JP2014088292A5 - - Google Patents
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- Publication number
- JP2014088292A5 JP2014088292A5 JP2012239813A JP2012239813A JP2014088292A5 JP 2014088292 A5 JP2014088292 A5 JP 2014088292A5 JP 2012239813 A JP2012239813 A JP 2012239813A JP 2012239813 A JP2012239813 A JP 2012239813A JP 2014088292 A5 JP2014088292 A5 JP 2014088292A5
- Authority
- JP
- Japan
- Prior art keywords
- powder
- silicon oxide
- silicon
- oxide powder
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 67
- 239000000843 powder Substances 0.000 claims description 42
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 38
- 210000002381 Plasma Anatomy 0.000 claims description 15
- 239000012535 impurity Substances 0.000 claims description 12
- 235000012239 silicon dioxide Nutrition 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 11
- 239000011863 silicon-based powder Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 239000000377 silicon dioxide Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 5
- 239000002994 raw material Substances 0.000 claims description 5
- 229910020230 SIOx Inorganic materials 0.000 claims description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 2
- 229910021485 fumed silica Inorganic materials 0.000 claims 3
- 238000001035 drying Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000007790 scraping Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium Ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000007773 negative electrode material Substances 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 229910052904 quartz Inorganic materials 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004429 atoms Chemical group 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium(0) Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000002427 irreversible Effects 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001376 precipitating Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012239813A JP5994573B2 (ja) | 2012-10-31 | 2012-10-31 | 酸化珪素粉末の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012239813A JP5994573B2 (ja) | 2012-10-31 | 2012-10-31 | 酸化珪素粉末の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014088292A JP2014088292A (ja) | 2014-05-15 |
| JP2014088292A5 true JP2014088292A5 (zh) | 2016-04-28 |
| JP5994573B2 JP5994573B2 (ja) | 2016-09-21 |
Family
ID=50790561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012239813A Expired - Fee Related JP5994573B2 (ja) | 2012-10-31 | 2012-10-31 | 酸化珪素粉末の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5994573B2 (zh) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015015795A1 (ja) * | 2013-07-30 | 2015-02-05 | 東京印刷機材トレーディング株式会社 | ＳｉＯＸ粉末製造法及びＳｉＯＸ粉末製造装置 |
| JP2017061411A (ja) * | 2016-12-01 | 2017-03-30 | 株式会社日清製粉グループ本社 | 不定比酸化物粒子の製造方法 |
| SG11202006013VA (en) * | 2018-01-26 | 2020-07-29 | Denka Company Ltd | Amorphous silica powder, production method therefor, and use thereof |
| WO2023074217A1 (ja) * | 2021-10-27 | 2023-05-04 | 三菱ケミカル株式会社 | 酸化珪素粒子及びその製造方法と、粒子及びその製造方法と、二次電池及びその製造方法 |
| CN114349011B (zh) * | 2022-01-14 | 2023-04-11 | 宁波广新纳米材料有限公司 | 一种纳米氧化亚硅粉体的制备方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4900573B2 (ja) * | 2006-04-24 | 2012-03-21 | 信越化学工業株式会社 | 酸化珪素粉末の製造方法 |
| JP2011079724A (ja) * | 2009-10-09 | 2011-04-21 | Osaka Titanium Technologies Co Ltd | ＳｉＯｘ（ｘ＜１）の製造方法 |
| JP5362614B2 (ja) * | 2010-02-16 | 2013-12-11 | 日清エンジニアリング株式会社 | 一酸化珪素微粒子の製造方法および一酸化珪素微粒子 |
-
2012
- 2012-10-31 JP JP2012239813A patent/JP5994573B2/ja not_active Expired - Fee Related
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