JP2013539543A5 - - Google Patents

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Publication number
JP2013539543A5
JP2013539543A5 JP2013518646A JP2013518646A JP2013539543A5 JP 2013539543 A5 JP2013539543 A5 JP 2013539543A5 JP 2013518646 A JP2013518646 A JP 2013518646A JP 2013518646 A JP2013518646 A JP 2013518646A JP 2013539543 A5 JP2013539543 A5 JP 2013539543A5
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JP
Japan
Prior art keywords
film
reflective property
change
radiation
birefringence
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JP2013518646A
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Japanese (ja)
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JP2013539543A (ja
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Priority claimed from PCT/US2011/042368 external-priority patent/WO2012012177A1/en
Publication of JP2013539543A publication Critical patent/JP2013539543A/ja
Publication of JP2013539543A5 publication Critical patent/JP2013539543A5/ja
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JP2013518646A 2010-06-30 2011-06-29 空間選択的な複屈折低減を有するフィルムを使用するマスク加工 Withdrawn JP2013539543A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36012910P 2010-06-30 2010-06-30
US61/360,129 2010-06-30
PCT/US2011/042368 WO2012012177A1 (en) 2010-06-30 2011-06-29 Mask processing using films with spatially selective birefringence reduction

Related Child Applications (1)

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JP2016068116A Division JP6297086B2 (ja) 2010-06-30 2016-03-30 空間選択的な複屈折低減を有するフィルムを使用するマスク加工

Publications (2)

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JP2013539543A JP2013539543A (ja) 2013-10-24
JP2013539543A5 true JP2013539543A5 (https=) 2014-08-14

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JP2013518646A Withdrawn JP2013539543A (ja) 2010-06-30 2011-06-29 空間選択的な複屈折低減を有するフィルムを使用するマスク加工
JP2016068116A Expired - Fee Related JP6297086B2 (ja) 2010-06-30 2016-03-30 空間選択的な複屈折低減を有するフィルムを使用するマスク加工

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JP2016068116A Expired - Fee Related JP6297086B2 (ja) 2010-06-30 2016-03-30 空間選択的な複屈折低減を有するフィルムを使用するマスク加工

Country Status (7)

Country Link
US (3) US9101956B2 (https=)
EP (1) EP2588903B1 (https=)
JP (2) JP2013539543A (https=)
KR (2) KR101877209B1 (https=)
CN (1) CN103038681B (https=)
BR (1) BR112012033235A2 (https=)
WO (1) WO2012012177A1 (https=)

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