JP2014022378A5 - - Google Patents

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Publication number
JP2014022378A5
JP2014022378A5 JP2012156145A JP2012156145A JP2014022378A5 JP 2014022378 A5 JP2014022378 A5 JP 2014022378A5 JP 2012156145 A JP2012156145 A JP 2012156145A JP 2012156145 A JP2012156145 A JP 2012156145A JP 2014022378 A5 JP2014022378 A5 JP 2014022378A5
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JP
Japan
Prior art keywords
imprint apparatus
shape
substrate
gas
holding
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Application number
JP2012156145A
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English (en)
Japanese (ja)
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JP5995567B2 (ja
JP2014022378A (ja
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Priority to JP2012156145A priority Critical patent/JP5995567B2/ja
Priority claimed from JP2012156145A external-priority patent/JP5995567B2/ja
Publication of JP2014022378A publication Critical patent/JP2014022378A/ja
Publication of JP2014022378A5 publication Critical patent/JP2014022378A5/ja
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Publication of JP5995567B2 publication Critical patent/JP5995567B2/ja
Expired - Fee Related legal-status Critical Current
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JP2012156145A 2012-07-12 2012-07-12 インプリント装置、それを用いた物品の製造方法 Expired - Fee Related JP5995567B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012156145A JP5995567B2 (ja) 2012-07-12 2012-07-12 インプリント装置、それを用いた物品の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012156145A JP5995567B2 (ja) 2012-07-12 2012-07-12 インプリント装置、それを用いた物品の製造方法

Publications (3)

Publication Number Publication Date
JP2014022378A JP2014022378A (ja) 2014-02-03
JP2014022378A5 true JP2014022378A5 (https=) 2015-08-27
JP5995567B2 JP5995567B2 (ja) 2016-09-21

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JP2012156145A Expired - Fee Related JP5995567B2 (ja) 2012-07-12 2012-07-12 インプリント装置、それを用いた物品の製造方法

Country Status (1)

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JP (1) JP5995567B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6700794B2 (ja) * 2015-04-03 2020-05-27 キヤノン株式会社 インプリント材吐出装置
KR102204149B1 (ko) 2016-07-01 2021-01-18 에이에스엠엘 네델란즈 비.브이. 스테이지 시스템, 리소그래피 장치, 위치설정 방법 및 디바이스 제조 방법
JP6983091B2 (ja) * 2018-03-19 2021-12-17 キヤノン株式会社 インプリント装置、および、物品の製造方法
JP2020043160A (ja) 2018-09-07 2020-03-19 キオクシア株式会社 インプリント装置、インプリント方法、及び半導体装置の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0846017A (ja) * 1994-07-29 1996-02-16 Sony Corp 基板の位置決め装置および位置決め方法
JP3846092B2 (ja) * 1999-02-24 2006-11-15 松下電器産業株式会社 プラズマ処理装置および方法
ITMI20021365A1 (it) * 2002-06-21 2003-12-22 Ausimont Spa Processo per preparare acilfluoruri
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
JP4493638B2 (ja) * 2006-10-12 2010-06-30 株式会社アルバック 真空処理方法
JP2008258389A (ja) * 2007-04-04 2008-10-23 Matsushita Electric Ind Co Ltd 基板処理装置の異常検出方法および基板処理装置
JP5386795B2 (ja) * 2007-05-16 2014-01-15 株式会社ニコン 接合装置、接合方法
KR101232234B1 (ko) * 2007-06-21 2013-02-12 에이에스엠엘 네델란즈 비.브이. 클램핑 디바이스 및 대상물 로딩 방법
JP5003545B2 (ja) * 2008-03-18 2012-08-15 富士通株式会社 磁気記録媒体の製造方法および製造装置
CA3093427A1 (en) * 2008-05-07 2009-11-12 The Chemours Company Fc, Llc Compositions comprising 1,1,1,2,3-pentafluoropropane or 2,3,3,3-tetrafluoropropene
NL2003380A (en) * 2008-10-17 2010-04-20 Asml Netherlands Bv Imprint lithography apparatus and method.
JP5669466B2 (ja) * 2010-07-12 2015-02-12 キヤノン株式会社 保持装置、インプリント装置及び物品の製造方法
US9310700B2 (en) * 2010-08-13 2016-04-12 Asml Netherlands B.V. Lithography method and apparatus
JP5395769B2 (ja) * 2010-09-13 2014-01-22 株式会社東芝 テンプレートチャック、インプリント装置、及びパターン形成方法

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