JP2013530517A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2013530517A5 JP2013530517A5 JP2013508482A JP2013508482A JP2013530517A5 JP 2013530517 A5 JP2013530517 A5 JP 2013530517A5 JP 2013508482 A JP2013508482 A JP 2013508482A JP 2013508482 A JP2013508482 A JP 2013508482A JP 2013530517 A5 JP2013530517 A5 JP 2013530517A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thermal expansion
- temperature
- zero crossing
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 46
- 239000000463 material Substances 0.000 claims 24
- 238000000034 method Methods 0.000 claims 11
- 238000001900 extreme ultraviolet lithography Methods 0.000 claims 10
- 238000009826 distribution Methods 0.000 claims 6
- 238000005304 joining Methods 0.000 claims 5
- 230000000737 periodic effect Effects 0.000 claims 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 4
- 239000006112 glass ceramic composition Substances 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- 238000004381 surface treatment Methods 0.000 claims 3
- 229910052878 cordierite Inorganic materials 0.000 claims 2
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 claims 2
- 230000007423 decrease Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000009828 non-uniform distribution Methods 0.000 claims 1
- 238000005498 polishing Methods 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 238000005245 sintering Methods 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US33051710P | 2010-05-03 | 2010-05-03 | |
| DE102010028488.2 | 2010-05-03 | ||
| US61/330,517 | 2010-05-03 | ||
| DE102010028488A DE102010028488A1 (de) | 2010-05-03 | 2010-05-03 | Substrate für Spiegel für die EUV-Lithographie und deren Herstellung |
| PCT/EP2011/057074 WO2011138340A2 (en) | 2010-05-03 | 2011-05-03 | Substrates for mirrors for euv lithography and their production |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013530517A JP2013530517A (ja) | 2013-07-25 |
| JP2013530517A5 true JP2013530517A5 (enExample) | 2015-04-23 |
| JP5934698B2 JP5934698B2 (ja) | 2016-06-15 |
Family
ID=44626227
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013508482A Active JP5934698B2 (ja) | 2010-05-03 | 2011-05-03 | Ｅｕｖリソグラフィ用ミラーの基板およびその製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8870396B2 (enExample) |
| JP (1) | JP5934698B2 (enExample) |
| CN (1) | CN102934030B (enExample) |
| DE (1) | DE102010028488A1 (enExample) |
| WO (1) | WO2011138340A2 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5510308B2 (ja) * | 2009-12-25 | 2014-06-04 | 旭硝子株式会社 | Ｅｕｖｌ光学部材用基材 |
| TWI475330B (zh) | 2010-07-30 | 2015-03-01 | 卡爾蔡司Ｓｍｔ有限公司 | 超紫外線曝光裝置 |
| DE102012201075A1 (de) * | 2012-01-25 | 2013-07-25 | Carl Zeiss Smt Gmbh | Optische Anordnung, EUV-Lithographieanlage und Verfahren zum Konfigurieren einer optischen Anordnung |
| FR2992313B1 (fr) * | 2012-06-21 | 2014-11-07 | Eurokera | Article vitroceramique et procede de fabrication |
| DE102013101328B3 (de) * | 2013-02-11 | 2014-02-13 | Heraeus Quarzglas Gmbh & Co. Kg | Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie sowie Verfahren für dessen Herstellung |
| DE102013219808A1 (de) | 2013-09-30 | 2015-04-02 | Heraeus Quarzglas Gmbh & Co. Kg | Spiegelblank für EUV Lithographie ohne Ausdehnung unter EUV-Bestrahlung |
| DE102013221378A1 (de) * | 2013-10-22 | 2014-05-22 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines Rohlings |
| DE102014219755A1 (de) * | 2013-10-30 | 2015-04-30 | Carl Zeiss Smt Gmbh | Reflektives optisches Element |
| US9382151B2 (en) | 2014-01-31 | 2016-07-05 | Corning Incorporated | Low expansion silica-titania articles with a Tzc gradient by compositional variation |
| RU2681015C2 (ru) | 2014-02-21 | 2019-03-01 | Шотт Аг | Высокооднородная стеклокерамическая деталь |
| US20150239767A1 (en) * | 2014-02-26 | 2015-08-27 | Corning Incorporated | HEAT TREATING SILICA-TITANIA GLASS TO INDUCE A Tzc GRADIENT |
| WO2015153774A1 (en) * | 2014-04-02 | 2015-10-08 | Zygo Corporation | Photo-masks for lithography |
| DE102014206765A1 (de) * | 2014-04-08 | 2015-10-08 | Carl Zeiss Smt Gmbh | Spiegelanordnung, Projektionsobjektiv und EUV-Lithographieanlage |
| DE102014216631A1 (de) * | 2014-08-21 | 2016-02-25 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsbelichtungsanlage, Spiegelmodul hierfür, sowie Verfahren zum Betrieb des Spiegelmoduls |
| DE102015225510A1 (de) | 2015-12-16 | 2017-01-12 | Carl Zeiss Smt Gmbh | Spiegelelement, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| DE102016210794A1 (de) * | 2016-06-16 | 2017-04-27 | Carl Zeiss Smt Gmbh | Optische Anordnung, EUV-Lithographieanlage und Verfahren zum Betrieb der optischen Anordnung |
| DE102021201396A1 (de) * | 2021-02-15 | 2022-08-18 | Carl Zeiss Smt Gmbh | Verfahren zur Herstellung eines mehrteiligen Spiegels einer Projektionsbelichtungsanlage für die Mikrolithographie |
| DE102021213441A1 (de) | 2021-11-29 | 2022-09-15 | Carl Zeiss Smt Gmbh | Verfahren zum herstellen eines optischen systems |
| CN114582445B (zh) * | 2022-03-10 | 2024-06-21 | 湖南大学 | 一种超材料的优化方法、系统及设备 |
| CN115145108B (zh) * | 2022-09-05 | 2022-12-02 | 上海传芯半导体有限公司 | Euv级衬底、euv掩模基版、euv掩模版及其制造方法 |
| US12117731B2 (en) * | 2022-12-13 | 2024-10-15 | Carl Zeiss Smt Gmbh | Method for producing a mirror of a microlithographic projection exposure apparatus |
| DE102023200970A1 (de) * | 2023-02-07 | 2024-08-08 | Carl Zeiss Smt Gmbh | Optisches element mit polierschicht |
| WO2025068034A2 (en) * | 2023-09-27 | 2025-04-03 | Carl Zeiss Smt Gmbh | Method for producing an optical system for a lithography apparatus, substrate for an optical component of a lithography apparatus, and lithography apparatus |
| DE102023209473A1 (de) * | 2023-09-27 | 2025-03-27 | Carl Zeiss Smt Gmbh | Verfahren zum herstellen eines optischen systems für eine lithographieanlage, substrat für eine optische komponente einer lithographieanlage und lithographieanlage |
| DE102023212752A1 (de) * | 2023-12-14 | 2025-06-18 | Carl Zeiss Smt Gmbh | Verfahren zum herstellen eines optischen systems für eine lithographieanlage, substrat für eine optische komponente einer lithographieanlage und lithographieanlage |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2668057B2 (ja) * | 1994-09-13 | 1997-10-27 | 株式会社オハラ | 低膨張透明ガラスセラミックス |
| US8047023B2 (en) * | 2001-04-27 | 2011-11-01 | Corning Incorporated | Method for producing titania-doped fused silica glass |
| US20030125184A1 (en) * | 2001-12-21 | 2003-07-03 | Schott Glas | Glass ceramic product with variably adjustable zero crossing of the CTE-T curve |
| JP4792706B2 (ja) * | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびその製造方法 |
| WO2005040925A1 (de) * | 2003-09-27 | 2005-05-06 | Carl Zeiss Smt Ag | Euv-projektionsobjektiv mit spiegeln aus materialien mit unterschiedlichem vorzeichen der steigung der temperaturabhängigkeit des wärmeausdehnungskoeffizienten nahe der nulldurchgangstemperatur |
| JP4492123B2 (ja) * | 2004-01-05 | 2010-06-30 | 旭硝子株式会社 | シリカガラス |
| DE102004008824B4 (de) * | 2004-02-20 | 2006-05-04 | Schott Ag | Glaskeramik mit geringer Wärmeausdehnung sowie deren Verwendung |
| DE102004024808B4 (de) * | 2004-05-17 | 2006-11-09 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglasrohling für ein optisches Bauteil zur Übertragung extrem kurzwelliger ultravioletter Strahlung |
| JP2008514971A (ja) * | 2004-09-27 | 2008-05-08 | ショット アクチエンゲゼルシャフト | ゼロ膨張材料で作製された複合構造物およびその製造方法 |
| US20060179879A1 (en) * | 2004-12-29 | 2006-08-17 | Ellison Adam J G | Adjusting expansivity in doped silica glasses |
| US20090107869A1 (en) * | 2007-10-31 | 2009-04-30 | Eric Davis Child | Liquid-filled suspended-particle-scene gift card holder |
| EP2217539A4 (en) * | 2007-11-30 | 2015-07-01 | Corning Inc | LOW DILATION GLASS MATERIAL HAVING A LOW GRADIENT OF EXPANSION POWER |
| JP5428323B2 (ja) * | 2007-12-27 | 2014-02-26 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラス |
| WO2009107858A1 (en) * | 2008-02-26 | 2009-09-03 | Asahi Glass Co., Ltd. | Tio2-containing silica glass and optical member for euv lithography using high energy densities as well as special temperature controlled process for its manufacture |
| EP2250133A1 (en) * | 2008-02-29 | 2010-11-17 | Asahi Glass Company, Limited | Tio2-containing silica glass and optical member for lithography using the same |
| JP2010135732A (ja) * | 2008-08-01 | 2010-06-17 | Asahi Glass Co Ltd | Ｅｕｖマスクブランクス用基板 |
| DE102010039779A1 (de) * | 2009-08-28 | 2011-03-24 | Corning Inc. | Glas mit geringer wärmeausdehnung für euvl-anwendungen |
| DE102009043680A1 (de) * | 2009-09-30 | 2011-03-31 | Heraeus Quarzglas Gmbh & Co. Kg | Rohling aus Titan-dotiertem, hochkieselsäurehaltigem Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie und Verfahren für seine Herstellung |
| JP5510308B2 (ja) * | 2009-12-25 | 2014-06-04 | 旭硝子株式会社 | Ｅｕｖｌ光学部材用基材 |
-
2010
- 2010-05-03 DE DE102010028488A patent/DE102010028488A1/de not_active Ceased
-
2011
- 2011-05-03 CN CN201180022451.XA patent/CN102934030B/zh active Active
- 2011-05-03 WO PCT/EP2011/057074 patent/WO2011138340A2/en not_active Ceased
- 2011-05-03 JP JP2013508482A patent/JP5934698B2/ja active Active
-
2012
- 2012-11-02 US US13/667,862 patent/US8870396B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2013530517A5 (enExample) | ||
| WO2011138340A3 (en) | Substrates for mirrors for euv lithography and their production | |
| Huang et al. | Correlation between structure, phonon spectra, thermal expansion, and thermomechanics of single-layer MoS 2 | |
| JP2010013335A5 (enExample) | ||
| Zhao et al. | Frost spreading on microscale wettability/morphology patterned surfaces | |
| JP2011053687A5 (enExample) | ||
| JP2013144634A5 (enExample) | ||
| JP2009111373A5 (enExample) | ||
| JP2015067473A5 (enExample) | ||
| Cocemasov et al. | Thermal transport in semiconductor nanostructures, graphene, and related two-dimensional materials | |
| ATE410905T1 (de) | Mehrzonen-keramikheizsystem und verfahren zu seiner herstellung | |
| JP2013510791A5 (enExample) | ||
| JP2018513093A5 (enExample) | ||
| Narasaki et al. | Experimental study on thermal conductivity of free-standing fluorinated single-layer graphene | |
| Xiao et al. | Q-enhancement of piezoelectric micro-oven-controlled MEMS resonators using honeycomb lattice phononic crystals | |
| CN104297817B (zh) | 一种具有激光高反射率、红外光高透射率的膜系及制备方法 | |
| Van Le et al. | Sintered silica colloidal crystals with fully hydroxylated surfaces | |
| KR101070605B1 (ko) | 반도체 웨이퍼용 세라믹 히터 및 그 제조방법 | |
| CN104261344A (zh) | 聚酰亚胺涂布及烘烤方法 | |
| Hong et al. | Effect of surfactant concentration variation on the thermoelectric properties of mesoporous ZnO | |
| Syme et al. | Porous silica nanotube thin films as thermally insulating barrier coatings | |
| CN102224277B (zh) | 外延反应器的反应室 | |
| Li et al. | A Superhydrophobic Multiwalled Carbon Nanotube/Epoxy Nanocomposite with Photothermal and Electrothermal Properties as Durable Anti-Icing Coating | |
| CN116210077A (zh) | 加热系统和用于加热大面积基板的方法 | |
| CN102831999B (zh) | 一种悬空热敏薄膜电阻的加工方法 |