JP5934698B2 - Ｅｕｖリソグラフィ用ミラーの基板およびその製造方法 - Google Patents

Ｅｕｖリソグラフィ用ミラーの基板およびその製造方法 Download PDF

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JP5934698B2
JP5934698B2 JP2013508482A JP2013508482A JP5934698B2 JP 5934698 B2 JP5934698 B2 JP 5934698B2 JP 2013508482 A JP2013508482 A JP 2013508482A JP 2013508482 A JP2013508482 A JP 2013508482A JP 5934698 B2 JP5934698 B2 JP 5934698B2
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substrate
thermal expansion
temperature
zero crossing
mirror
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JP2013530517A (ja
JP2013530517A5 (enExample
Inventor
カーラー ジュリアン
カーラー ジュリアン
クラウス ヴィルフリード
クラウス ヴィルフリード
ゲルハルト ミカエル
ゲルハルト ミカエル
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Glass Compositions (AREA)
JP2013508482A 2010-05-03 2011-05-03 Ｅｕｖリソグラフィ用ミラーの基板およびその製造方法 Active JP5934698B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US33051710P 2010-05-03 2010-05-03
DE102010028488.2 2010-05-03
US61/330,517 2010-05-03
DE102010028488A DE102010028488A1 (de) 2010-05-03 2010-05-03 Substrate für Spiegel für die EUV-Lithographie und deren Herstellung
PCT/EP2011/057074 WO2011138340A2 (en) 2010-05-03 2011-05-03 Substrates for mirrors for euv lithography and their production

Publications (3)

Publication Number Publication Date
JP2013530517A JP2013530517A (ja) 2013-07-25
JP2013530517A5 JP2013530517A5 (enExample) 2015-04-23
JP5934698B2 true JP5934698B2 (ja) 2016-06-15

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JP2013508482A Active JP5934698B2 (ja) 2010-05-03 2011-05-03 Ｅｕｖリソグラフィ用ミラーの基板およびその製造方法

Country Status (5)

Country Link
US (1) US8870396B2 (enExample)
JP (1) JP5934698B2 (enExample)
CN (1) CN102934030B (enExample)
DE (1) DE102010028488A1 (enExample)
WO (1) WO2011138340A2 (enExample)

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JP5510308B2 (ja) * 2009-12-25 2014-06-04 旭硝子株式会社 Ｅｕｖｌ光学部材用基材
TWI475330B (zh) 2010-07-30 2015-03-01 卡爾蔡司Ｓｍｔ有限公司 超紫外線曝光裝置
DE102012201075A1 (de) * 2012-01-25 2013-07-25 Carl Zeiss Smt Gmbh Optische Anordnung, EUV-Lithographieanlage und Verfahren zum Konfigurieren einer optischen Anordnung
FR2992313B1 (fr) * 2012-06-21 2014-11-07 Eurokera Article vitroceramique et procede de fabrication
DE102013101328B3 (de) * 2013-02-11 2014-02-13 Heraeus Quarzglas Gmbh & Co. Kg Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie sowie Verfahren für dessen Herstellung
DE102013219808A1 (de) 2013-09-30 2015-04-02 Heraeus Quarzglas Gmbh & Co. Kg Spiegelblank für EUV Lithographie ohne Ausdehnung unter EUV-Bestrahlung
DE102013221378A1 (de) * 2013-10-22 2014-05-22 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines Rohlings
DE102014219755A1 (de) * 2013-10-30 2015-04-30 Carl Zeiss Smt Gmbh Reflektives optisches Element
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
RU2681015C2 (ru) 2014-02-21 2019-03-01 Шотт Аг Высокооднородная стеклокерамическая деталь
US20150239767A1 (en) * 2014-02-26 2015-08-27 Corning Incorporated HEAT TREATING SILICA-TITANIA GLASS TO INDUCE A Tzc GRADIENT
WO2015153774A1 (en) * 2014-04-02 2015-10-08 Zygo Corporation Photo-masks for lithography
DE102014206765A1 (de) * 2014-04-08 2015-10-08 Carl Zeiss Smt Gmbh Spiegelanordnung, Projektionsobjektiv und EUV-Lithographieanlage
DE102014216631A1 (de) * 2014-08-21 2016-02-25 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage, Spiegelmodul hierfür, sowie Verfahren zum Betrieb des Spiegelmoduls
DE102015225510A1 (de) 2015-12-16 2017-01-12 Carl Zeiss Smt Gmbh Spiegelelement, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102016210794A1 (de) * 2016-06-16 2017-04-27 Carl Zeiss Smt Gmbh Optische Anordnung, EUV-Lithographieanlage und Verfahren zum Betrieb der optischen Anordnung
DE102021201396A1 (de) * 2021-02-15 2022-08-18 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines mehrteiligen Spiegels einer Projektionsbelichtungsanlage für die Mikrolithographie
DE102021213441A1 (de) 2021-11-29 2022-09-15 Carl Zeiss Smt Gmbh Verfahren zum herstellen eines optischen systems
CN114582445B (zh) * 2022-03-10 2024-06-21 湖南大学 一种超材料的优化方法、系统及设备
CN115145108B (zh) * 2022-09-05 2022-12-02 上海传芯半导体有限公司 Euv级衬底、euv掩模基版、euv掩模版及其制造方法
US12117731B2 (en) * 2022-12-13 2024-10-15 Carl Zeiss Smt Gmbh Method for producing a mirror of a microlithographic projection exposure apparatus
DE102023200970A1 (de) * 2023-02-07 2024-08-08 Carl Zeiss Smt Gmbh Optisches element mit polierschicht
WO2025068034A2 (en) * 2023-09-27 2025-04-03 Carl Zeiss Smt Gmbh Method for producing an optical system for a lithography apparatus, substrate for an optical component of a lithography apparatus, and lithography apparatus
DE102023209473A1 (de) * 2023-09-27 2025-03-27 Carl Zeiss Smt Gmbh Verfahren zum herstellen eines optischen systems für eine lithographieanlage, substrat für eine optische komponente einer lithographieanlage und lithographieanlage
DE102023212752A1 (de) * 2023-12-14 2025-06-18 Carl Zeiss Smt Gmbh Verfahren zum herstellen eines optischen systems für eine lithographieanlage, substrat für eine optische komponente einer lithographieanlage und lithographieanlage

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US8047023B2 (en) * 2001-04-27 2011-11-01 Corning Incorporated Method for producing titania-doped fused silica glass
US20030125184A1 (en) * 2001-12-21 2003-07-03 Schott Glas Glass ceramic product with variably adjustable zero crossing of the CTE-T curve
JP4792706B2 (ja) * 2003-04-03 2011-10-12 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法
WO2005040925A1 (de) * 2003-09-27 2005-05-06 Carl Zeiss Smt Ag Euv-projektionsobjektiv mit spiegeln aus materialien mit unterschiedlichem vorzeichen der steigung der temperaturabhängigkeit des wärmeausdehnungskoeffizienten nahe der nulldurchgangstemperatur
JP4492123B2 (ja) * 2004-01-05 2010-06-30 旭硝子株式会社 シリカガラス
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DE102004024808B4 (de) * 2004-05-17 2006-11-09 Heraeus Quarzglas Gmbh & Co. Kg Quarzglasrohling für ein optisches Bauteil zur Übertragung extrem kurzwelliger ultravioletter Strahlung
JP2008514971A (ja) * 2004-09-27 2008-05-08 ショット アクチエンゲゼルシャフト ゼロ膨張材料で作製された複合構造物およびその製造方法
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WO2009107858A1 (en) * 2008-02-26 2009-09-03 Asahi Glass Co., Ltd. Tio2-containing silica glass and optical member for euv lithography using high energy densities as well as special temperature controlled process for its manufacture
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JP2010135732A (ja) * 2008-08-01 2010-06-17 Asahi Glass Co Ltd Ｅｕｖマスクブランクス用基板
DE102010039779A1 (de) * 2009-08-28 2011-03-24 Corning Inc. Glas mit geringer wärmeausdehnung für euvl-anwendungen
DE102009043680A1 (de) * 2009-09-30 2011-03-31 Heraeus Quarzglas Gmbh & Co. Kg Rohling aus Titan-dotiertem, hochkieselsäurehaltigem Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie und Verfahren für seine Herstellung
JP5510308B2 (ja) * 2009-12-25 2014-06-04 旭硝子株式会社 Ｅｕｖｌ光学部材用基材

Also Published As

Publication number Publication date
US20130120863A1 (en) 2013-05-16
US8870396B2 (en) 2014-10-28
JP2013530517A (ja) 2013-07-25
DE102010028488A1 (de) 2011-11-03
CN102934030A (zh) 2013-02-13
WO2011138340A2 (en) 2011-11-10
CN102934030B (zh) 2015-06-03
WO2011138340A3 (en) 2012-01-12

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