JP2013526044A5 - - Google Patents

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Publication number
JP2013526044A5
JP2013526044A5 JP2013506551A JP2013506551A JP2013526044A5 JP 2013526044 A5 JP2013526044 A5 JP 2013526044A5 JP 2013506551 A JP2013506551 A JP 2013506551A JP 2013506551 A JP2013506551 A JP 2013506551A JP 2013526044 A5 JP2013526044 A5 JP 2013526044A5
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JP
Japan
Prior art keywords
radiation
spectral purity
purity filter
wavelength
mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013506551A
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English (en)
Japanese (ja)
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JP5727590B2 (ja
JP2013526044A (ja
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Publication date
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Priority claimed from PCT/EP2011/052573 external-priority patent/WO2011134692A1/en
Publication of JP2013526044A publication Critical patent/JP2013526044A/ja
Publication of JP2013526044A5 publication Critical patent/JP2013526044A5/ja
Application granted granted Critical
Publication of JP5727590B2 publication Critical patent/JP5727590B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013506551A 2010-04-27 2011-02-22 スペクトル純度フィルタ Active JP5727590B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US32842610P 2010-04-27 2010-04-27
US61/328,426 2010-04-27
PCT/EP2011/052573 WO2011134692A1 (en) 2010-04-27 2011-02-22 Spectral purity filter

Publications (3)

Publication Number Publication Date
JP2013526044A JP2013526044A (ja) 2013-06-20
JP2013526044A5 true JP2013526044A5 (enExample) 2014-04-10
JP5727590B2 JP5727590B2 (ja) 2015-06-03

Family

ID=43837934

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013506551A Active JP5727590B2 (ja) 2010-04-27 2011-02-22 スペクトル純度フィルタ

Country Status (8)

Country Link
US (1) US9726989B2 (enExample)
EP (1) EP2564273A1 (enExample)
JP (1) JP5727590B2 (enExample)
KR (1) KR101776829B1 (enExample)
CN (1) CN102859444B (enExample)
SG (1) SG184557A1 (enExample)
TW (1) TWI528117B (enExample)
WO (1) WO2011134692A1 (enExample)

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SG182568A1 (en) * 2010-02-12 2012-08-30 Asml Netherlands Bv Spectral purity filter
US9407997B2 (en) * 2010-10-12 2016-08-02 Invensense, Inc. Microphone package with embedded ASIC
TWI596384B (zh) * 2012-01-18 2017-08-21 Ａｓｍｌ荷蘭公司 光源收集器元件、微影裝置及元件製造方法
DE102012215698A1 (de) * 2012-09-05 2013-08-29 Carl Zeiss Smt Gmbh Überwachungseinrichtung für eine Projektonsbelichtungsanlage und Verfahren zu deren Betrieb
DE102012216502A1 (de) * 2012-09-17 2014-03-20 Carl Zeiss Smt Gmbh Spiegel
US9244368B2 (en) * 2012-09-26 2016-01-26 Kla-Tencor Corporation Particle control near reticle and optics using showerhead
DE102013213842A1 (de) * 2013-07-16 2015-01-22 Carl Zeiss Smt Gmbh Optisches Bauelement
NL2013700A (en) 2013-11-25 2015-05-27 Asml Netherlands Bv An apparatus, a device and a device manufacturing method.
KR20240038172A (ko) * 2014-07-04 2024-03-22 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 내에서 사용하는 멤브레인 및 이러한 멤브레인을 포함한 리소그래피 장치
US9664907B2 (en) * 2014-07-21 2017-05-30 Applied Materials Israel Ltd. Optical element for spatial beam shaping
CN105573065B (zh) * 2015-12-21 2017-12-26 中国科学院长春光学精密机械与物理研究所 用于极紫外光刻装置中的锆膜置换机构
CN119575749A (zh) 2018-10-15 2025-03-07 Asml荷兰有限公司 制造隔膜组件的方法
CN117999857A (zh) * 2021-09-15 2024-05-07 Asml荷兰有限公司 用于主动加热euv光源中的基板的装置和方法

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US6014251A (en) * 1997-04-08 2000-01-11 The United States Of America As Represented By The Secretary Of The Navy Optical filters based on uniform arrays of metallic waveguides
US5973316A (en) 1997-07-08 1999-10-26 Nec Research Institute, Inc. Sub-wavelength aperture arrays with enhanced light transmission
GB0108129D0 (en) 2001-03-31 2001-05-23 Bookham Technology Plc Optoelectronic filters
DE10127537C1 (de) 2001-05-31 2002-11-14 Apsys Advanced Particle System Trägersubstrat für die Abscheidung, automatisierte Erkennung und spektroskopische Identifizierung von Partikeln
US6522465B1 (en) * 2001-09-27 2003-02-18 Intel Corporation Transmitting spectral filtering of high power extreme ultra-violet radiation
JP4229103B2 (ja) 2001-10-29 2009-02-25 住友電気工業株式会社 金属微細構造体の製造方法
TWI227380B (en) * 2002-06-06 2005-02-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2004103773A (ja) * 2002-09-09 2004-04-02 Nikon Corp Ｘ線発生装置、ｘ線露光装置及びｘ線フィルター
US7453645B2 (en) 2004-12-30 2008-11-18 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
US7372623B2 (en) 2005-03-29 2008-05-13 Asml Netherlands B.V. Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
DE102005020521B4 (de) 2005-04-29 2013-05-02 Xtreme Technologies Gmbh Verfahren und Anordnung zur Unterdrückung von Debris bei der Erzeugung kurzwelliger Strahlung auf Basis eines Plasmas
JP2007227532A (ja) 2006-02-22 2007-09-06 Dainippon Printing Co Ltd 電磁波遮蔽シート
US7453071B2 (en) 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US8536551B2 (en) * 2008-06-12 2013-09-17 Gigaphoton Inc. Extreme ultra violet light source apparatus
NL2003256A1 (nl) 2008-08-06 2010-02-09 Asml Netherlands Bv Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element.
WO2010017890A1 (en) 2008-08-14 2010-02-18 Asml Netherlands B.V. Radiation source, lithographic apparatus, and device manufacturing method
JP5528449B2 (ja) 2008-08-29 2014-06-25 エーエスエムエル ネザーランズ ビー．ブイ． スペクトル純度フィルタ、このスペクトル純度フィルタを備えたリソグラフィ装置、およびデバイス製造方法
EP2329323A1 (en) * 2008-09-26 2011-06-08 ASML Netherlands BV Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
US20120147350A1 (en) 2009-06-30 2012-06-14 Asml Netherlands B.V Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
WO2011023470A1 (en) 2009-08-27 2011-03-03 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
NL2005166A (en) 2009-09-16 2011-03-17 Asml Netherlands Bv Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus.
CN102576194A (zh) 2009-09-23 2012-07-11 Asml荷兰有限公司 光谱纯度滤光片、光刻设备以及器件制造方法
SG182568A1 (en) 2010-02-12 2012-08-30 Asml Netherlands Bv Spectral purity filter
US8298729B2 (en) * 2010-03-18 2012-10-30 Micron Technology, Inc. Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks

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