JP2013544030A5 - - Google Patents

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Publication number
JP2013544030A5
JP2013544030A5 JP2013538224A JP2013538224A JP2013544030A5 JP 2013544030 A5 JP2013544030 A5 JP 2013544030A5 JP 2013538224 A JP2013538224 A JP 2013538224A JP 2013538224 A JP2013538224 A JP 2013538224A JP 2013544030 A5 JP2013544030 A5 JP 2013544030A5
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JP
Japan
Prior art keywords
aperture array
array element
aperture
plate
regions
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JP2013538224A
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English (en)
Japanese (ja)
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JP6133212B2 (ja
JP2013544030A (ja
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Priority claimed from PCT/EP2011/070030 external-priority patent/WO2012065941A1/en
Publication of JP2013544030A publication Critical patent/JP2013544030A/ja
Publication of JP2013544030A5 publication Critical patent/JP2013544030A5/ja
Application granted granted Critical
Publication of JP6133212B2 publication Critical patent/JP6133212B2/ja
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JP2013538224A 2010-11-13 2011-11-14 アパーチャアレイ冷却部を備えた荷電粒子リソグラフィシステム Active JP6133212B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US41339610P 2010-11-13 2010-11-13
US61/413,396 2010-11-13
US41520010P 2010-11-18 2010-11-18
US61/415,200 2010-11-18
US42171710P 2010-12-10 2010-12-10
US61/421,717 2010-12-10
PCT/EP2011/070030 WO2012065941A1 (en) 2010-11-13 2011-11-14 Charged particle lithography system with aperture array cooling

Publications (3)

Publication Number Publication Date
JP2013544030A JP2013544030A (ja) 2013-12-09
JP2013544030A5 true JP2013544030A5 (https=) 2015-01-15
JP6133212B2 JP6133212B2 (ja) 2017-05-24

Family

ID=45065871

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013538224A Active JP6133212B2 (ja) 2010-11-13 2011-11-14 アパーチャアレイ冷却部を備えた荷電粒子リソグラフィシステム

Country Status (6)

Country Link
US (1) US8558196B2 (https=)
EP (1) EP2638560B1 (https=)
JP (1) JP6133212B2 (https=)
KR (1) KR101755577B1 (https=)
TW (1) TWI562183B (https=)
WO (1) WO2012065941A1 (https=)

Families Citing this family (19)

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US8586949B2 (en) * 2010-11-13 2013-11-19 Mapper Lithography Ip B.V. Charged particle lithography system with intermediate chamber
NL2007604C2 (en) * 2011-10-14 2013-05-01 Mapper Lithography Ip Bv Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams.
KR101945964B1 (ko) * 2012-05-14 2019-02-11 마퍼 리쏘그라피 아이피 비.브이. 하전 입자 다중-빔렛 리소그래피 시스템 및 냉각 장치 제조 방법
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator
US9724553B2 (en) * 2013-03-15 2017-08-08 Arqex Outdoor Fitness Systems, Llc Resistance band assembly and a method of varying a resistive force applied thereby
EP3155630A4 (en) 2014-06-13 2018-01-24 Intel Corporation Ebeam staggered beam aperture array
US10486232B2 (en) * 2015-04-21 2019-11-26 Varian Semiconductor Equipment Associates, Inc. Semiconductor manufacturing device with embedded fluid conduits
JP2017199610A (ja) * 2016-04-28 2017-11-02 株式会社ニューフレアテクノロジー ステージ機構
KR20190032592A (ko) * 2016-08-08 2019-03-27 에이에스엠엘 네델란즈 비.브이. 전자 이미터 및 이의 제작 방법
US10663746B2 (en) * 2016-11-09 2020-05-26 Advanced Semiconductor Engineering, Inc. Collimator, optical device and method of manufacturing the same
CN111108582B (zh) 2017-08-08 2024-07-05 Asml荷兰有限公司 带电粒子阻挡元件、包括这样的元件的曝光装置以及使用这样的曝光装置的方法
EP3703100A1 (en) * 2019-02-27 2020-09-02 FEI Company Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets
EP3716313A1 (en) * 2019-03-28 2020-09-30 ASML Netherlands B.V. Aperture array with integrated current measurement
EP4086933A1 (en) 2021-05-03 2022-11-09 ASML Netherlands B.V. Charged particle system, method of processing a sample using a multi-beam of charged particles
WO2022128392A1 (en) 2020-12-14 2022-06-23 Asml Netherlands B.V. Charged particle system, method of processing a sample using a multi-beam of charged particles
JP2024501655A (ja) 2020-12-23 2024-01-15 エーエスエムエル ネザーランズ ビー．ブイ． 電子レンズ
EP4020517A1 (en) 2020-12-23 2022-06-29 ASML Netherlands B.V. Electron-optical device
US11615939B2 (en) * 2021-03-24 2023-03-28 Kla Corporation Shaped aperture set for multi-beam array configurations
JPWO2024180616A1 (https=) * 2023-02-27 2024-09-06

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JPH11354063A (ja) * 1998-06-05 1999-12-24 Nikon Corp 電子線転写装置
JP2000030647A (ja) * 1998-07-10 2000-01-28 Advantest Corp 荷電粒子ビーム露光装置
GB2351567A (en) * 1999-04-19 2001-01-03 Ims Ionen Mikrofab Syst Transmission mask and mask-exposure arrangement for projection lithography
JP2001237161A (ja) * 2000-02-23 2001-08-31 Nikon Corp 荷電粒子線光学系及び電子光学系
JP4355446B2 (ja) * 2000-12-28 2009-11-04 株式会社アドバンテスト 電子ビーム露光装置及び電子ビーム成形部材
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ATE538412T1 (de) 2002-10-25 2012-01-15 Mapper Lithography Ip Bv Lithographisches system
AU2003276779A1 (en) 2002-10-30 2004-05-25 Mapper Lithography Ip B.V. Electron beam exposure system
KR101068607B1 (ko) 2003-03-10 2011-09-30 마퍼 리쏘그라피 아이피 비.브이. 복수 개의 빔렛 발생 장치
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JP5438670B2 (ja) * 2009-03-27 2014-03-12 株式会社アドバンテスト マルチコラム電子線描画用マスク保持装置及びマルチコラム電子線描画装置
US8586949B2 (en) * 2010-11-13 2013-11-19 Mapper Lithography Ip B.V. Charged particle lithography system with intermediate chamber
WO2012062854A1 (en) * 2010-11-13 2012-05-18 Mapper Lithography Ip B.V. Lithography system and method of refracting
WO2012062934A1 (en) * 2010-11-13 2012-05-18 Mapper Lithography Ip B.V. Charged particle beam modulator

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