JP2013544030A5 - - Google Patents
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- Publication number
- JP2013544030A5 JP2013544030A5 JP2013538224A JP2013538224A JP2013544030A5 JP 2013544030 A5 JP2013544030 A5 JP 2013544030A5 JP 2013538224 A JP2013538224 A JP 2013538224A JP 2013538224 A JP2013538224 A JP 2013538224A JP 2013544030 A5 JP2013544030 A5 JP 2013544030A5
- Authority
- JP
- Japan
- Prior art keywords
- aperture array
- array element
- aperture
- plate
- regions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 claims 10
- 238000001816 cooling Methods 0.000 claims 9
- 239000002826 coolant Substances 0.000 claims 3
- 238000001459 lithography Methods 0.000 claims 3
- 239000000463 material Substances 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 239000003507 refrigerant Substances 0.000 claims 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 230000005684 electric field Effects 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000010937 tungsten Substances 0.000 claims 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US41339610P | 2010-11-13 | 2010-11-13 | |
| US61/413,396 | 2010-11-13 | ||
| US41520010P | 2010-11-18 | 2010-11-18 | |
| US61/415,200 | 2010-11-18 | ||
| US42171710P | 2010-12-10 | 2010-12-10 | |
| US61/421,717 | 2010-12-10 | ||
| PCT/EP2011/070030 WO2012065941A1 (en) | 2010-11-13 | 2011-11-14 | Charged particle lithography system with aperture array cooling |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013544030A JP2013544030A (ja) | 2013-12-09 |
| JP2013544030A5 true JP2013544030A5 (https=) | 2015-01-15 |
| JP6133212B2 JP6133212B2 (ja) | 2017-05-24 |
Family
ID=45065871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013538224A Active JP6133212B2 (ja) | 2010-11-13 | 2011-11-14 | アパーチャアレイ冷却部を備えた荷電粒子リソグラフィシステム |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8558196B2 (https=) |
| EP (1) | EP2638560B1 (https=) |
| JP (1) | JP6133212B2 (https=) |
| KR (1) | KR101755577B1 (https=) |
| TW (1) | TWI562183B (https=) |
| WO (1) | WO2012065941A1 (https=) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012062932A1 (en) | 2010-11-13 | 2012-05-18 | Mapper Lithography Ip B.V. | Charged particle lithography system with intermediate chamber |
| NL2007604C2 (en) * | 2011-10-14 | 2013-05-01 | Mapper Lithography Ip Bv | Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams. |
| US10586625B2 (en) | 2012-05-14 | 2020-03-10 | Asml Netherlands B.V. | Vacuum chamber arrangement for charged particle beam generator |
| EP2850635B1 (en) * | 2012-05-14 | 2016-04-27 | Mapper Lithography IP B.V. | Charged particle multi-beamlet lithography system and cooling arrangement manufacturing method |
| US9724553B2 (en) * | 2013-03-15 | 2017-08-08 | Arqex Outdoor Fitness Systems, Llc | Resistance band assembly and a method of varying a resistive force applied thereby |
| KR102377771B1 (ko) | 2014-06-13 | 2022-03-23 | 인텔 코포레이션 | Ｅ 빔 스태거형 빔 애퍼처 어레이 |
| US10486232B2 (en) * | 2015-04-21 | 2019-11-26 | Varian Semiconductor Equipment Associates, Inc. | Semiconductor manufacturing device with embedded fluid conduits |
| JP2017199610A (ja) * | 2016-04-28 | 2017-11-02 | 株式会社ニューフレアテクノロジー | ステージ機構 |
| KR20190032592A (ko) | 2016-08-08 | 2019-03-27 | 에이에스엠엘 네델란즈 비.브이. | 전자 이미터 및 이의 제작 방법 |
| US10663746B2 (en) * | 2016-11-09 | 2020-05-26 | Advanced Semiconductor Engineering, Inc. | Collimator, optical device and method of manufacturing the same |
| KR102876293B1 (ko) * | 2017-08-08 | 2025-10-27 | 에이에스엠엘 네델란즈 비.브이. | 하전 입자 차단 요소, 이러한 요소를 포함하는 노광 장치, 및 이러한 노광 장치를 사용하는 방법 |
| EP3703100A1 (en) * | 2019-02-27 | 2020-09-02 | FEI Company | Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets |
| EP3716313A1 (en) * | 2019-03-28 | 2020-09-30 | ASML Netherlands B.V. | Aperture array with integrated current measurement |
| EP4086933A1 (en) | 2021-05-03 | 2022-11-09 | ASML Netherlands B.V. | Charged particle system, method of processing a sample using a multi-beam of charged particles |
| IL303577A (en) | 2020-12-14 | 2023-08-01 | Asml Netherlands Bv | Charged particle system, a sample processing method using multiple beams of charged particles |
| WO2022135926A1 (en) | 2020-12-23 | 2022-06-30 | Asml Netherlands B.V. | Electron lens |
| EP4020517A1 (en) | 2020-12-23 | 2022-06-29 | ASML Netherlands B.V. | Electron-optical device |
| US11615939B2 (en) * | 2021-03-24 | 2023-03-28 | Kla Corporation | Shaped aperture set for multi-beam array configurations |
| JPWO2024180616A1 (https=) * | 2023-02-27 | 2024-09-06 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11224846A (ja) * | 1998-02-04 | 1999-08-17 | Nikon Corp | レチクル照明光学系 |
| JPH11354063A (ja) * | 1998-06-05 | 1999-12-24 | Nikon Corp | 電子線転写装置 |
| JP2000030647A (ja) * | 1998-07-10 | 2000-01-28 | Advantest Corp | 荷電粒子ビーム露光装置 |
| GB2351567A (en) | 1999-04-19 | 2001-01-03 | Ims Ionen Mikrofab Syst | Transmission mask and mask-exposure arrangement for projection lithography |
| JP2001237161A (ja) * | 2000-02-23 | 2001-08-31 | Nikon Corp | 荷電粒子線光学系及び電子光学系 |
| JP4355446B2 (ja) * | 2000-12-28 | 2009-11-04 | 株式会社アドバンテスト | 電子ビーム露光装置及び電子ビーム成形部材 |
| JP4156809B2 (ja) * | 2001-01-31 | 2008-09-24 | 株式会社アドバンテスト | 電子ビーム露光装置及び電子レンズ |
| EP2302457B1 (en) | 2002-10-25 | 2016-03-30 | Mapper Lithography Ip B.V. | Lithography system |
| CN101414534B (zh) | 2002-10-30 | 2012-10-03 | 迈普尔平版印刷Ip有限公司 | 电子束曝光系统 |
| KR101068607B1 (ko) | 2003-03-10 | 2011-09-30 | 마퍼 리쏘그라피 아이피 비.브이. | 복수 개의 빔렛 발생 장치 |
| ATE524822T1 (de) | 2003-05-28 | 2011-09-15 | Mapper Lithography Ip Bv | Belichtungsverfahren für strahlen aus geladenen teilchen |
| GB2412232A (en) * | 2004-03-15 | 2005-09-21 | Ims Nanofabrication Gmbh | Particle-optical projection system |
| JP3929459B2 (ja) * | 2004-11-11 | 2007-06-13 | 株式会社日立ハイテクノロジーズ | 荷電粒子線露光装置 |
| JP4652829B2 (ja) * | 2005-01-26 | 2011-03-16 | キヤノン株式会社 | 電子線露光装置およびデバイス製造方法 |
| DE602005012945D1 (de) | 2005-07-20 | 2009-04-09 | Zeiss Carl Sms Gmbh | Teilchenstrahlbelichtungssystem und Vorrichtung zur Strahlbeeinflussung |
| US7781748B2 (en) * | 2006-04-03 | 2010-08-24 | Ims Nanofabrication Ag | Particle-beam exposure apparatus with overall-modulation of a patterned beam |
| SG153748A1 (en) * | 2007-12-17 | 2009-07-29 | Asml Holding Nv | Lithographic method and apparatus |
| WO2009127659A2 (en) * | 2008-04-15 | 2009-10-22 | Mapper Lithography Ip B.V. | Beamlet blanker arrangement |
| JP5438670B2 (ja) * | 2009-03-27 | 2014-03-12 | 株式会社アドバンテスト | マルチコラム電子線描画用マスク保持装置及びマルチコラム電子線描画装置 |
| US8604411B2 (en) * | 2010-11-13 | 2013-12-10 | Mapper Lithography Ip B.V. | Charged particle beam modulator |
| WO2012062932A1 (en) * | 2010-11-13 | 2012-05-18 | Mapper Lithography Ip B.V. | Charged particle lithography system with intermediate chamber |
| WO2012062854A1 (en) * | 2010-11-13 | 2012-05-18 | Mapper Lithography Ip B.V. | Lithography system and method of refracting |
-
2011
- 2011-11-14 EP EP11790574.5A patent/EP2638560B1/en active Active
- 2011-11-14 KR KR1020137015246A patent/KR101755577B1/ko active Active
- 2011-11-14 JP JP2013538224A patent/JP6133212B2/ja active Active
- 2011-11-14 US US13/295,246 patent/US8558196B2/en active Active
- 2011-11-14 WO PCT/EP2011/070030 patent/WO2012065941A1/en not_active Ceased
- 2011-11-14 TW TW100141411A patent/TWI562183B/zh active
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