared to the conveyance plane of the object W, and protrudes so as to cover the other surface (lower surface in fig. 13) of both side edge portions in the width direction of the object W without contact. A total of 4 elongated holes 28h extending in the width direction of the object W are formed in the front end portion and the rear end portion of the shielding member 28 in the conveyance direction of the object W supported by both side edge portions of the frame 12C of the globe 12, and the elongated holes 28h are screwed to the frame 12C of the globe 12 by screws 29, thereby fixing the shielding member 28 to the globe 12. By adjusting the position of the screw fastening of the elongated hole 28h, the length of the both side edge portions of the shielding member 28 extending in the conveying direction of the object W protruding in the width direction of the object W can be displaced. In the light irradiation device of this example, a choke passage G for gas flow resistance is formed between the other surface (the lower surface in fig. 13) of the object W and the upper surface (the upper surface in fig. 13) of the shielding member 28. The distance in the width direction of the object W between the side edge of the shielding member 28 extending in the conveyance direction of the object W and the side edge in the width direction of the processing region in which the object W is to be disposed is 0 to 5mm, and the distance in the height direction between the upper surface of the shielding member 28 and the passage plane on the other surface side of the processing region in which the object W is to be disposed is 5 to 10mm. In fig. 13 and 14, the same components as those of the light irradiation device of fig. 1 to 3 are denoted by the same reference numerals.
For example, in the light irradiation device of the present invention, when the object to be processed has a hole, a wind shielding body may be provided to cover the hole.
For example, in the light irradiation device shown in fig. 7 and 8, a case where a structure having a hole is used as an object to be processed will be described.
As shown in fig. 15 and 16, the plate-like wind shielding member 30 is disposed so as to support both ends of the object W in the conveying direction in a state of covering the plurality of through holes Wh provided separately in the conveying direction without contact at the center of the object W in the width direction. Thus, gas flow resistance bottlenecks Gx that prevent free gas from flowing between the space in the globe 12 and the space in the exhaust space forming member 13 are formed between both side edge portions of the through hole Wh on the other surface of the object W and the upper surface (upper surface in fig. 15) of the wind shield 30. The distance in the width direction of the object W between both side edges of the wind shielding member 30 extending in the conveying direction of the object W and the position of the through hole Wh where the object W is to be disposed is 0 to 5mm, and the distance in the height direction between the upper surface of the wind shielding member 30 and the passage plane on the other surface side of the processing region where the object W is to be disposed is 5 to 10mm. Fig. 16 is a perspective view seen from the exhaust space side. In fig. 15 and 16, the same components as those of the light irradiation device of fig. 7 and 8 are denoted by the same reference numerals.
According to such a light irradiation device, even when the object W has the through hole Wh, the gas flow resistance increases by blocking the free gas flow from the through hole Wh, and the sealing performance in the globe 12 can be improved.
[ examples ] A method for producing a compound
Specific examples of the present invention will be described below, but the present invention is not limited thereto.
< example 1>
A light irradiation device having the structure of fig. 1 to 3 was manufactured [ 1 ]. Specifically, as described below.
A process chamber; length of object to be processed in conveyance direction: 445mm, length of the object in the width direction: 1090mm, distance between the processing area and the top surface of the lampshade: 72mm, distance between the treatment region and the bottom surface of the exhaust space formation member: 150mm, distance (interval) of a choke for gas flow resistance: 10mm
An ultraviolet lamp; the types are as follows: xenon excimer lamp, center wavelength: 172nm, length: 640mm, effective irradiation width: 510mm, distance from treatment area: 4mm
Pressure inside the lamp housing: positive pressure 2Pa higher than the external atmosphere (atmospheric pressure)
Pressure inside the exhaust space forming member: negative pressure (differential pressure 4 Pa) 2Pa lower than the outside atmosphere (atmospheric pressure)
Supply amount of inert gas from the gas supply port: 100L/min
The amount of gas discharged from the gas discharge port of the exhaust space formation member: 200L/min
The amount of exhaust from each exhaust portion of the sub-chamber: respectively at 200L/min
An object to be processed; the types are as follows: sheet-like film, width: 500mm
< comparative example 1>
In example 1, a comparative light irradiation device [ 2 ] was manufactured in the same manner except that no gas flow resistance necks were provided and the distance between both side edges of the object to be processed and the side edge of the frame portion of the globe was 50mm.
In the above light irradiation apparatuses [ 1 ] and [ 2 ], the transport speed of the object to be processed is changed to 0 to 20m/min, and the oxygen concentration on the surface of the object to be processed when the object is located in the processing region of the transport path is measured. The results are shown in the graph of fig. 17. In FIG. 17, the result of the light irradiation apparatus [ 1 ] is represented by a square plot (\9632;) and the result of the light irradiation apparatus [ 2 ] is represented by a triangular plot (. Tangle-solidup.).
As is clear from the graph of fig. 17, in the light irradiation device [ 1 ] of the example provided with the choke for gas flow resistance, the variation in the oxygen concentration on the surface of the object to be processed when located in the processing region of the conveyance path was about 2.5% ± 0.1%, and was maintained substantially constant as compared with the variation in the oxygen concentration on the surface of the light irradiation device [ 2 ] of the comparative example (about 2.5% ± 1%), and therefore, it was confirmed that there was no dependence on the conveyance speed.
Claims (3)
1. A light irradiation device for irradiating one surface of a belt-shaped object to be processed conveyed along a conveying path with ultraviolet rays, the light irradiation device comprising:
a lamp cover having an opening along a passing plane on one surface side of the object to be processed on the conveying path;
an ultraviolet lamp provided in the lamp housing and extending in a width direction of the object to be processed;
a gas supply unit for supplying an inert gas into the lamp housing; and
an exhaust space forming member having an opening along a passage plane on the other surface side of the object to be processed on the conveying path,
a shield body provided in an opening of the lamp housing, the shield body extending in a conveying direction of the object to be processed continuously with a peripheral edge of the opening of the lamp housing, the shield body forming a choke path for gas flow resistance between the shield body and both side edge portions of the object to be processed being conveyed,
in a state where the inert gas is supplied into the globe, the pressure in the globe is a positive pressure higher than the atmospheric pressure which is the external atmosphere by the shielding body, and the pressure in the exhaust space forming member is a negative pressure lower than the atmospheric pressure which is the external atmosphere.
2. The light irradiation apparatus according to claim 1,
the side edge of the shielding body extending in the conveying direction of the processed object is set in a state that the front end of the side edge is close to the side edge of the processed object.
3. A light irradiation apparatus according to claim 1 or 2,
the shielding body is provided so that a side edge portion extending in a conveying direction of the object to be processed can be displaced in a width direction of the object to be processed.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017075786A JP7003431B2 (en) | 2017-04-06 | 2017-04-06 | Light irradiation device |
| JP2017-075786 | 2017-04-06 |
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| CN108687057A CN108687057A (en) | 2018-10-23 |
| CN108687057B true CN108687057B (en) | 2023-04-11 |
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| JP (1) | JP7003431B2 (en) |
| KR (1) | KR102479760B1 (en) |
| CN (1) | CN108687057B (en) |
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| JP7281083B2 (en) * | 2019-05-14 | 2023-05-25 | ウシオ電機株式会社 | Excimer light irradiation device |
| KR102623544B1 (en) | 2019-06-10 | 2024-01-10 | 삼성전자주식회사 | Wafer cleaning apparatus based on light irradiation and wafer cleaning system comprising the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2000218248A (en) * | 1999-01-27 | 2000-08-08 | Iwasaki Electric Co Ltd | Surface treating device |
| JP4453527B2 (en) * | 2004-11-22 | 2010-04-21 | ウシオ電機株式会社 | Excimer lamp device |
| JP2009097801A (en) * | 2007-10-17 | 2009-05-07 | Mitsubishi Heavy Ind Ltd | Boiler, and steam temperature adjusting method for boiler |
| JP5077173B2 (en) * | 2008-09-27 | 2012-11-21 | 株式会社Ｇｓユアサ | UV irradiation treatment equipment |
| JP2011243913A (en) * | 2010-05-21 | 2011-12-01 | Ushio Inc | Ultraviolet treatment device and ultraviolet irradiation device |
| JP5729034B2 (en) * | 2011-03-15 | 2015-06-03 | ウシオ電機株式会社 | Light irradiation device |
| JP5601312B2 (en) * | 2011-11-25 | 2014-10-08 | ウシオ電機株式会社 | Light irradiation device |
| JP5601551B2 (en) * | 2013-01-21 | 2014-10-08 | ウシオ電機株式会社 | Light irradiation device |
| JP5861696B2 (en) * | 2013-03-28 | 2016-02-16 | ウシオ電機株式会社 | Light irradiation device |
| KR101657038B1 (en) * | 2013-09-13 | 2016-09-12 | 우시오덴키 가부시키가이샤 | Light projection device |
| TWI588925B (en) * | 2015-04-16 | 2017-06-21 | Ushio Electric Inc | Light irradiation device |
| JP6544524B2 (en) * | 2015-05-18 | 2019-07-17 | パナソニックＩｐマネジメント株式会社 | UV light irradiation device |
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| KR20180113461A (en) | 2018-10-16 |
| TW201836723A (en) | 2018-10-16 |
| JP7003431B2 (en) | 2022-01-20 |
| TWI774734B (en) | 2022-08-21 |
| CN108687057A (en) | 2018-10-23 |
| KR102479760B1 (en) | 2022-12-21 |
| JP2018176032A (en) | 2018-11-15 |
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