JP2013524533A5 - - Google Patents
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- Publication number
- JP2013524533A5 JP2013524533A5 JP2013503817A JP2013503817A JP2013524533A5 JP 2013524533 A5 JP2013524533 A5 JP 2013524533A5 JP 2013503817 A JP2013503817 A JP 2013503817A JP 2013503817 A JP2013503817 A JP 2013503817A JP 2013524533 A5 JP2013524533 A5 JP 2013524533A5
- Authority
- JP
- Japan
- Prior art keywords
- bandwidth
- range
- light beam
- control
- switching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 15
- 238000005259 measurement Methods 0.000 claims 11
- 230000004913 activation Effects 0.000 claims 6
- 230000003287 optical effect Effects 0.000 claims 6
- 230000003213 activating effect Effects 0.000 claims 3
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/755,772 | 2010-04-07 | ||
| US12/755,772 US8837536B2 (en) | 2010-04-07 | 2010-04-07 | Method and apparatus for controlling light bandwidth |
| PCT/US2011/031116 WO2011126992A1 (en) | 2010-04-07 | 2011-04-04 | Method and apparatus for controlling light bandwidth |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016233858A Division JP2017046013A (ja) | 2010-04-07 | 2016-12-01 | 光の帯域幅を制御する方法及び装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013524533A JP2013524533A (ja) | 2013-06-17 |
| JP2013524533A5 true JP2013524533A5 (enExample) | 2014-05-22 |
| JP6097213B2 JP6097213B2 (ja) | 2017-03-15 |
Family
ID=44760889
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013503817A Active JP6097213B2 (ja) | 2010-04-07 | 2011-04-04 | 光の帯域幅を制御する方法及び装置 |
| JP2016233858A Withdrawn JP2017046013A (ja) | 2010-04-07 | 2016-12-01 | 光の帯域幅を制御する方法及び装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016233858A Withdrawn JP2017046013A (ja) | 2010-04-07 | 2016-12-01 | 光の帯域幅を制御する方法及び装置 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8837536B2 (enExample) |
| EP (1) | EP2556569A4 (enExample) |
| JP (2) | JP6097213B2 (enExample) |
| KR (1) | KR101811742B1 (enExample) |
| CN (1) | CN102834988B (enExample) |
| SG (1) | SG184081A1 (enExample) |
| TW (1) | TWI538329B (enExample) |
| WO (1) | WO2011126992A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8624209B1 (en) * | 2013-03-14 | 2014-01-07 | Cymer, Llc | Controlling spatial properties in an excimer ring amplifier |
| US9785050B2 (en) | 2015-06-26 | 2017-10-10 | Cymer, Llc | Pulsed light beam spectral feature control |
| WO2017066602A1 (en) * | 2015-10-16 | 2017-04-20 | Thorlabs, Inc. | Linear motor or voice coil for fast tuning of a laser cavity |
| US10416471B2 (en) | 2016-10-17 | 2019-09-17 | Cymer, Llc | Spectral feature control apparatus |
| US9966725B1 (en) * | 2017-03-24 | 2018-05-08 | Cymer, Llc | Pulsed light beam spectral feature control |
| US10096969B1 (en) * | 2017-09-14 | 2018-10-09 | Cymer, Llc | Method for dither free adaptive and robust dose control for photolithography |
| CN111148994A (zh) * | 2017-09-25 | 2020-05-12 | 西默有限公司 | 气体放电光源中的氟检测 |
| CN111433674B (zh) | 2017-10-19 | 2024-01-09 | 西默有限公司 | 在单次光刻曝光通过过程中形成多个空间图像 |
| US11588293B2 (en) * | 2017-11-21 | 2023-02-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | Methods and systems for aligning master oscillator power amplifier systems |
| CN108628109B (zh) * | 2018-05-04 | 2021-06-15 | 上海华力集成电路制造有限公司 | 光刻曝光设备及光刻曝光方法 |
| JP7382424B2 (ja) * | 2019-05-22 | 2023-11-16 | サイマー リミテッド ライアビリティ カンパニー | 複数の深紫外光発振器のための制御システム |
| JP7358610B2 (ja) * | 2019-07-23 | 2023-10-10 | サイマー リミテッド ライアビリティ カンパニー | 繰り返し率のずれによって誘発される波長誤差を補償する方法 |
| CN115542689A (zh) * | 2022-09-30 | 2022-12-30 | 东方晶源微电子科技（北京）有限公司 | 一种套刻标记可制造性快速筛选方法、装置及计算机设备 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2830492B2 (ja) | 1991-03-06 | 1998-12-02 | 株式会社ニコン | 投影露光装置及び投影露光方法 |
| JPH05167163A (ja) * | 1991-12-12 | 1993-07-02 | Mitsubishi Electric Corp | 狭帯域化レーザ装置 |
| JP3600883B2 (ja) * | 1995-12-25 | 2004-12-15 | 株式会社ニコン | 露光方法 |
| US6671294B2 (en) | 1997-07-22 | 2003-12-30 | Cymer, Inc. | Laser spectral engineering for lithographic process |
| US6853653B2 (en) | 1997-07-22 | 2005-02-08 | Cymer, Inc. | Laser spectral engineering for lithographic process |
| US6393037B1 (en) | 1999-02-03 | 2002-05-21 | Lambda Physik Ag | Wavelength selector for laser with adjustable angular dispersion |
| US6496528B2 (en) * | 1999-09-03 | 2002-12-17 | Cymer, Inc. | Line narrowing unit with flexural grating mount |
| JP2001258406A (ja) * | 2000-03-22 | 2001-09-25 | Kubota Corp | 農用膜体の剥取り装置 |
| US7088758B2 (en) | 2001-07-27 | 2006-08-08 | Cymer, Inc. | Relax gas discharge laser lithography light source |
| US7154928B2 (en) | 2004-06-23 | 2006-12-26 | Cymer Inc. | Laser output beam wavefront splitter for bandwidth spectrum control |
| JP2003298163A (ja) * | 2002-01-31 | 2003-10-17 | Canon Inc | レーザー装置、露光装置及び露光方法 |
| KR100624081B1 (ko) | 2002-01-31 | 2006-09-19 | 캐논 가부시끼가이샤 | 레이저장치, 노광장치 및 노광방법 |
| US6816535B2 (en) * | 2002-09-17 | 2004-11-09 | Northrop Grumman Corporation | Co-alignment of time-multiplexed pulsed laser beams to a single reference point |
| US7256893B2 (en) * | 2003-06-26 | 2007-08-14 | Cymer, Inc. | Method and apparatus for measuring bandwidth of an optical spectrum output of a very small wavelength very narrow bandwidth high power laser |
| US6952267B2 (en) | 2003-07-07 | 2005-10-04 | Cymer, Inc. | Method and apparatus for measuring bandwidth of a laser output |
| US7643522B2 (en) * | 2004-11-30 | 2010-01-05 | Cymer, Inc. | Method and apparatus for gas discharge laser bandwidth and center wavelength control |
| US20060114956A1 (en) * | 2004-11-30 | 2006-06-01 | Sandstrom Richard L | High power high pulse repetition rate gas discharge laser system bandwidth management |
| US7366219B2 (en) | 2004-11-30 | 2008-04-29 | Cymer, Inc. | Line narrowing module |
| JP5183013B2 (ja) * | 2005-01-27 | 2013-04-17 | 住友電工デバイス・イノベーション株式会社 | レーザモジュールおよび外部共振型レーザの波長制御方法 |
| US7317536B2 (en) | 2005-06-27 | 2008-01-08 | Cymer, Inc. | Spectral bandwidth metrology for high repetition rate gas discharge lasers |
| US7653095B2 (en) | 2005-06-30 | 2010-01-26 | Cymer, Inc. | Active bandwidth control for a laser |
| KR100702845B1 (ko) * | 2006-01-20 | 2007-04-03 | 삼성전자주식회사 | 엑시머 레이저 및 그의 협대역 모듈 |
| US7822084B2 (en) * | 2006-02-17 | 2010-10-26 | Cymer, Inc. | Method and apparatus for stabilizing and tuning the bandwidth of laser light |
| US7852889B2 (en) * | 2006-02-17 | 2010-12-14 | Cymer, Inc. | Active spectral control of DUV light source |
| US8259764B2 (en) | 2006-06-21 | 2012-09-04 | Cymer, Inc. | Bandwidth control device |
| TWI424645B (zh) * | 2007-04-13 | 2014-01-21 | Cymer Inc | 用以穩定及調諧雷射光帶寬之方法與裝置 |
| US7659529B2 (en) * | 2007-04-13 | 2010-02-09 | Cymer, Inc. | Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element |
-
2010
- 2010-04-07 US US12/755,772 patent/US8837536B2/en active Active
-
2011
- 2011-03-28 TW TW100110585A patent/TWI538329B/zh active
- 2011-04-04 JP JP2013503817A patent/JP6097213B2/ja active Active
- 2011-04-04 KR KR1020127029121A patent/KR101811742B1/ko active Active
- 2011-04-04 CN CN201180016717.XA patent/CN102834988B/zh active Active
- 2011-04-04 WO PCT/US2011/031116 patent/WO2011126992A1/en not_active Ceased
- 2011-04-04 EP EP11766562.0A patent/EP2556569A4/en not_active Withdrawn
- 2011-04-04 SG SG2012068367A patent/SG184081A1/en unknown
-
2016
- 2016-12-01 JP JP2016233858A patent/JP2017046013A/ja not_active Withdrawn