JP2014010459A - バイナリ空間フィルタを作成する方法及びシステム - Google Patents

バイナリ空間フィルタを作成する方法及びシステム Download PDF

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Publication number
JP2014010459A
JP2014010459A JP2013136268A JP2013136268A JP2014010459A JP 2014010459 A JP2014010459 A JP 2014010459A JP 2013136268 A JP2013136268 A JP 2013136268A JP 2013136268 A JP2013136268 A JP 2013136268A JP 2014010459 A JP2014010459 A JP 2014010459A
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Prior art keywords
binary
filter
pattern
transmission
blob
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JP2013136268A
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English (en)
Japanese (ja)
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JP2014010459A5 (enExample
Inventor
Mangan Shmuel
マンガン シュムエル
Sagiv Amir
サギフ アミル
Abramson Mariano
アブラムソン マリアノ
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Applied Materials Israel Ltd
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Applied Materials Israel Ltd
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Application filed by Applied Materials Israel Ltd filed Critical Applied Materials Israel Ltd
Publication of JP2014010459A publication Critical patent/JP2014010459A/ja
Publication of JP2014010459A5 publication Critical patent/JP2014010459A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2013136268A 2012-06-28 2013-06-28 バイナリ空間フィルタを作成する方法及びシステム Pending JP2014010459A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/536,625 2012-06-28
US13/536,625 US8984453B2 (en) 2012-06-28 2012-06-28 Method and system for creation of binary spatial filters

Publications (2)

Publication Number Publication Date
JP2014010459A true JP2014010459A (ja) 2014-01-20
JP2014010459A5 JP2014010459A5 (enExample) 2016-08-12

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013136268A Pending JP2014010459A (ja) 2012-06-28 2013-06-28 バイナリ空間フィルタを作成する方法及びシステム

Country Status (3)

Country Link
US (2) US8984453B2 (enExample)
EP (1) EP2680072B1 (enExample)
JP (1) JP2014010459A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8984453B2 (en) 2012-06-28 2015-03-17 Applied Materials Israel, Ltd. Method and system for creation of binary spatial filters
US10157186B2 (en) * 2013-07-18 2018-12-18 Microsoft Technology Licensing, Llc Data handling
US9664907B2 (en) * 2014-07-21 2017-05-30 Applied Materials Israel Ltd. Optical element for spatial beam shaping
US9696265B2 (en) * 2014-11-04 2017-07-04 Exnodes Inc. Computational wafer inspection filter design
WO2022147670A1 (en) * 2021-01-06 2022-07-14 Jiangsu Jitri Micro-Nano Automation Institute Co., Ltd Automatic exposure selection method for high dynamic range 3d optical measurements

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235853A (ja) * 1999-10-13 2001-08-31 Applied Materials Inc 空中画像を使用するレチクル検査のための方法及び装置
JP2001318326A (ja) * 2000-05-12 2001-11-16 Canon Inc 光学素子、及び該光学素子によって構成された二次元画像表示素子
WO2011029535A2 (en) * 2009-09-11 2011-03-17 Carl Zeiss Sms Gmbh Mask inspection microscope with variable illumination setting

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4521075A (en) 1983-03-07 1985-06-04 Obenschain Stephen P Controllable spatial incoherence echelon for laser
US4926489A (en) 1983-03-11 1990-05-15 Kla Instruments Corporation Reticle inspection system
US4619508A (en) 1984-04-28 1986-10-28 Nippon Kogaku K. K. Illumination optical arrangement
US4805123B1 (en) 1986-07-14 1998-10-13 Kla Instr Corp Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems
IL125217A (en) * 1990-12-04 1999-10-28 Orbot Instr Ltd Apparatus and method for microscopic inspection of articles
US5326659A (en) 1992-03-05 1994-07-05 Regents Of The University Of California Method for making masks
US5864394A (en) * 1994-06-20 1999-01-26 Kla-Tencor Corporation Surface inspection system
US6369888B1 (en) 1999-11-17 2002-04-09 Applied Materials, Inc. Method and apparatus for article inspection including speckle reduction
US6563566B2 (en) 2001-01-29 2003-05-13 International Business Machines Corporation System and method for printing semiconductor patterns using an optimized illumination and reticle
US7321605B2 (en) 2004-05-24 2008-01-22 Asml Holding, N.V. Helical optical pulse stretcher
US7084959B2 (en) 2004-05-27 2006-08-01 Asml Holding N.V. Compact pulse stretcher
JP4241632B2 (ja) * 2005-01-25 2009-03-18 富士フイルム株式会社 色版作成用閾値マトリクスの作成方法、カラー画像の再現方法、カラー画像分版作成装置及び閾値マトリクス
US8351037B2 (en) 2010-07-12 2013-01-08 International Business Machines Corporation Method to match exposure tools using a programmable illuminator
US8984453B2 (en) 2012-06-28 2015-03-17 Applied Materials Israel, Ltd. Method and system for creation of binary spatial filters

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235853A (ja) * 1999-10-13 2001-08-31 Applied Materials Inc 空中画像を使用するレチクル検査のための方法及び装置
JP2001318326A (ja) * 2000-05-12 2001-11-16 Canon Inc 光学素子、及び該光学素子によって構成された二次元画像表示素子
WO2011029535A2 (en) * 2009-09-11 2011-03-17 Carl Zeiss Sms Gmbh Mask inspection microscope with variable illumination setting

Also Published As

Publication number Publication date
EP2680072B1 (en) 2019-12-25
US20150233842A1 (en) 2015-08-20
US9470637B2 (en) 2016-10-18
US20140007025A1 (en) 2014-01-02
US8984453B2 (en) 2015-03-17
EP2680072A1 (en) 2014-01-01

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