JP2014114333A5 - - Google Patents
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- Publication number
- JP2014114333A5 JP2014114333A5 JP2012267482A JP2012267482A JP2014114333A5 JP 2014114333 A5 JP2014114333 A5 JP 2014114333A5 JP 2012267482 A JP2012267482 A JP 2012267482A JP 2012267482 A JP2012267482 A JP 2012267482A JP 2014114333 A5 JP2014114333 A5 JP 2014114333A5
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- low refractive
- polymer
- porous
- porous low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000463 material Substances 0.000 claims description 46
- 239000000203 mixture Substances 0.000 claims description 38
- 229920000642 polymer Polymers 0.000 claims description 33
- 229920002873 Polyethylenimine Polymers 0.000 claims description 29
- 238000007789 sealing Methods 0.000 claims description 25
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 18
- 229910052757 nitrogen Inorganic materials 0.000 claims description 18
- 125000000524 functional group Chemical group 0.000 claims description 17
- 239000011148 porous material Substances 0.000 claims description 15
- 125000002091 cationic group Chemical group 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 claims description 10
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 125000005372 silanol group Chemical group 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 2
- 229920002521 macromolecule Polymers 0.000 claims 2
- 239000010410 layer Substances 0.000 description 24
- 230000015572 biosynthetic process Effects 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000005160 1H NMR spectroscopy Methods 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000000693 micelle Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 4
- 238000004809 thin layer chromatography Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- HBXWUCXDUUJDRB-UHFFFAOYSA-N 1-octadecoxyoctadecane Chemical compound CCCCCCCCCCCCCCCCCCOCCCCCCCCCCCCCCCCCC HBXWUCXDUUJDRB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- -1 Polyoxyethylene Polymers 0.000 description 2
- 239000003125 aqueous solvent Substances 0.000 description 2
- 150000001541 aziridines Chemical class 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000003795 desorption Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- JKXYOQDLERSFPT-UHFFFAOYSA-N 2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-(2-octadecoxyethoxy)ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethanol Chemical compound CCCCCCCCCCCCCCCCCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCO JKXYOQDLERSFPT-UHFFFAOYSA-N 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000012901 Milli-Q water Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005349 anion exchange Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000012792 core layer Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical group [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012267482A JP6049432B2 (ja) | 2012-12-06 | 2012-12-06 | 多孔質低屈折率材料用のシール組成物、低屈折率部材及びその製造方法。 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012267482A JP6049432B2 (ja) | 2012-12-06 | 2012-12-06 | 多孔質低屈折率材料用のシール組成物、低屈折率部材及びその製造方法。 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014114333A JP2014114333A (ja) | 2014-06-26 |
| JP2014114333A5 true JP2014114333A5 (https=) | 2015-11-26 |
| JP6049432B2 JP6049432B2 (ja) | 2016-12-21 |
Family
ID=51170685
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012267482A Active JP6049432B2 (ja) | 2012-12-06 | 2012-12-06 | 多孔質低屈折率材料用のシール組成物、低屈折率部材及びその製造方法。 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6049432B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI712640B (zh) * | 2015-11-16 | 2020-12-11 | 日商三井化學股份有限公司 | 半導體用膜組成物、半導體用膜組成物的製造方法、半導體用構件的製造方法、半導體用工程材料的製造方法及半導體裝置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004002111A (ja) * | 2002-05-31 | 2004-01-08 | Ulvac Japan Ltd | ディスプレイ窓材用光学薄膜の形成方法及び光学薄膜構造体 |
| JP2005126497A (ja) * | 2003-10-21 | 2005-05-19 | Jsr Corp | 光導波路用感光性樹脂組成物および光導波路 |
| JP2008202025A (ja) * | 2007-01-22 | 2008-09-04 | Honda Motor Co Ltd | プロトン伝導性高分子 |
| JP5243065B2 (ja) * | 2008-03-03 | 2013-07-24 | 学校法人慶應義塾 | 反射防止膜及び光学素子 |
| CN102224577B (zh) * | 2009-05-29 | 2013-12-04 | 三井化学株式会社 | 半导体用密封组合物、半导体装置及半导体装置的制造方法 |
-
2012
- 2012-12-06 JP JP2012267482A patent/JP6049432B2/ja active Active
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