JP2013529256A - 導電性のメソ構造の被覆物を低温調製する方法 - Google Patents
導電性のメソ構造の被覆物を低温調製する方法 Download PDFInfo
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- JP2013529256A JP2013529256A JP2013513731A JP2013513731A JP2013529256A JP 2013529256 A JP2013529256 A JP 2013529256A JP 2013513731 A JP2013513731 A JP 2013513731A JP 2013513731 A JP2013513731 A JP 2013513731A JP 2013529256 A JP2013529256 A JP 2013529256A
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- coating
- layer
- mesostructured
- copolymers
- metal
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- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1664—Process features with additional means during the plating process
- C23C18/1667—Radiant energy, e.g. laser
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
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Abstract
Description
(b)ゾル−ゲル法により、工程(a)で被覆した上記第1の層上に、光触媒材料を含んでおらず、構造化剤によってメソ構造化された、シリカ材料を主成分とする第2の層を被覆する;
(c)上記第1の層および第2の層を、共に、50〜250℃までの温度による熟成処理に10分〜200時間供し、上記第1の層および第2の層を固化する;
(d)工程(c)で得た固化した被覆物と、銀、金、パラジウムおよび白金のイオンからなる群から選択される金属イオン、望ましくは銀のイオン、を含む溶液とを接触させ、上記光触媒材料を活性化する放射光を、浸透の閾値に達するのに十分な時間照射し、その上に、光触媒作用による上記金属イオンの還元により得られた金属ナノ粒子による導電性構造を形成する。
(1)少なくとも1つのシリカの前駆体(望ましくは、含水有機溶媒に溶解した、酸または塩基性の加水分解触媒および構造化剤を含む、テトラエトキシシランのようなテトラアルコキシシラン)を含むゾルを調製する。
‐(Agの場合)硝酸銀の溶液、
‐(Auの場合)塩化金(HAuCl4)の溶液、
‐(Pdの場合)塩化パラジウム(PdCl2)の溶液、または
‐(Ptの場合)四塩化白金(H2PtCl6)の溶液
であることが望ましい。
‐下記を60℃で1時間還流しながら加熱して溶液1を調製する。
‐11mLのエタノール
‐4.5mLのHCl(pH=1.25)
‐湯浴で撹拌しながら20mLのエタノールに1.47gのプルロニック(登録商標)PE6800(構造化剤)を溶解させる。その後、10mLの溶液1を加える。ナイロンフィルタ450nmを使用してこの溶液2をろ過する。
比較の3つの被覆物B、CおよびDは、以下の点を除き、被覆物Aに関して記載された手順に従って調製された。
結果は、図1に示されている。グラフA、B、CおよびDは、水とイソプロパノールが50対50の混合物の、0.05MのAgNO3の存在下における、照射時間(312nmのUVランプ)に応じた、被覆物A、B、CおよびDの導電率(四端子法によって測定された)のそれぞれの変化を表している。
Claims (13)
- Ag、Au、PdおよびPtからなる群から選択される金属、望ましくはAg、のナノ粒子から形成された導電性構造を含むメソ構造の被覆物の製造方法であって、当該方法は、以下の工程からなり:
(a)ゾル−ゲル法により、基板上に、シリカ材料および光触媒材料を主成分とし、構造化剤によってメソ構造化された第1の層を被覆する;
(b)ゾル−ゲル法により、工程(a)で被覆した上記第1の層上に、光触媒材料を含んでおらず、構造化剤によってメソ構造化された、シリカ材料を主成分とする第2の層を被覆する;
(c)上記第1の層および第2の層を、共に、50〜250℃までの温度による熟成処理に10分〜200時間供し、上記第1の層および第2の層を固化する;
(d)工程(c)で得た固化した被覆物と、銀、金、パラジウムおよび白金のイオンからなる群から選択される金属イオン、望ましくは銀のイオン、を含む溶液とを接触させ、上記光触媒材料を活性化する放射光を、浸透の閾値に達するのに十分な時間照射し、その上に、光触媒作用による上記金属イオンの還元により得られた金属ナノ粒子による導電性構造を形成する、
当該方法は、250℃を超える温度における熱処理を一切含まないことを特徴とする。 - 上記光触媒材料は、金属酸化物であり、望ましくは、チタン酸化物、酸化亜鉛、酸化ビスマス、酸化バナジウムまたはそれらの混合物からなる群から選択されることを特徴とする、請求項1に記載の方法。
- 上記構造化剤は、非イオンの界面活性剤から選択されており、望ましくは、ブロック共重合体、特にエチレンオキシドおよび酸化プロピレンを主成分とするブロック共重合体から選択されていることを特徴とする、請求項1または2に記載の方法。
- 上記光触媒材料は、チタン酸化物であり、上記第一の層のメソ構造におけるTi/Siの原子比率は0.05〜2であり、望ましくは0.5〜1.5であり、より望ましくは0.8〜1.2であることを特徴とする、請求項1〜3のいずれか1項に記載の方法。
- 上記基板は、バルク材、フィルム、または糸状の形態である有機物のポリマーであり、望ましくは、ポリ(エチレンテレフタレート)、ポリカーボネート、ポリアミド、ポリイミド、ポリサルフォン、ポリ(メタクリル酸メチル)、エチレンテレフタレートとカーボネートの共重合体、ポリオレフィン、特にポリノルボルネン、ジエチレングリコールビス(アリルカーボネート)の単一化合物の重合体および共重合体、メタクリル酸(アクリル酸)の単一化合物の重合体および共重合体、特にビスフェノールAに由来するメタクリル酸(アクリル酸)の単一化合物の重合体および共重合体、チオメタクリル酸(チオアクリル酸)の単一化合物の重合体および共重合体、ウレタンおよびチオウレタンの単一化合物の重合体および共重合体、エポキシドの単一化合物の重合体および共重合体、エピスルフィドの単一化合物の重合体および共重合体、ならびに綿、からなる群から選択される有機物のポリマーであることを特徴とする、請求項1〜4のいずれか1項に記載の方法。
- 工程(d)の照射は、マスク、望ましくはフォトリソグラフィ用マスクを通して行われることを特徴とする、請求項1〜5のいずれか1項に記載の方法。
- 請求項1〜6のいずれか1項に記載の方法によって得られる、金属のナノ粒子で形成された導電性構造を含むメソ構造の被覆物。
- 上記導電性構造は、20S/cm、望ましくは70S/cm、より望ましくは90S/cmを超える導電率を有しており、上記導電率は、ファンデルポー法によって測定されたものであることを特徴とする、請求項7に記載のメソ構造の被覆物。
- メソ構造の材料の上記第1の層は、200〜2000nm、望ましくは400〜800nmの厚さを有していることを特徴とする、請求項7または8に記載のメソ構造の被覆物。
- メソ構造の材料の上記第2の層は、50〜1000nm、望ましくは100〜300nmの厚さを有していることを特徴とする、請求項7〜9のいずれか1項に記載のメソ構造の被覆物。
- 請求項7〜10のいずれか1項に記載のメソ構造の被覆物の電極としての使用。
- 請求項7〜10のいずれか1項に記載のメソ構造の被覆物の制電性の被覆物としての使用。
- 請求項7〜10のいずれか1項に記載のメソ構造の被覆物の断熱性の被覆物としての使用。
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PCT/FR2011/051205 WO2011154637A1 (fr) | 2010-06-09 | 2011-05-26 | Procede de preparation a basse temperature de revetements mesostructures electroconducteurs |
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EP2829857A1 (en) * | 2013-07-24 | 2015-01-28 | Ecole Polytechnique | Piezoresistive material exhibiting an optimal gauge factor |
CN104934330A (zh) * | 2015-05-08 | 2015-09-23 | 京东方科技集团股份有限公司 | 一种薄膜晶体管及其制备方法、阵列基板和显示面板 |
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JP2003209339A (ja) * | 2001-11-06 | 2003-07-25 | Dainippon Printing Co Ltd | 導電性パターン形成体の製造方法 |
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