TWI528117B - 光譜純度濾光器 - Google Patents

光譜純度濾光器 Download PDF

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Publication number
TWI528117B
TWI528117B TW100109983A TW100109983A TWI528117B TW I528117 B TWI528117 B TW I528117B TW 100109983 A TW100109983 A TW 100109983A TW 100109983 A TW100109983 A TW 100109983A TW I528117 B TWI528117 B TW I528117B
Authority
TW
Taiwan
Prior art keywords
radiation
spectral purity
purity filter
wavelength
apertures
Prior art date
Application number
TW100109983A
Other languages
English (en)
Chinese (zh)
Other versions
TW201142541A (en
Inventor
烏特爾 安頌 索爾
凡丁 葉弗真葉米希 白尼
艾瑞克 羅勒夫 洛卜史塔
安卓 米克哈洛維奇 亞庫寧
馬丁 賈庫柏斯 喬漢 賈克
Original Assignee
Ａｓｍｌ荷蘭公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ａｓｍｌ荷蘭公司 filed Critical Ａｓｍｌ荷蘭公司
Publication of TW201142541A publication Critical patent/TW201142541A/zh
Application granted granted Critical
Publication of TWI528117B publication Critical patent/TWI528117B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H10P76/2041—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Optical Filters (AREA)
TW100109983A 2010-04-27 2011-03-23 光譜純度濾光器 TWI528117B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US32842610P 2010-04-27 2010-04-27

Publications (2)

Publication Number Publication Date
TW201142541A TW201142541A (en) 2011-12-01
TWI528117B true TWI528117B (zh) 2016-04-01

Family

ID=43837934

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100109983A TWI528117B (zh) 2010-04-27 2011-03-23 光譜純度濾光器

Country Status (8)

Country Link
US (1) US9726989B2 (enExample)
EP (1) EP2564273A1 (enExample)
JP (1) JP5727590B2 (enExample)
KR (1) KR101776829B1 (enExample)
CN (1) CN102859444B (enExample)
SG (1) SG184557A1 (enExample)
TW (1) TWI528117B (enExample)
WO (1) WO2011134692A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2534537B1 (en) * 2010-02-12 2016-05-04 ASML Netherlands B.V. Spectral purity filter
WO2012051340A1 (en) * 2010-10-12 2012-04-19 Analog Devices, Inc. Microphone package with embedded asic
TWI596384B (zh) * 2012-01-18 2017-08-21 Ａｓｍｌ荷蘭公司 光源收集器元件、微影裝置及元件製造方法
DE102012215698A1 (de) * 2012-09-05 2013-08-29 Carl Zeiss Smt Gmbh Überwachungseinrichtung für eine Projektonsbelichtungsanlage und Verfahren zu deren Betrieb
DE102012216502A1 (de) * 2012-09-17 2014-03-20 Carl Zeiss Smt Gmbh Spiegel
US9244368B2 (en) * 2012-09-26 2016-01-26 Kla-Tencor Corporation Particle control near reticle and optics using showerhead
DE102013213842A1 (de) * 2013-07-16 2015-01-22 Carl Zeiss Smt Gmbh Optisches Bauelement
NL2013700A (en) * 2013-11-25 2015-05-27 Asml Netherlands Bv An apparatus, a device and a device manufacturing method.
EP3164764B1 (en) * 2014-07-04 2021-02-24 ASML Netherlands B.V. Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane
US9664907B2 (en) * 2014-07-21 2017-05-30 Applied Materials Israel Ltd. Optical element for spatial beam shaping
CN105573065B (zh) * 2015-12-21 2017-12-26 中国科学院长春光学精密机械与物理研究所 用于极紫外光刻装置中的锆膜置换机构
CN112930498B (zh) * 2018-10-15 2024-12-13 Asml荷兰有限公司 制造隔膜组件的方法
WO2023041306A1 (en) * 2021-09-15 2023-03-23 Asml Netherlands B.V. Apparatus and method for actively heating a substrate in an euv light source

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6014251A (en) * 1997-04-08 2000-01-11 The United States Of America As Represented By The Secretary Of The Navy Optical filters based on uniform arrays of metallic waveguides
US5973316A (en) 1997-07-08 1999-10-26 Nec Research Institute, Inc. Sub-wavelength aperture arrays with enhanced light transmission
GB0108129D0 (en) 2001-03-31 2001-05-23 Bookham Technology Plc Optoelectronic filters
DE10127537C1 (de) 2001-05-31 2002-11-14 Apsys Advanced Particle System Trägersubstrat für die Abscheidung, automatisierte Erkennung und spektroskopische Identifizierung von Partikeln
US6522465B1 (en) * 2001-09-27 2003-02-18 Intel Corporation Transmitting spectral filtering of high power extreme ultra-violet radiation
JP4229103B2 (ja) 2001-10-29 2009-02-25 住友電気工業株式会社 金属微細構造体の製造方法
TWI227380B (en) 2002-06-06 2005-02-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2004103773A (ja) 2002-09-09 2004-04-02 Nikon Corp Ｘ線発生装置、ｘ線露光装置及びｘ線フィルター
US7453645B2 (en) * 2004-12-30 2008-11-18 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
US7372623B2 (en) 2005-03-29 2008-05-13 Asml Netherlands B.V. Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
DE102005020521B4 (de) 2005-04-29 2013-05-02 Xtreme Technologies Gmbh Verfahren und Anordnung zur Unterdrückung von Debris bei der Erzeugung kurzwelliger Strahlung auf Basis eines Plasmas
JP2007227532A (ja) 2006-02-22 2007-09-06 Dainippon Printing Co Ltd 電磁波遮蔽シート
US7453071B2 (en) * 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US8536551B2 (en) 2008-06-12 2013-09-17 Gigaphoton Inc. Extreme ultra violet light source apparatus
US9897930B2 (en) 2008-08-06 2018-02-20 Asml Netherlands B.V. Optical element comprising oriented carbon nanotube sheet and lithographic apparatus comprising such optical element
CN102099747B (zh) 2008-08-14 2013-06-19 Asml荷兰有限公司 辐射源、光刻设备以及器件制造方法
NL2003303A (en) 2008-08-29 2010-03-11 Asml Netherlands Bv Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby.
EP2329323A1 (en) 2008-09-26 2011-06-08 ASML Netherlands BV Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
EP2449430A1 (en) 2009-06-30 2012-05-09 ASML Netherlands BV Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
NL2005119A (en) 2009-08-27 2011-03-01 Asml Netherlands Bv Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter.
NL2005166A (en) 2009-09-16 2011-03-17 Asml Netherlands Bv Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus.
JP2013505593A (ja) 2009-09-23 2013-02-14 エーエスエムエル ネザーランズ ビー．ブイ． スペクトル純度フィルタ、リソグラフィ装置、及びデバイス製造方法
EP2534537B1 (en) 2010-02-12 2016-05-04 ASML Netherlands B.V. Spectral purity filter
US8298729B2 (en) * 2010-03-18 2012-10-30 Micron Technology, Inc. Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks

Also Published As

Publication number Publication date
JP2013526044A (ja) 2013-06-20
US9726989B2 (en) 2017-08-08
EP2564273A1 (en) 2013-03-06
WO2011134692A1 (en) 2011-11-03
CN102859444A (zh) 2013-01-02
SG184557A1 (en) 2012-11-29
KR20130105292A (ko) 2013-09-25
JP5727590B2 (ja) 2015-06-03
CN102859444B (zh) 2015-04-08
US20130038926A1 (en) 2013-02-14
TW201142541A (en) 2011-12-01
KR101776829B1 (ko) 2017-09-08

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