JP2014022378A5

JP2014022378A5 -

Info

Publication number: JP2014022378A5
Application number: JP2012156145A
Authority: JP
Filing date: 2012-07-12
Publication date: 2015-08-27
Anticipated expiration: 2032-07-12

Description

本発明は、例えば、重ね合わせ精度の点で有利なインプリント装置を提供することを目的とする。
The present invention, if example embodiment, an object to provide an advantageous imprint apparatus in terms of I heavy alignment accuracy.

上記課題を解決するために、本発明は、基板上に形成されているパターンの上にパターン形成を行うインプリント装置であって、基板の裏面に接触する接触面を有し、基板を吸着して保持する保持手段と、裏面と接触面との間に無極性ガスを供給する供給手段と、前記パターンの形状を変化させる変形手段と、を備え、保持手段により裏面を吸着し、かつ、供給手段により裏面と接触面との間に無極性ガスを供給して、変形手段により形状を変化させることを特徴とする。
In order to solve the above problems, the present invention provides an imprint apparatus for performing path coater emission type formed on the Rupa terpolymers emissions are formed on the substrate and having a contact surface in contact with the back surface of the substrate , lining and holding means for holding a substrate to adsorb a supply means for supplying a non-polar gas between the back surface and the contact surface, and a deforming means for changing the shape of the pattern, the holding means adsorbing surface, and, by supplying a non-polar gas between the back surface and the contact surface by the supply means, to change the shape by deformation means, wherein the Turkey.

本発明によれば、例えば、重ね合わせ精度の点で有利なインプリント装置を提供することができる。
According to the present invention, for example, it is possible to provide an advantageous imprint apparatus in terms of precision fit it heavy.

Claims

Pas coater emission type formed on the Rupa terpolymers emissions have been formed on a substrate an imprint apparatus which performs,
Has a contact surface for contacting a back surface of the substrate, a holding means for holding a substrate by adsorb,
A supply means for supplying a non-polar gas between the front Kiura surface and said contact surface,
Deformation means for changing the shape of the pattern,
The adsorbed before Kiura surface by the holding means, or One supplies the nonpolar gas between said contact surface and prior Kiura surface by said supply means, Ru is change the shape by the deforming means imprint and wherein a call.

The imprint apparatus according to claim 1, wherein the nonpolar gas is a rare gas.

The imprint apparatus according to claim 1, wherein the nonpolar gas is a perfluoro-based gas.

It said supply means, the imprint apparatus according to any one of the claims 1 supplies in addition to the non-polar gas air 3.

The proportion of nonpolar gases, when giving change the shape, imprint apparatus according to claim 4, wherein the multi Ikoto Ri by the ratio of the air.

The proportion of nonpolar gases, after allowed to change at least the shape, imprint apparatus according to claim 4 or claim 5, characterized in that not less Ri by the ratio of the air.

Said supply means, before a plurality of areas definitive in Kiura surface Niso respectively independently a according to any one of claims 1 to 6, characterized in that to supply the non-polar gas imprint apparatus.

The deforming means, the imprint apparatus according to any one of claims 1 to 7, characterized in that to change the shape by heating.

The deforming means, the imprint apparatus according to any one of claims 1 to 7, characterized in that to change the shape by obtaining pressure force to the substrate.

Imprinting device as claimed in any one of claims 1 to 9, characterized in that it comprises a mold deforming means for deforming the mold by a force obtaining pressurized on the type of Me other before Kipa turn formed.

An imprint apparatus for performing pattern formation on a pattern formed on a substrate,
A holding means for contacting and holding the substrate;
Supply means for supplying a rare gas between the back surface and the contact surface;
Deformation means for changing the shape of the pattern,
An imprint apparatus characterized by adsorbing the back surface by the holding means, supplying the rare gas between the back surface and the contact surface by the supply means, and changing the shape by the deformation means. .

An imprint apparatus for performing pattern formation on a pattern formed on a substrate,
A holding means for contacting and holding the substrate;
Supply means for supplying perfluoro-based gas between the back surface and the contact surface;
Deformation means for changing the shape of the pattern,
The back surface is adsorbed by the holding means, the perfluoro-based gas is supplied between the back surface and the contact surface by the supply means, and the shape is changed by the deformation means. Printing device.

And performing the path coater emission type formed on a substrate using an imprint apparatus according to any one of claims 1 to 12,
A step of processing the substrate made of the pattern shape formed in the step,
A method for producing an article comprising: