JP6356404B2 - Electrodeposition wheel and method for producing electrodeposition wheel - Google Patents

Electrodeposition wheel and method for producing electrodeposition wheel Download PDF

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JP6356404B2
JP6356404B2 JP2013220118A JP2013220118A JP6356404B2 JP 6356404 B2 JP6356404 B2 JP 6356404B2 JP 2013220118 A JP2013220118 A JP 2013220118A JP 2013220118 A JP2013220118 A JP 2013220118A JP 6356404 B2 JP6356404 B2 JP 6356404B2
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JP2014111302A (en
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深見　肇
肇 深見
利浩 佐藤
利浩 佐藤
貞雄 榊原
貞雄 榊原
隆行 小林
隆行 小林
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Toyoda Van Moppes Ltd
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Toyoda Van Moppes Ltd
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Priority to JP2013220118A priority Critical patent/JP6356404B2/en
Priority to US14/065,575 priority patent/US20140115973A1/en
Priority to DE201310222034 priority patent/DE102013222034A1/en
Priority to CN201310524831.4A priority patent/CN103786107A/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0018—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for by electrolytic deposition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/02—Wheels in one piece

Description

本発明は、電着砥石や電着ドレッサの砥粒の集中度をマスキングパターンにより調整した電着ホイールに関する。   The present invention relates to an electrodeposition wheel in which the concentration of abrasive grains of an electrodeposition grindstone or an electrodeposition dresser is adjusted by a masking pattern.

砥粒の集中度は、砥石の中に砥粒がどれだけ入っているかを示す値であり、集中度が高いほど砥粒が多く入っていることになり、砥石としての寿命が延びる反面、砥粒の目つぶれが発生しやすく、切れ味がすぐに落ちるおそれがある。反対に低い集中度では切れ味は上がるが、目こぼれが発生しやすくなり寿命が短くなる。そのため、砥石にどのように集中度を調整して砥粒を含ませるかは、大変重要である。   The concentration of abrasive grains is a value that indicates how much abrasive grains are contained in the grindstone. The higher the degree of concentration, the more abrasive grains are contained. Grain clogging is likely to occur, and the sharpness may drop immediately. On the other hand, sharpness increases at a low concentration, but spillage tends to occur and the life is shortened. Therefore, it is very important how to adjust the degree of concentration and include abrasive grains in the grindstone.

従来の技術としての特許文献１によると、台金の研削面にインクジェット装置でマスキング部を形成し、非マスキング部に砥粒をめっき固着し、台金の面積に対する砥粒の投影面積が５〜４０％であり、砥粒の付かないマスキング部と非マスキング部とを、一定のパターンで形成することで砥粒の集中度をコントロールするものが記載されている。   According to Patent Document 1 as a conventional technique, a masking portion is formed by an inkjet device on a ground surface of a base metal, and abrasive particles are plated and fixed on a non-masking portion. It is described that the concentration of abrasive grains is controlled by forming a masking portion and an unmasking portion, which are 40%, with no abrasive grains, in a constant pattern.

特許文献２には、導電性の母型周壁にジェル状接着剤を点着して突起を形成し、母型周壁にダイヤモンド砥粒を電気めっきにより固着し、母型を取り除くことで、ディンプルを点在させ、砥粒のないディンプル部分で集中度をコントロールするダイヤモンドドレッサが記載されている。   In Patent Document 2, a gel adhesive is spotted on a conductive mother mold peripheral wall to form protrusions, diamond abrasive grains are fixed to the mother mold peripheral wall by electroplating, and the mother mold is removed to remove dimples. A diamond dresser is described which is interspersed and controls the degree of concentration in dimple portions without abrasive grains.

特許第４８７１５４３号公報Japanese Patent No. 4871543 特許第３３２５８３２号公報Japanese Patent No. 3325832

しかし、特許文献１では、マスキングのパターンは、インクを塗布した円のうち隣接する３つが正三角形をなすよう配置されているにすぎない。そのため、砥石の回転軸線を中心とする円周上に配置されるマスキングが多く配置される箇所と、マスキングが少なく配置される箇所が生じ、砥粒の均一な集中が図れない。   However, in Patent Document 1, the masking pattern is merely arranged so that three adjacent circles formed with ink form a regular triangle. Therefore, there are places where a lot of masking is placed on the circumference centered on the rotation axis of the grindstone, and places where there is little masking, and the abrasive grains cannot be concentrated uniformly.

また、特許文献２では、マスキング部により形成されるディンプルの配置パターンが、正三角形、格子型等に形成されている。そのため、砥石の回転軸線を中心とする円周上に配置されるディンプルが多い部分と少ない部分とが生じ、砥粒の均一な集中が図れないおそれがあった。   Further, in Patent Document 2, the dimple arrangement pattern formed by the masking portion is formed in an equilateral triangle, a lattice shape, or the like. Therefore, there are portions where there are many and few dimples arranged on the circumference centering on the rotation axis of the grindstone, and there is a fear that uniform concentration of the abrasive grains cannot be achieved.

また、図１４に示すように、複数のマスキングを格子状に点在させて配置する電着ホイールを製作したが、特許文献１及び特許文献２と同様に、回転軸線を中心とする円周上に配置されるマスキングの多い部分と少ない部分とが生じ、砥粒の均一な集中が図れない。   In addition, as shown in FIG. 14, an electrodeposition wheel in which a plurality of masks are arranged in a grid pattern is manufactured. However, as in Patent Document 1 and Patent Document 2, on the circumference around the rotation axis. A portion with a large amount of masking and a portion with a small amount of masking are formed on the surface, and the abrasive grains cannot be uniformly concentrated.

その結果、特許文献１、特許文献２及び図１４に示すマスキング（或いはディンプル）のパターンでは、マスキングの少ないところでは、「目づまり」によりすぐに砥石の切れ味が悪くなり、また、マスキングの多いところでは「目こぼれ」により摩耗が激しくなる。そして、このように砥粒の均一な集中が図れないことから、電着ホイールの「形状くずれ」が発生して、電着ホイールの寿命が短くなるという問題があった。   As a result, in the masking (or dimple) patterns shown in Patent Document 1, Patent Document 2 and FIG. 14, the sharpness of the grindstone immediately deteriorates due to “clogging” when the masking is small, and the masking is large. Wears severely due to “spilling”. In addition, since the abrasive grains cannot be uniformly concentrated in this way, there has been a problem that the “deformation” of the electrodeposition wheel occurs and the life of the electrodeposition wheel is shortened.

本発明は係る従来の問題点に鑑みてなされたものであり、切れ味を良い状態で長く保持でき、かつホイールとしての寿命が長い、電着ホイールを提供するものである。   This invention is made | formed in view of the conventional problem which concerns, and provides the electrodeposition wheel which can hold | maintain a sharpness for a long time and has a long lifetime as a wheel.

上述した課題を解決するために、請求項１に係る発明の特徴は、円盤状に形成され回転軸線回りに回転駆動される台金と、前記台金の外周部に所定幅で延在する帯状部に複数の超砥粒がめっきにより固着されることで形成された超砥粒層と、を備えた電着ホイールにおいて、前記帯状部を幅方向に等間隔で分割するように前記回転軸と同心に仮想的に描かれた複数の同心円を、複数の第一同心配置円とし、前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれた複数の線を、複数の第一主配置線とし、隣り合う２つの前記第一主配置線のそれぞれの間に配置され、前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、隣り合う２つの前記第一主配置線のうち周方向一方側の基準となる前記第一主配置線からの距離が近い位置にそれぞれ配置された複数の線を、複数の第一副配置線とし、前記複数の第一同心配置円と前記複数の第一主配置線との各交点、及び、前記複数の第一同心配置円と前記複数の第一副配置線との各交点に、ジェル状接着剤がディスペンサにより前記超砥粒より大きく点着されたことにより前記超砥粒が電着されていない複数のマスキング部が形成されており、前記基準となる前記第一主配置線と当該基準となる前記第一主配置線からの距離が近い位置に配置された前記第一副配置線との周方向間には、前記マスキング部が形成されておらず、隣り合う２つの前記第一同心配置円のそれぞれの間において、当該２つの前記第一同心配置円と前記第一主配置線との２つの交点の各間、及び、当該２つの前記第一同心配置円と前記第一副配置線との２つの交点の各間には、前記マスキング部が形成されておらず、隣接する前記第一同心配置円の間のそれぞれに配置され、隣接する前記第一同心配置円の間を幅方向に等間隔で分割するように前記回転軸と同心に仮想的に描かれた複数の線を第二同心配置円とし、隣接する前記第一主配置線の間のそれぞれに配置され、隣接する前記第一主配置線の間を円周方向に等間隔に分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれた複数の線を、複数の第二主配置線とし、隣り合う２つの前記第二主配置線の間のそれぞれに配置され、前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、隣り合う２つの前記第二主配置線のうち周方向一方側の基準となる前記第二主配置線からの距離が近い位置にそれぞれ配置された複数の線を、複数の第二副配置線とし、前記複数の第二同心配置円と前記複数の第二主配置線との各交点、及び、前記複数の第二同心配置円と前記複数の第二副配置線との各交点に、前記複数のマスキング部が形成されていない、ことである。
これによると、超砥粒層の帯状部に仮想的に描かれた複数の第一主配置線及び第一副配置線と複数の第一同心配置円との交点に配置された複数のマスキング部が、帯状部の円周方向及び幅方向に均等に配置されることとなり、電着ホイールが回転すると、複数のマスキング部が偏ることなく超砥粒層全体にわたってまんべんなく被研削物に接触する。
そして、複数のマスキング部を帯状部の円周方向及び幅方向に均等に配置することで、帯状部の超砥粒層の超砥粒の集中度を全体として均一にすることができる。そして、超砥粒層に存在する配置線上に形成された複数のマスキング部により、超砥粒の集中度が高くなることによって生じる「目づまり」を防止するとともに、超砥粒層の隣接する配置線間のマスキング部が存在しない部分によって「形状くずれ」を防止することができる。
また、このように、配置線は、第一主配置線に加えて第一副配置線を少なくとも１つ備えているので、同心配置円上の超砥粒に対するマスキング部の割合を、マスキング部を副配置線に配置することで調節することができる。
また、同心配置円群とそれに対応関係にある配置線群との交点に形成された複数のマスキング部と、他の同心円群とそれに対応関係にある他の配置線群との交点に形成された複数の他のマスキング部とは、同心配置円が異なるため、ひとつの配置線群ではマスキング部が配置できない他の配置線と他の同心配置円の交点にマスキング部を配置することができる。これによって、帯状部の幅方向に配置するマスキング部の密度を高めることができる。 In order to solve the above-described problem, the feature of the invention according to claim 1 is that a base metal that is formed in a disk shape and is driven to rotate around a rotation axis, and a belt-like shape that extends to the outer periphery of the base metal with a predetermined width. A superabrasive grain layer formed by fixing a plurality of superabrasive grains to the part by plating, and the rotating shaft so as to divide the belt-like part at equal intervals in the width direction. A plurality of concentric circles virtually drawn concentrically are defined as a plurality of first concentric circles, and the band-shaped portions are arranged from the one end to the other end in the width direction so as to be divided at equal intervals in the circumferential direction. A plurality of lines drawn virtually as a plurality of first main arrangement lines, arranged between each of the two adjacent first main arrangement lines, and the strips at equal intervals in the circumferential direction. Virtually drawn from one end to the other end in the width direction of the band-shaped part so as to be divided, Two more lines distance is arranged in a position closer from the first main array lines as a reference for one side in the circumferential direction of said first main array lines, and a plurality of first sub-array lines, the Gel adhesives at the intersections of the plurality of first concentric arrangement circles and the plurality of first main arrangement lines and at the intersections of the plurality of first concentric arrangement circles and the plurality of first sub arrangement lines Are dispensed larger than the superabrasive grains by the dispenser, thereby forming a plurality of masking portions where the superabrasive grains are not electrodeposited, and the first main arrangement line serving as the reference and the reference Between the circumferential direction of the first sub arrangement line arranged at a position close to the first main arrangement line, the masking portion is not formed, and two adjacent first concentric arrangement circles are formed. Between each of the two first concentric circles and the During each of the two intersections of the first main array lines, and the between the two intersection points between the two of said first concentric array circles first sub array lines, he said masking unit is formed Rather, they are virtually arranged concentrically with the rotation axis so as to be respectively arranged between the adjacent first concentric circles and divided at equal intervals in the width direction between the adjacent first concentric circles. The plurality of lines are arranged as second concentric circles, arranged between the adjacent first main arrangement lines, and divided between the adjacent first main arrangement lines at equal intervals in the circumferential direction. A plurality of lines virtually drawn from one end to the other end in the width direction of the belt-shaped portion are set as a plurality of second main arrangement lines, and arranged between each of the two adjacent second main arrangement lines. The strip-shaped portion is directed from one end to the other end in the width direction so as to divide the strip-shaped portion at equal intervals in the circumferential direction. A plurality of lines that are virtually drawn and arranged respectively at positions near the second main arrangement line that is a reference on one side in the circumferential direction among the two adjacent second main arrangement lines that are adjacent to each other. Each of the intersections of the plurality of second concentric arrangement circles and the plurality of second main arrangement lines, and the plurality of second concentric arrangement circles and the plurality of second sub arrangement lines. The plurality of masking portions are not formed at the respective intersections .
According to this, a plurality of masking portions arranged at the intersection of the virtually drawn plurality of first main array lines and the first sub-array lines and a plurality of first concentric array circles strip portion of the superabrasive layer However, when the electrodeposition wheel is rotated evenly in the circumferential direction and the width direction of the belt-shaped part, the plurality of masking parts are uniformly contacted with the object to be ground over the entire superabrasive layer.
Then, by arranging the plurality of masking portions uniformly in the circumferential direction and the width direction of the strip portion, the concentration of super abrasive grains in the super abrasive layer of the strip portion can be made uniform as a whole. Then, a plurality of masking portions formed on distribution置線that exists superabrasive layer, thereby preventing the "clogging" caused by the degree of concentration of ultra abrasive grains is higher, adjacent superabrasive layer by partial masking portion is not present between the distribution置線you can prevent "shape collapse".
Further, in this way, since the arrangement line includes at least one first sub arrangement line in addition to the first main arrangement line, the ratio of the masking part to the superabrasive grains on the concentric arrangement circle is determined by the masking part. It can be adjusted by placing it on the sub placement line.
In addition, a plurality of masking portions formed at intersections between concentric arrangement circle groups and arrangement line groups corresponding thereto, and formed at intersections between other concentric circle groups and other arrangement line groups corresponding thereto. Since concentric arrangement circles are different from those of a plurality of other masking portions, the masking portions can be arranged at the intersections of other arrangement lines and other concentric arrangement circles where the masking portion cannot be arranged in one arrangement line group. Thereby, the density of the masking part arrange | positioned in the width direction of a strip | belt-shaped part can be raised.

請求項２に係る発明の構成上の特徴は、前記第一主配置線、前記第一副配置線、前記第二主配置線及び前記第二副配置線は、半径方向に対して同一角度で傾斜した直線である。
これによると、傾斜した配置線に沿って配置された複数のマスキング部を、被研削物の同じ位置ばかりに接触させるのではなく、被研削物の連続する隣接箇所に接触位置を移動させながら研削することができ、研削抵抗を均一にすることができる。 The structural feature of the invention according to claim 2 is that the first main arrangement line, the first sub arrangement line, the second main arrangement line, and the second sub arrangement line are at the same angle with respect to the radial direction. An inclined straight line.
According to this, a plurality of masking portions arranged along the inclined distribution置線, instead of being contacted only at the same position of the object to be ground to move the contact position to the adjacent position of consecutive object to be ground Thus, the grinding resistance can be made uniform.

請求項３に係る発明の構成上の特徴は、前記第一副配置線と前記第一副配置線に隣り合う前記第二主配置線との間にそれぞれ配置され、前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、前記第一副配置線に近い位置にそれぞれ配置された複数の線を、複数の第一補助配置線とし、前記第二副配置線と前記第二副配置線に隣り合う前記第一主配置線との間にそれぞれ配置され、前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、前記第二副配置線に近い位置にそれぞれ配置された複数の線を、複数の第二補助配置線とし、前記複数の第一同心配置円と前記複数の第一補助配置線との交点、前記複数の第二同心配置円と前記複数の第二補助配置線との交点には、前記超砥粒層の摩耗が均一になるように、前記マスキング部が夫々形成されていることである。
これによると、同心配置円群と補助配置線との交点に配置されたマスキング部によって、超砥粒層の部分に摩耗の程度に応じてマスキング部を増やし、超砥粒層におけるマスキング部の割合を容易に調節することができる。これによって、超砥粒層の摩耗を均一にして「形状くずれ」を防止することができる。 The structural features of the invention according to claim 3 are arranged between the first sub arrangement line and the second main arrangement line adjacent to the first sub arrangement line, respectively. A plurality of lines that are virtually drawn from one end to the other end and are arranged at positions close to the first sub arrangement line are a plurality of first auxiliary arrangement lines, and the second sub arrangement line and the first sub arrangement line Positioned between each of the first main arrangement lines adjacent to the second sub arrangement line, virtually drawn from one end to the other end in the width direction of the band-shaped portion, and close to the second sub arrangement line wherein a plurality of lines which are arranged, and a plurality of second auxiliary array lines, said plurality of first concentric array circles and the plurality of intersections of the first auxiliary array lines, and said plurality of second concentric array circles In the intersection with the plurality of second auxiliary arrangement lines, the masking is performed so that the wear of the superabrasive layer is uniform. Parts is that they are respectively formed.
According to this, the masking part arranged at the intersection of the concentric arrangement circle group and the auxiliary arrangement line increases the masking part in the superabrasive layer part according to the degree of wear, and the ratio of the masking part in the superabrasive layer Can be adjusted easily. As a result, the wear of the superabrasive layer can be made uniform to prevent “shape loss”.

請求項４に係る発明の構成上の特徴は、請求項１乃至３のいずれか１項に記載の電着ホイールは、工作物を研削する砥石であるとすることである。
これによると、工作物を研削する場合において、複数のマスキング部が、帯状部に形成された超砥粒層の幅方向及び円周方向に均等に配置されているので、砥石が回転すると、複数のマスキング部が、超砥粒層全体においてまんべんなく工作物に接触する。これによって、砥石の超砥粒層の「形状くずれ」を防止し、砥石の寿命を延すことができる。 The constitutional feature of the invention according to claim 4 is that the electrodeposition wheel according to any one of claims 1 to 3 is a grindstone for grinding a workpiece.
According to this, when grinding a workpiece, a plurality of masking portions are evenly arranged in the width direction and the circumferential direction of the superabrasive grain layer formed in the belt-shaped portion. The masking portion of the whole of the superabrasive layer uniformly contacts the workpiece. As a result, it is possible to prevent the “shape loss” of the superabrasive layer of the grindstone and to prolong the life of the grindstone.

請求項５に係る発明の構成上の特徴は、請求項１乃至３のいずれか１項に記載の電着ホイールは、砥石をドレッシングするドレッサとすることである。
これによると、砥石をドレッシングする場合において、複数のマスキング部が、帯状部に形成された超砥粒層の幅方向及び円周方向に均等に配置されているので、ドレッサが回転すると、複数のマスキング部が、超砥粒層全体においてまんべんなく砥石に接触する。これによって、ドレッサの超砥粒層の「形状くずれ」を防止して、ドレッサの寿命を延すことができる。 The structural feature of the invention according to claim 5 is that the electrodeposition wheel according to any one of claims 1 to 3 is a dresser for dressing a grindstone.
According to this, when dressing a grindstone, a plurality of masking portions are evenly arranged in the width direction and the circumferential direction of the superabrasive grain layer formed in the belt-shaped portion. A masking part contacts a grindstone uniformly in the whole superabrasive grain layer. As a result, the “shape loss” of the superabrasive layer of the dresser can be prevented, and the life of the dresser can be extended.

請求項６に係る発明の構成上の特徴は、円盤状に形成され回転軸線回りに回転駆動される台金と、前記台金の外周部に所定幅で延在する帯状部に複数の超砥粒がめっきにより固着されることで形成される超砥粒層と、を備えた電着ホイールの製造方法であって、前記帯状部を幅方向に等間隔で分割するように前記回転軸と同心に仮想的に描かれた複数の同心円を、複数の第一同心配置円とし、前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれた複数の線を、複数の第一主配置線とし、隣り合う２つの前記第一主配置線のそれぞれの間に配置され、前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、隣り合う２つの前記第一主配置線のうち周方向一方側の基準となる前記第一主配置線からの距離が近い位置にそれぞれ配置された複数の線を、複数の第一副配置線とし、前記複数の第一同心配置円と前記複数の第一主配置線との各交点、及び、前記複数の第一同心配置円と前記複数の第一副配置線との各交点に、ジェル状接着剤がディスペンサにより前記超砥粒より大きく点着されたことにより前記超砥粒が電着されていない複数のマスキング部が形成されており、前記基準となる前記第一主配置線と当該基準となる前記第一主配置線からの距離が近い位置に配置された前記第一副配置線との周方向間には、前記マスキング部が形成されておらず、隣り合う２つの前記第一同心配置円のそれぞれの間において、当該２つの前記第一同心配置円と前記第一主配置線との２つの交点の各間、及び、当該２つの前記第一同心配置円と前記第一副配置線との２つの交点の各間には、前記マスキング部が形成されておらず、隣接する前記第一同心配置円の間のそれぞれに配置され、隣接する前記第一同心配置円の間を幅方向に等間隔で分割するように前記回転軸と同心に仮想的に描かれた複数の線を第二同心配置円とし、隣接する前記第一主配置線の間のそれぞれに配置され、隣接する前記第一主配置線の間を円周方向に等間隔に分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれた複数の線を、複数の第二主配置線とし、隣り合う２つの前記第二主配置線の間のそれぞれに配置され、前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、隣り合う２つの前記第二主配置線のうち周方向一方側の基準となる前記第二主配置線からの距離が近い位置にそれぞれ配置された複数の線を、複数の第二副配置線とし、前記複数の第二同心配置円と前記複数の第二主配置線との各交点、及び、前記複数の第二同心配置円と前記複数の第二副配置線との各交点に、前記複数のマスキング部が形成されていない、マスキング部形成工程と、前記複数の超砥粒を、前記マスキング部を除いた前記帯状部に、電着めっきにより固着する電着めっき工程と、を備え、前記マスキング部形成工程において、前記マスキング部の総投影面積を、前記超砥粒層の総投影面積の５〜２０パーセントに配置することである。
これによると、ディスペンサによって台金の外周部の帯状部に、その幅方向及び円周方向にマスキング部が均一に配置された超砥粒層を容易に形成することができる。そして、ディスペンサを調節することで、「目づまり」と「形状くずれ」とを防止する効果が高いとされるマスキング部の総投影面積が、超砥粒層の総投影面積の５〜２０パーセントの電着ホイールを容易に製造することができる。 A structural feature of the invention according to claim 6 is that a base metal formed in a disk shape and driven to rotate around a rotation axis, and a plurality of superabrasives on a belt-like part extending at a predetermined width around the outer periphery of the base metal. And a superabrasive grain layer formed by fixing the grains by plating, and is concentric with the rotary shaft so as to divide the belt-like portion at equal intervals in the width direction. A plurality of concentric circles virtually drawn in FIG. 5 are defined as a plurality of first concentric circles, and from one end to the other end in the width direction of the strip portion so as to divide the strip portion at equal intervals in the circumferential direction. A plurality of virtually drawn lines are defined as a plurality of first main arrangement lines, arranged between each of the two adjacent first main arrangement lines, and the strip portion is divided at equal intervals in the circumferential direction. So that the band-like portion is virtually drawn from one end to the other end in the width direction, A plurality of lines a distance from said first main array lines as a reference for one side in the circumferential direction of the first major placement lines are disposed at positions closer to the plurality of first sub-array lines, said plurality of first The gel-like adhesive is dispensed by a dispenser at each intersection of the concentric arrangement circle and the plurality of first main arrangement lines, and at each intersection of the plurality of first concentric arrangement circles and the plurality of first sub arrangement lines. A plurality of masking portions where the superabrasive grains are not electrodeposited are formed by spotting larger than the superabrasive grains, and the first main arrangement line serving as the reference and the first main serving as the reference The masking part is not formed between the first sub-arrangement lines arranged at positions close to the arrangement line and between the two adjacent first concentric arrangement circles. The two first concentric arrangement circles and the first main arrangement line Each of the two between the intersection of, and, said the two respective between the intersection of two of the first concentric array circles and the first sub-array lines, the said masking unit is formed Orazu, adjacent A plurality of lines virtually arranged concentrically with the rotation axis so as to be divided at equal intervals in the width direction between the first concentric circles arranged adjacent to each other between the first concentric circles. A second concentric arrangement circle is arranged between each of the adjacent first main arrangement lines, and the width of the band-like portion so as to divide the adjacent first main arrangement lines at equal intervals in the circumferential direction. A plurality of lines virtually drawn from one end of the direction to the other end are used as a plurality of second main arrangement lines, arranged between each of the two adjacent second main arrangement lines, Is virtually divided from one end to the other end in the width direction of the belt-like portion so as to be divided at equal intervals in the circumferential direction. A plurality of lines arranged at positions where the distance from the second main arrangement line that is a reference on one side in the circumferential direction among the two adjacent second main arrangement lines adjacent to each other is a plurality of second lines Each of the intersections of the plurality of second concentric arrangement circles and the plurality of second main arrangement lines, and each of the intersections of the plurality of second concentric arrangement circles and the plurality of second sub arrangement lines. A plurality of masking portions are not formed, a masking portion forming step, and an electrodeposition plating step of fixing the plurality of superabrasive grains to the band-shaped portion excluding the masking portion by electrodeposition plating, In the masking part forming step, the total projected area of the masking part is arranged at 5 to 20 percent of the total projected area of the superabrasive layer.
According to this, the superabrasive layer in which the masking portions are uniformly arranged in the width direction and the circumferential direction can be easily formed on the belt-like portion of the outer peripheral portion of the base metal by the dispenser. Then, by adjusting the dispenser, the total projected area of the masking portion, which is considered to be highly effective in preventing “clogging” and “shape loss”, is 5 to 20% of the total projected area of the superabrasive layer. An electrodeposition wheel can be manufactured easily.

本発明に係る第1実施形態の電着ホイールの側面を示す図。The figure which shows the side surface of the electrodeposition wheel of 1st Embodiment which concerns on this invention. 図１における電着ホイールのII-II断面を示す図。The figure which shows the II-II cross section of the electrodeposition wheel in FIG. ディスペンサにより台金に点着する状態を示す図。The figure which shows the state spotted on a base metal with a dispenser. マスキングされた台金上に超砥粒を充填した状態を示す図。The figure which shows the state which filled the masking base metal with the superabrasive grain. めっきにより超砥粒を仮固定した状態を示す図。The figure which shows the state which fixed the superabrasive grain temporarily by plating. 余分な超砥粒を取り除いた状態を示す図。The figure which shows the state which removed the excess superabrasive grain. めっきにより超砥粒を台金に本固定した状態を示す図。The figure which shows the state which fixed the superabrasive grain to the base metal by plating. めっき槽の概要を示す図。The figure which shows the outline | summary of a plating tank. 試験体の研削抵抗を比較するグラフ。Graph comparing grinding resistance of test specimens. 試験体の摩耗量を比較するグラフ。The graph which compares the abrasion loss of a test body. 第２実施形態の電着ホイールの側面を示す図。The figure which shows the side surface of the electrodeposition wheel of 2nd Embodiment. 電着ホイールの正面を示す図。The figure which shows the front of an electrodeposition wheel. ねじ形状の砥石をドレッシングする状況を示す図。The figure which shows the condition which dresses a screw-shaped grindstone. 電着ホイールの従来例を示す図。The figure which shows the prior art example of an electrodeposition wheel.

（第１実施形態）
以下、本発明に係る電着ホイールを歯車研削用砥石に適用した第１の実施形態について図面を参照して説明する。
歯車研削用砥石２は、図１及び図２に示すように、円盤状に形成された台金４と、台金４の両側面５４に所定の幅で形成された超砥粒層としてのダイヤモンド砥粒層６と、を備えている。台金４に所定の幅で帯状部１８が形成され、帯状部１８にはダイヤモンド砥粒層６が形成されている。台金４は、例えば、焼入れ、焼戻し鋼（ＳＵＪ）が用いられる。 (First embodiment)
Hereinafter, a first embodiment in which an electrodeposition wheel according to the present invention is applied to a grinding wheel for gear grinding will be described with reference to the drawings.
As shown in FIGS. 1 and 2, the gear grinding wheel 2 includes a base metal 4 formed in a disc shape, and a diamond as a superabrasive layer formed with a predetermined width on both side surfaces 54 of the base metal 4. An abrasive layer 6. A band-shaped portion 18 having a predetermined width is formed on the base metal 4, and a diamond abrasive grain layer 6 is formed on the band-shaped portion 18. For the base metal 4, for example, quenched and tempered steel (SUJ) is used.

本実施形態の歯車研削用電着砥石２には、超砥粒として例えば♯３０〜♯１４０程度の粒径のダイヤモンド砥粒８が使用される。ダイヤモンド砥粒層６はダイヤモンド砥粒８をめっきで固定した電鋳砥粒層で形成されている。また、図８に示すように、台金４の両側面５４は凸曲面状に形成され、外周縁５６は両側面５４が尖頭状に接近するよう形成されている。   In the electrode grinding wheel 2 for gear grinding of this embodiment, diamond abrasive grains 8 having a grain size of, for example, about # 30 to # 140 are used as superabrasive grains. The diamond abrasive grain layer 6 is formed of an electroformed abrasive grain layer in which diamond abrasive grains 8 are fixed by plating. As shown in FIG. 8, both side surfaces 54 of the base metal 4 are formed in a convex curved shape, and the outer peripheral edge 56 is formed so that the both side surfaces 54 approach a pointed shape.

ダイヤモンド砥粒層６の表面には複数のマスキング部１２が配置されている。図１に示すように、前記帯状部１８を等間隔で分割するように歯車研削用砥石２の回転軸３と同心に仮想的に描かれた複数の同心配置円１４と、前記帯状部１８を円周方向に等間隔で分割するように前記帯状部１８の一端５０から他端５２に向かって仮想的に描かれた複数の幅方向配置線１６との交点に、ジェル状接着剤２０がディスペンサ２２によりダイヤモンド砥粒８より大きく点着されたことによりダイヤモンド砥粒８が電着されていない複数のマスキング部１２が形成されている。各マスキング部は、例えば直径が１．５ｍｍの半球状に形成される。   A plurality of masking portions 12 are arranged on the surface of the diamond abrasive layer 6. As shown in FIG. 1, a plurality of concentric circles 14 virtually drawn concentrically with the rotating shaft 3 of the grinding wheel 2 for gear grinding so as to divide the belt-like portion 18 at equal intervals, and the belt-like portion 18. The gel-like adhesive 20 is dispensed at the intersections with a plurality of width direction arrangement lines 16 virtually drawn from one end 50 to the other end 52 of the strip 18 so as to be divided at equal intervals in the circumferential direction. A plurality of masking portions 12 where the diamond abrasive grains 8 are not electrodeposited are formed by being spotted larger than the diamond abrasive grains 8 by 22. Each masking part is formed in a hemispherical shape having a diameter of 1.5 mm, for example.

具体的に説明すると、仮想的に描かれた複数の同心配置円１４は、外側から奇数番目の同心配置円で構成される第１同心配置円（第一同心配置円）群（１４Ａ、１４Ｃ、１４Ｅ、１４Ｇ、１４Ｉ）と、外側から偶数番目の同心配置円で構成される第２同心配置円（第二同心配置円）群（１４Ｂ、１４Ｄ、１４Ｆ、１４Ｈ、１４Ｊ）とに分割される。
仮想的に描かれた幅方向配置線１６は、帯状部１８を円周方向に２２．５度の間隔で均等に分割している。各幅方向配置線１６は、帯状部１８の幅方向中央部において半径方向に対して６７．５度の同一角度で傾斜した直線である。そのため、傾斜した幅方向配置線１６Ａ、１６Ｂに沿って配置されたマスキング部１２を、被研削物の同じ位置ばかりに接触させるのではなく、被研削物の連続する隣接箇所に接触位置を移動させながら研削することができ、研削抵抗を均一にすることができる。
また、仮想的に描かれた幅方向配置線１６は、第１同心配置円群（１４Ａ、１４Ｃ、１４Ｅ、１４Ｇ、１４Ｉ）と対応関係にある第１幅方向配置線（第一配置線）１６Ａと、第２同心配置円群（１４Ｂ、１４Ｄ、１４Ｆ、１４Ｈ、１４Ｊ）と対応関係にある第２幅方向配置線（第二配置線）１６Ｂとに分割されている。
第１幅方向配置線（第一配置線）１６Ａは、主配置線（第一主配置線）１６Ａ１と主配置線１６Ａ１に近接して設けられる副配置線（第一副配置線）１６Ａ２とを有しており、第２幅方向配置線（第二配置線）１６Ｂは、同様に主配置線（第二主配置線）１６Ｂ１と主配置線１６Ｂ１に近接して設けられる副配置線（第二副配置線）１６Ｂ２とを備えている。このように幅方向配置線１６Ａ、１６Ｂは、主配置線１６Ａ１、１６Ｂ１に近接して副配置線１６Ａ２、１６Ｂ２を備えているので、同心配置円１４上の超砥粒８に対するマスキング部１２の割合を、副配置線１６Ａ２、１６Ｂ２に配置するマスキング部１２で調節することができる。
マスキング部１２は、対応関係にある第１同心配置円群（１４Ａ、１４Ｃ、１４Ｅ、１４Ｇ、１４Ｉ）と第１幅方向配置線（第一主配置線、第一副配置線）１６Ａ１、１６Ａ２との各交点、及び対応関係にある第２同心配置円群（１４Ｂ、１４Ｄ、１４Ｆ、１４Ｈ、１４Ｊ）と第２幅方向配置線（第二主配置線、第二副配置線）１６Ｂ１、１６Ｂ２との交点に配置される。 More specifically, a plurality of concentrically arranged circles 14 that are virtually drawn include a first concentric arranged circle (first concentric arranged circle) group (14A, 14C, 14E, 14G, 14I) and a second concentric arrangement circle (second concentric arrangement circle) group (14B, 14D, 14F, 14H, 14J) composed of even-numbered concentric arrangement circles from the outside.
Virtually drawn width direction arrangement lines 16 divide the band-like portion 18 evenly at intervals of 22.5 degrees in the circumferential direction. Each width direction arrangement line 16 is a straight line inclined at the same angle of 67.5 degrees with respect to the radial direction at the center in the width direction of the band-shaped portion 18. Therefore, the contact position of the masking portion 12 arranged along the inclined width direction arrangement lines 16A and 16B is not moved to the same position of the workpiece, but the contact position is moved to a continuous adjacent location of the workpiece. Thus, the grinding resistance can be made uniform.
Further, the virtually drawn width direction arrangement line 16 is a first width direction arrangement line (first arrangement line) 16A having a correspondence relationship with the first concentric arrangement circle group (14A, 14C, 14E, 14G, 14I). And a second concentric arrangement circle group (14B, 14D, 14F, 14H, 14J) and a second width direction arrangement line (second arrangement line) 16B corresponding to the second concentric arrangement circle group (14B, 14D, 14F, 14H, 14J).
The first width direction arrangement line (first arrangement line) 16A includes a main arrangement line (first main arrangement line) 16A1 and a sub arrangement line (first sub arrangement line) 16A2 provided close to the main arrangement line 16A1. The second width direction arrangement line (second arrangement line) 16B has a main arrangement line ( second main arrangement line) 16B1 and a sub arrangement line (second arrangement line) provided close to the main arrangement line 16B1 . Sub-arrangement line) 16B2. Thus, since the width direction arrangement lines 16A and 16B are provided with the sub arrangement lines 16A2 and 16B2 close to the main arrangement lines 16A1 and 16B1, the ratio of the masking portion 12 to the superabrasive grains 8 on the concentric arrangement circle 14 Can be adjusted by the masking unit 12 arranged in the sub arrangement lines 16A2 and 16B2.
The masking unit 12 includes a first concentric arrangement circle group (14A, 14C, 14E, 14G, 14I) and a first width direction arrangement line (first main arrangement line, first sub arrangement line) 16A1, 16A2 and Second intersection arrangement circle group (14B, 14D, 14F, 14H, 14J) and second width direction arrangement line (second main arrangement line, second sub arrangement line) 16B1, 16B2 It is arranged at the intersection of

前述したように、第１幅方向配置線１６Ａ上のマスキング部１２は、奇数番目の第１同心配置円群１４Ａ、１４Ｃ、１４Ｅ、１４Ｇ、１４Ｉとの交点に位置し、第２幅方向配置線１６Ｂ上のマスキング部１２は偶数番目の第２同心配置円群（１４Ｂ、１４Ｄ、１４Ｆ、１４Ｈ、１４Ｊ）との交点に位置することから、第１幅方向配置線１６Ａ上のマスキング部１２と、第１幅方向配置線に隣り合う第２幅方向配置線１６Ｂ上のマスキング部１２とは、半径方向に１つずれた同心配置円上に配置されている。
そのため、第１幅方向配置線１６Ａにおいて、帯状部１８の幅方向にマスキング部１２が配置できないダイヤモンド砥粒層６部分（例えば外側から１番目の同心配置円１４Ａと３番目の同心配置円１４Ｃとの間）が生じても、隣り合う第２幅方向配置線（他の幅方向配置線）１６Ｂと外側から２番目の同心配置円（他の同心配置円）１４Ｂとの交点にマスキング部１２を配置することができる。これによって、帯状部１８の幅方向に配置するマスキング部１２の密度を高めることができる。 As described above, the masking portion 12 on the first width direction arrangement line 16A is located at the intersection of the odd-numbered first concentric arrangement circle groups 14A, 14C, 14E, 14G, 14I, and the second width direction arrangement line Since the masking part 12 on 16B is located at the intersection with the even-numbered second concentric circles (14B, 14D, 14F, 14H, 14J), the masking part 12 on the first width direction arrangement line 16A, The masking portion 12 on the second width direction arrangement line 16B adjacent to the first width direction arrangement line is arranged on a concentric arrangement circle shifted by one in the radial direction.
Therefore, in the first width direction arrangement line 16A, the diamond abrasive grain layer 6 portion (for example, the first concentric arrangement circle 14A and the third concentric arrangement circle 14C from the outer side) where the masking portion 12 cannot be arranged in the width direction of the band-shaped portion 18 Between the adjacent second width direction arrangement line (other width direction arrangement line) 16B and the second concentric arrangement circle (other concentric arrangement circle) 14B from the outside. Can be arranged. Thereby, the density of the masking part 12 arrange | positioned in the width direction of the strip | belt-shaped part 18 can be raised.

次に、歯車研削用砥石２の製造方法について図３〜図８に基づいて以下に説明する。
まず、図３に示すように、鉄等の導電性の台金４の外周部に所定の幅で設けられた帯状部１８の表面に非導電性ジェル状の接着剤２０をディスペンサ２２の円形のノズルより一定量点着する（マスキング部形成工程）。
ジェル状の接着剤２０は、台金４の超砥粒層６が形成される帯状部１８を等間隔で分割するように回転軸３と同心に仮想的に描かれた複数の同心配置円１４と、帯状部１８を円周方向に等間隔で分割するように帯状部１８の一端５０から他端５２に向かって仮想的に描かれた複数の幅方向配置線１６との交点に、点着される。 Next, the manufacturing method of the grinding wheel 2 for gear grinding is demonstrated below based on FIGS.
First, as shown in FIG. 3, a non-conductive gel-like adhesive 20 is applied to the surface of a band-like portion 18 provided with a predetermined width on the outer periphery of a conductive base metal 4 such as iron. A fixed amount is spotted from the nozzle (masking part forming step).
The gel-like adhesive 20 includes a plurality of concentrically arranged circles 14 which are virtually drawn concentrically with the rotary shaft 3 so as to divide the belt-like portion 18 on which the superabrasive grain layer 6 of the base metal 4 is formed at equal intervals. And a plurality of width direction arrangement lines 16 virtually drawn from one end 50 to the other end 52 of the strip 18 so as to divide the strip 18 at equal intervals in the circumferential direction. Is done.

点着された接着剤はジェル状であるので、略半球状になり瞬間的に固形化して突起（マスキング部１２）となる。マスキング部１２の大きさは、点着する接着剤２０の量により、密度は点着の数によるが、ノズルの大きさとディスペンサ２２の吐出量とを選択することにより、簡単に調整することができる。本実施形態においては、非導電性ジェル状接着剤２０として、ジェルタイプの瞬間接着剤を使用した。非導電性ジェル状接着剤２０は、本件発明の趣旨に合うものであれば他のものでも良いが、良い形状（例えば半球状）を形成する上において、その作業を容易にするため、粘度は７５，０００ｍＰＡ・ｓ以下であることが好ましい。なお、マスキング部１２の形状は、半球状に限定されず、例えば、三角形、四角形、ひし形等任意に選択することができる。この場合ノズルの形状を、三角錐、四角錘等の形状とすることで、容易にマスキング部１２の形状を選択することができる。   Since the spotted adhesive is in the form of a gel, it becomes substantially hemispherical and instantly solidifies to become a protrusion (masking portion 12). The size of the masking portion 12 depends on the amount of the adhesive 20 to be spotted, and the density depends on the number of spotted dots, but can be easily adjusted by selecting the size of the nozzle and the discharge amount of the dispenser 22. . In the present embodiment, a gel-type instantaneous adhesive is used as the non-conductive gel adhesive 20. The non-conductive gel adhesive 20 may be other as long as it fits the purpose of the present invention. However, in order to facilitate the work in forming a good shape (eg, hemisphere), the viscosity is It is preferably 75,000 mPA · s or less. In addition, the shape of the masking part 12 is not limited to a hemisphere, For example, a triangle, a square, a rhombus, etc. can be selected arbitrarily. In this case, the shape of the masking portion 12 can be easily selected by setting the shape of the nozzle to a shape such as a triangular pyramid or a quadrangular pyramid.

また、ノズル部分の移動・接着剤の吐出を数値制御装置により制御して予め決められた配置位置に自動的に点着することができる。
すなわち、ノズルを数値制御装置により移動して、ジェル状接着剤２０が略半球状のマスキング部１２として、台金４の帯状部１８の表面に仮想的に描かれた前記第１同心配置円群１４Ａ、１４Ｃ、１４Ｅ、１４Ｇ、１４Ｉと第１幅方向配置線１６Ａとの交点、及び第２同心配置円群１４Ｂ、１４Ｄ、１４Ｆ、１４Ｈ、１４Ｊと第２幅方向配置線１６Ｂとの交点に自動的に配置される。 Further, the movement of the nozzle portion and the discharge of the adhesive can be controlled by a numerical control device, and can be automatically spotted at a predetermined arrangement position.
That is, the first concentric arrangement circle group virtually drawn on the surface of the band-like portion 18 of the base metal 4 as a masking portion 12 in which the gel adhesive 20 is moved by a numerical controller. Automatically at the intersection of 14A, 14C, 14E, 14G, 14I and the first width direction arrangement line 16A, and the intersection of the second concentric arrangement circle group 14B, 14D, 14F, 14H, 14J and the second width direction arrangement line 16B Arranged.

次に、図４に示すように、台金４の表面にダイヤモンド砥粒８を充填すると、マスキング部１２のないところでは、ダイヤモンド砥粒８が直接台金４の壁面に接し、マスキング部１２のある部分では、ダイヤモンド砥粒８が台金４の壁面に接触することが妨げられる。   Next, as shown in FIG. 4, when the surface of the base metal 4 is filled with diamond abrasive grains 8, the diamond abrasive grains 8 are in direct contact with the wall surface of the base metal 4 where there is no masking section 12. In some parts, the diamond abrasive grains 8 are prevented from contacting the wall surface of the base metal 4.

次に、図８に示すように、ダイヤモンド砥粒８が充填された台金４を電気めっき槽２４に入れ、電気めっきすることにより、図５に示すように、ダイヤモンド砥粒８と台金４の壁面の間にめっき層２６が形成され、ダイヤモンド砥粒８の台金４の壁面への仮電着をおこなう（電着めっき工程その１）。   Next, as shown in FIG. 8, the base metal 4 filled with the diamond abrasive grains 8 is placed in an electroplating tank 24 and electroplated, thereby forming the diamond abrasive grains 8 and the base metal 4 as shown in FIG. A plating layer 26 is formed between the wall surfaces of the diamond, and temporary electrodeposition of the diamond abrasive grains 8 to the wall surface of the base metal 4 is performed (electrodeposition plating step 1).

電気めっき槽２４には、例えばホウ酸、硫酸ニッケル、塩化ニッケル等を混合しためっき液３０が収納されている。めっき液３０中には、陽極としてニッケル電極３２が設けられている。陰極として台金４が使用される。陰極の端子に接続された導電性の支持部材３４のフランジ部３４Ａには台金４がナット３６により締結され、台金４は底板３８と塩ビ製のブラケット４０によりゴム製のマスキング部材４２を介して上下から挟持されている。仮電着では、例えば０．１〜０．１５Ａ/ｄｍ2の電流密度でダイヤモンド砥粒８の仮電着をおこなった。 In the electroplating tank 24, for example, a plating solution 30 in which boric acid, nickel sulfate, nickel chloride or the like is mixed is stored. In the plating solution 30, a nickel electrode 32 is provided as an anode. A base metal 4 is used as the cathode. A base metal 4 is fastened by a nut 36 to a flange portion 34A of the conductive support member 34 connected to the cathode terminal, and the base metal 4 is interposed by a bottom plate 38 and a vinyl chloride bracket 40 through a rubber masking member 42. Is sandwiched from above and below. The provisional electrodeposition was performed provisional electrodeposition of diamond abrasive grains 8 for example at a current density of 0.1~0.15A / dm 2.

次に、ダイヤモンド砥粒８の仮電着が終わった状態で、余剰のダイヤモンド砥粒８を取り除く。この際、台金４の表面に点着されたマスキング部１２による突起は、図６に示すように、非導電性の接着剤２０で形成されているため、マスキング部１２のみに接していたダイヤモンド砥粒８は、電着されていないので、容易に取り除かれ、ダイヤモンド砥粒層６のマスキング部１２に相当する部分はダイヤモンド砥粒８がほとんど固着しないこととなる。   Next, after the temporary electrodeposition of the diamond abrasive grains 8 is completed, the excess diamond abrasive grains 8 are removed. At this time, since the projections by the masking portion 12 spotted on the surface of the base metal 4 are formed of the non-conductive adhesive 20 as shown in FIG. Since the abrasive grains 8 are not electrodeposited, they are easily removed, and the diamond abrasive grains 8 hardly adhere to the portions corresponding to the masking portion 12 of the diamond abrasive grain layer 6.

次に、図８に示すように、再び電気めっき槽２４に入れて本格的にダイヤモンド砥粒８を固着するために電気めっきにより電鋳層２８を形成する（電着めっき工程その２）。これにより、図７に示すように、ダイヤモンド砥粒８を確実に固着するための、十分な厚さの電鋳層２８を形成するものである。台金４を電気めっき槽２４にセットして、例えば、０．３Ａ/ｄｍ2で９０時間ニッケル電気めっきにより電鋳層２８を形成し、ダイヤモンド砥粒８を固着した。 Next, as shown in FIG. 8, an electroformed layer 28 is formed by electroplating in order to fix the diamond abrasive grains 8 in earnest in the electroplating tank 24 again (electrodeposition plating step 2). As a result, as shown in FIG. 7, an electroformed layer 28 having a sufficient thickness for securely fixing the diamond abrasive grains 8 is formed. The base metal 4 was set in the electroplating tank 24. For example, the electroformed layer 28 was formed by nickel electroplating at 0.3 A / dm 2 for 90 hours, and the diamond abrasive grains 8 were fixed.

このように、マスキング部１２の形状、大きさ、配置位置は、ディスペンサ２２による接着剤２０によるマスキング部１２の点着時の調整により容易にコントロールすることができる。電着めっき工程その１および電着めっき工程その２により電着めっき工程が構成される。
本実施形態の歯車研削用砥石２は、図８に示すように、超砥粒層６が台金４の外周部が凸曲面状に形成された両側面５４に形成され、これらの両側面５４が外周縁５６に向かって接近するよう形成されている。そして、超砥粒層６には、複数のマスキング部１２が、帯状部１８の円周方向及び幅方向に均等に配置されている。そのため、歯車の溝部側面を研削する場合において、超砥粒層６を有する両側面５４の外周縁５６を、歯車の溝部に入り込ませることで、容易に研削することができる。この際に複数のマスキング部１２は、超砥粒層６全体においてまんべんなく被研削物に接触する。これによって、歯車研削用砥石２の超砥粒層６の「形状くずれ」を防止して、砥石の寿命を延すことができる。 As described above, the shape, size, and arrangement position of the masking portion 12 can be easily controlled by adjusting when the masking portion 12 is spotted by the adhesive 20 by the dispenser 22. The electrodeposition plating step is composed of the electrodeposition plating step 1 and the electrodeposition plating step 2.
In the gear grinding wheel 2 of the present embodiment, as shown in FIG. 8, the superabrasive grain layer 6 is formed on both side surfaces 54 in which the outer peripheral portion of the base metal 4 is formed in a convex curved shape, and these both side surfaces 54. Is formed toward the outer peripheral edge 56. In the superabrasive layer 6, a plurality of masking portions 12 are evenly arranged in the circumferential direction and the width direction of the band-shaped portion 18. Therefore, when grinding the groove side surface of the gear, the outer peripheral edge 56 of both side surfaces 54 having the superabrasive grain layer 6 can be easily ground by entering the groove portion of the gear. At this time, the plurality of masking portions 12 are in contact with the object to be ground evenly in the entire superabrasive grain layer 6. Thereby, the “shape failure” of the superabrasive layer 6 of the gear grinding wheel 2 can be prevented, and the life of the wheel can be extended.

上記のように構成された歯車研削用砥石２によると、ダイヤモンド砥粒層６が台金４の外周部に帯状に形成された帯状部１８を、等間隔で分割するように回転軸３と同心に仮想的に描かれた複数の同心配置円１４と、帯状部１８を円周方向に等間隔で分割するように、帯状部１８の一端５０から他端５２に向かって仮想的に描かれた複数の幅方向配置線１６との交点に、ディスペンサ２２により、インクジェットよりも径の大きな複数のマスキング部１２が形成されている。そのため、帯状部１８に仮想的に描かれた幅方向配置線１６及び同心配置円１４の交点に配置された複数のマスキング部１２が、帯状部１８の円周方向及び幅方向に均等に配置されることとなり、歯車研削用砥石２が回転すると、複数のマスキング部１２が偏ることなくダイヤモンド砥粒層６全体にわたってまんべんなく被研削物に接触する。
そして、複数のマスキング部１２を帯状部１８の円周方向及び幅方向に均等に配置することで、帯状部１８の超砥粒層６の超砥粒８の集中度を全体として均一にすることができる。そして、超砥粒層６に存在する幅方向配置線１６上に形成された複数のマスキング部１２により、超砥粒８の集中度が高くなることによって生じる「目づまり」を防止するとともに、超砥粒層６の隣接する幅方向配置線１６Ａ、１６Ｂ間のスキング部１２が存在しない部分によって「形状くずれ」を防止することができる。
これによって、歯車研削用砥石２の寿命を延すことができる。そして、マスキング部１２の総投影面積が、ダイヤモンド砥粒層６の総投影面積の５〜２０パーセントであるときに、特に「目づまり」と「形状くずれ」とを防止する効果が高いことが実験的に導き出されている。 According to the grinding wheel 2 for gear grinding configured as described above, the diamond abrasive grain layer 6 is concentric with the rotary shaft 3 so as to divide the band-shaped part 18 formed in the band shape on the outer peripheral part of the base metal 4 at equal intervals. A plurality of concentrically arranged circles 14 virtually drawn in FIG. 5 and the belt-like portion 18 are virtually drawn from one end 50 to the other end 52 so as to divide the belt-like portion 18 at equal intervals in the circumferential direction. A plurality of masking portions 12 having a diameter larger than that of the ink jet are formed by the dispenser 22 at intersections with the plurality of width direction arrangement lines 16. Therefore, the plurality of masking portions 12 arranged at the intersections of the width direction arrangement lines 16 and the concentric arrangement circles 14 that are virtually drawn on the belt-like portion 18 are evenly arranged in the circumferential direction and the width direction of the belt-like portion 18. Thus, when the gear grinding grindstone 2 rotates, the plurality of masking portions 12 do not bias and contact the object to be ground evenly over the entire diamond abrasive grain layer 6.
And the concentration degree of the superabrasive grain 8 of the superabrasive grain layer 6 of the strip-shaped part 18 is made uniform as a whole by arranging the plurality of masking parts 12 uniformly in the circumferential direction and the width direction of the strip-shaped part 18. Can do. The plurality of masking portions 12 formed on the width direction arrangement line 16 existing in the superabrasive grain layer 6 prevent “clogging” caused by the high concentration of the superabrasive grains 8 and The “shape loss” can be prevented by the portion where the sking portion 12 between the adjacent width direction arrangement lines 16A and 16B of the abrasive grain layer 6 does not exist.
Thereby, the life of the grinding wheel 2 for gear grinding can be extended. When the total projected area of the masking portion 12 is 5 to 20% of the total projected area of the diamond abrasive grain layer 6, the experiment is particularly effective in preventing “clogging” and “shape loss”. Has been derived.

（第２実施形態）
以下、本発明に係る電着ホイールの第２実施形態について図面を参照して説明する。
本実施形態の電着ホイールは、電着ドレッサ１０２であること、片面のみに頂角１４５度の円錐状の側面を持つこと、円錐状の側面の外側の周に帯状部１１８が設けられ、帯状部１１８にダイヤモンド砥粒層１０６が形成されていること、帯状部１１８には仮想的に描かれた幅方向補助配置線１７が設けられている点において、第１実施形態と相違する。
また、ダイヤモンド砥粒層１０６の帯状部１１８には、第１実施形態と同様に、帯状部１１８の外側から仮想的に描かれた奇数番目の同心配置円（１４Ａ、１４Ｃ、１４Ｅ、１４Ｇ、１４Ｉ）で構成される第１同心配置円群、および帯状部１１８の外側から仮想的に描かれた偶数番目の同心配置円（１４Ｂ、１４Ｄ、１４Ｆ、１４Ｈ、１４Ｊ）で構成される第２同心配置円群が設けられ、第１同心配置円群と対応関係にある仮想的に描かれた第１幅方向配置線１６Ａ１，１６Ａ２、第２同心配置円群と対応関係にある仮想的に描かれた第２幅方向配置線１６Ｂ１，１６Ｂ２が設けられている。これらの配置は、電着ドレッサ１０２を側面から見たときに第１実施形態と同様である。 (Second Embodiment)
Hereinafter, a second embodiment of the electrodeposition wheel according to the present invention will be described with reference to the drawings.
The electrodeposition wheel of the present embodiment is an electrodeposition dresser 102, has a conical side surface with an apex angle of 145 degrees only on one side, and is provided with a band-shaped portion 118 on the outer periphery of the conical side surface. This is different from the first embodiment in that the diamond abrasive grain layer 106 is formed in the portion 118, and the widthwise auxiliary arrangement line 17 is provided in the band-like portion 118.
Similarly to the first embodiment, odd-numbered concentric circles (14A, 14C, 14E, 14G, 14I) virtually drawn from the outside of the band 118 are formed on the band 118 of the diamond abrasive grain layer 106. ) And a second concentric arrangement composed of even-numbered concentric arrangement circles (14B, 14D, 14F, 14H, and 14J) virtually drawn from the outside of the belt-shaped portion 118. A circle group is provided, and the first width direction arrangement lines 16A1 and 16A2 that are virtually drawn corresponding to the first concentric arrangement circle group and the second concentric arrangement circle group are virtually drawn. Second width direction arrangement lines 16B1 and 16B2 are provided. These arrangements are the same as those in the first embodiment when the electrodeposition dresser 102 is viewed from the side.

次に、上記相違点について、以下に詳細に説明する。
電着ドレッサ１０２は、図１１及び図１２に示すように、片方の側面１５４が広い頂角の円錐面で形成され、他の側面が平面で形成されて全体として円盤状に構成された台金１０４と、台金１０４の片方の側面１５４の半径方向外側に所定の幅で帯状に形成された超砥粒層としてのダイヤモンド砥粒層１０６と、を備えている。電着ドレッサ１０２の台金１０４の外周側面に所定の幅で帯状部１１８が形成され、帯状部１１８にはダイヤモンド砥粒層１０６が形成されている。台金１０４は、例えば、焼入れ、焼戻し鋼（ＳＵＪ）が用いられる。 Next, the difference will be described in detail below.
As shown in FIGS. 11 and 12, the electrodeposition dresser 102 is a base metal having one side 154 formed with a conical surface with a wide apex angle and the other side formed with a flat surface so as to form a disc shape as a whole. 104 and a diamond abrasive layer 106 as a superabrasive layer formed in a band shape with a predetermined width on the outer side in the radial direction of one side surface 154 of the base metal 104. A band-shaped portion 118 having a predetermined width is formed on the outer peripheral side surface of the base metal 104 of the electrodeposition dresser 102, and a diamond abrasive layer 106 is formed on the band-shaped portion 118. For the base metal 104, for example, quenched and tempered steel (SUJ) is used.

本実施形態の電着ドレッサ１０２は、ねじ形状の砥石１０９（図１３参照）を研削するドレッサであり、超砥粒として例えば♯３０〜♯１４０程度の粒径のダイヤモンド砥粒８が使用される。   The electrodeposition dresser 102 of this embodiment is a dresser for grinding a screw-shaped grindstone 109 (see FIG. 13), and diamond abrasive grains 8 having a grain size of, for example, about # 30 to # 140 are used as superabrasive grains. .

ダイヤモンド砥粒層１０６が存在する帯状部１１８に設けられた第１幅方向配置線１６Ａ１，１６Ａ２には、回転方向隣りに幅方向補助配置線（補助配置線）としての第１幅方向補助配置線（第一補助配置線）１７Ａ１，１７Ａ２，１７Ａ３が設けられている。また、第２幅方向配置線１６Ｂ１、１６Ｂ２には、回転方向隣りに第２幅方向補助配置線（第二補助配置線）１７Ｂ１、１７Ｂ２、１７Ｂ３が設けられている。これらの第１幅方向配置線１６Ａ１，１６Ａ２及び第２幅方向補助配置線１７Ａ１，１７Ａ２，１７Ａ３は、夫々が帯状部１１８幅方向中央部において半径方向に対して６７．５度の同一角度で傾斜した直線であり、各線が互いに円周方向において等間隔となるよう配置されている。 A first width direction auxiliary arrangement line as a width direction auxiliary arrangement line (auxiliary arrangement line) is adjacent to the rotation direction in the first width direction arrangement lines 16A1 and 16A2 provided in the belt-shaped portion 118 where the diamond abrasive layer 106 exists. (First auxiliary arrangement line) 17A1, 17A2, and 17A3 are provided. The second width direction arrangement lines 16B1 and 16B2 are provided with second width direction auxiliary arrangement lines (second auxiliary arrangement lines) 17B1, 17B2, and 17B3 adjacent to the rotation direction. The first width direction placement lines 16A1, 16A2 and the second width direction auxiliary placement lines 17A1, 17A2, 17A3 are inclined at the same angle of 67.5 degrees with respect to the radial direction at the central portion in the width direction of the belt-shaped portion 118. The lines are arranged at equal intervals in the circumferential direction.

第１幅方向補助配置線１７Ａ１，１７Ａ２，１７Ａ３は第１同心配置円群１４Ａ、１４Ｃ、１４Ｅ、１４Ｇ、１４Ｉと対応関係にあり、第２幅方向補助配置線１７Ｂ１、１７Ｂ２、１７Ｂ３は第２同心配置円群１４Ｂ、１４Ｄ、１４Ｆ、１４Ｈ、１４Ｊと対応関係にある。そして、対応関係にある幅方向補助配置線と同心配置円群との交点に夫々マスキング部１２が設けられている。   The first width direction auxiliary arrangement lines 17A1, 17A2, and 17A3 are in correspondence with the first concentric arrangement circle groups 14A, 14C, 14E, 14G, and 14I, and the second width direction auxiliary arrangement lines 17B1, 17B2, and 17B3 are the second concentric lines. Corresponding to the arrangement circle groups 14B, 14D, 14F, 14H, and 14J. And the masking part 12 is provided in the intersection of the width direction auxiliary | assistant arrangement | positioning line and concentric arrangement | positioning circle group which have a corresponding relationship, respectively.

これらのマスキング部１２は、幅方向補助配置線１７Ａ、１７Ｂとそれに対応する同心配置円群１４とのすべての交点に配置されているわけでなく、幅方向補助配置線１７Ａ,１７Ｂとそれに対応関係にある同心配置円群１４の交点の帯状部１１８の半径方向外側に配置されることで、ダイヤモンド砥粒層１０６の摩耗の均一が図られる。   These masking portions 12 are not arranged at all the intersections of the width direction auxiliary arrangement lines 17A and 17B and the corresponding concentric arrangement circle group 14, but the width direction auxiliary arrangement lines 17A and 17B and the corresponding relationship. The diamond abrasive grain layer 106 can be evenly worn by being arranged on the radially outer side of the belt-like portion 118 at the intersection of the concentric arrangement circle group 14 in FIG.

具体的には、まず、第１同心配置円群１４Ａ、１４Ｃ、１４Ｅ、１４Ｇ、１４Ｉにおいて、一番外側の同心配置円１４Ａ上では、第１幅方向配置線１６Ａ２の左隣（電着ドレッサ１０２の回転方向側）にある３本の第１幅方向補助配置線１７Ａ１、１７Ａ２、１７Ａ３との３つの交点全てにマスキング部１２が配置されている。   Specifically, first, in the first concentric arrangement circle group 14A, 14C, 14E, 14G, 14I, on the outermost concentric arrangement circle 14A, the left adjacent to the first width direction arrangement line 16A2 (the electrodeposition dresser 102) The masking portions 12 are arranged at all three intersections with the three first width direction auxiliary arrangement lines 17A1, 17A2, and 17A3 on the rotation direction side).

外側から３番目の同心配置円１４Ｃ上では、第１幅方向配置線上１６Ａ２の左隣にある２本の第１幅方向補助配置線１７Ａ１、１７Ａ２との２つの交点にマスキング部１２が配置されている。
外側から５番目の同心配置円１４Ｅ上では、第１幅方向配置線上１６Ａ２の左隣にある２本の第１幅方向補助配置線１７Ａ１、１７Ａ２との２つの交点にマスキング部１２が配置されている。
外側から７番目の同心配置円１４Ｇ上では、第１幅方向配置線上１６Ａ２の左隣にある１本の第１方向補助配置線１７Ａ１との１つの交点にマスキング部１２が配置されている。
外側から９番目の同心配置円１４Ｉでは、いずれの第１幅方向補助配置線との交点にもマスキング部１２は配置されていない。 On the third concentric arrangement circle 14C from the outside, the masking portion 12 is arranged at two intersections with the two first width direction auxiliary arrangement lines 17A1 and 17A2 on the left side of the first width direction arrangement line 16A2. Yes.
On the fifth concentric arrangement circle 14E from the outside, the masking portion 12 is arranged at two intersections with the two first width direction auxiliary arrangement lines 17A1 and 17A2 on the left side of the first width direction arrangement line 16A2. Yes.
On the seventh concentric arrangement circle 14G from the outside, the masking portion 12 is arranged at one intersection with the first first auxiliary arrangement line 17A1 on the left side of the first width direction arrangement line 16A2.
In the ninth concentric arrangement circle 14I from the outside, the masking portion 12 is not arranged at the intersection with any of the first width direction auxiliary arrangement lines.

同様にして、第２同心配置円群１４Ｂ、１４Ｄ、１４Ｆ、１４Ｈ、１４Ｊにおいて、第２幅方向配置線１６Ｂ１、１８Ｂ２の左隣に配置される第２幅方向補助配置線１７Ｂ１、１７Ｂ２、１７Ｂ３との交点にすべてマスキング部１２が配置されるものではなく、マスキング部１２が配置される範囲の交点のうち電着ドレッサ１０２の帯状部１１８の半径方向外側の交点にマスキング部１２を配置して、超砥粒層１０６の摩耗の均一を図っている。   Similarly, in the second concentric arrangement circle group 14B, 14D, 14F, 14H, 14J, the second width direction auxiliary arrangement lines 17B1, 17B2, 17B3 arranged on the left side of the second width direction arrangement lines 16B1, 18B2 and The masking portion 12 is not arranged at all the intersection points of the masking portion 12, but the masking portion 12 is arranged at the intersection point outside the belt-shaped portion 118 of the electrodeposition dresser 102 in the radial direction among the intersection points where the masking portion 12 is arranged, The wear of the superabrasive layer 106 is made uniform.

円盤状の電着ドレッサ１０２では外側に行くほど周長が長くなる。そのため、電着ドレッサ１０２の超砥粒層１０６が存在する帯状部１１８の外側に行くほどマスキング部１２を増加させて配置することで、超砥粒層１０６に対するマスキング部１２の割合の均等を保持することができる。これによって、ドレッシングする際に、常に均一な接触を砥石１０９に対して行うことができ、電着ドレッサ１０２のダイヤモンド砥粒層１０６の「形状くずれ」を防止して電着ドレッサ１０２の寿命を延すことができる。   In the disc-shaped electrodeposition dresser 102, the circumference increases as it goes outward. Therefore, the masking portion 12 is arranged so as to increase toward the outside of the belt-shaped portion 118 where the superabrasive layer 106 of the electrodeposition dresser 102 exists, so that the ratio of the masking portion 12 to the superabrasive layer 106 is kept uniform. can do. This makes it possible to always make uniform contact with the grindstone 109 during dressing, and prevent the diamond abrasive grain layer 106 of the electrodeposition dresser 102 from being “deformed” to prolong the life of the electrodeposition dresser 102. I can do it.

次に、本実施形態における電着ドレッサ１０２を使用して、ねじ形状の砥石１０９をドレッシングする場合について簡単に説明する。
まず、図１３に示すように、駆動軸１１３には２つの電着ドレッサ１０２がボルト等によって相対回転不能に設けられている。二つの電着ドレッサ１０２は、ダイヤモンド砥粒層１０６が設けられた円錐面を対向して配置されている。駆動軸１１３は、減速装置（図略）を介して駆動モータ（図略）により駆動トルクが伝達されて回転する。駆動軸１１３の回転速度は、減速装置におけるギヤ比を切替える機構によって任意の周速度に変更されるよう構成されている。被研削物であるねじ形状の砥石１０９は、駆動軸１１３とは異なる周速度で回転可能な図略の駆動軸に相対回転不能に組み付けられている。駆動軸１１３とねじ形状の砥石１０９が組み付けられた駆動軸とは、互いに平行な状態で接近離間可能とする図略の切込移動機構に組み込まれている。また、駆動軸１１３とねじ形状の砥石１０９が組み付けられた駆動軸とは、ねじ形状の砥石１０９が組み付けられた駆動軸の回転に連動して軸方向に相対移動可能とする送り移動機構に組み込まれている。 Next, the case where the thread-shaped grindstone 109 is dressed using the electrodeposition dresser 102 in this embodiment will be briefly described.
First, as shown in FIG. 13, two electrodeposition dressers 102 are provided on the drive shaft 113 so as not to be relatively rotatable by bolts or the like. The two electrodeposition dressers 102 are arranged so that the conical surfaces provided with the diamond abrasive layer 106 are opposed to each other. The drive shaft 113 is rotated by a drive torque transmitted by a drive motor (not shown) via a speed reducer (not shown). The rotational speed of the drive shaft 113 is configured to be changed to an arbitrary peripheral speed by a mechanism that switches a gear ratio in the reduction gear. A thread-shaped grindstone 109 that is an object to be ground is assembled to a drive shaft (not shown) that is rotatable at a peripheral speed different from that of the drive shaft 113 so as not to be relatively rotatable. The drive shaft 113 and the drive shaft on which the screw-shaped grindstone 109 is assembled are incorporated in a not-shown notch moving mechanism that can approach and separate in a parallel state. The drive shaft 113 and the drive shaft on which the screw-shaped grindstone 109 is assembled are incorporated in a feed movement mechanism that can move relative to the axial direction in conjunction with the rotation of the drive shaft on which the screw-shaped grindstone 109 is assembled. It is.

ドレッシングを実施するに際して、例えば、電着ドレッサ１０２の周速度よりもねじ形状の砥石１０９の周速度を低くして、電着ドレッサ１０２と砥石１０９とが接触点において同一の接線方向に回転するよう互いに逆方向に回転させる。そして、切込移動機構によって切り込み量を調節しながら接近させてねじ形状の砥石１０９のねじ歯の谷の側面をドレッシングする。そして、砥石１０９のねじ形状の回転に同期させて送り移動機構により、電着ドレッサ１０２とねじ形状の砥石１０９とを軸方向に相対移動させて、ねじ形状の砥石１０９のねじ歯の谷の側面を連続してドレッシングする。   When performing dressing, for example, the peripheral speed of the thread-shaped grindstone 109 is made lower than the peripheral speed of the electrodeposition dresser 102 so that the electrodeposition dresser 102 and the grindstone 109 rotate in the same tangential direction at the contact point. Rotate in opposite directions. Then, the side of the thread tooth valley of the thread-shaped grindstone 109 is dressed by adjusting the depth of cut by the notch moving mechanism. Then, the electrodeposition dresser 102 and the thread-shaped grindstone 109 are moved relative to each other in the axial direction by a feed movement mechanism in synchronization with the thread-shaped rotation of the grindstone 109, and the side surface of the thread tooth valley of the thread-shaped grindstone 109 Dress continuously.

上記のように構成された電着ドレッサ１０２によると、同心配置円群１４Ａ、１４Ｃ、１４Ｅ、１４Ｇ、１４Ｉとそれに対応する幅方向配置線１６Ａ１，１６Ａ２との交点に配置されたマスキング部１２に加えて、幅方向補助配置線１７Ａ１、１７Ａ２、１７Ａ３に配置されたマスキング部１２によって、超砥粒層１０６の摩耗が少ないと予想される帯状部１１８の半径方向外側にマスキング部１２が配置されるので、超砥粒層１０６の摩耗をより均一にして「形状くずれ」を防止することができる。   According to the electrodeposition dresser 102 configured as described above, in addition to the masking portion 12 arranged at the intersection of the concentric arrangement circle group 14A, 14C, 14E, 14G, 14I and the corresponding width direction arrangement lines 16A1, 16A2. Thus, the masking portion 12 arranged on the width direction auxiliary arrangement lines 17A1, 17A2, and 17A3 arranges the masking portion 12 on the outer side in the radial direction of the belt-like portion 118 where the abrasion of the superabrasive grain layer 106 is expected to be small. Further, the wear of the superabrasive grain layer 106 can be made more uniform, and “shape loss” can be prevented.

次に、ドレッサ１０２におけるダイヤモンド砥粒層１０６表面のマスキング部１２の最適な配置位置、占有面積等について、実験データに基づいて以下に説明する。
複数のマスキング部を、図１４に示すような従来行なわれていた格子状に配置した電着ドレッサ（試験体Ａ）と、図１１に示すような本件実施形態に係る電着ドレッサ（試験体Ｂ）との比較を行った。試験体Ｂは、複数のマスキング部１２を、図１１に示すように、第１同心配置円群１４Ａ、１４Ｃ、１４Ｅ、１４Ｇ、１４Ｉと、その対応関係にある第１幅方向配置線群１６Ａ１、１６Ａ２及び第１幅方向補助配置線群１７Ａ１、１７Ａ２、１７Ａ３との交点に配置している。また、複数のマスキング部１２を、第２同心配置円群１４Ｂ、１４Ｄ、１４Ｆ、１４Ｈ、１４Ｊと、その対応関係にある第２幅方向配置線群１６Ｂ１、１６Ｂ２及び第２幅方向補助配置線群１７Ｂ１、１７Ｂ２、１７Ｂ３との交点に配置している。そして、第１及び第２幅方向補助配置線群１７Ａ、１７Ｂにおいては、それぞれ帯状部１１８の半径方向外側にマスキング部１２が配置されている。
ダイヤモンド砥粒８の総投影面積に対するマスキング部１２の総投影面積は、試験体Ａ及び試験体Ｂについて共に１０％とした。マスキング部１２の総投影面積が多くなると、ダイヤモンド砥粒への負荷が大きくなるところから「形状くずれ」となり易く、マスキング部１２の総投影面積が少なくなると、「目づまり」を生じてすぐに切れ味が悪くなるところから、ダイヤモンド砥粒８の総投影面積に対するマスキング部１２の総投影面積を１０％前後とすることが好ましいと考えられた。 Next, the optimal arrangement position, occupied area, etc. of the masking portion 12 on the surface of the diamond abrasive layer 106 in the dresser 102 will be described based on experimental data.
An electrodeposition dresser (test body A) in which a plurality of masking portions are arranged in a lattice shape as shown in FIG. 14 and an electrodeposition dresser (test body B) according to the present embodiment as shown in FIG. ). As shown in FIG. 11, the test body B includes a plurality of masking portions 12, as shown in FIG. 11, the first concentric arrangement circle group 14 </ b> A, 14 </ b> C, 14 </ b> E, 14 </ b> G, 14 </ b> I and the first width direction arrangement line group 16 </ b> A <b> 1. 16A2 and the first width direction auxiliary arrangement line groups 17A1, 17A2, and 17A3. In addition, the plurality of masking portions 12 are arranged in the second concentric arrangement circle groups 14B, 14D, 14F, 14H, and 14J, the second width direction arrangement line groups 16B1 and 16B2, and the second width direction auxiliary arrangement line group that are in a corresponding relationship. They are arranged at the intersections with 17B1, 17B2, and 17B3. In each of the first and second width direction auxiliary arrangement line groups 17A and 17B, the masking part 12 is arranged on the outer side in the radial direction of the belt-like part 118.
The total projected area of the masking portion 12 with respect to the total projected area of the diamond abrasive grains 8 was 10% for both the test body A and the test body B. When the total projected area of the masking portion 12 increases, the load on the diamond abrasive grains tends to become “shape loss”, and when the total projected area of the masking portion 12 decreases, “clogging” occurs and the sharpness is immediately cut. Therefore, it was considered that the total projected area of the masking portion 12 with respect to the total projected area of the diamond abrasive grains 8 is preferably about 10%.

同一のドレス条件で実際に研削することで、切れ味をしめすドレス抵抗（値が大きいほど「切れ味」が悪くなる）と、形状維持性（寿命）を示す摩耗量（値が大きいほど形状維持性が悪く「形状くずれ」し易くなる）とについて比較試験を行なった。
試験体Ａ及び試験体Ｂの電着ドレッサは、夫々電着ドレッサの径１１０ｍｍ、ドレッシングされるビトリファイド砥石の径３００ｍｍ、切込み速度０．０２７ｍ/ｓ、ドレッサ周速度１８．８ｍ/ｓ、砥石周速度１．４ｍ/ｓのドレス条件で実施した。 By actually grinding under the same dressing conditions, the dress resistance that shows sharpness (the higher the value, the worse the "sharpness") and the wear amount that shows shape maintenance (life) (the higher the value, the more the shape maintenance) A comparative test was conducted with respect to “it is easy to deform”.
The electrodeposition dresser of the test body A and the test body B has an electrodeposition dresser diameter of 110 mm, a dressed vitrified grinding wheel diameter of 300 mm, a cutting speed of 0.027 m / s, a dresser circumferential speed of 18.8 m / s, and a grinding wheel circumferential speed. The dressing condition was 1.4 m / s.

電着ドレッサとしての切れ味は、図９に示すように、試験体Ａの切れ味を示すドレス抵抗を１としたとき、試験体Ｂのドレス抵抗は０．５であり、本件実施形態にかかる試験体Ｂの電着ドレッサの切れ味が２倍も良くなっており、高い切れ味を示すことが確認された。   As shown in FIG. 9, when the dress resistance indicating the sharpness of the test specimen A is 1, the dress resistance of the test specimen B is 0.5, and the test specimen according to this embodiment is as shown in FIG. The sharpness of the electrodeposition dresser of B was improved twice, and it was confirmed that the sharpness was high.

電着ドレッサの形状維持性は、図１０に示すように、試験体Ａの摩耗量を１としたとき、試験体Ｂの摩耗量は約０．６３である。これはマスキング部が全くないものと同程度であって、形状維持性も高いことが確認された。   As shown in FIG. 10, in the shape maintaining property of the electrodeposition dresser, when the wear amount of the test body A is 1, the wear amount of the test body B is about 0.63. This was the same as that without any masking part, and it was confirmed that the shape maintainability was high.

なお、本実施形態においては、幅方向補助配置線１７を幅方向配置線１６の回転方向側に配置するものとしたが、これに限定されず、例えば、幅方向配置線１６の回転方向反対側に配置しても良く、また、幅方向補助配置線を、幅方向配置線の回転方向側と回転方向反対側とに分けて配置してもよい。
また、幅方向配置線１６及び幅方向補助配置線１７を直線としたが、これに限定されず、例えば円弧状などの曲線でもよい。
また、幅方向配置線を電着ホイールの円周方向に２２．５度ごとに均等間隔で配置するものとしたが、これに限定されず、例えば１５度ごと等、制作する電着ホイールの機能に合わせて任意に変更することができる。
また、各幅方向配置線における主配置線と副配置線との間に幅方向補助配置線を夫々配置しても良い。
また、電着ドレッサ１０２は、幅方向補助配置線１７Ａ、１７Ｂ上のマスキング部１２は、帯状部１１８の半径方向外側に配置されて超砥粒層の摩耗の均一を図るものとしたが、これに限定されず、例えば、研削する被研削物の形状により摩耗が少ない超砥粒層の面が生じる場合には、その摩耗しない面に幅方向補助配置線を配置して、マスキング部を増加させても良い。 In the present embodiment, the width direction auxiliary arrangement line 17 is arranged on the rotation direction side of the width direction arrangement line 16, but is not limited to this, for example, the rotation direction opposite side of the width direction arrangement line 16. Alternatively, the width direction auxiliary arrangement line may be divided into the rotation direction side and the rotation direction opposite side of the width direction arrangement line.
Moreover, although the width direction arrangement | positioning line 16 and the width direction auxiliary arrangement line 17 were made into the straight line, it is not limited to this, For example, curves, such as circular arc shape, may be sufficient.
In addition, the width direction arrangement lines are arranged at equal intervals every 22.5 degrees in the circumferential direction of the electrodeposition wheel. However, the present invention is not limited to this, and the function of the electrodeposition wheel to be produced, for example, every 15 degrees. It can be arbitrarily changed according to.
Moreover, you may arrange | position the width direction auxiliary arrangement line between the main arrangement line and the sub arrangement line in each width direction arrangement line.
In the electrodeposition dresser 102, the masking portion 12 on the width direction auxiliary arrangement lines 17A and 17B is arranged on the outer side in the radial direction of the belt-shaped portion 118 so as to achieve uniform wear of the superabrasive layer. For example, when a surface of a superabrasive layer with little wear occurs due to the shape of the workpiece to be ground, an auxiliary arrangement line in the width direction is arranged on the non-wear surface to increase the masking portion. May be.

また、上記第１及び第２実施形態においては、ダイヤモンド砥粒８を電着で単層に設けたダイヤモンド砥粒層６としたが、これに限定されず、例えば、ＣＢＮ砥粒を電着等により固着した超砥粒層であってもよい。
また、幅方向配置線を主配置線１本と副配置線１本のものとしたが、これに限定されず、例えば、副配置線が２本以上のものであって、この上にマスキング部が配置されていても良い。
また、第１及び第２幅方向配置線が回転方向に対して後傾するように傾斜したものとしたが、これに限定されず、例えば前傾するよう傾斜したものでもよい。
また、帯状部は、円盤状の台金の側面に設けられるものとしたが、これに限定されず、例えば、台金の外周面に設けられるものでもよい。
また、同心配置円１４を、外側から奇数番目の複数の同心配置円で構成される第１同心配置円群と外側から偶数番目の複数の同心配置円で構成される第２同心配置円群との２つに分割したが、これに限定されず、例えば、第１番目の同心配置円１４Ａ、第４番目の同心配置円１４Ｄ、第７番目の同心配置円１４Ｇで構成する第１同心配置円群と、第２番目の同心配置円１４Ｂ、第５番目の同心配置円１４Ｅ、第８番目の同心配置円１４Ｈで構成する第２同心配置円群と、第３同心配置円１４Ｃ、第６番目の同心配置円１４Ｆ、第９番目の同心配置円１４Ｉで構成する第３同心配置円群としてもよく、これ以上の群に分割するものでもよい。
また、マスキング部は、硬化したジェル状接着剤が残っているものとしたが、これに限定されず、例えば、ジェル状接着剤を除去して、超砥粒層の表面に超砥粒のないディンプル（へこみ）が形成されたものでもよい。 Moreover, in the said 1st and 2nd embodiment, although the diamond abrasive grain 8 was used as the diamond abrasive grain layer 6 provided in the single layer by electrodeposition, it is not limited to this, For example, a CBN abrasive grain is electrodeposited etc. It may be a superabrasive layer fixed by.
In addition, although the width direction arrangement line is one main arrangement line and one sub arrangement line, the present invention is not limited to this. For example, there are two or more sub arrangement lines, and a masking portion is formed thereon. May be arranged.
Further, the first and second width direction arrangement lines are inclined so as to incline backward with respect to the rotation direction.
Moreover, although the strip | belt-shaped part shall be provided in the side surface of a disk-shaped base metal, it is not limited to this, For example, you may provide in the outer peripheral surface of a base metal.
Further, the concentric arrangement circle 14 includes a first concentric arrangement circle group composed of a plurality of odd-numbered concentric arrangement circles from the outside and a second concentric arrangement circle group constituted of a plurality of even-numbered concentric arrangement circles from the outside. However, the present invention is not limited to this. For example, the first concentric arrangement circle formed by the first concentric arrangement circle 14A, the fourth concentric arrangement circle 14D, and the seventh concentric arrangement circle 14G. A group, a second concentric circle 14 </ b> C, a fifth concentric circle 14 </ b> E, a fifth concentric circle 14 </ b> E, and an eighth concentric circle 14 </ b> H, a third concentric circle 14 </ b> C, and a sixth The third concentric arrangement circle 14F and the ninth concentric arrangement circle 14I may be divided into groups of more than this.
In addition, the masking portion is assumed to have the cured gel adhesive remaining, but is not limited to this, for example, the gel adhesive is removed and the superabrasive layer has no superabrasive grains on the surface. A dimple (dent) may be formed.

斯様に、上記した実施の形態で述べた具体的構成は、本発明の一例を示したものにすぎず、本発明はそのような具体的構成に限定されることなく、本発明の主旨を逸脱しない範囲で種々の態様を採り得るものである。   Thus, the specific configuration described in the above-described embodiment is merely an example of the present invention, and the present invention is not limited to such a specific configuration. Various embodiments can be adopted without departing from the scope.

２…電着ホイール、３…回転軸、４…台金、６…超砥粒層（ダイヤモンド砥粒層）、１２…マスキング部、１４…同心配置円、１４Ａ〜１４Ｊ…同心配置円、１６…幅方向配置線、１６Ａ…幅方向配置線（第１幅方向配置線）、１６Ａ１…幅方向配置線・主配置線（第１幅方向配置線）、１６Ａ２…幅方向配置線・副配置線（第１幅方向配置線）、１６Ｂ…幅方向配置線（第２幅方向配置線）、１６Ｂ１…幅方向配置線・主配置線（第２幅方向配置線）、１６Ｂ２…幅方向配置線・副配置線（第２幅方向配置線）、１７…幅方向補助配置線、１７Ａ…幅方向補助配置線（第１幅方向補助配置線）、１７Ｂ…幅方向補助配置線（第２幅方向補助配置線）、１７Ａ１…幅方向補助配置線（第１幅方向補助配置線）、１７Ａ２…幅方向補助配置線（第１幅方向補助配置線）、１７Ａ３…幅方向補助配置線（第１幅方向補助配置線）、１７Ｂ１…幅方向補助配置線（第２幅方向補助配置線）、１７Ｂ２…幅方向補助配置線（第２幅方向補助配置線）、１７Ｂ３…幅方向補助配置線（第２幅方向補助配置線）、１８…帯状部、２０…接着剤、２２…ディスペンサ、２６…めっき層、２８…電鋳層、５０…一端（内端）、５２…他端（外端）、５４…両側面、５６…外周縁、１０２…電着ホイール、１０４…台金、１０６…超砥粒層（ダイヤモンド砥粒層）、１１８…帯状部、１５４…側面。   DESCRIPTION OF SYMBOLS 2 ... Electrodeposition wheel, 3 ... Rotating shaft, 4 ... Base metal, 6 ... Super abrasive grain layer (diamond abrasive grain layer), 12 ... Masking part, 14 ... Concentric arrangement circle, 14A-14J ... Concentric arrangement circle, 16 ... Width direction arrangement line, 16A ... Width direction arrangement line (first width direction arrangement line), 16A1 ... Width direction arrangement line / main arrangement line (first width direction arrangement line), 16A2 ... Width direction arrangement line / sub arrangement line ( First width direction arrangement line), 16B... Width direction arrangement line (second width direction arrangement line), 16B1... Width direction arrangement line / main arrangement line (second width direction arrangement line), 16B2. Arrangement line (second width direction arrangement line), 17 ... width direction auxiliary arrangement line, 17A ... width direction auxiliary arrangement line (first width direction auxiliary arrangement line), 17B ... width direction auxiliary arrangement line (second width direction auxiliary arrangement line) Line), 17A1 ... width direction auxiliary arrangement line (first width direction auxiliary arrangement line), 17A2 ... width direction auxiliary arrangement line ( 1 width direction auxiliary arrangement line), 17A3... Width direction auxiliary arrangement line (first width direction auxiliary arrangement line), 17B1... Width direction auxiliary arrangement line (second width direction auxiliary arrangement line), 17B2. (Second width direction auxiliary arrangement line), 17B3 ... width direction auxiliary arrangement line (second width direction auxiliary arrangement line), 18 ... band-shaped portion, 20 ... adhesive, 22 ... dispenser, 26 ... plating layer, 28 ... electroforming layer 50 ... One end (inner end), 52 ... Other end (outer end), 54 ... Both sides, 56 ... Outer peripheral edge, 102 ... Electrodeposition wheel, 104 ... Base metal, 106 ... Super abrasive layer (diamond abrasive layer) ), 118..., Strips, 154.

Claims (6)

円盤状に形成され回転軸線回りに回転駆動される台金と、
前記台金の外周部に所定幅で延在する帯状部に複数の超砥粒がめっきにより固着されることで形成された超砥粒層と、
を備えた電着ホイールにおいて、
前記帯状部を幅方向に等間隔で分割するように前記回転軸と同心に仮想的に描かれた複数の同心円を、複数の第一同心配置円とし、
前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれた複数の線を、複数の第一主配置線とし、
隣り合う２つの前記第一主配置線のそれぞれの間に配置され、前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、隣り合う２つの前記第一主配置線のうち周方向一方側の基準となる前記第一主配置線からの距離が近い位置にそれぞれ配置された複数の線を、複数の第一副配置線とし、
前記複数の第一同心配置円と前記複数の第一主配置線との各交点、及び、前記複数の第一同心配置円と前記複数の第一副配置線との各交点に、ジェル状接着剤がディスペンサにより前記超砥粒より大きく点着されたことにより前記超砥粒が電着されていない複数のマスキング部が形成されており、
前記基準となる前記第一主配置線と当該基準となる前記第一主配置線からの距離が近い位置に配置された前記第一副配置線との周方向間には、前記マスキング部が形成されておらず、
隣り合う２つの前記第一同心配置円のそれぞれの間において、当該２つの前記第一同心配置円と前記第一主配置線との２つの交点の各間、及び、当該２つの前記第一同心配置円と前記第一副配置線との２つの交点の各間には、前記マスキング部が形成されておらず、
隣接する前記第一同心配置円の間のそれぞれに配置され、隣接する前記第一同心配置円の間を幅方向に等間隔で分割するように前記回転軸と同心に仮想的に描かれた複数の線を第二同心配置円とし、
隣接する前記第一主配置線の間のそれぞれに配置され、隣接する前記第一主配置線の間を円周方向に等間隔に分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれた複数の線を、複数の第二主配置線とし、
隣り合う２つの前記第二主配置線の間のそれぞれに配置され、前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、隣り合う２つの前記第二主配置線のうち周方向一方側の基準となる前記第二主配置線からの距離が近い位置にそれぞれ配置された複数の線を、複数の第二副配置線とし、
前記複数の第二同心配置円と前記複数の第二主配置線との各交点、及び、前記複数の第二同心配置円と前記複数の第二副配置線との各交点に、前記複数のマスキング部が形成されている、
電着ホイール。 A base metal formed in a disk shape and driven to rotate about the rotation axis;
A superabrasive grain layer formed by fixing a plurality of superabrasive grains by plating on a belt-like part extending at a predetermined width to the outer periphery of the base metal;
In the electrodeposition wheel with
A plurality of concentric circles virtually drawn concentrically with the rotation axis so as to divide the belt-like portion at equal intervals in the width direction, and a plurality of first concentric arrangement circles,
A plurality of lines virtually drawn from one end to the other end in the width direction of the strip portion so as to divide the strip portion at equal intervals in the circumferential direction, a plurality of first main arrangement lines,
Arranged between each of the two adjacent first main arrangement lines, and virtually divided from one end to the other end in the width direction of the strip portion so as to divide the strip portion at equal intervals in the circumferential direction. A plurality of lines that are drawn and arranged at positions close to the distance from the first main arrangement line that is the reference on one side in the circumferential direction among the two adjacent first main arrangement lines A placement line,
Gel-like adhesion to each intersection of the plurality of first concentric arrangement circles and the plurality of first main arrangement lines, and to each intersection of the plurality of first concentric arrangement circles and the plurality of first sub arrangement lines A plurality of masking portions in which the superabrasive grains are not electrodeposited are formed by the agent being spotted larger than the superabrasive grains by a dispenser,
The masking portion is formed between circumferential directions of the first main arrangement line serving as the reference and the first sub arrangement line disposed at a position where the distance from the first main arrangement line serving as the reference is short. Not
Between each of the two first concentric circles adjacent to each other, between each of the two intersections of the two first concentric circles and the first main arrangement line, and the two first concentric circles Between each of the two intersections of the arrangement circle and the first sub arrangement line, the masking portion is not formed,
Plurally drawn concentrically with the rotation axis so as to be respectively arranged between the adjacent first concentric circles and divided between the adjacent first concentric circles at equal intervals in the width direction. Is the second concentric circle,
It is arrange | positioned at each between adjacent said 1st main arrangement | positioning lines, and is divided from the one end of the said strip | belt-shaped part to the other end so that it may divide | segment between the said 1st main arrangement | positioning lines at equal intervals in the circumferential direction. A plurality of lines virtually drawn toward the second as a plurality of second main arrangement lines,
Virtually arranged from one end to the other end in the width direction of the band-shaped portion so as to be divided between the two adjacent second main arrangement lines, and to divide the band-shaped portion at equal intervals in the circumferential direction. A plurality of lines that are drawn and arranged at positions where the distance from the second main arrangement line that is the reference on one side in the circumferential direction among the two adjacent second main arrangement lines is close to each other. A placement line,
The intersections of the plurality of second concentric arrangement circles and the plurality of second main arrangement lines, and the intersections of the plurality of second concentric arrangement circles and the plurality of second sub arrangement lines, Masking part is formed,
Electrodeposition wheel. 前記第一主配置線、前記第一副配置線、前記第二主配置線及び前記第二副配置線は、半径方向に対して同一角度で傾斜した直線である請求項１に記載の電着ホイール。 It said first main array lines, the first sub-array lines, the second main array lines and the second sub-arrangement line, electrodeposition of claim 1 is a straight line which is inclined at the same angle to the radial direction wheel. 前記第一副配置線と前記第一副配置線に隣り合う前記第二主配置線との間にそれぞれ配置され、前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、前記第一副配置線に近い位置にそれぞれ配置された複数の線を、複数の第一補助配置線とし、
前記第二副配置線と前記第二副配置線に隣り合う前記第一主配置線との間にそれぞれ配置され、前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、前記第二副配置線に近い位置にそれぞれ配置された複数の線を、複数の第二補助配置線とし、
前記複数の第一同心配置円と前記複数の第一補助配置線との交点、前記複数の第二同心配置円と前記複数の第二補助配置線との交点には、前記超砥粒層の摩耗が均一になるように、前記マスキング部が夫々形成されている請求項１又は２に記載の電着ホイール。 It is respectively arranged between the first sub arrangement line and the second main arrangement line adjacent to the first sub arrangement line, and is virtually drawn from one end to the other end in the width direction of the band-shaped portion, A plurality of lines respectively arranged at positions close to the first sub arrangement line, a plurality of first auxiliary arrangement lines,
It is respectively arranged between the second sub arrangement line and the first main arrangement line adjacent to the second sub arrangement line, and is virtually drawn from one end to the other end in the width direction of the band-shaped portion, A plurality of lines respectively arranged at positions close to the second sub arrangement line are a plurality of second auxiliary arrangement lines,
Said plurality of first concentric array circles and the plurality of intersections of the first auxiliary routing lines, said plurality and said second plurality of concentric array circles the intersection of the second auxiliary routing lines, the superabrasive layer as wear is uniform electrodeposited wheel according to claim 1 or 2, wherein the masking unit are respectively formed. 前記電着ホイールは、工作物を研削する砥石である請求項１乃至３のいずれか１項に記載の電着ホイール。 The electrodeposition wheel according to any one of claims 1 to 3 , wherein the electrodeposition wheel is a grindstone for grinding a workpiece. 前記電着ホイールは、砥石をドレッシングするドレッサである請求項１乃至３のいずれか１項に記載の電着ホイール。 The electrodeposition wheel according to any one of claims 1 to 3 , wherein the electrodeposition wheel is a dresser for dressing a grindstone. 円盤状に形成され回転軸線回りに回転駆動される台金と、前記台金の外周部に所定幅で延在する帯状部に複数の超砥粒がめっきにより固着されることで形成される超砥粒層と、を備えた電着ホイールの製造方法であって、
前記帯状部を幅方向に等間隔で分割するように前記回転軸と同心に仮想的に描かれた複数の同心円を、複数の第一同心配置円とし、前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれた複数の線を、複数の第一主配置線とし、隣り合う２つの前記第一主配置線のそれぞれの間に配置され、前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、隣り合う２つの前記第一主配置線のうち周方向一方側の基準となる前記第一主配置線からの距離が近い位置にそれぞれ配置された複数の線を、複数の第一副配置線とし、前記複数の第一同心配置円と前記複数の第一主配置線との各交点、及び、前記複数の第一同心配置円と前記複数の第一副配置線との各交点に、ジェル状接着剤がディスペンサにより前記超砥粒より大きく点着されたことにより前記超砥粒が電着されていない複数のマスキング部が形成されており、
前記基準となる前記第一主配置線と当該基準となる前記第一主配置線からの距離が近い位置に配置された前記第一副配置線との周方向間には、前記マスキング部が形成されておらず、隣り合う２つの前記第一同心配置円のそれぞれの間において、当該２つの前記第一同心配置円と前記第一主配置線との２つの交点の各間、及び、当該２つの前記第一同心配置円と前記第一副配置線との２つの交点の各間には、前記マスキング部が形成されておらず、
隣接する前記第一同心配置円の間のそれぞれに配置され、隣接する前記第一同心配置円の間を幅方向に等間隔で分割するように前記回転軸と同心に仮想的に描かれた複数の線を第二同心配置円とし、隣接する前記第一主配置線の間のそれぞれに配置され、隣接する前記第一主配置線の間を円周方向に等間隔に分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれた複数の線を、複数の第二主配置線とし、隣り合う２つの前記第二主配置線の間のそれぞれに配置され、前記帯状部を円周方向に等間隔で分割するように前記帯状部の幅方向の一端から他端に向かって仮想的に描かれ、隣り合う２つの前記第二主配置線のうち周方向一方側の基準となる前記第二主配置線からの距離が近い位置にそれぞれ配置された複数の線を、複数の第二副配置線とし、前記複数の第二同心配置円と前記複数の第二主配置線との各交点、及び、前記複数の第二同心配置円と前記複数の第二副配置線との各交点に、前記複数のマスキング部が形成されている、マスキング部形成工程と、
前記複数の超砥粒を、前記マスキング部を除いた前記帯状部に、電着めっきにより固着する電着めっき工程と、を備え、
前記マスキング部形成工程において、前記マスキング部の総投影面積を、前記超砥粒層の総投影面積の５〜２０パーセントに配置することを特徴とする電着ホイールの製造方法。 A base metal that is formed in a disk shape and is driven to rotate around a rotation axis, and a super-abrasion formed by fixing a plurality of superabrasive grains by plating on a belt-like part extending at a predetermined width around the base metal. A method for producing an electrodeposition wheel comprising an abrasive layer,
A plurality of concentric circles virtually drawn concentrically with the rotation axis so as to divide the belt-like portion at equal intervals in the width direction are a plurality of first concentric circles, and the belt-like portions are equally spaced in the circumferential direction. A plurality of lines virtually drawn from one end to the other end in the width direction of the band-shaped portion so as to be divided at a plurality of first main arrangement lines, and two adjacent first main arrangement lines The two first main parts that are arranged between each other and are virtually drawn from one end to the other end in the width direction of the strips so as to divide the strips at equal intervals in the circumferential direction. Among the arrangement lines, a plurality of lines arranged at positions close to the first main arrangement line as a reference on one side in the circumferential direction are set as a plurality of first sub arrangement lines, and the plurality of first concentric arrangements Each intersection of a circle and the plurality of first main arrangement lines, and the plurality of first concentric arrangement circles and the plurality Each intersection of the first sub-array lines, gelled adhesive is a plurality of masking portions where the superabrasive is not electrodeposited by which is larger spotted than superabrasive formed by a dispenser,
The masking portion is formed between circumferential directions of the first main arrangement line serving as the reference and the first sub arrangement line disposed at a position where the distance from the first main arrangement line serving as the reference is short. Not between each of the two first concentric arrangement circles adjacent to each other, between each of the two intersections of the two first concentric arrangement circles and the first main arrangement line, and the two Between each of the two intersections of the first concentric arrangement circle and the first sub arrangement line, the masking portion is not formed,
Plurally drawn concentrically with the rotation axis so as to be respectively arranged between the adjacent first concentric circles and divided between the adjacent first concentric circles at equal intervals in the width direction. The second concentric circles are arranged between the adjacent first main arrangement lines, and the band-like shape is divided between the adjacent first main arrangement lines at equal intervals in the circumferential direction. A plurality of lines virtually drawn from one end to the other end in the width direction of the part, a plurality of second main arrangement lines, arranged between each of the two adjacent second main arrangement lines, One of the two second main arrangement lines adjacent to each other is virtually drawn from one end to the other end in the width direction of the strip portion so as to divide the strip portion at equal intervals in the circumferential direction. A plurality of lines arranged at positions close to the second main arrangement line as a reference on the side , A plurality of second sub-arrangement lines, intersections of the plurality of second concentric arrangement circles and the plurality of second main arrangement lines, and the plurality of second concentric arrangement circles and the plurality of second sub-arrangements A plurality of masking portions are formed at each intersection with a line, a masking portion forming step,
An electrodeposition plating step for fixing the plurality of superabrasive grains to the belt-like portion excluding the masking portion by electrodeposition plating,
In the masking part forming step, the total projected area of the masking part is arranged in 5 to 20 percent of the total projected area of the superabrasive grain layer.
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