JP2013528414A5 - - Google Patents

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JP2013528414A5
JP2013528414A5 JP2013506350A JP2013506350A JP2013528414A5 JP 2013528414 A5 JP2013528414 A5 JP 2013528414A5 JP 2013506350 A JP2013506350 A JP 2013506350A JP 2013506350 A JP2013506350 A JP 2013506350A JP 2013528414 A5 JP2013528414 A5 JP 2013528414A5
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pulse
laser
tissue
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wavelength
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  1. 組織を治療する装置であって、
    1400と1520nmの間又は1860と2500nmの間の波長を有し、1と40ミリジュール/パルスの間を有し、かつ200nsec未満のパルス持続時間を有するレーザパルスを発生するレーザシステムと、
    前記レーザに結合されて組織上のスポットに該レーザからパルスを送出し、それによって相互作用容積が、該スポットの面積及び水中の該パルスに対する貫通深度(1/e)によって定められ、該相互作用容積が2:1から1:6の深さ:幅の比を有するビーム送出デバイスと、
    を含み、
    各スポットに送出される前記容積電力密度は、10 10 W/cm 3 よりも大きいことを特徴とする装置。
  2. パルス繰返し数が、単一の発射から2kHzまでであることを特徴とする請求項に記載の装置。
  3. 前記波長は、1880と2080nmの間又は2340と2500nmの間であり、前記パルスは、1と30ミリジュール/パルスの間と200nsec未満のパルス持続時間とを有することを特徴とする請求項に記載の装置。
  4. 前記パルス持続時間は、100ns未満であることを特徴とする請求項に記載の装置。
  5. 前記レーザパルスは、組織を放出するために該組織内の水のスピノーダル分解と前記相互作用容積内に閉じ込められた運動エネルギとを誘発する容積電力密度を該相互作用容積に送出することを特徴とする請求項に記載の装置。
  6. 組織を治療する装置であって、
    波長、パルス繰返し数、パルス持続時間、及びパルス当たりのエネルギのうちの少なくとも1つが制御可能であるレーザパルスを発生するレーザシステムと、
    前記レーザから前記組織上のスポットにパルスを送出するために該レーザに結合されたビーム送出デバイスと、
    前記レーザが、組織の容積がスピノーダル分解を用いて放出されるように前記スポットである一定の容積の組織を照射するための波長とパルス当たりのエネルギとを有し、かつ前記レーザパルスが該容積からの応力及び熱エネルギ伝播を抑制するのに十分に短い持続時間を有する少なくとも第1の作動モードと、組織凝固がスピノーダル分解による放出なしにもたらされる少なくとも第2の作動モードとを含む該レーザに対する作動モードを選択するユーザ入力を有する該レーザシステムに結合されたコントローラと、
    を含むことを特徴とする装置。
  7. 前記第1の作動モード及び前記第2の作動モードは、露光中に混在することを特徴とする請求項に記載の装置。
  8. 前記第1の作動モードの前記レーザパルスは、第1の波長を有し、前記第2の作動モードの前記レーザパルスは、第2の波長を有することを特徴とする請求項に記載の装置。
  9. 前記ビーム送出デバイスは、10から300ミクロンの範囲のコア径を有するシリカ導波管を有することを特徴とする請求項に記載の装置。
  10. 前記第1の作動モードのパルス繰返し数が、単一の発射から2kHzまでであることを特徴とする請求項に記載の装置。
  11. 前記第2の作動モードにおいて、前記波長は、1880と2080nmの間又は2340と2500nmの間であり、前記パルスは、1と10ミリジュール/パルスの間と200nsec未満のパルス持続時間とを有することを特徴とする請求項に記載の装置。
  12. 前記パルス持続時間は、100ns未満であることを特徴とする請求項に記載の装置。
  13. 前記レーザシステムは、ツリウムドープホストを含む利得媒体を有することを特徴とする請求項に記載の装置。
  14. 前記ビーム送出デバイスは、前記組織上のスポットのパターン内に複数のパルスを送出するように配置された複数の導波管を含むことを特徴とする請求項に記載の装置。
  15. 前記ビーム送出デバイスは、単一スポットと平行に複数のパルスを送出するように配置された複数の導波管を含むことを特徴とする請求項に記載の装置。
JP2013506350A 2010-04-22 2011-04-22 フラッシュ蒸発手術システム Expired - Fee Related JP5919258B2 (ja)

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US32706010P 2010-04-22 2010-04-22
US61/327,060 2010-04-22
US37072710P 2010-08-04 2010-08-04
US61/370,727 2010-08-04
PCT/US2011/033677 WO2011133941A2 (en) 2010-04-22 2011-04-22 Flash vaporization surgical systems

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JP2013528414A5 true JP2013528414A5 (ja) 2014-06-19
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