JP2014102926A5 - - Google Patents
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- Publication number
- JP2014102926A5 JP2014102926A5 JP2012252989A JP2012252989A JP2014102926A5 JP 2014102926 A5 JP2014102926 A5 JP 2014102926A5 JP 2012252989 A JP2012252989 A JP 2012252989A JP 2012252989 A JP2012252989 A JP 2012252989A JP 2014102926 A5 JP2014102926 A5 JP 2014102926A5
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- target
- support substrate
- heat dissipation
- target according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000758 substrate Substances 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 230000017525 heat dissipation Effects 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 claims description 2
- 239000010432 diamond Substances 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 claims 3
- 229910002804 graphite Inorganic materials 0.000 claims 3
- 239000010439 graphite Substances 0.000 claims 3
- 238000001514 detection method Methods 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N Silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012252989A JP6153314B2 (ja) | 2012-11-19 | 2012-11-19 | Ｘ線透過型ターゲット及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012252989A JP6153314B2 (ja) | 2012-11-19 | 2012-11-19 | Ｘ線透過型ターゲット及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014102926A JP2014102926A (ja) | 2014-06-05 |
| JP2014102926A5 true JP2014102926A5 (es) | 2016-01-14 |
| JP6153314B2 JP6153314B2 (ja) | 2017-06-28 |
Family
ID=51025287
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012252989A Active JP6153314B2 (ja) | 2012-11-19 | 2012-11-19 | Ｘ線透過型ターゲット及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6153314B2 (es) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6468821B2 (ja) * | 2014-11-28 | 2019-02-13 | キヤノン株式会社 | Ｘ線発生管、ｘ線発生装置およびｘ線撮影システム |
| JP6867224B2 (ja) | 2017-04-28 | 2021-04-28 | 浜松ホトニクス株式会社 | Ｘ線管及びｘ線発生装置 |
| US20200194212A1 (en) * | 2018-12-13 | 2020-06-18 | General Electric Company | Multilayer x-ray source target with stress relieving layer |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3950389B2 (ja) * | 2002-08-14 | 2007-08-01 | 浜松ホトニクス株式会社 | Ｘ線管 |
| JP5787556B2 (ja) * | 2011-03-08 | 2015-09-30 | キヤノン株式会社 | Ｘ線発生装置及びｘ線撮影装置 |
| JP2012212562A (ja) * | 2011-03-31 | 2012-11-01 | Kobe Steel Ltd | Ｘ線発生用ターゲットならびにそれを備えたｘ線発生装置、およびｘ線発生用ターゲットの製造方法 |
-
2012
- 2012-11-19 JP JP2012252989A patent/JP6153314B2/ja active Active
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