JP2013526004A5 - - Google Patents
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- Publication number
- JP2013526004A5 JP2013526004A5 JP2012556449A JP2012556449A JP2013526004A5 JP 2013526004 A5 JP2013526004 A5 JP 2013526004A5 JP 2012556449 A JP2012556449 A JP 2012556449A JP 2012556449 A JP2012556449 A JP 2012556449A JP 2013526004 A5 JP2013526004 A5 JP 2013526004A5
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- stage
- electrodes
- pair
- contaminant particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31350710P | 2010-03-12 | 2010-03-12 | |
| US61/313,507 | 2010-03-12 | ||
| US34852110P | 2010-05-26 | 2010-05-26 | |
| US61/348,521 | 2010-05-26 | ||
| PCT/EP2011/053171 WO2011110467A2 (en) | 2010-03-12 | 2011-03-03 | System for removing contaminant particles, lithographic apparatus, method for removing contaminant particles and method for manufacturing a device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013526004A JP2013526004A (ja) | 2013-06-20 |
| JP2013526004A5 true JP2013526004A5 (cg-RX-API-DMAC7.html) | 2014-04-17 |
Family
ID=44544069
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012556449A Withdrawn JP2013526004A (ja) | 2010-03-12 | 2011-03-03 | 汚染粒子を除去するシステム、リソグラフィ装置、汚染粒子を除去する方法、及びデバイス製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20130070218A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2013526004A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20130054945A (cg-RX-API-DMAC7.html) |
| CN (1) | CN102918461A (cg-RX-API-DMAC7.html) |
| TW (1) | TW201214060A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2011110467A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130235357A1 (en) * | 2012-03-12 | 2013-09-12 | Kla-Tencor Corporation | System and Method for Particle Control Near A Reticle |
| US20140253887A1 (en) * | 2013-03-07 | 2014-09-11 | Applied Materials, Inc. | Contamination prevention for photomask in extreme ultraviolet lithography application |
| EP3032334B1 (en) * | 2014-12-08 | 2017-10-18 | Agfa Graphics Nv | A system for reducing ablation debris |
| WO2016079607A1 (en) * | 2015-06-24 | 2016-05-26 | Alvarado Castañeda Diego Arturo | Method and apparatus for maintaining the surface of a reticle free of particles |
| DE102015215223A1 (de) | 2015-08-10 | 2017-02-16 | Carl Zeiss Smt Gmbh | EUV-Lithographiesystem |
| RU2623400C1 (ru) * | 2015-12-24 | 2017-06-26 | Федеральное государственное бюджетное учреждение науки Физико-технический институт им. А.Ф. Иоффе Российской академии наук | Способ защиты литографического оборудования от пылевых металлических частиц |
| DE102016208850A1 (de) * | 2016-05-23 | 2017-12-07 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Halbleiterlithographie mit Elementen zur Plasmakonditionierung |
| US10149375B2 (en) * | 2016-09-14 | 2018-12-04 | Asml Netherlands B.V. | Target trajectory metrology in an extreme ultraviolet light source |
| WO2019020445A1 (en) * | 2017-07-28 | 2019-01-31 | Asml Netherlands B.V. | PARTICLE TRAPS AND BARRIERS FOR DEPLETION OF PARTICLES |
| CN119493333A (zh) * | 2018-11-27 | 2025-02-21 | Asml荷兰有限公司 | 隔膜清洁设备 |
| KR20240104185A (ko) | 2018-12-10 | 2024-07-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 극자외선 리소그래피 애플리케이션에서 포토마스크로부터의 부착 피처 제거 |
| US12332570B2 (en) | 2020-01-23 | 2025-06-17 | Asml Holding N.V. | Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris |
| DE102020208568A1 (de) * | 2020-07-08 | 2022-01-13 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren zum Entfernen eines einzelnen Partikels von einem Substrat |
| CN119317867A (zh) * | 2022-05-11 | 2025-01-14 | Asml荷兰有限公司 | 光刻设备及相关方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1008352C2 (nl) | 1998-02-19 | 1999-08-20 | Stichting Tech Wetenschapp | Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden. |
| DE60118669T2 (de) | 2000-08-25 | 2007-01-11 | Asml Netherlands B.V. | Lithographischer Projektionsapparat |
| US6614505B2 (en) | 2001-01-10 | 2003-09-02 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method, and device manufactured thereby |
| EP1223468B1 (en) * | 2001-01-10 | 2008-07-02 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
| TWI255394B (en) * | 2002-12-23 | 2006-05-21 | Asml Netherlands Bv | Lithographic apparatus with debris suppression means and device manufacturing method |
| US7230258B2 (en) * | 2003-07-24 | 2007-06-12 | Intel Corporation | Plasma-based debris mitigation for extreme ultraviolet (EUV) light source |
| EP1726993A1 (de) * | 2005-05-24 | 2006-11-29 | Carl Zeiss SMT AG | Optisches System und Verfahren zum Betreiben desselben |
| JP5758153B2 (ja) * | 2010-03-12 | 2015-08-05 | エーエスエムエル ネザーランズ ビー．ブイ． | 放射源装置、リソグラフィ装置、放射発生および送出方法、およびデバイス製造方法 |
-
2011
- 2011-03-03 WO PCT/EP2011/053171 patent/WO2011110467A2/en not_active Ceased
- 2011-03-03 JP JP2012556449A patent/JP2013526004A/ja not_active Withdrawn
- 2011-03-03 CN CN2011800133737A patent/CN102918461A/zh active Pending
- 2011-03-03 US US13/580,364 patent/US20130070218A1/en not_active Abandoned
- 2011-03-03 KR KR1020127026672A patent/KR20130054945A/ko not_active Withdrawn
- 2011-03-11 TW TW100108400A patent/TW201214060A/zh unknown
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