JP2013533373A5 - - Google Patents

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Publication number
JP2013533373A5
JP2013533373A5 JP2013501718A JP2013501718A JP2013533373A5 JP 2013533373 A5 JP2013533373 A5 JP 2013533373A5 JP 2013501718 A JP2013501718 A JP 2013501718A JP 2013501718 A JP2013501718 A JP 2013501718A JP 2013533373 A5 JP2013533373 A5 JP 2013533373A5
Authority
JP
Japan
Prior art keywords
end block
rotating
rotor
base body
rotation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013501718A
Other languages
English (en)
Japanese (ja)
Other versions
JP5793555B2 (ja
JP2013533373A (ja
Filing date
Publication date
Priority claimed from EP10159023.0A external-priority patent/EP2371992B1/en
Application filed filed Critical
Publication of JP2013533373A publication Critical patent/JP2013533373A/ja
Publication of JP2013533373A5 publication Critical patent/JP2013533373A5/ja
Application granted granted Critical
Publication of JP5793555B2 publication Critical patent/JP5793555B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013501718A 2010-04-01 2011-03-11 エンドブロックおよびスパッタリング装置 Active JP5793555B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP10159023.0 2010-04-01
EP10159023.0A EP2371992B1 (en) 2010-04-01 2010-04-01 End-block and sputtering installation
PCT/EP2011/053736 WO2011120782A2 (en) 2010-04-01 2011-03-11 End-block and sputtering installation

Publications (3)

Publication Number Publication Date
JP2013533373A JP2013533373A (ja) 2013-08-22
JP2013533373A5 true JP2013533373A5 (cg-RX-API-DMAC10.html) 2014-05-01
JP5793555B2 JP5793555B2 (ja) 2015-10-14

Family

ID=42590049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013501718A Active JP5793555B2 (ja) 2010-04-01 2011-03-11 エンドブロックおよびスパッタリング装置

Country Status (6)

Country Link
US (1) US20110240465A1 (cg-RX-API-DMAC10.html)
EP (1) EP2371992B1 (cg-RX-API-DMAC10.html)
JP (1) JP5793555B2 (cg-RX-API-DMAC10.html)
CN (1) CN103119191B (cg-RX-API-DMAC10.html)
TW (1) TWI432593B (cg-RX-API-DMAC10.html)
WO (1) WO2011120782A2 (cg-RX-API-DMAC10.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9809876B2 (en) 2014-01-13 2017-11-07 Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique (C.R.V.C.) Sarl Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure
DE102014101830B4 (de) * 2014-02-13 2015-10-08 Von Ardenne Gmbh Antriebs-Baugruppe, Prozessieranordnung, Verfahren zum Montieren einer Antriebs-Baugruppe und Verfahren zum Demontieren einer Antriebs-Baugruppe
DE102014115275B4 (de) * 2014-10-20 2019-10-02 VON ARDENNE Asset GmbH & Co. KG Endblockanordnung und Prozessieranordnung
CN104357802B (zh) * 2014-11-06 2017-03-15 深圳市纳为金属技术有限公司 一种氟化物轴封超薄旋转阴极端头
KR101694197B1 (ko) * 2015-03-25 2017-01-09 주식회사 에스에프에이 스퍼터 장치
BE1024754B9 (nl) * 2016-11-29 2018-07-24 Soleras Advanced Coatings Bvba Een universeel monteerbaar eindblok
JP2018131644A (ja) * 2017-02-13 2018-08-23 株式会社アルバック スパッタリング装置用の回転式カソードユニット
CN107779830B (zh) * 2017-11-09 2023-10-10 浙江大学昆山创新中心 一种应用于柱形旋转靶的挡板组件
KR102462111B1 (ko) * 2020-09-14 2022-11-02 주식회사 케이씨엠씨 회전형 캐소드 및 이를 구비한 스퍼터 장치
WO2022268311A1 (en) * 2021-06-23 2022-12-29 Applied Materials, Inc. Cathode assembly, deposition apparatus, and method for deinstalling a cathode assembly

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53163352U (cg-RX-API-DMAC10.html) * 1977-05-31 1978-12-21
US5200049A (en) * 1990-08-10 1993-04-06 Viratec Thin Films, Inc. Cantilever mount for rotating cylindrical magnetrons
US5100527A (en) * 1990-10-18 1992-03-31 Viratec Thin Films, Inc. Rotating magnetron incorporating a removable cathode
JP3428264B2 (ja) * 1995-12-22 2003-07-22 日本精工株式会社 転がり軸受用回転精度測定装置
US20020189939A1 (en) * 2001-06-14 2002-12-19 German John R. Alternating current rotatable sputter cathode
KR20060111896A (ko) * 2003-07-04 2006-10-30 베카에르트 어드벤스드 코팅스 회전 관형 스퍼터 타겟 조립체
ATE423225T1 (de) * 2004-10-18 2009-03-15 Bekaert Advanced Coatings Flacher endblock als träger eines drehbaren sputter-targets
US7824528B2 (en) * 2004-10-18 2010-11-02 Bekaert Advanced Coatings End-block for a rotatable target sputtering apparatus
US7578061B2 (en) * 2004-11-18 2009-08-25 Sms Demag Ag Method and device for prestressing tapered roller bearings of a rolling mill roller
US20080202925A1 (en) * 2005-03-11 2008-08-28 Bekaert Advanced Coatings Single, Right-Angled End-Block
FR2886204A1 (fr) * 2005-05-24 2006-12-01 Sidel Sas Machine tournante a colonne tournante d'alimentation fluidique
JP2007119824A (ja) * 2005-10-26 2007-05-17 Kohatsu Kogaku:Kk 回転円筒型マグネトロンスパッタリングカソード用ターゲット組立体、それを用いたスパッタリングカソード組立体及びスパッタリング装置並びに薄膜作成方法
DE102008018609B4 (de) * 2008-04-11 2012-01-19 Von Ardenne Anlagentechnik Gmbh Antriebsendblock für ein rotierendes Magnetron

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