JP2014010459A5 - - Google Patents

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Publication number
JP2014010459A5
JP2014010459A5 JP2013136268A JP2013136268A JP2014010459A5 JP 2014010459 A5 JP2014010459 A5 JP 2014010459A5 JP 2013136268 A JP2013136268 A JP 2013136268A JP 2013136268 A JP2013136268 A JP 2013136268A JP 2014010459 A5 JP2014010459 A5 JP 2014010459A5
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JP
Japan
Prior art keywords
binary
transmission
pattern
filter
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013136268A
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English (en)
Japanese (ja)
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JP2014010459A (ja
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Publication date
Priority claimed from US13/536,625 external-priority patent/US8984453B2/en
Application filed filed Critical
Publication of JP2014010459A publication Critical patent/JP2014010459A/ja
Publication of JP2014010459A5 publication Critical patent/JP2014010459A5/ja
Pending legal-status Critical Current

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JP2013136268A 2012-06-28 2013-06-28 バイナリ空間フィルタを作成する方法及びシステム Pending JP2014010459A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/536,625 2012-06-28
US13/536,625 US8984453B2 (en) 2012-06-28 2012-06-28 Method and system for creation of binary spatial filters

Publications (2)

Publication Number Publication Date
JP2014010459A JP2014010459A (ja) 2014-01-20
JP2014010459A5 true JP2014010459A5 (enExample) 2016-08-12

Family

ID=48692381

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013136268A Pending JP2014010459A (ja) 2012-06-28 2013-06-28 バイナリ空間フィルタを作成する方法及びシステム

Country Status (3)

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US (2) US8984453B2 (enExample)
EP (1) EP2680072B1 (enExample)
JP (1) JP2014010459A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8984453B2 (en) 2012-06-28 2015-03-17 Applied Materials Israel, Ltd. Method and system for creation of binary spatial filters
US10157186B2 (en) * 2013-07-18 2018-12-18 Microsoft Technology Licensing, Llc Data handling
US9664907B2 (en) * 2014-07-21 2017-05-30 Applied Materials Israel Ltd. Optical element for spatial beam shaping
US9696265B2 (en) * 2014-11-04 2017-07-04 Exnodes Inc. Computational wafer inspection filter design
WO2022147670A1 (en) * 2021-01-06 2022-07-14 Jiangsu Jitri Micro-Nano Automation Institute Co., Ltd Automatic exposure selection method for high dynamic range 3d optical measurements

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4521075A (en) 1983-03-07 1985-06-04 Obenschain Stephen P Controllable spatial incoherence echelon for laser
US4926489A (en) 1983-03-11 1990-05-15 Kla Instruments Corporation Reticle inspection system
US4619508A (en) 1984-04-28 1986-10-28 Nippon Kogaku K. K. Illumination optical arrangement
US4805123B1 (en) 1986-07-14 1998-10-13 Kla Instr Corp Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems
IL125217A (en) * 1990-12-04 1999-10-28 Orbot Instr Ltd Apparatus and method for microscopic inspection of articles
US5326659A (en) 1992-03-05 1994-07-05 Regents Of The University Of California Method for making masks
US5864394A (en) * 1994-06-20 1999-01-26 Kla-Tencor Corporation Surface inspection system
US6268093B1 (en) * 1999-10-13 2001-07-31 Applied Materials, Inc. Method for reticle inspection using aerial imaging
US6369888B1 (en) 1999-11-17 2002-04-09 Applied Materials, Inc. Method and apparatus for article inspection including speckle reduction
JP2001318326A (ja) * 2000-05-12 2001-11-16 Canon Inc 光学素子、及び該光学素子によって構成された二次元画像表示素子
US6563566B2 (en) 2001-01-29 2003-05-13 International Business Machines Corporation System and method for printing semiconductor patterns using an optimized illumination and reticle
US7321605B2 (en) 2004-05-24 2008-01-22 Asml Holding, N.V. Helical optical pulse stretcher
US7084959B2 (en) 2004-05-27 2006-08-01 Asml Holding N.V. Compact pulse stretcher
JP4241632B2 (ja) * 2005-01-25 2009-03-18 富士フイルム株式会社 色版作成用閾値マトリクスの作成方法、カラー画像の再現方法、カラー画像分版作成装置及び閾値マトリクス
DE102009041405B4 (de) * 2009-09-14 2020-08-20 Carl Zeiss Smt Gmbh Maskeninspektionsmikroskop mit variabler Beleuchtungseinstellung
US8351037B2 (en) 2010-07-12 2013-01-08 International Business Machines Corporation Method to match exposure tools using a programmable illuminator
US8984453B2 (en) 2012-06-28 2015-03-17 Applied Materials Israel, Ltd. Method and system for creation of binary spatial filters

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