JP2014185022A - Peeling device and peeling method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a peeling device and a peeling method which peel and separate two closely-attached plate-like bodies, and prevent local peeling between the plate-like bodies which interferes a suitable progress of peeling.SOLUTION: A vacuum suction groove 314 for sucking and holding a peripheral edge part of a blanket BL is formed on a horizontal surface part 311 of a stage 310 on which a laminate formed by closely attaching a substrate SB and the blanket BL through a pattern is mounted. An annular groove 313 for surrounding an effective area AR of the laminate with an effective pattern formed is formed on an inner side of the vacuum suction groove 314. The annular groove 313 is released to an atmosphere by communicating with an external space so as to prevent the blanket BL from being peeled from the substrate SB by propagating a negative pressure supplied to the vacuum suction groove 314 to the effective area AR.

Description

  The present invention relates to a peeling apparatus and a peeling method for peeling and separating two plate-like bodies that are in close contact with each other.

  As a technique for forming a predetermined pattern or thin film on a plate-like body such as a glass substrate or a semiconductor substrate, a technique for transferring a pattern or thin film (hereinafter referred to as “pattern etc.”) carried on another plate-like body onto the substrate. is there. In this technique, after two plates are brought into close contact with each other and a pattern or the like is transferred from one to the other, it is necessary to peel the two plates without damaging the pattern or the like.

  As a technique that can be used for this purpose, for example, Patent Document 1 describes an apparatus for separating an element formation substrate and a transfer substrate that are in close contact with each other via an organic layer. In this technique, two bonded substrates are held in a horizontal posture, and are moved in a separating direction in a state where the upper and lower substrates are vacuum-adsorbed. The upper and lower substrates are sucked and held by a plurality of suction pads arranged in a distributed manner.

Japanese Patent Laying-Open No. 2008-287949 (for example, FIG. 6)

  This type of transfer technology has come to be applied to various device manufacturing processes, but in the peeling process due to the diversification of materials forming patterns, pattern miniaturization, and substrate size increase. More precise progress management is required. That is, in order to prevent damage to the pattern or the like due to local stress concentration, it is necessary to appropriately manage the progress of peeling.

  However, in the above-described prior art, since the upper and lower substrates are locally adsorbed by the suction pads, the exfoliation proceeds under appropriate management, such as local exfoliation between the substrates at the adsorption site. There was a case that could not be done. In particular, when a suction pad is brought into contact with a substrate in a region where a pattern or the like is formed, a strong peeling force may act intensively in the region to damage the pattern or the like.

  As described above, in order to appropriately manage the progress of peeling, it is important how to hold and peel a laminated body in which two plate-like bodies are in close contact with each other. So this point was not considered enough.

  The present invention has been made in view of the above problems, and in a peeling apparatus and a peeling method for peeling and separating two plate-like bodies that are in close contact with each other, a local area between the plate-like bodies that inhibits the progress of good peeling. An object of the present invention is to provide a technique capable of preventing an easy peeling.

  One aspect of the present invention provides a peeling apparatus for peeling a first plate-like body and a second plate-like body, which are in close contact with each other through a thin film or a pattern, in order to achieve the above object, First holding means for holding the first plate by adsorbing the other main surface opposite to the one main surface in close contact with the second plate, and the surface of the second plate A second holding means for holding a surface different from the surface in close contact with the first plate-like body, a first holding means for holding the first plate-like body, and a second for holding the second plate-like body. Moving means for moving the holding means relative to each other in a direction away from each other, wherein the first holding means is formed with the thin film or pattern in the center of the one main surface of the first plate-like body. A contact plane that is larger than the effective area and contacts the other main surface of the first plate-like body; A negative pressure blocking recess formed in an annular shape surrounding an area larger than the plane size of the effective area on the abutting plane, and disposed outside the negative pressure blocking recess and supplied with negative pressure. An adsorption recess for adsorbing the other main surface of the plate-shaped body is provided, and the negative pressure blocking recess is configured to be in contact with the other main surface of the first plate-shaped body and the negative pressure block. It is characterized by communicating with a gas inflow portion for allowing gas to flow into a gap space surrounded by the wall surface of the concave portion for use.

  According to another aspect of the present invention, there is provided a peeling method for peeling a first plate-like body and a second plate-like body that are in close contact with each other through a thin film or a pattern. The other main surface opposite to the one main surface that is in close contact with the second plate-like body of the surface of the body, and the plane of the effective region in which the thin film or pattern is formed on the main surface of the first plate-like body A negative pressure blocking recess formed in an annular shape surrounding a region larger than the effective region in size, and a suction recess disposed outside the negative pressure blocking recess. Different from the surface of the second plate-like body that is in close contact with the first plate-like body, and the step of supplying a negative pressure to the suction recess and holding it by suction. While holding the surface, the first plate and the second plate are separated from each other. And the step of blocking the propagation of negative pressure from the suction recess to the area inside the negative pressure blocking recess by flowing gas into the negative pressure blocking recess. .

  In the invention thus configured, the first plate-like body is effectively adsorbed by adsorbing the first plate-like body outside the effective region where the thin film or pattern (hereinafter referred to as “pattern or the like”) is formed. Damage to the pattern and the like due to local adsorption in the region is prevented. However, it is difficult to reliably prevent damage to the pattern or the like simply by adsorbing the first plate-like body outside the effective area. This is because the negative pressure from the suction recess propagates in the gap between the contact plane and the first plate-like body, so that the first plate-like body is attracted to the contact plane and the contact plane is slightly uneven. This is because there is a possibility that local peeling occurs between the first plate-like body and the second plate-like body.

  Therefore, in the present invention, an annular negative pressure blocking recess that surrounds an area having a plane size larger than the effective area is provided on the inner side of the adsorption recess, and gas from the outside flows into the negative pressure blocking recess. To be able to. As a result, negative pressure does not propagate to the inner region surrounded by the negative pressure blocking recess, and the first plate-like body in the effective region is prevented from following the unevenness of the contact plane. With these configurations, in the present invention, the first plate-like body and the second plate-like body are prevented from peeling locally within the effective area, and peeling under appropriate management can be performed.

  In the present invention, for example, the air pressure in the gap space surrounded by the other main surface of the first plate-like body that is in contact with the abutting plane and the wall surface of the negative pressure blocking recess is changed to You may make it equal or substantially equal to the atmospheric | air pressure of a surface side. By doing so, it is possible to prevent the first plate-like body from locally bending toward the one main surface side or the other main surface side due to the pressure difference, and locally due to the bending of the first plate-like body. Peeling can be prevented more reliably.

  For example, the air pressure in the gap space may be equal to or substantially equal to the atmospheric pressure. By doing so, it is possible to prevent the first plate-like body from being bent due to the pressure difference when the peeling process proceeds under atmospheric pressure.

  In this case, for example, the gap space may be communicated with the external space so that air from the external space flows into the gap space. In such a configuration, the air flowing out from the gap space is compensated from the external space by the propagation of the negative pressure supplied to the suction recess, thereby maintaining the gap space at atmospheric pressure and preventing the first plate-like body from being bent. can do. For this purpose, it is only necessary to simply communicate the gap space with the external space, and it is not particularly necessary to provide a configuration for actively sending gas into the gap space, so that the apparatus configuration can be simplified.

  Further, for example, in these inventions, it is preferable to form a gas inflow path to the negative pressure blocking recess before the start of supply of the negative pressure to the suction recess. Once local peeling between the first plate and the second plate occurs, damage to the pattern or the like is not prevented. Therefore, before the negative pressure is started to be supplied to the suction recess, the negative pressure is reduced. It is desirable that a gas inflow path for shutting off the gas is secured.

  According to this invention, the first plate-like body is adsorbed and held outside the effective area where the thin film or pattern is formed, and the gas flows between the adsorbing recess to which the negative pressure is supplied and the effective area. Since it is interrupted | blocked by the possible negative pressure interruption | blocking recessed part, it is prevented effectively that peeling arises locally between a 1st plate-shaped body and a 2nd plate-shaped body.

It is a perspective view which shows one Embodiment of the peeling apparatus concerning this invention. It is a figure which shows the principal part of this peeling apparatus. It is a block diagram which shows the electric constitution of this peeling apparatus. It is a figure which shows the positional relationship of a stage and the laminated body mounted on this. It is a flowchart which shows a peeling process. It is a 1st figure which shows the positional relationship of each part in each step in process. It is a 2nd figure which shows the positional relationship of each part in each step in process. It is a figure for demonstrating the effect | action of an annular groove and a vacuum suction groove. It is a figure which shows the relationship between a peeling boundary line and peeling speed. It is a 1st figure which shows the modification of a stage. It is a 2nd figure which shows the modification of a stage.

  FIG. 1 is a perspective view showing an embodiment of a peeling apparatus according to the present invention. In order to uniformly indicate the direction in each figure, XYZ orthogonal coordinate axes are set as shown in the lower right of FIG. Here, the XY plane represents a horizontal plane and the Z axis represents a vertical axis. More specifically, the (+ Z) direction represents a vertically upward direction.

  This peeling apparatus 1 is an apparatus for peeling two plate-like bodies carried in with the main surfaces in close contact with each other. For example, it is used in a part of a pattern forming process for forming a predetermined pattern on the surface of a substrate such as a glass substrate or a semiconductor substrate. More specifically, in this pattern formation process, a pattern forming material is uniformly applied to a blanket surface as a carrier that temporarily carries a pattern to be transferred to a substrate, which is a transfer target (application process), and a pattern is formed. The coating layer is patterned by pressing a plate whose surface is processed according to the shape against the coating layer on the blanket (patterning step), and the blanket thus formed is brought into close contact with the substrate (transfer step), thereby forming a pattern. Is finally transferred from the blanket to the substrate.

  At this time, the apparatus can be suitably applied for the purpose of separating the plate and the blanket that are in close contact in the patterning step, or the substrate and the blanket that is in close contact in the transfer step. Of course, it may be used for both of these, and may be used for other purposes. For example, the present invention can also be applied to a peeling process when transferring a thin film carried on a carrier to a substrate.

  The peeling apparatus 1 has a structure in which an upper unit 10, a central unit 30, and a lower unit 50 are installed on a casing. In FIG. 1, the housing is not shown to show the internal structure of the apparatus. In addition to these units, the peeling apparatus 1 includes a control unit 70 (FIG. 3) described later.

  In the upper unit 10, a pair of support columns 102 and 103 are erected on the upper surface of the support base 101 fixed to the housing in a predetermined interval in the Y direction, and a beam member 104 is installed above these support columns. Has been. Guide rails 102a and 103a extending in the vertical direction (Z direction) are attached to the (+ X) side surfaces of the columns 102 and 103, respectively. Sliders 111 and 112 are respectively attached to the guide rails 102a and 103a so as to be slidable in the vertical direction. These sliders 111 and 112 are attached to both ends of an arm support plate 113 extending in the Y direction. ing.

  A pair of arms 114 and 115 extending in the (+ X) direction are attached to both ends of the arm support plate 113, and various processing blocks can be attached to these arms. In this embodiment, an upper suction block 120 as a processing block is attached to one arm 115 on the (+ Y) side. The upper suction block 120 will be described later.

  A plate lifting / lowering mechanism 116 is provided on the (−X) side surface of the arm support plate 113 and is connected to the rotation shaft of the motor 105 attached to the beam member 104 thereabove. When the rotating shaft of the motor 105 rotates, the rotational motion is converted into vertical motion by a conversion mechanism such as a ball screw mechanism provided in the plate lifting mechanism 116, whereby the arm support plate 113 is moved along the guide rails 102a and 103a. Move in the Z direction. Accordingly, the upper suction block 120 attached to the arm 115 also moves in the Z direction.

  Next, the configuration of the central unit 30 will be described. In the central unit 30, a stage 310 is installed at a substantially central portion of the upper surface of the support base 301 fixed to the housing. As will be described in detail later, a laminate in which the plate and the blanket are in close contact with each other through the coating layer, or a laminate in which the substrate and the blanket are in close contact with each other through the pattern are carried into the peeling apparatus 1 from the outside. Then, the stacked body is placed on the upper surface of the stage 310. The stage 310 has a larger planar size than the stacked body placed thereon.

  On the (+ Y) side of the stage 310 on the support base 301, an initial peeling block 320 that starts peeling by bending the end of the stacked body placed on the upper surface of the stage 310 downward is attached. The initial peeling block 320 will be described in detail later.

  In the lower unit 50, a support base 501 fixed to the housing extends in the Y direction below the support base 301 of the central unit 30, and a guide rail 510 is attached to the upper surface thereof. A slider 511 is slidably attached to the guide rail 510, and the slider 511 supports a pressing roller block 520. Therefore, the pressing roller block 520 is movable in the Y direction.

  The pressing roller block 520 includes a roller 521 extending in the X direction above the stage 310 of the central unit 30, a horizontal section extending in the X direction below the stage 310, and both ends thereof from the upper surface of the stage 310. A roller holding part 522 having a standing part protruding upward and holding both ends of the roller 521 rotatably by the standing part, and a roller by moving the roller holding part 522 in the Z direction, although hidden in FIG. Elevating mechanism 523 (FIG. 3) that changes the height of 521 is provided.

  The lower unit 50 further includes a motor 502. The rotational motion of the motor 502 is converted into a linear motion in the Y direction by a conversion mechanism (not shown), and drives the pressing roller block 520. That is, the pressing roller block 520 moves in the Y direction along the guide rail 510 by the rotation of the motor 502.

  FIG. 2 is a view showing a main part of the peeling apparatus. More specifically, FIG. 2A is a perspective view showing the arrangement of the peripheral configuration of the stage 310, and FIG. 2B is a partial cross-sectional view of the YZ cut plane. In the figure, broken line arrows indicate the moving directions of the constituent elements.

  A plurality of grooves are formed in the stage 310. Specifically, a rectangular annular groove 313 is provided on the innermost side so as to surround the central portion of the stage 310. A vacuum suction groove 314 having a substantially rectangular shape is provided adjacent to the outer (± X) side and the (± Y) side of the annular groove 313. Note that the vacuum suction groove 314 may not be annular, and for example, a part of the four sides of the rectangle may be independent.

  Each of these grooves is individually supplied with positive pressure, negative pressure, or atmospheric pressure as appropriate according to the processing to be performed. Thereby, the suction and release of the object placed on the stage 310 and the floating of the object are realized. As will be described later, in this embodiment, the annular groove 313 functions as an atmospheric release groove released to atmospheric pressure, while a negative pressure is supplied to the vacuum suction groove 314.

  As can be seen from FIG. 2B, the upper surface of the stage 310 includes a horizontal plane portion 311 that is a substantially horizontal plane and an inclined plane portion 312 that is a plane connected to the horizontal plane portion 311 and having a predetermined inclination angle θ. A ridge line portion E where the horizontal surface portion 311 and the inclined surface portion 312 are in contact with each other is a straight line parallel to the X direction. Although the inclination is emphasized in the figure, the inclination angle θ is about several degrees, and can be, for example, 2 degrees. The vacuum suction groove 314 is provided in the vicinity of the ridge line portion E in the horizontal plane portion 311.

  Above the horizontal surface portion 311 of the stage 310, a roller 521 that is rotatably held by a roller holding portion 522 that extends from below the stage 310 is disposed to extend in the X direction. The roller 521 can be moved in the Z direction by an elevating mechanism (not shown), and thereby moves toward and away from the stage 310. Further, the roller 521 moves in the Y direction integrally with the pressing roller block 520 by the rotation of the motor 502 (FIG. 1). The roller 521 does not have a drive source and rotates freely.

  Above the ridge line portion E of the stage 310, a suction mechanism for the upper suction block 120 (FIG. 1) is provided. The suction mechanism includes a head portion 121 extending in the X direction and a plurality of suction pads 122 mounted on the head portion 121 and arranged in the X direction. The suction pad 122 is formed of an elastic material such as rubber, for example, and a negative pressure is supplied to each of them to suck an object. The head portion 121 can be moved up and down by a lifting mechanism 123 (FIG. 1) of the upper suction block 120, whereby the suction pads 122 are integrally moved toward and away from the stage 310. Although not shown, the upper suction block 120 further includes a position adjustment mechanism for adjusting the position of each suction pad 122 in the Y direction by moving the head portion 121 in the Y direction.

  Above the inclined surface portion 312 of the stage 310, a pressing member 321 of the initial peeling block 320 is disposed. More specifically, the initial peeling block 320 has a pressing member 321 extending in the X direction above the inclined surface portion 312, and the pressing member 321 is supported by the support arm 322. The pressing member 321 is formed in a substantially rectangular parallelepiped shape by a single plate-like body, and in a cross section perpendicular to the longitudinal direction, a taper that decreases in width toward one short side is provided, and a flat top surface at the top thereof. Is formed. The pressing member 321 having such a shape is supported by the support arm 322 with the X direction as the longitudinal direction and the top surface facing downward. The pressing member 321 has both end portions in the X direction extending outward from the end portion of the stage 310, and thus extends outward from the X direction end portion of the stacked body placed on the stage 310.

  The support arm 322 is supported by a pair of sliders 323 and 324 slidably attached to a pair of guide rails 326 and 327 erected on a base plate 325 fixed to the housing. Further, the initial peeling block 320 includes a driving unit 328 having an appropriate driving source such as a motor or a cylinder, and the driving force of the driving unit 328 is changed to a straight line in the Z direction by a conversion mechanism such as a ball screw mechanism as necessary. It is converted into motion and transmitted to the support arm 322. Therefore, when the drive unit 328 is operated, the support arm 322 moves up and down in the Z direction, and the pressing member 321 moves up and down integrally with the support arm 322 and moves toward and away from the stage 310. Although not shown, the initial peeling block 320 further includes a position adjusting mechanism for adjusting the Y direction position of the pressing member 321 by moving the guide rails 326 and 327 on the base plate 325 in the Y direction. Have.

  FIG. 3 is a block diagram showing an electrical configuration of the peeling apparatus. Each part of the apparatus is controlled by a control unit 70. The control unit 70 supplies the CPU 701 that controls the operation of the entire apparatus, a motor control unit 702 that controls motors provided in each unit, a valve control unit 703 that controls valves provided in each unit, and each unit. A negative pressure supply unit 704 that generates a negative pressure and a user interface (UI) unit 705 for accepting an operation input from the user and notifying the user of the state of the apparatus are provided. In addition, when the negative pressure supplied from the outside, such as factory power, can be used, the control unit 70 may not include the negative pressure supply unit.

  The motor control unit 702 is provided in the motor 105 provided in the upper unit 10, the elevating mechanism 123 provided in the upper suction unit 120, the drive unit 328 provided in the initial peeling block 320 of the central unit 30, and the lower unit 50. The motor 502 and the lifting mechanism 523 are controlled. The valve control unit 703 is provided on a piping path connected from the negative pressure supply unit 704 to the suction pad 122 and supplies a predetermined negative pressure to the suction pad 122. The valve control unit 703 supplies the stage 310 with the negative pressure supply unit 704. A valve group V30 for supplying a predetermined negative pressure to the vacuum suction groove 314, which is provided on a piping path connected to the provided vacuum suction groove, is controlled.

  FIG. 4 is a diagram showing a positional relationship between the stage and the stacked body placed on the stage. More specifically, FIG. 4A is a plan view showing the position of the stacked body placed on the stage 310, and FIG. 4B is a portion showing a state where the stacked body is placed on the stage 310. It is a side view. Here, a case where a stacked body in which a substrate SB to which a pattern is to be finally transferred and a blanket BL that temporarily carries the pattern to be transferred to the substrate SB is superimposed is placed on the stage 310 is shown. Although described as an example, the same applies to the case of a laminate of a plate and blanket BL for patterning the blanket BL. In this case, in the following description, “substrate” may be read as “version”.

  In the stacked body in which the substrate SB and the blanket BL are in close contact with each other through the pattern, the blanket BL has a larger planar size than the substrate SB. Therefore, the entire surface of the substrate SB faces the blanket BL, while the blanket BL has a central portion facing the substrate SB, but the peripheral portion is a blank portion that does not face the substrate SB. Yes. An effective area AR that functions as a device by effectively transferring the pattern is set in the central portion of the surface area of the substrate SB except the peripheral edge. Therefore, the purpose of the peeling apparatus 1 is to peel the blanket BL from the substrate SB without damaging the pattern transferred from the blanket BL to the effective area AR of the substrate SB.

  As shown in FIG. 4A, the stacked body is placed on the stage 310 so that the entire effective area AR of the substrate SB is positioned on the horizontal surface portion 311 of the stage 310. At this time, the arrangement of the annular grooves 313 is determined in advance so that the annular grooves 313 completely surround the effective area AR. On the other hand, the vacuum suction groove 314 provided in the horizontal surface portion 311 of the stage 310 so as to surround the annular groove 313 is provided at a position where the blanket BL is closed by the blanket BL when it is placed on the stage 310.

  The (+ Y) side end portion of the substrate SB is disposed at a position slightly protruding to the (+ Y) side from the ridge line portion E of the stage 310. On the other hand, the (+ Y) side end portion of the blanket BL protrudes greatly from the ridge line portion E of the stage 310 and extends to above the inclined surface portion 312. For this reason, the lower surface of the blanket BL is not in contact with the stage 310 in this portion, and there is a gap between the blanket BL and the inclined surface portion 312.

  The position of the suction pad 122 in the Y direction is adjusted in advance so that the suction pad 122 is positioned immediately above the (+ Y) side end of the substrate SB and on the (+ Y) side of the vacuum suction groove 314 provided in the stage 310. ing. On the other hand, the pressing member 321 is located above the end of the blanket BL protruding from the inclined surface portion 312. As described above, each part operates in accordance with a control command from the CPU 701 in a state where the stacked body of the substrate SB and the blanket BL is placed on the stage 310, whereby the substrate SB and the blanket BL are separated.

  FIG. 5 is a flowchart showing the peeling process. FIG. 6 and FIG. 7 are diagrams showing the positional relationship of each part in each stage during processing, and schematically show the progress of processing. This peeling process is performed by the CPU 701 executing a processing program stored in advance to control each unit.

  When the stacked body is carried in by an operator or an external transfer robot or the like and placed at the above position on the stage 310 (step S101), negative pressure is supplied to the vacuum suction groove 314 of the stage 310, and the stacked body is moved by the stage 310. Adsorption is held (step S102). Subsequently, each part of the apparatus is arranged at an initial position for performing peeling (step S103). FIG. 6A shows the initial position of each part. As shown in the figure, the head part 121 is lowered and the lower surface of each suction pad 122 comes into contact with the upper surface of the end portion of the substrate SB. In particular, it is only pressed against the upper surface of the substrate SB. The pressing member 321 is disposed in the vicinity of the end portion of the blanket BL and at a position spaced upward from the upper surface thereof. Furthermore, the roller 521 is in contact with the upper surface of the substrate SB at the (+ Y) side of the effective area AR of the substrate SB and at the (−Y) side of the position of the vacuum suction groove 314.

  Next, in this state, the pressing member 321 is lowered (step S104), and further lowered while the lower end (top surface) of the pressing member 321 is in contact with the blanket BL. At this time, as shown in FIG. 6B, the (+ Y) side end portion of the blanket BL is pushed downward by the top surface of the pressing member 321 and bent downward. On the (−Y) side from the ridge line portion E, that is, on the left side in the drawing, the lower surface of the blanket BL is adsorbed and held by the horizontal surface portion 311 of the stage 310, so that deformation of the blanket BL is restricted. Therefore, the portion where the blanket BL is bent is limited to the (+ Y) side from the ridge line portion E, that is, the right side in the drawing. In particular, since stress concentrates in the vicinity of the ridge line portion E, bending tends to occur in this portion.

  The pressing member 321 extended in the X direction presses the blanket BL uniformly in the X direction. That is, the pressing force is constant regardless of the position in the X direction. For this reason, the bending of the blanket BL is uniform in the X direction. That is, the blanket BL is bent into a columnar shape having an axis parallel to the X direction. Further, since the ridge line portion E of the stage 310 is also in the X direction, the tendency is more remarkable.

  On the other hand, the substrate SB is formed of a material having higher rigidity than the blanket BL, and deformation is more limited than that of the blanket BL. That is, the (+ Y) side end portion of the substrate SB does not follow the downward bending of the blanket BL, and tries to return to the original horizontal posture due to its own rigidity. For this reason, a gap is generated between the blanket BL bent downward and the substrate SB trying to maintain the horizontal posture, and partial peeling is started. That is, the pressing member 321 pressing the blanket BL triggers the separation from the substrate SB. In order to prevent the substrate SB from bending downward together with the blanket BL, the blanket BL needs to have appropriate flexibility and the substrate SB needs to be more rigid. Further, the suction pad 122 can follow the deformation of the substrate SB accompanying the pressing of the blanket BL by the pressing member 321, that is, has a stretchability that does not release the contact state even when the substrate SB is temporarily bent. Need to be.

  Here, the non-peeled area where the blanket BL and the substrate SB are in close contact is referred to as a close contact area, the area that has already been peeled and has a gap between them is referred to as the peel area, and a line formed by the boundary between the close contact area and the peel area is shown. It is called a peeling boundary line and is represented by the symbol PL. Since the blanket BL is bent into a columnar shape having an axis in the X direction, the separation boundary line PL is a single straight line along the X direction.

  FIG. 6C is a view of the substrate SB and the blanket BL viewed from above in the state of FIG. 6B. The hatched regions R1, R2, and R3 are respectively in contact with the pressing member 321 in the blanket BL. A region in contact, a region attracted by the negative pressure supplied to the vacuum suction groove 314 in the blanket BL, and a region in contact with the roller 521 in the substrate SB are shown. As shown in the figure, at the initial stage when the peeling starts, the contact between the center side (left side in the figure) of the blanket BL and the (+ Y) side end of the effective area AR and the roller 521 is made. The contact region R3, the attracted region R2, the separation boundary line PL, the (+ Y) side end of the substrate SB, and the contact region R1 with the pressing member 321 are arranged in this order.

  The blanket BL is pressed outside the contact area R3 between the roller 521 and the substrate SB and the area R2 where the blanket BL is attracted (right side in the drawing), so that the deformation of the blanket BL reaches the effective area AR. Is prevented. Further, since the contact position of the roller 521 is outside the effective area AR, it is possible to avoid a local pressing force from the roller 521 being applied to the pattern in the effective area AR.

  Returning to FIG. 5, when the blanket BL is bent downward by the pressing of the pressing member 321 while the substrate SB returns to the horizontal state and the separation boundary line PL is formed, the contact with the upper surface of the substrate SB is continued. A negative pressure is supplied to the suction pad 122 that is in contact with the substrate to hold the substrate SB by suction, and the suction pad 122 starts to rise (step S105). In synchronization with the raising of the suction pad 122, the roller 521 is moved in the direction opposite to the peeled area, that is, in the (−Y) direction while keeping the roller 521 in contact with the upper surface of the substrate SB (step S106). Both the ascending speed of the suction pad 122 and the moving speed of the roller 521 are constant speeds.

  As shown in FIG. 7A, when the suction pad 122 is raised, the end of the substrate SB sucked by the suction pad 122 is lifted, and peeling from the blanket BL proceeds. That is, the peeling boundary line proceeds in the (−Y) direction (left direction in the figure). By bringing the roller 521 into contact with the upper surface of the substrate SB, the progress of the peeling boundary line is limited to the contact position with the roller 521. Since the roller 521 extends in the X direction, the peeling boundary line is also a straight line extending in the X direction. In this embodiment, a plurality of suction pads 122 (six in FIG. 2) are juxtaposed in the X direction to obtain a high suction holding force. Further, the substrate SB is reliably lifted by adsorbing it as close as possible to the end of the substrate SB.

  By moving the roller 521 in the (−Y) direction at a constant speed while raising the suction pad 122 in this state, the separation boundary line advances in the (−Y) direction at a constant speed while maintaining the linear state. That is, peeling proceeds with the (−Y) direction as the peeling direction. Since the movement of the roller 521 starts from the outside of the effective area AR, the speed of the roller 521 passing above the effective area AR is constant, and the pressing force that the pattern receives from the roller 521 in the effective area AR is Uniform regardless of location.

  In this way, the suction pad 122 is raised and the roller 521 continues to move, and when they reach the end position where the peeling of the entire substrate SB is completed (step S107), the movement is stopped and the roller 521 and the pressing member 321 are moved. Move to a predetermined retreat position (step S108). When the suction of the suction pad 122 is released in this state, the substrate SB peeled off from the blanket BL can be carried out (step S109). Subsequently, when the suction by the stage 310 is released, the blanket BL can be carried out (step S110). These are carried out and the peeling process ends.

  In the process of the peeling process described above, the annular groove 313 is always released to the atmosphere. Since the blanket BL is vacuum-sucked by the vacuum suction groove 314 provided outside the annular groove 313, the blanket BL is not lost even when the annular groove 313 is released to the atmosphere. On the other hand, by making the annular groove 313 provided so as to surround the effective area AR into the atmospheric release state, the following advantages can be obtained.

  FIG. 8 is a diagram for explaining the operation of the annular groove and the vacuum suction groove. In the suction of the blanket BL by the vacuum suction groove 314 provided on the upper surface (horizontal surface portion 311) of the stage 310, the blanket BL and the blanket BL are caused by the negative pressure supplied to the vacuum suction groove 314 as shown in FIG. An airflow F is generated along a small gap G between the stage 310 and the stage 310. As a result, the gap G becomes negative pressure, and the blanket BL is sucked and held on the stage 310.

  Here, it is assumed that there is a small depression on the upper surface of the stage 310. Such a depression may be caused by abrasion of the stage 310 or a scratch due to contact with other members. FIG. 8B shows Comparative Example 1 in which only the vacuum suction groove 314 is provided in the stage 310 without providing the annular groove 313 released to the atmosphere. In this case, as shown in the figure, the blanket BL is drawn toward the recess D on the stage 310 due to the negative pressure generated between the blanket BL and the upper surface of the stage 310, and is partially bent. A gap may be formed between the substrate SB and the substrate SB. That is, unintended local peeling between the blanket BL and the substrate SB occurs. In the figure, an example in which the pattern PT formed between the substrate SB and the blanket BL is attached to the substrate SB side is shown. However, in the case of such accidental peeling, the pattern PT is formed on the substrate SB and the blanket BL. It is not possible to control which of the two adheres. Further, along with the peeling, the pattern PT may be broken due to a shearing force acting on the pattern PT.

  Apart from this, the upper surface of the stage 310 may partially protrude upward, or foreign matter may be sandwiched between the stage 310 and the blanket BL. Even in such a case, the blanket BL is caused to follow the upper surface of the stage 310 by negative pressure, so that the blanket BL is bent and local peeling occurs, or a strong pressing force is locally applied to the pattern PT. The pattern PT may be damaged.

  As described above, if the upper surface of the stage 310 has irregularities such as scratches or foreign substances, and the blanket BL is pressed against the upper surface of the stage 310 by vacuum suction, the blanket BL also bends following the irregularities of the stage. Sometimes. As a result, the substrate SB may be bent, or the pattern sandwiched between the substrate SB and the blanket BL may be distorted. In any case, this is an undesirable phenomenon for the purpose of transferring the pattern onto the substrate SB satisfactorily.

  On the other hand, in the present embodiment shown in FIG. 8C, an annular groove 313 is provided inside the vacuum suction groove 314 when viewed from the center of the stage 310 (left side in the figure). The annular groove 313 is connected to an opening 319 provided on the lower surface of the stage 310, for example, and communicates with the external space. Accordingly, even when the blanket BL is held on the stage 310, the gap space SP formed between the lower surface of the blanket BL and the wall surface of the annular groove 313 always communicates with the external space through the opening 319. Yes.

  For this reason, as shown by the white arrow in the figure, the airflow caused by the negative pressure supplied to the vacuum suction groove 314 flows into the annular groove 313 from the external space through the opening 319, and further, the blanket BL and the stage 310 Through the gap to the vacuum suction groove 314 and discharged. That is, when outside air flows into the annular groove 313 from the external space, no negative pressure is generated between the blanket BL and the stage 310 on the inner side (left side in the drawing) of the annular groove 313.

  As a result, even if there is a recess D in the stage 310, the blanket BL is not forcibly imitated, and the blanket BL can maintain a horizontal posture. The blanket BL does not act on the protrusion of the stage 310 or the adhering foreign matter. In particular, by providing the annular groove 313 so as to surround the effective area AR where the pattern PT is effectively formed, damage to the pattern PT can be prevented at least in the effective area AR. It is not preferable to provide the suction groove inside the annular groove 313 because the action of the annular groove 313 is destroyed.

  As described above, in this embodiment, the blanket BL is not strongly pressed against the upper surface of the stage 310 in the region inside the annular groove 313. For this reason, even if there are irregularities on the upper surface of the stage, it is avoided that the influence affects the substrate SB and the pattern. That is, the annular groove 313 has a function of blocking the negative pressure supplied to the vacuum suction groove 314 from propagating to the effective area AR.

  It should be noted that the air pressure in the gap space SP formed between the lower surface of the blanket BL and the wall surface of the annular groove 313 does not need to completely match the air pressure in the external space, that is, the atmospheric pressure. It suffices if a large negative pressure is not generated in the gap space SP such that air intervening in the gap between the blanket BL inside the annular groove 313 and the stage 310 is sucked out. For this purpose, with respect to the opening area of the opening 319 and the cross-sectional area of the gas flow path from the opening 319 to the annular groove 313, a sufficient amount of air is maintained to maintain the gap space SP at substantially atmospheric pressure. It is preferable that the setting is such that it can be supplied to 313.

  In this embodiment, since the annular groove 313 communicates with the external space in advance, a path for introducing outside air into the gap space SP before the negative pressure is supplied to the vacuum suction groove 314 is provided. Is formed. Once the negative pressure propagates to the effective area AR, the blanket BL and the substrate SB are separated from each other. In order to avoid this reliably, a gas inflow path is secured before the negative pressure supply is started. It is necessary to keep.

  In the pattern transfer from the blanket BL to the substrate SB as described above, in order to transfer the pattern carried on the blanket BL to the substrate SB in a complete form, the advancing speed of the peeling boundary line, that is, the advancing speed of peeling (here Is called “peeling speed”). This is because, in particular, in the case of a fine pattern or the property of the pattern forming material, a shearing force is applied when the peeling speed changes, and the pattern may be damaged. The same applies to patterning from the plate to the blanket BL.

  In the above-described peeling treatment, it is possible to advance the peeling boundary line formed in advance in a straight line at a constant speed, and by changing the peeling boundary line at a constant speed in at least the effective area AR, the peeling speed changes. It is possible to prevent damage to the pattern due to the above.

  FIG. 9 is a diagram showing the relationship between the peeling boundary line and the peeling speed. When the substrate SB and the blanket BL are pulled apart without particularly giving an opportunity for separation at the initial stage of peeling, as shown in Comparative Example 2 in FIG. 9 (a), peeling generally occurs from both corners of the substrate SB. Beginning, the separation boundary line PL is initially formed at two locations, and then they are integrated, and finally become linear by contact with the roller.

  Further, in the configuration in which the blanket is locally pushed out or the separation claw is inserted as in the prior art described above, the trigger is given as shown in Comparative Example 3 in FIG. 9B. A large peeling region is locally formed in the portion, and the peeling boundary line PL is finally connected by gradually spreading.

  In these configurations, the shape of the separation boundary line generated in the initial stage of separation is not managed and is not constant. For this reason, even if the separation between the substrate and the blanket is performed at a constant speed, there is a discontinuous change in the traveling speed when the locally generated peeling boundary line PL is integrated, and the wavy peeling boundary line PL In the process of changing linearly, speed fluctuations occur everywhere when viewed locally (the shape of the separation boundary changes due to the speed difference depending on the position). This can cause pattern damage.

  Even in these comparative examples, it is possible to finally make the separation boundary line a straight line by bringing the roller into contact with the substrate. However, in order to obtain the effect with certainty, up to the contact position with the roller. It is necessary to stop the progress once the peeling progresses, and then perform the peeling while moving the roller. At this time, speed fluctuations occur, which again causes pattern damage. If the roller is previously brought into contact with the substrate outside the effective area, damage within the effective area can be prevented, but the size of the effective area is determined by how close the roller can be to the end of the substrate. The effective area may be narrowed due to structural constraints.

  In contrast, in the peeling process of this embodiment, as shown in FIG. 9C, a linear peeling boundary line PL orthogonal to the peeling direction is formed at the initial stage of peeling, and the process proceeds. Even in the process, the shape does not change and proceeds only in the peeling direction. For this reason, the peeling speed is kept constant from start to finish locally, and damage to the pattern is prevented.

  The main configuration in the present embodiment for making the peeling boundary line PL straight at the initial stage of peeling is to bend the blanket BL in a columnar shape in a direction away from the substrate SB, and to bring the roller 521 into contact. This is a component for proceeding at a constant speed while keeping the peeling boundary line PL straight. In this sense, regardless of the position of the roller 521 in the initial stage, in this embodiment, it is possible to generate a linear peeling boundary line from the beginning.

  As described above, in this embodiment, the stacked body in which the substrate SB (or plate) and the blanket BL are in close contact with each other via a pattern or the like is placed on the stage 310 whose upper surface is a horizontal plane. The blanket BL and the substrate SB are peeled off by pulling up the substrate SB corresponding to the upper component of the laminate while holding the blanket BL corresponding to the lower component of the laminate by vacuum suction using the stage 310.

  At this time, the blanket BL is adsorbed on the outer side of the effective area AR where the pattern of the substrate SB and the blanket BL is effectively formed, and is not adsorbed in the effective area AR. It is possible to effectively prevent the local deflection of the substrate and the local peeling from the substrate SB due to this. Further, since the annular groove 313 communicating with the external space and released to the atmosphere is provided outside the effective area AR and inside the vacuum suction groove 314, the negative pressure supplied to the vacuum suction groove 314 is the annular groove 313. And is not propagated to the effective area AR. As a result, it is possible to reliably prevent local peeling due to the blanket BL being bent following the minute irregularities and foreign matter of the stage 310.

  In this embodiment, in the initial stage of peeling, by bending one end of the blanket BL, which is one of the laminates to be peeled, into a columnar shape in a direction away from the other substrate SB, A single and linear peeling boundary line PL is generated at the end of the close contact area. Then, while maintaining the peeling boundary line PL in a straight line, it is possible to perform the peeling while preventing the pattern damage due to the fluctuation of the peeling speed by performing the peeling at a constant speed. ing.

  In order to transform the blanket BL into a columnar shape, in this embodiment, the laminated body is placed on the horizontal surface portion 311 of the stage 310 having the linear ridgeline portion E, and the blanket BL of the portion protruding from the ridgeline portion E is attached. Pressing with the pressing member 321. At this time, the pressing member 321 presses the blanket BL uniformly in a wide range extending in parallel with the ridge line direction. Thereby, it is prevented that the blanket BL bends locally, and the columnar deformation can be generated stably and reliably.

  As described above, in this embodiment, the blanket BL corresponds to the “first plate-like body” of the present invention, and the substrate SB (or the plate) is the “ It corresponds to a “second plate-like body”. Therefore, the stage 310 in this embodiment functions as the “first holding means” of the present invention, and the suction pad 122 functions as the “second holding means” of the present invention. Further, the elevating mechanism 123 that raises the suction pad 122 functions as the “moving means” of the present invention.

  In the above embodiment, the horizontal surface portion 311 of the stage 310 corresponds to the “contact plane” of the present invention, and the annular groove 313 and the vacuum suction groove 314 provided on the horizontal surface portion 311 of the stage 310 respectively correspond to the “negative pressure” of the present invention. It functions as a “blocking recess” and an “adsorption recess”. In this embodiment, the opening 319 and the flow path from the opening 319 to the annular groove 313 function as the “gas inflow portion” of the present invention.

  The present invention is not limited to the above-described embodiment, and various modifications other than those described above can be made without departing from the spirit of the present invention. For example, in the above embodiment, the stacked body in which the substrate SB and the blanket BL are overlapped is placed in a horizontal posture with the blanket BL facing down. However, the posture of the substrate and the blanket is not limited to this and is arbitrary.

  In the above embodiment, the annular groove 313 is provided so as to surround an area having a plane size larger than the effective area AR in the horizontal plane part 311 of the stage 310, and the vacuum suction groove 314 is provided so as to surround the area. It is not limited to this. For example, the following modes may be used. In addition, although some modified examples of the stage shape according to the present embodiment will be exemplified below, in the description of these modified examples, the same components as those in the above embodiment are denoted by the same reference numerals and description thereof is omitted. The characteristic part will be mainly described.

  10 and 11 are diagrams showing modifications of the stage. In the modified stage 310a shown in FIG. 10A, the vacuum suction groove formed in an annular shape in the above embodiment is divided into two parts. More specifically, a linear vacuum suction groove 314 a is provided between the ridge line portion E between the horizontal surface portion 311 and the inclined surface portion 312 of the stage 310 a and the annular groove 313, and the other three sides of the annular groove 313. A U-shaped vacuum suction groove 314b is provided so as to surround. In this modification, the vacuum suction grooves 314a and 314b integrally function as the vacuum suction groove 314 of the above embodiment. In this case, for example, if the negative pressure supply paths to the vacuum suction grooves 314a and 314b are made independent of each other, the blanket BL is lifted from the stage horizontal surface portion 311 in the vicinity of the ridge line E at the initial stage of peeling, and the vacuum in the vacuum suction groove 314a is increased. Even if it is destroyed, the vacuum suction by the other vacuum suction grooves 314b is maintained, so that the blanket BL can be maintained. For the same purpose, a plurality of vacuum suction grooves may be provided.

  Further, in the modified stage 310c shown in FIG. 10 (b), the vacuum suction grooves 314c and 314d divided into two as in the modified example are provided, and a part of the annular groove 313c is a peripheral edge of the stage 310c. It is extended toward the part. The extension 313d extends to the outside of the end of the blanket BL when the blanket BL is placed on the stage 310c. Even when the annular groove 313c is covered with the blanket BL, the extension 313d is in the external space. Is exposed. For this reason, the annular groove 313c communicates with the external space via the extension 313d, and the inside of the annular groove 313c is always at atmospheric pressure. Therefore, in this modification, the extension portion 313d functions as the “gas inflow portion” of the present invention instead of the opening 319 in the above-described embodiment, and it is not necessary to separately provide an opening communicating with the annular groove.

  Further, in the stage 310e of the modified example shown in FIG. 11A, a large number of vacuum suction holes 314e are arranged around the annular groove 313 similar to the above-described embodiment so as to surround the annular groove 313. The vacuum suction hole 314e is disposed at a position covered by the blanket BL when the blanket BL is placed on the stage 310e. In such a configuration, the blanket BL is sucked and held by supplying a negative pressure to each vacuum suction hole 314e. The annular groove 313 prevents negative pressure from propagating to the inner region.

  Further, in the modification shown in FIG. 11B, instead of the annular groove 313 being released to the atmosphere through the opening, gas is supplied to the annular groove 313 from the gas supply unit 706 provided in the control unit. For example, a pressure valve is provided in the gas supply path from the gas supply unit 706 to the annular groove 313, and when the atmospheric pressure in the gap space SP falls below a predetermined value, gas is supplied from the gas supply unit 706 and flows into the annular groove 313. It is good also as a structure which does. The gas can be air or an inert gas (eg, nitrogen gas). Even with such a configuration, it is possible to prevent the negative pressure supplied to the vacuum suction groove 314 from propagating to the inner side of the annular groove 313 and to prevent damage to the pattern or the like due to the deformation of the blanket BL. . In this case, the gas supply part 706 corresponds to the “gas inflow part” of the present invention. When the gap space SP becomes positive with respect to the external space, a pressing force is applied to the pattern via the blanket BL. Therefore, the amount of gas inflow is set so that the gap space SP is approximately equal to the atmospheric pressure. Preferably it is controlled.

  In the above embodiment, the substrate SB and the blanket BL are each held by vacuum suction, but the holding of the substrate SB is not limited by suction. For example, a configuration in which the peripheral edge of the substrate is held by a mechanical nail and separated from the blanket BL may be employed. In the above embodiment, only one end portion of the substrate SB is vacuum-sucked, but the entire substrate may be sucked or suction pads may be dispersedly arranged at various locations on the substrate.

  The present invention can be applied to a peeling process in a pattern forming process in which two plates are brought into close contact with each other to transfer a pattern or the like. This can be suitably applied to various purposes for satisfactorily peeling the plate-like body.

122 Suction pad (second holding means)
310 stage (first holding means)
311 Horizontal plane (contact plane)
313 annular groove (recess for blocking negative pressure)
314 Vacuum suction groove (suction recess)
319 opening (gas inlet)
123 Lifting mechanism (moving means)
706 Gas supply part (gas inflow part)
BL blanket (first plate)
SB substrate (second plate)

Claims (7)

In the peeling apparatus for peeling the first plate and the second plate that are in close contact with each other through a thin film or pattern,
A first holding means for holding the first plate-like body by adsorbing the other main surface opposite to the one main surface in close contact with the second plate-like body among the surfaces of the first plate-like body;
A second holding means for holding a surface different from a surface in close contact with the first plate-like body among the surfaces of the second plate-like body;
A moving means for relatively moving the first holding means for holding the first plate-like body and the second holding means for holding the second plate-like body in a direction away from each other;
The first holding means has a planar size larger than an effective area where the thin film or pattern is formed in the central portion of the one main surface of the first plate-like body, and is in contact with the other main surface of the first plate-like body. A negative pressure blocking recess formed in an annular shape surrounding an area larger than the plane size of the effective area, and disposed outside the negative pressure blocking recess. A suction recess that is supplied with pressure and sucks the other main surface of the first plate-like body;
The negative pressure blocking recess is a gas inflow portion that allows gas to flow into a gap space surrounded by the other main surface of the first plate-like body that contacts the contact plane and the wall surface of the negative pressure blocking recess. A peeling device characterized in that it communicates with the device.   The peeling apparatus according to claim 1, wherein the gas inflow portion makes the air pressure in the gap space equal to or substantially equal to the air pressure on the one main surface side of the first plate-like body.   The peeling apparatus according to claim 2, wherein the air pressure in the gap space is equal to or substantially equal to the atmospheric pressure.   The peeling apparatus according to claim 3, wherein the gas inflow portion communicates the gap space with an external space and allows air from the external space to flow into the gap space. In the peeling method of peeling the first plate and the second plate that are in close contact with each other through a thin film or pattern,
Of the surface of the first plate-like body, the other main surface opposite to the one main surface in close contact with the second plate-like body is formed, and the thin film or pattern is formed on the main surface of the first plate-like body. A negative pressure blocking recess having a plane size larger than that of the effective area and surrounding the area larger than the effective area plane size, and disposed outside the negative pressure blocking recess. A step of abutting against the abutting plane provided with the suction recess, supplying a negative pressure to the suction recess and holding the suction,
A step of separating the first plate and the second plate while holding a surface different from the surface in close contact with the first plate of the surface of the second plate,
A peeling method characterized by blocking the propagation of negative pressure from the suction recess to an inner area of the negative pressure blocking recess by flowing a gas into the negative pressure blocking recess.   The one main surface of the first plate-like body is configured to reduce the air pressure in the gap space surrounded by the other main surface of the first plate-like member that contacts the contact flat surface and the wall surface of the negative pressure blocking recess. The peeling method according to claim 5, wherein the peeling pressure is equal to or substantially equal to the atmospheric pressure on the side.   7. The peeling method according to claim 5, wherein a gas inflow path to the negative pressure blocking recess is formed before the supply of the negative pressure to the suction recess is started.

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