JP2014111302A - Electrodeposition wheel - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an electrodeposition wheel which holds sharpness with excellent condition for a long time and has a long service life as a wheel.SOLUTION: The electrodeposition wheel comprises: a base metal which is formed into a disk-like shape and rotated and driven around a rotation axial line; and a super abrasive grain layer formed by fixing plural super abrasive grains on a belt-like part extended at a prescribed width at an outer peripheral part of the base metal by metal plating. On an intersection between plural concentrically disposed circles drawn virtually concentrically to the rotation axis so as to divide the belt-like part by an equal interval, and plural width direction disposed lines drawn virtually from one end of the belt-like part toward the other end so as to divide the belt-like part in a circumferential direction by an equal interval, a gel-form adhesive is dispensed by larger spot than the super abrasive grains by a dispenser. Therefore plural masking parts on which the super abrasive grains are not deposited electronically are formed.

Description

  The present invention relates to an electrodeposition wheel in which the concentration of abrasive grains of an electrodeposition grindstone or an electrodeposition dresser is adjusted by a masking pattern.

  The concentration of abrasive grains is a value that indicates how much abrasive grains are contained in the grindstone. The higher the degree of concentration, the more abrasive grains are contained. Grain clogging is likely to occur, and the sharpness may drop immediately. On the other hand, sharpness increases at a low concentration, but spillage tends to occur and the life is shortened. Therefore, it is very important how to adjust the degree of concentration and include abrasive grains in the grindstone.

  According to Patent Document 1 as a conventional technique, a masking portion is formed by an inkjet device on a ground surface of a base metal, and abrasive particles are plated and fixed on a non-masking portion. It is described that the concentration of abrasive grains is controlled by forming a masking portion and an unmasking portion, which are 40%, with no abrasive grains, in a constant pattern.

  In Patent Document 2, a gel adhesive is spotted on a conductive mother mold peripheral wall to form protrusions, diamond abrasive grains are fixed to the mother mold peripheral wall by electroplating, and the mother mold is removed to remove dimples. A diamond dresser is described which is interspersed and controls the degree of concentration in dimple portions without abrasive grains.

Japanese Patent No. 4871543 Japanese Patent No. 3325832

  However, in Patent Document 1, the masking pattern is merely arranged so that three adjacent circles formed with ink form a regular triangle. Therefore, there are places where a lot of masking is placed on the circumference centered on the rotation axis of the grindstone, and places where there is little masking, and the abrasive grains cannot be concentrated uniformly.

  Further, in Patent Document 2, the dimple arrangement pattern formed by the masking portion is formed in an equilateral triangle, a lattice shape, or the like. Therefore, there are portions where there are many and few dimples arranged on the circumference centering on the rotation axis of the grindstone, and there is a fear that uniform concentration of the abrasive grains cannot be achieved.

  In addition, as shown in FIG. 14, an electrodeposition wheel in which a plurality of masks are arranged in a grid pattern is manufactured. However, as in Patent Document 1 and Patent Document 2, on the circumference around the rotation axis. A portion with a large amount of masking and a portion with a small amount of masking are formed on the surface, and the abrasive grains cannot be uniformly concentrated.

  As a result, in the masking (or dimple) patterns shown in Patent Document 1, Patent Document 2 and FIG. 14, the sharpness of the grindstone immediately deteriorates due to “clogging” when the masking is small, and the masking is large. Wears severely due to “spilling”. In addition, since the abrasive grains cannot be uniformly concentrated in this way, there has been a problem that the “deformation” of the electrodeposition wheel occurs and the life of the electrodeposition wheel is shortened.

  This invention is made | formed in view of the conventional problem which concerns, and provides the electrodeposition wheel which can hold | maintain a sharpness for a long time and has a long lifetime as a wheel.

In order to solve the above-described problem, the structural feature of the invention according to claim 1 is that a base metal that is formed in a disk shape and is driven to rotate around a rotation axis, and extends to the outer periphery of the base metal with a predetermined width. A superabrasive grain layer formed by fixing a plurality of superabrasive grains to the existing belt-like portion by plating, and the rotating shaft so as to divide the belt-like portion at equal intervals. A plurality of concentrically arranged concentric circles concentrically drawn, and a plurality of widths virtually drawn from one end of the strip to the other end so as to divide the strip at equal intervals in the circumferential direction A plurality of masking portions where the superabrasive grains are not electrodeposited are formed at the intersections with the direction arrangement lines by the gel adhesive being spotted larger than the superabrasive grains by the dispenser.
According to this, the plurality of masking portions arranged at the intersections of the width direction arrangement lines and the concentric arrangement circles virtually drawn on the band portion of the superabrasive layer are evenly arranged in the circumferential direction and the width direction of the band portion. When the electrodeposition wheel is rotated, the plurality of masking portions are uniformly contacted with the object to be ground over the entire superabrasive layer without being biased.
Then, by arranging the plurality of masking portions uniformly in the circumferential direction and the width direction of the strip portion, the concentration of super abrasive grains in the super abrasive layer of the strip portion can be made uniform as a whole. And by the several masking part formed on the width direction arrangement | positioning line which exists in a superabrasive grain layer, while preventing "clogging" which arises when the superabrasive grain concentration degree becomes high, adjacent to a superabrasive grain layer "Shape loss" can be prevented by a portion where there is no masking portion between the arrangement lines in the width direction.

The structural feature of the invention according to claim 2 is that the plurality of concentric arrangement circles are divided into a plurality of concentric arrangement circle groups including a plurality of different concentric arrangement circles, and the plurality of width direction arrangement lines are a plurality of concentric arrangement circles. The plurality of concentric arrangement circles of the concentric arrangement circle group that are divided into a plurality of width direction arrangement line groups that include different width direction arrangement lines and are in a corresponding relationship with the plurality of concentric arrangement circle groups, respectively. The electrodeposition wheel according to claim 1, wherein the plurality of masking portions are formed at intersections of the plurality of width direction arrangement line groups with the plurality of width direction arrangement line groups.
According to this, a plurality of masking portions formed at the intersection of the concentric arrangement circle group and the width direction arrangement line group corresponding to it, another concentric circle group and other width direction arrangement line group corresponding to it Since the concentric circle is different from the other masking parts formed at the intersection of the other, the masking part cannot be placed in one widthwise placement line group at the intersection of other widthwise placement lines and other concentric placement circles A masking part can be arranged. Thereby, the density of the masking part arrange | positioned in the width direction of a strip | belt-shaped part can be raised.

The structural feature of the invention according to claim 3 is that each of the width direction arrangement lines is composed of a main arrangement line and at least one sub arrangement line adjacent to the main arrangement line. It is to make it a landing wheel.
Thus, since the width direction arrangement line includes at least one sub arrangement line in addition to the main arrangement line, the ratio of the masking portion to the superabrasive grains on the concentric arrangement circle is set to the masking portion as the sub arrangement line. It can be adjusted by arranging.

The constitutional feature of the invention according to claim 4 is the electrodeposition wheel according to any one of claims 1 to 3, wherein the width direction arrangement line is a straight line inclined at the same angle with respect to the radial direction. It is to be.
According to this, a plurality of masking portions arranged along the inclined width direction arrangement line are not brought into contact with only the same position of the workpiece, but the contact position is moved to a continuous adjacent location of the workpiece. Thus, the grinding resistance can be made uniform.

The structural feature of the invention according to claim 5 is that a width direction auxiliary arrangement line is virtually drawn adjacent to each of the plurality of width direction arrangement lines so that the wear of the superabrasive layer is uniform. The electrodeposition wheel according to any one of claims 1 to 4, wherein the masking portions are respectively formed at intersections of the plurality of concentric arrangement circles and the plurality of width direction auxiliary arrangement lines. is there.
According to this, by the masking part arranged at the intersection of the concentric arrangement circle group and the width direction auxiliary arrangement line, the masking part in the superabrasive layer is increased according to the degree of wear in the superabrasive layer part. The ratio of can be easily adjusted. As a result, the wear of the superabrasive layer can be made uniform to prevent “shape loss”.

The structural feature of the invention according to claim 6 is that the electrodeposition wheel is an electrodeposition wheel according to any one of claims 1 to 5, which is a grindstone for grinding a workpiece.
According to this, when grinding a workpiece, a plurality of masking portions are evenly arranged in the width direction and the circumferential direction of the superabrasive grain layer formed in the belt-shaped portion. The masking portion of the whole of the superabrasive layer uniformly contacts the workpiece. As a result, it is possible to prevent the “shape loss” of the superabrasive layer of the grindstone and to prolong the life of the grindstone.

A structural feature of the invention according to claim 7 is that the electrodeposition wheel is a dresser for dressing a grindstone, and is an electrodeposition wheel according to any one of claims 1 to 5.
According to this, when dressing a grindstone, a plurality of masking portions are evenly arranged in the width direction and the circumferential direction of the superabrasive grain layer formed in the belt-shaped portion. A masking part contacts a grindstone uniformly in the whole superabrasive grain layer. As a result, the “shape loss” of the superabrasive layer of the dresser can be prevented, and the life of the dresser can be extended.

A structural feature of the invention according to claim 8 is that a base metal formed in a disk shape and driven to rotate around a rotation axis, and a plurality of superabrasives on a belt-like portion extending at a predetermined width around the outer periphery of the base metal. A superabrasive grain layer formed by fixing grains by plating, and is virtually concentric with the rotating shaft so as to divide the belt-like portion at equal intervals. A plurality of concentrically arranged circles drawn in FIG. 5 and a plurality of circumferential wirings virtually drawn from one end of the belt-like portion toward the other end so as to divide the belt-like portion at equal intervals in the circumferential direction. A masking part forming step for forming a masking part where the superabrasive grains are not electrodeposited by spotting a gel adhesive with a dispenser larger than the superabrasive grains at a crossing point; and the masking part Electrodeposition that adheres to the belt-like part excluding Comprising a can step, in the masking pattern forming step, the total projected area of the masking portion, and to said placing 5 to 20 percent of the total projected area of the superabrasive layer.
According to this, the superabrasive layer in which the masking portions are uniformly arranged in the width direction and the circumferential direction can be easily formed on the belt-like portion of the outer peripheral portion of the base metal by the dispenser. Then, by adjusting the dispenser, the total projected area of the masking portion, which is considered to be highly effective in preventing “clogging” and “shape loss”, is 5 to 20% of the total projected area of the superabrasive layer. An electrodeposition wheel can be manufactured easily.

The figure which shows the side surface of the electrodeposition wheel of 1st Embodiment which concerns on this invention. The figure which shows the II-II cross section of the electrodeposition wheel in FIG. The figure which shows the state spotted on a base metal with a dispenser. The figure which shows the state which filled the masking base metal with the superabrasive grain. The figure which shows the state which fixed the superabrasive grain temporarily by plating. The figure which shows the state which removed the excess superabrasive grain. The figure which shows the state which fixed the superabrasive grain to the base metal by plating. The figure which shows the outline | summary of a plating tank. Graph comparing grinding resistance of test specimens. The graph which compares the abrasion loss of a test body. The figure which shows the side surface of the electrodeposition wheel of 2nd Embodiment. The figure which shows the front of an electrodeposition wheel. The figure which shows the condition which dresses a screw-shaped grindstone. The figure which shows the prior art example of an electrodeposition wheel.

(First embodiment)
Hereinafter, a first embodiment in which an electrodeposition wheel according to the present invention is applied to a grinding wheel for gear grinding will be described with reference to the drawings.
As shown in FIGS. 1 and 2, the gear grinding wheel 2 includes a base metal 4 formed in a disc shape, and a diamond as a superabrasive layer formed with a predetermined width on both side surfaces 54 of the base metal 4. An abrasive layer 6. A band-shaped portion 18 having a predetermined width is formed on the base metal 4, and a diamond abrasive grain layer 6 is formed on the band-shaped portion 18. For the base metal 4, for example, quenched and tempered steel (SUJ) is used.

  In the electrode grinding wheel 2 for gear grinding of this embodiment, diamond abrasive grains 8 having a grain size of, for example, about # 30 to # 140 are used as superabrasive grains. The diamond abrasive grain layer 6 is formed of an electroformed abrasive grain layer in which diamond abrasive grains 8 are fixed by plating. Further, as shown in FIG. 8, both side surfaces 54 of the base metal 4 are formed in a convex curved shape, and the outer peripheral edge 56 is formed so that the both side surfaces 54 approach a pointed shape.

  A plurality of masking portions 12 are arranged on the surface of the diamond abrasive layer 6. As shown in FIG. 1, a plurality of concentric circles 14 virtually drawn concentrically with the rotating shaft 3 of the grinding wheel 2 for gear grinding so as to divide the belt-like portion 18 at equal intervals, and the belt-like portion 18. The gel-like adhesive 20 is dispensed at the intersections with a plurality of width direction arrangement lines 16 virtually drawn from one end 50 to the other end 52 of the strip 18 so as to be divided at equal intervals in the circumferential direction. A plurality of masking portions 12 where the diamond abrasive grains 8 are not electrodeposited are formed by being spotted larger than the diamond abrasive grains 8 by 22. Each masking part is formed in a hemispherical shape having a diameter of 1.5 mm, for example.

Specifically, the plurality of concentrically arranged circles 14 that are virtually drawn include a first concentric arranged circle group (14A, 14C, 14E, 14G, 14I) composed of odd-numbered concentric arranged circles from the outside. , And is divided into second concentric circles (14B, 14D, 14F, 14H, and 14J) configured by even-numbered concentric circles from the outside.
Virtually drawn width direction arrangement lines 16 divide the band-like portion 18 evenly at intervals of 22.5 degrees in the circumferential direction. Each width direction arrangement line 16 is a straight line inclined at the same angle of 67.5 degrees with respect to the radial direction at the center in the width direction of the band-shaped portion 18. Therefore, the contact position of the masking portion 12 arranged along the inclined width direction arrangement lines 16A and 16B is not moved to the same position of the workpiece, but the contact position is moved to a continuous adjacent location of the workpiece. Thus, the grinding resistance can be made uniform.
The virtually drawn width direction arrangement line 16 includes the first width direction arrangement line 16A corresponding to the first concentric arrangement circle group (14A, 14C, 14E, 14G, 14I) and the second concentric arrangement line. The circle group (14B, 14D, 14F, 14H, 14J) is divided into a second width direction arrangement line 16B that has a corresponding relationship.
The first width direction arrangement line 16A has a main arrangement line 16A1 and a sub arrangement line 16A2 provided close to the main arrangement line 16A1, and the second width direction arrangement line 16B is similarly the main arrangement line 16B1. And a sub arrangement line 16B2 provided close to the main arrangement line 16B1. Thus, since the width direction arrangement lines 16A and 16B are provided with the sub arrangement lines 16A2 and 16B2 close to the main arrangement lines 16A1 and 16B1, the ratio of the masking portion 12 to the superabrasive grains 8 on the concentric arrangement circle 14 Can be adjusted by the masking unit 12 arranged in the sub arrangement lines 16A2 and 16B2.
The masking unit 12 includes a first concentric arrangement circle group (14A, 14C, 14E, 14G, 14I) in correspondence with each intersection of the first width direction arrangement lines 16A1, 16A2, and a second concentric arrangement in correspondence. It arrange | positions at the intersection of circle group (14B, 14D, 14F, 14H, 14J) and 2nd width direction arrangement line 16B1, 16B2.

As described above, the masking portion 12 on the first width direction arrangement line 16A is located at the intersection of the odd-numbered first concentric arrangement circle groups 14A, 14C, 14E, 14G, 14I, and the second width direction arrangement line Since the masking part 12 on 16B is located at the intersection with the even-numbered second concentric circles (14B, 14D, 14F, 14H, 14J), the masking part 12 on the first width direction arrangement line 16A, The masking portion 12 on the second width direction arrangement line 16B adjacent to the first width direction arrangement line is arranged on a concentric arrangement circle shifted by one in the radial direction.
Therefore, in the first width direction arrangement line 16A, the diamond abrasive grain layer 6 portion (for example, the first concentric arrangement circle 14A and the third concentric arrangement circle 14C from the outer side) where the masking portion 12 cannot be arranged in the width direction of the band-shaped portion 18 Between the adjacent second width direction arrangement line (other width direction arrangement line) 16B and the second concentric arrangement circle (other concentric arrangement circle) 14B from the outside. Can be arranged. Thereby, the density of the masking part 12 arrange | positioned in the width direction of the strip | belt-shaped part 18 can be raised.

Next, the manufacturing method of the grinding wheel 2 for gear grinding is demonstrated below based on FIGS.
First, as shown in FIG. 3, a non-conductive gel-like adhesive 20 is applied to the surface of a band-like portion 18 provided with a predetermined width on the outer periphery of a conductive base metal 4 such as iron. A fixed amount is spotted from the nozzle (masking part forming step).
The gel-like adhesive 20 includes a plurality of concentrically arranged circles 14 which are virtually drawn concentrically with the rotary shaft 3 so as to divide the belt-like portion 18 on which the superabrasive grain layer 6 of the base metal 4 is formed at equal intervals. And a plurality of width direction arrangement lines 16 virtually drawn from one end 50 to the other end 52 of the strip 18 so as to divide the strip 18 at equal intervals in the circumferential direction. Is done.

  Since the spotted adhesive is in the form of a gel, it becomes substantially hemispherical and instantly solidifies to become a protrusion (masking portion 12). The size of the masking portion 12 depends on the amount of the adhesive 20 to be spotted, and the density depends on the number of spotted dots, but can be easily adjusted by selecting the size of the nozzle and the discharge amount of the dispenser 22. . In the present embodiment, a gel-type instantaneous adhesive is used as the non-conductive gel adhesive 20. The non-conductive gel adhesive 20 may be other as long as it fits the purpose of the present invention. However, in order to facilitate the work in forming a good shape (eg, hemisphere), the viscosity is It is preferably 75,000 mPA · s or less. In addition, the shape of the masking part 12 is not limited to a hemisphere, For example, a triangle, a square, a rhombus, etc. can be selected arbitrarily. In this case, the shape of the masking portion 12 can be easily selected by setting the shape of the nozzle to a shape such as a triangular pyramid or a quadrangular pyramid.

Further, the movement of the nozzle portion and the discharge of the adhesive can be controlled by a numerical control device, and can be automatically spotted at a predetermined arrangement position.
That is, the first concentric arrangement circle group virtually drawn on the surface of the band-like portion 18 of the base metal 4 as a masking portion 12 in which the gel adhesive 20 is moved by a numerical controller. Automatically at the intersection of 14A, 14C, 14E, 14G, 14I and the first width direction arrangement line 16A, and the intersection of the second concentric arrangement circle group 14B, 14D, 14F, 14H, 14J and the second width direction arrangement line 16B Arranged.

  Next, as shown in FIG. 4, when the surface of the base metal 4 is filled with diamond abrasive grains 8, the diamond abrasive grains 8 are in direct contact with the wall surface of the base metal 4 where there is no masking section 12. In some parts, the diamond abrasive grains 8 are prevented from contacting the wall surface of the base metal 4.

  Next, as shown in FIG. 8, the base metal 4 filled with the diamond abrasive grains 8 is placed in an electroplating tank 24 and electroplated, thereby forming the diamond abrasive grains 8 and the base metal 4 as shown in FIG. A plating layer 26 is formed between the wall surfaces of the diamond, and temporary electrodeposition of the diamond abrasive grains 8 to the wall surface of the base metal 4 is performed (electrodeposition plating step 1).

In the electroplating tank 24, for example, a plating solution 30 in which boric acid, nickel sulfate, nickel chloride or the like is mixed is stored. In the plating solution 30, a nickel electrode 32 is provided as an anode. A base metal 4 is used as the cathode. A base metal 4 is fastened by a nut 36 to a flange portion 34A of the conductive support member 34 connected to the cathode terminal, and the base metal 4 is interposed by a bottom plate 38 and a vinyl chloride bracket 40 through a rubber masking member 42. Is sandwiched from above and below. The provisional electrodeposition was performed provisional electrodeposition of diamond abrasive grains 8 for example at a current density of 0.1~0.15A / dm ^2.

  Next, after the temporary electrodeposition of the diamond abrasive grains 8 is completed, the excess diamond abrasive grains 8 are removed. At this time, since the projections by the masking portion 12 spotted on the surface of the base metal 4 are formed of the non-conductive adhesive 20 as shown in FIG. Since the abrasive grains 8 are not electrodeposited, they are easily removed, and the diamond abrasive grains 8 hardly adhere to the portions corresponding to the masking portion 12 of the diamond abrasive grain layer 6.

Next, as shown in FIG. 8, an electroformed layer 28 is formed by electroplating in order to fix the diamond abrasive grains 8 in earnest in the electroplating tank 24 again (electrodeposition plating step 2). As a result, as shown in FIG. 7, an electroformed layer 28 having a sufficient thickness for securely fixing the diamond abrasive grains 8 is formed. The base metal 4 was set in the electroplating tank 24. For example, the electroformed layer 28 was formed by nickel electroplating at 0.3 A / dm ² for 90 hours, and the diamond abrasive grains 8 were fixed.

As described above, the shape, size, and arrangement position of the masking portion 12 can be easily controlled by adjusting when the masking portion 12 is spotted by the adhesive 20 by the dispenser 22. The electrodeposition plating step is composed of the electrodeposition plating step 1 and the electrodeposition plating step 2.
In the gear grinding wheel 2 of the present embodiment, as shown in FIG. 8, the superabrasive grain layer 6 is formed on both side surfaces 54 in which the outer peripheral portion of the base metal 4 is formed in a convex curved shape, and these both side surfaces 54. Is formed toward the outer peripheral edge 56. In the superabrasive layer 6, a plurality of masking portions 12 are evenly arranged in the circumferential direction and the width direction of the band-shaped portion 18. Therefore, when grinding the groove side surface of the gear, the outer peripheral edge 56 of both side surfaces 54 having the superabrasive grain layer 6 can be easily ground by entering the groove portion of the gear. At this time, the plurality of masking portions 12 are in contact with the object to be ground evenly in the entire superabrasive grain layer 6. Thereby, the “shape failure” of the superabrasive layer 6 of the gear grinding wheel 2 can be prevented, and the life of the wheel can be extended.

According to the grinding wheel 2 for gear grinding configured as described above, the diamond abrasive grain layer 6 is concentric with the rotary shaft 3 so as to divide the band-shaped part 18 formed in the band shape on the outer peripheral part of the base metal 4 at equal intervals. A plurality of concentrically arranged circles 14 virtually drawn in FIG. 5 and the belt-like portion 18 are virtually drawn from one end 50 to the other end 52 so as to divide the belt-like portion 18 at equal intervals in the circumferential direction. A plurality of masking portions 12 having a diameter larger than that of the ink jet are formed by the dispenser 22 at intersections with the plurality of width direction arrangement lines 16. Therefore, the plurality of masking portions 12 arranged at the intersections of the width direction arrangement lines 16 and the concentric arrangement circles 14 that are virtually drawn on the belt-like portion 18 are evenly arranged in the circumferential direction and the width direction of the belt-like portion 18. Thus, when the gear grinding grindstone 2 rotates, the plurality of masking portions 12 do not bias and contact the object to be ground evenly over the entire diamond abrasive grain layer 6.
And the concentration degree of the superabrasive grain 8 of the superabrasive grain layer 6 of the strip-shaped part 18 is made uniform as a whole by arranging the plurality of masking parts 12 uniformly in the circumferential direction and the width direction of the strip-shaped part 18. Can do. The plurality of masking portions 12 formed on the width direction arrangement line 16 existing in the superabrasive grain layer 6 prevent “clogging” caused by the high concentration of the superabrasive grains 8 and The “shape loss” can be prevented by the portion where the sking portion 12 between the adjacent width direction arrangement lines 16A and 16B of the abrasive grain layer 6 does not exist.
Thereby, the life of the grinding wheel 2 for gear grinding can be extended. When the total projected area of the masking portion 12 is 5 to 20% of the total projected area of the diamond abrasive grain layer 6, the experiment is particularly effective in preventing “clogging” and “shape loss”. Has been derived.

(Second Embodiment)
Hereinafter, a second embodiment of the electrodeposition wheel according to the present invention will be described with reference to the drawings.
The electrodeposition wheel of the present embodiment is an electrodeposition dresser 102, has a conical side surface with an apex angle of 145 degrees only on one side, and is provided with a band-shaped portion 118 on the outer periphery of the conical side surface. This is different from the first embodiment in that the diamond abrasive grain layer 106 is formed in the portion 118, and the widthwise auxiliary arrangement line 17 is provided in the band-like portion 118.
Similarly to the first embodiment, odd-numbered concentric circles (14A, 14C, 14E, 14G, 14I) virtually drawn from the outside of the band 118 are formed on the band 118 of the diamond abrasive grain layer 106. ) And a second concentric arrangement composed of even-numbered concentric arrangement circles (14B, 14D, 14F, 14H, and 14J) virtually drawn from the outside of the belt-shaped portion 118. A circle group is provided, and the first width direction arrangement lines 16A1 and 16A2 that are virtually drawn corresponding to the first concentric arrangement circle group and the second concentric arrangement circle group are virtually drawn. Second width direction arrangement lines 16B1 and 16B2 are provided. These arrangements are the same as those in the first embodiment when the electrodeposition dresser 102 is viewed from the side.

Next, the difference will be described in detail below.
As shown in FIGS. 11 and 12, the electrodeposition dresser 102 is a base metal having one side 154 formed with a conical surface with a wide apex angle and the other side formed with a flat surface so as to form a disc shape as a whole. 104 and a diamond abrasive layer 106 as a superabrasive layer formed in a band shape with a predetermined width on the outer side in the radial direction of one side surface 154 of the base metal 104. A band-shaped portion 118 having a predetermined width is formed on the outer peripheral side surface of the base metal 104 of the electrodeposition dresser 102, and a diamond abrasive layer 106 is formed on the band-shaped portion 118. For the base metal 104, for example, quenched and tempered steel (SUJ) is used.

  The electrodeposition dresser 102 of this embodiment is a dresser for grinding a screw-shaped grindstone 109 (see FIG. 13), and diamond abrasive grains 8 having a grain size of, for example, about # 30 to # 140 are used as superabrasive grains. .

  First width direction auxiliary arrangement lines 17A1, 17A2, and 17A3 as width direction auxiliary arrangement lines adjacent to the rotation direction are arranged in the first width direction arrangement lines 16A1 and 16A2 provided in the belt-shaped portion 118 where the diamond abrasive layer 106 exists. Is provided. Further, second width direction auxiliary lines 17B1, 17B2, and 17B3 are provided on the second width direction arrangement lines 16B1 and 16B2 adjacent to the rotation direction. The first width direction placement lines 16A1, 16A2 and the first width direction auxiliary placement lines 17A1, 17A2, 17A3 are inclined at the same angle of 67.5 degrees with respect to the radial direction at the central portion in the width direction of the belt-shaped portion 118. The lines are arranged at equal intervals in the circumferential direction.

  The first width direction auxiliary arrangement lines 17A1, 17A2, and 17A3 are in correspondence with the first concentric arrangement circle groups 14A, 14C, 14E, 14G, and 14I, and the second width direction auxiliary arrangement lines 17B1, 17B2, and 17B3 are the second concentric lines. Corresponding to the arrangement circle groups 14B, 14D, 14F, 14H, and 14J. And the masking part 12 is provided in the intersection of the width direction auxiliary | assistant arrangement | positioning line and concentric arrangement | positioning circle group which have a corresponding relationship, respectively.

  These masking portions 12 are not arranged at all the intersections of the width direction auxiliary arrangement lines 17A and 17B and the corresponding concentric arrangement circle group 14, but the width direction auxiliary arrangement lines 17A and 17B and the corresponding relationship. The diamond abrasive grain layer 106 can be evenly worn by being arranged on the radially outer side of the belt-like portion 118 at the intersection of the concentric arrangement circle group 14 in FIG.

  Specifically, first, in the first concentric arrangement circle group 14A, 14C, 14E, 14G, 14I, on the outermost concentric arrangement circle 14A, the left adjacent to the first width direction arrangement line 16A2 (the electrodeposition dresser 102) The masking portions 12 are arranged at all three intersections with the three first width direction auxiliary arrangement lines 17A1, 17A2, and 17A3 on the rotation direction side).

On the third concentric arrangement circle 14C from the outside, the masking portion 12 is arranged at two intersections with the two first width direction auxiliary arrangement lines 17A1 and 17A2 on the left side of the first width direction arrangement line 16A2. Yes.
On the fifth concentric arrangement circle 14E from the outside, the masking portion 12 is arranged at two intersections with the two first width direction auxiliary arrangement lines 17A1 and 17A2 on the left side of the first width direction arrangement line 16A2. Yes.
On the seventh concentric arrangement circle 14G from the outside, the masking portion 12 is arranged at one intersection with the first first auxiliary arrangement line 17A1 on the left side of the first width direction arrangement line 16A2.
In the ninth concentric arrangement circle 14I from the outside, the masking portion 12 is not arranged at the intersection with any of the first width direction auxiliary arrangement lines.

  Similarly, in the second concentric arrangement circle group 14B, 14D, 14F, 14H, 14J, the second width direction auxiliary arrangement lines 17B1, 17B2, 17B3 arranged on the left side of the second width direction arrangement lines 16B1, 18B2 and The masking portion 12 is not arranged at all the intersection points of the masking portion 12, but the masking portion 12 is arranged at the intersection point outside the belt-shaped portion 118 of the electrodeposition dresser 102 in the radial direction among the intersection points where the masking portion 12 is arranged, The wear of the superabrasive layer 106 is made uniform.

  In the disc-shaped electrodeposition dresser 102, the circumference increases as it goes outward. Therefore, the masking portion 12 is arranged so as to increase toward the outside of the belt-shaped portion 118 where the superabrasive layer 106 of the electrodeposition dresser 102 exists, so that the ratio of the masking portion 12 to the superabrasive layer 106 is kept uniform. can do. This makes it possible to always make uniform contact with the grindstone 109 during dressing, and prevent the diamond abrasive grain layer 106 of the electrodeposition dresser 102 from being “deformed” to prolong the life of the electrodeposition dresser 102. I can do it.

Next, the case where the thread-shaped grindstone 109 is dressed using the electrodeposition dresser 102 in this embodiment will be briefly described.
First, as shown in FIG. 13, two electrodeposition dressers 102 are provided on the drive shaft 113 so as not to be relatively rotatable by bolts or the like. The two electrodeposition dressers 102 are arranged so that the conical surfaces provided with the diamond abrasive layer 106 are opposed to each other. The drive shaft 113 is rotated by a drive torque transmitted by a drive motor (not shown) via a speed reducer (not shown). The rotational speed of the drive shaft 113 is configured to be changed to an arbitrary peripheral speed by a mechanism that switches a gear ratio in the reduction gear. A thread-shaped grindstone 109 that is an object to be ground is assembled to a drive shaft (not shown) that is rotatable at a peripheral speed different from that of the drive shaft 113 so as not to be relatively rotatable. The drive shaft 113 and the drive shaft on which the screw-shaped grindstone 109 is assembled are incorporated in a not-shown notch moving mechanism that can approach and separate in a parallel state. The drive shaft 113 and the drive shaft on which the screw-shaped grindstone 109 is assembled are incorporated in a feed movement mechanism that can move relative to the axial direction in conjunction with the rotation of the drive shaft on which the screw-shaped grindstone 109 is assembled. It is.

  When performing dressing, for example, the peripheral speed of the thread-shaped grindstone 109 is made lower than the peripheral speed of the electrodeposition dresser 102 so that the electrodeposition dresser 102 and the grindstone 109 rotate in the same tangential direction at the contact point. Rotate in opposite directions. Then, the side of the thread tooth valley of the thread-shaped grindstone 109 is dressed by adjusting the depth of cut by the notch moving mechanism. Then, the electrodeposition dresser 102 and the thread-shaped grindstone 109 are moved relative to each other in the axial direction by a feed movement mechanism in synchronization with the thread-shaped rotation of the grindstone 109, and the side surface of the thread tooth valley of the thread-shaped grindstone 109 Dress continuously.

  According to the electrodeposition dresser 102 configured as described above, in addition to the masking portion 12 arranged at the intersection of the concentric arrangement circle group 14A, 14C, 14E, 14G, 14I and the corresponding width direction arrangement lines 16A1, 16A2. Thus, the masking portion 12 arranged on the width direction auxiliary arrangement lines 17A1, 17A2, and 17A3 arranges the masking portion 12 on the outer side in the radial direction of the belt-like portion 118 where the abrasion of the superabrasive grain layer 106 is expected to be small. Further, the wear of the superabrasive grain layer 106 can be made more uniform, and “shape loss” can be prevented.

Next, the optimal arrangement position, occupied area, etc. of the masking portion 12 on the surface of the diamond abrasive layer 106 in the dresser 102 will be described based on experimental data.
An electrodeposition dresser (test body A) in which a plurality of masking portions are arranged in a lattice shape as shown in FIG. 14 and an electrodeposition dresser (test body B) according to the present embodiment as shown in FIG. ). As shown in FIG. 11, the test body B includes a plurality of masking portions 12, as shown in FIG. 11, the first concentric arrangement circle group 14 </ b> A, 14 </ b> C, 14 </ b> E, 14 </ b> G, 14 </ b> I and the first width direction arrangement line group 16 </ b> A <b> 1. 16A2 and the first width direction auxiliary arrangement line groups 17A1, 17A2, and 17A3. In addition, the plurality of masking portions 12 are arranged in the second concentric arrangement circle groups 14B, 14D, 14F, 14H, and 14J, the second width direction arrangement line groups 16B1 and 16B2, and the second width direction auxiliary arrangement line group that are in a corresponding relationship. They are arranged at the intersections with 17B1, 17B2, and 17B3. In each of the first and second width direction auxiliary arrangement line groups 17A and 17B, the masking part 12 is arranged on the outer side in the radial direction of the belt-like part 118.
The total projected area of the masking portion 12 with respect to the total projected area of the diamond abrasive grains 8 was 10% for both the test body A and the test body B. When the total projected area of the masking portion 12 increases, the load on the diamond abrasive grains tends to become “shape loss”, and when the total projected area of the masking portion 12 decreases, “clogging” occurs and the sharpness is immediately cut. Therefore, it was considered that the total projected area of the masking portion 12 with respect to the total projected area of the diamond abrasive grains 8 is preferably about 10%.

By actually grinding under the same dressing conditions, the dress resistance that shows sharpness (the higher the value, the worse the "sharpness") and the wear amount that shows shape maintenance (life) (the higher the value, the more the shape maintenance) A comparative test was conducted with respect to “it is easy to deform”.
The electrodeposition dresser of the test body A and the test body B has an electrodeposition dresser diameter of 110 mm, a dressed vitrified grinding wheel diameter of 300 mm, a cutting speed of 0.027 m / s, a dresser circumferential speed of 18.8 m / s, and a grinding wheel circumferential speed. The dressing condition was 1.4 m / s.

  As shown in FIG. 9, when the dress resistance indicating the sharpness of the test specimen A is 1, the dress resistance of the test specimen B is 0.5, and the test specimen according to this embodiment is as shown in FIG. The sharpness of the electrodeposition dresser of B was improved twice, and it was confirmed that the sharpness was high.

  As shown in FIG. 10, in the shape maintaining property of the electrodeposition dresser, when the wear amount of the test body A is 1, the wear amount of the test body B is about 0.63. This was the same as that without any masking part, and it was confirmed that the shape maintainability was high.

In the present embodiment, the width direction auxiliary arrangement line 17 is arranged on the rotation direction side of the width direction arrangement line 16, but is not limited to this, for example, the rotation direction opposite side of the width direction arrangement line 16. Alternatively, the width direction auxiliary arrangement line may be divided into the rotation direction side and the rotation direction opposite side of the width direction arrangement line.
Moreover, although the width direction arrangement | positioning line 16 and the width direction auxiliary arrangement line 17 were made into the straight line, it is not limited to this, For example, curves, such as circular arc shape, may be sufficient.
In addition, the width direction arrangement lines are arranged at equal intervals every 22.5 degrees in the circumferential direction of the electrodeposition wheel. However, the present invention is not limited to this, and the function of the electrodeposition wheel to be produced, for example, every 15 degrees. It can be arbitrarily changed according to.
Moreover, you may arrange | position the width direction auxiliary arrangement line between the main arrangement line and the sub arrangement line in each width direction arrangement line.
In the electrodeposition dresser 102, the masking portion 12 on the width direction auxiliary arrangement lines 17A and 17B is arranged on the outer side in the radial direction of the belt-shaped portion 118 so as to achieve uniform wear of the superabrasive layer. For example, when a surface of a superabrasive layer with little wear occurs due to the shape of the workpiece to be ground, an auxiliary arrangement line in the width direction is arranged on the non-wear surface to increase the masking portion. May be.

Moreover, in the said 1st and 2nd embodiment, although the diamond abrasive grain 8 was used as the diamond abrasive grain layer 6 provided in the single layer by electrodeposition, it is not limited to this, For example, a CBN abrasive grain is electrodeposited etc. It may be a superabrasive layer fixed by.
In addition, although the width direction arrangement line is one main arrangement line and one sub arrangement line, the present invention is not limited to this. For example, there are two or more sub arrangement lines, and a masking portion is formed thereon. May be arranged.
Further, the first and second width direction arrangement lines are inclined so as to incline backward with respect to the rotation direction.
Moreover, although the strip | belt-shaped part shall be provided in the side surface of a disk-shaped base metal, it is not limited to this, For example, you may provide in the outer peripheral surface of a base metal.
Further, the concentric arrangement circle 14 includes a first concentric arrangement circle group composed of a plurality of odd-numbered concentric arrangement circles from the outside and a second concentric arrangement circle group constituted of a plurality of even-numbered concentric arrangement circles from the outside. However, the present invention is not limited to this. For example, the first concentric arrangement circle formed by the first concentric arrangement circle 14A, the fourth concentric arrangement circle 14D, and the seventh concentric arrangement circle 14G. A group, a second concentric circle 14 </ b> C, a fifth concentric circle 14 </ b> E, a fifth concentric circle 14 </ b> E, and an eighth concentric circle 14 </ b> H, a third concentric circle 14 </ b> C, and a sixth The third concentric arrangement circle 14F and the ninth concentric arrangement circle 14I may be divided into groups of more than this.
In addition, the masking portion is assumed to have the cured gel adhesive remaining, but is not limited to this, for example, the gel adhesive is removed and the superabrasive layer has no superabrasive grains on the surface. A dimple (dent) may be formed.

  Thus, the specific configuration described in the above-described embodiment is merely an example of the present invention, and the present invention is not limited to such a specific configuration. Various embodiments can be adopted without departing from the scope.

  DESCRIPTION OF SYMBOLS 2 ... Electrodeposition wheel, 3 ... Rotating shaft, 4 ... Base metal, 6 ... Super abrasive grain layer (diamond abrasive grain layer), 12 ... Masking part, 14 ... Concentric arrangement circle, 14A-14J ... Concentric arrangement circle, 16 ... Width direction arrangement line, 16A ... Width direction arrangement line (first width direction arrangement line), 16A1 ... Width direction arrangement line / main arrangement line (first width direction arrangement line), 16A2 ... Width direction arrangement line / sub arrangement line ( First width direction arrangement line), 16B... Width direction arrangement line (second width direction arrangement line), 16B1... Width direction arrangement line / main arrangement line (second width direction arrangement line), 16B2. Arrangement line (second width direction arrangement line), 17 ... width direction auxiliary arrangement line, 17A ... width direction auxiliary arrangement line (first width direction auxiliary arrangement line), 17B ... width direction auxiliary arrangement line (second width direction auxiliary arrangement line) Line), 17A1 ... width direction auxiliary arrangement line (first width direction auxiliary arrangement line), 17A2 ... width direction auxiliary arrangement line ( 1 width direction auxiliary arrangement line), 17A3... Width direction auxiliary arrangement line (first width direction auxiliary arrangement line), 17B1... Width direction auxiliary arrangement line (second width direction auxiliary arrangement line), 17B2. (Second width direction auxiliary arrangement line), 17B3 ... width direction auxiliary arrangement line (second width direction auxiliary arrangement line), 18 ... band-shaped portion, 20 ... adhesive, 22 ... dispenser, 26 ... plating layer, 28 ... electroforming layer 50 ... One end (inner end), 52 ... Other end (outer end), 54 ... Both sides, 56 ... Outer peripheral edge, 102 ... Electrodeposition wheel, 104 ... Base metal, 106 ... Super abrasive layer (diamond abrasive layer) ), 118..., Strips, 154.

Claims (8)

A base metal that is formed in a disk shape and is driven to rotate around a rotation axis, and a super-abrasion formed by fixing a plurality of superabrasive grains by plating on a belt-like part extending at a predetermined width around the base metal. In an electrodeposition wheel comprising an abrasive layer,
A plurality of concentric circles virtually drawn concentrically with the rotation axis so as to divide the belt-like portion at equal intervals, and one end of the belt-like portion so as to divide the belt-like portion at equal intervals in the circumferential direction The superabrasive grains are electrodeposited by the gel adhesive being spotted larger than the superabrasive grains by a dispenser at intersections with a plurality of width direction arrangement lines virtually drawn from the other end to the other end. Electrodeposition wheel with multiple masking parts not formed. The plurality of concentric arrangement circles are divided into a plurality of concentric arrangement circle groups including a plurality of different concentric arrangement circles,
The plurality of width direction arrangement lines are divided into a plurality of width direction arrangement line groups each including a plurality of different width direction arrangement lines and corresponding to the plurality of concentric arrangement circle groups,
The plurality of masking portions are formed at intersections of the plurality of concentric arrangement circles of the concentric arrangement circle group and the plurality of width direction arrangement line groups of the width direction arrangement line group, which are in a corresponding relationship with each other. The electrodeposition wheel according to claim 1.   3. The electrodeposition wheel according to claim 1, wherein each of the width direction arrangement lines includes a main arrangement line and at least one sub arrangement line adjacent thereto.   The electrodeposition wheel according to any one of claims 1 to 3, wherein the width direction arrangement line is a straight line inclined at the same angle with respect to a radial direction.   A plurality of the concentric arrangement circles and the plurality of the width directions are so drawn that the width direction auxiliary arrangement lines are virtually drawn close to the plurality of the width direction arrangement lines, respectively, so that the wear of the superabrasive layer is uniform. The electrodeposition wheel according to any one of claims 1 to 4, wherein each of the masking portions is formed at an intersection with an auxiliary arrangement line.   The electrodeposition wheel according to any one of claims 1 to 5, wherein the electrodeposition wheel is a grindstone for grinding a workpiece.   The electrodeposition wheel according to any one of claims 1 to 5, wherein the electrodeposition wheel is a dresser for dressing a grindstone. A base metal that is formed in a disk shape and is driven to rotate around a rotation axis, and a super-abrasion formed by fixing a plurality of superabrasive grains by plating on a belt-like part extending at a predetermined width around the base metal. A method for producing an electrodeposition wheel comprising an abrasive layer,
A plurality of concentric circles virtually drawn concentrically with the rotation axis so as to divide the belt-like portion at equal intervals, and one end of the belt-like portion so as to divide the belt-like portion at equal intervals in the circumferential direction A masking portion where the superabrasive grains are not electrodeposited by spotting a gel-like adhesive larger than the superabrasive grains with a dispenser at intersections with a plurality of widthwise wirings virtually drawn from the other end to the other end. A masking part forming step to be formed;
An electrodeposition plating step for fixing the plurality of superabrasive grains to the belt-like portion excluding the masking portion by electrodeposition plating,
In the masking pattern forming step, the total projected area of the masking portion is arranged at 5 to 20 percent of the total projected area of the superabrasive layer.

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