JP2013526777A - 化学機械平坦化用の界面活性剤を含む固定研磨パッド - Google Patents

化学機械平坦化用の界面活性剤を含む固定研磨パッド Download PDF

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Publication number
JP2013526777A
JP2013526777A JP2013510126A JP2013510126A JP2013526777A JP 2013526777 A JP2013526777 A JP 2013526777A JP 2013510126 A JP2013510126 A JP 2013510126A JP 2013510126 A JP2013510126 A JP 2013510126A JP 2013526777 A JP2013526777 A JP 2013526777A
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JP
Japan
Prior art keywords
structured
abrasive article
abrasive
polishing
structured abrasive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2013510126A
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English (en)
Japanese (ja)
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JP2013526777A5 (sv
Inventor
ジュリー ワイ． シアン，
ジミー アール．， ジュニア バラン，
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2013526777A publication Critical patent/JP2013526777A/ja
Publication of JP2013526777A5 publication Critical patent/JP2013526777A5/ja
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/34—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B24B37/245—Pads with fixed abrasives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/34—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties
    • B24D3/342—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent
    • B24D3/344—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent the bonding agent being organic

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
JP2013510126A 2010-05-11 2011-04-29 化学機械平坦化用の界面活性剤を含む固定研磨パッド Pending JP2013526777A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US33335110P 2010-05-11 2010-05-11
US61/333,351 2010-05-11
PCT/US2011/034439 WO2011142986A1 (en) 2010-05-11 2011-04-29 Fixed abrasive pad with surfactant for chemical mechanical planarization

Publications (2)

Publication Number Publication Date
JP2013526777A true JP2013526777A (ja) 2013-06-24
JP2013526777A5 JP2013526777A5 (sv) 2014-06-19

Family

ID=44383031

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013510126A Pending JP2013526777A (ja) 2010-05-11 2011-04-29 化学機械平坦化用の界面活性剤を含む固定研磨パッド

Country Status (7)

Country Link
US (1) US20130059506A1 (sv)
JP (1) JP2013526777A (sv)
KR (1) KR20130081229A (sv)
CN (1) CN102892553B (sv)
SG (1) SG185523A1 (sv)
TW (1) TWI532597B (sv)
WO (1) WO2011142986A1 (sv)

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SG11201502225XA (en) * 2012-09-21 2015-05-28 3M Innovative Properties Co Incorporating additives into fixed abrasive webs for improved cmp performance
WO2014189086A1 (ja) * 2013-05-24 2014-11-27 Jsr株式会社 化学機械研磨パッドおよびそれを用いた化学機械研磨方法
US20150104940A1 (en) * 2013-10-11 2015-04-16 Air Products And Chemicals Inc. Barrier chemical mechanical planarization composition and method thereof
US9873180B2 (en) 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
JP6545261B2 (ja) 2014-10-17 2019-07-17 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 付加製造プロセスを使用する、複合材料特性を有するｃｍｐパッド構造
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
US10821573B2 (en) 2014-10-17 2020-11-03 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US10875145B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
US10399201B2 (en) 2014-10-17 2019-09-03 Applied Materials, Inc. Advanced polishing pads having compositional gradients by use of an additive manufacturing process
US11351654B2 (en) 2014-11-26 2022-06-07 3M Innovative Properties Company Abrasive articles, assemblies, and methods with gripping material
US9914864B2 (en) 2014-12-23 2018-03-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particles and method of forming same
JP6538850B2 (ja) * 2014-12-23 2019-07-03 サン−ゴバン セラミックス アンド プラスティクス，インコーポレイティド 成形研磨粒子及びその形成方法
WO2016172450A1 (en) 2015-04-23 2016-10-27 The University Of Florida Research Foundation, Inc. Hybrid tool with both fixed-abrasive and loose-abrasive phases
KR20230169424A (ko) 2015-10-30 2023-12-15 어플라이드 머티어리얼스, 인코포레이티드 원하는 제타 전위를 가진 연마 제품을 형성하는 장치 및 방법
US10593574B2 (en) 2015-11-06 2020-03-17 Applied Materials, Inc. Techniques for combining CMP process tracking data with 3D printed CMP consumables
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
USD850041S1 (en) * 2017-07-31 2019-05-28 3M Innovative Properties Company Scouring pad
WO2019032286A1 (en) 2017-08-07 2019-02-14 Applied Materials, Inc. ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME
US11712784B2 (en) 2017-10-04 2023-08-01 Saint-Gobain Abrasives, Inc. Abrasive article and method for forming same
KR20210042171A (ko) 2018-09-04 2021-04-16 어플라이드 머티어리얼스, 인코포레이티드 진보한 폴리싱 패드들을 위한 제형들
US11331767B2 (en) 2019-02-01 2022-05-17 Micron Technology, Inc. Pads for chemical mechanical planarization tools, chemical mechanical planarization tools, and related methods
US11851570B2 (en) * 2019-04-12 2023-12-26 Applied Materials, Inc. Anionic polishing pads formed by printing processes
USD934573S1 (en) * 2019-12-19 2021-11-02 3M Innovative Properties Company Sponge with surface pattern
US11813712B2 (en) 2019-12-20 2023-11-14 Applied Materials, Inc. Polishing pads having selectively arranged porosity
US11806829B2 (en) 2020-06-19 2023-11-07 Applied Materials, Inc. Advanced polishing pads and related polishing pad manufacturing methods
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09201773A (ja) * 1996-01-29 1997-08-05 Dainippon Printing Co Ltd 研磨テープ及びその製造方法
JPH11512874A (ja) * 1995-09-22 1999-11-02 ミネソタ・マイニング・アンド・マニュファクチャリング・カンパニー 半導体ウェーハの露出面を改質する方法
JP2008537911A (ja) * 2005-04-14 2008-10-02 サンーゴバン アブレイシブズ，インコーポレイティド ストラクチャード研磨物品を作る方法

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US5152917B1 (en) * 1991-02-06 1998-01-13 Minnesota Mining & Mfg Structured abrasive article
US5435816A (en) 1993-01-14 1995-07-25 Minnesota Mining And Manufacturing Company Method of making an abrasive article
RU2124978C1 (ru) 1993-09-13 1999-01-20 Миннесота Майнинг Энд Мэнюфекчуринг Компани Абразивное изделие, способ его производства, способ его использования для чистовой обработки и рабочий инструмент для его производства
US5454844A (en) 1993-10-29 1995-10-03 Minnesota Mining And Manufacturing Company Abrasive article, a process of making same, and a method of using same to finish a workpiece surface
KR970701118A (ko) 1994-02-22 1997-03-17 로저 로이 템트 연마 물품, 이의 제조 방법 및 이를 표면 마무리용으로서 사용하는 방법(abrasive article, a method of making same, and a method of using same for finishing)
US5692950A (en) 1996-08-08 1997-12-02 Minnesota Mining And Manufacturing Company Abrasive construction for semiconductor wafer modification
US6475253B2 (en) * 1996-09-11 2002-11-05 3M Innovative Properties Company Abrasive article and method of making
US5876268A (en) * 1997-01-03 1999-03-02 Minnesota Mining And Manufacturing Company Method and article for the production of optical quality surfaces on glass
US5833724A (en) * 1997-01-07 1998-11-10 Norton Company Structured abrasives with adhered functional powders
US5851247A (en) 1997-02-24 1998-12-22 Minnesota Mining & Manufacturing Company Structured abrasive article adapted to abrade a mild steel workpiece
FR2766106B1 (fr) * 1997-07-18 2001-09-07 Coatex Sa Utilisation d'un copolymere a structure tensio-active comme agent dispersant et/ou d'aide au broyage
US6139594A (en) * 1998-04-13 2000-10-31 3M Innovative Properties Company Abrasive article with tie coat and method
US6458018B1 (en) * 1999-04-23 2002-10-01 3M Innovative Properties Company Abrasive article suitable for abrading glass and glass ceramic workpieces
US20030017797A1 (en) * 2001-03-28 2003-01-23 Kendall Philip E. Dual cured abrasive articles
US7150771B2 (en) * 2004-06-18 2006-12-19 3M Innovative Properties Company Coated abrasive article with composite tie layer, and method of making and using the same
US8083820B2 (en) * 2006-12-22 2011-12-27 3M Innovative Properties Company Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same
US7497885B2 (en) 2006-12-22 2009-03-03 3M Innovative Properties Company Abrasive articles with nanoparticulate fillers and method for making and using them
US8348723B2 (en) * 2009-09-16 2013-01-08 3M Innovative Properties Company Structured abrasive article and method of using the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11512874A (ja) * 1995-09-22 1999-11-02 ミネソタ・マイニング・アンド・マニュファクチャリング・カンパニー 半導体ウェーハの露出面を改質する方法
JPH09201773A (ja) * 1996-01-29 1997-08-05 Dainippon Printing Co Ltd 研磨テープ及びその製造方法
JP2008537911A (ja) * 2005-04-14 2008-10-02 サンーゴバン アブレイシブズ，インコーポレイティド ストラクチャード研磨物品を作る方法

Also Published As

Publication number Publication date
TWI532597B (zh) 2016-05-11
KR20130081229A (ko) 2013-07-16
WO2011142986A1 (en) 2011-11-17
CN102892553A (zh) 2013-01-23
SG185523A1 (en) 2012-12-28
TW201213121A (en) 2012-04-01
CN102892553B (zh) 2016-04-27
US20130059506A1 (en) 2013-03-07

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