KR101811742B1 - 광 대역폭 제어 방법 및 장치 - Google Patents

광 대역폭 제어 방법 및 장치 Download PDF

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Publication number
KR101811742B1
KR101811742B1 KR1020127029121A KR20127029121A KR101811742B1 KR 101811742 B1 KR101811742 B1 KR 101811742B1 KR 1020127029121 A KR1020127029121 A KR 1020127029121A KR 20127029121 A KR20127029121 A KR 20127029121A KR 101811742 B1 KR101811742 B1 KR 101811742B1
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South Korea
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bandwidth
range
actuation system
control
light beam
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Korean (ko)
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KR20130093486A (ko
Inventor
케빈 엠. 오브라이언
페도르 비. 트린트척
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사이머 엘엘씨
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020127029121A 2010-04-07 2011-04-04 광 대역폭 제어 방법 및 장치 Active KR101811742B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/755,772 2010-04-07
US12/755,772 US8837536B2 (en) 2010-04-07 2010-04-07 Method and apparatus for controlling light bandwidth
PCT/US2011/031116 WO2011126992A1 (en) 2010-04-07 2011-04-04 Method and apparatus for controlling light bandwidth

Publications (2)

Publication Number Publication Date
KR20130093486A KR20130093486A (ko) 2013-08-22
KR101811742B1 true KR101811742B1 (ko) 2018-01-25

Family

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Family Applications (1)

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KR1020127029121A Active KR101811742B1 (ko) 2010-04-07 2011-04-04 광 대역폭 제어 방법 및 장치

Country Status (8)

Country Link
US (1) US8837536B2 (enExample)
EP (1) EP2556569A4 (enExample)
JP (2) JP6097213B2 (enExample)
KR (1) KR101811742B1 (enExample)
CN (1) CN102834988B (enExample)
SG (1) SG184081A1 (enExample)
TW (1) TWI538329B (enExample)
WO (1) WO2011126992A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
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US8624209B1 (en) * 2013-03-14 2014-01-07 Cymer, Llc Controlling spatial properties in an excimer ring amplifier
US9785050B2 (en) * 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
CN108141003A (zh) * 2015-10-16 2018-06-08 统雷有限公司 用于快速调谐激光器腔的线性电机或音圈
US10416471B2 (en) * 2016-10-17 2019-09-17 Cymer, Llc Spectral feature control apparatus
US9966725B1 (en) * 2017-03-24 2018-05-08 Cymer, Llc Pulsed light beam spectral feature control
US10096969B1 (en) * 2017-09-14 2018-10-09 Cymer, Llc Method for dither free adaptive and robust dose control for photolithography
WO2019060164A1 (en) * 2017-09-25 2019-03-28 Cymer, Llc FLUORINE DETECTION IN A GAS DISCHARGE LIGHT SOURCE
KR102484685B1 (ko) 2017-10-19 2023-01-03 사이머 엘엘씨 단일의 리소그래피 노광 패스로 복수의 에어리얼 이미지를 형성하는 방법
US11588293B2 (en) * 2017-11-21 2023-02-21 Taiwan Semiconductor Manufacturing Co., Ltd. Methods and systems for aligning master oscillator power amplifier systems
CN108628109B (zh) * 2018-05-04 2021-06-15 上海华力集成电路制造有限公司 光刻曝光设备及光刻曝光方法
CN113853551B (zh) * 2019-05-22 2024-09-10 西默有限公司 用于多个深紫外光学振荡器的控制系统
JP7358610B2 (ja) * 2019-07-23 2023-10-10 サイマー リミテッド ライアビリティ カンパニー 繰り返し率のずれによって誘発される波長誤差を補償する方法
CN115542689A (zh) * 2022-09-30 2022-12-30 东方晶源微电子科技（北京）有限公司 一种套刻标记可制造性快速筛选方法、装置及计算机设备

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JP2830492B2 (ja) 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
JPH05167163A (ja) * 1991-12-12 1993-07-02 Mitsubishi Electric Corp 狭帯域化レーザ装置
JP3600883B2 (ja) * 1995-12-25 2004-12-15 株式会社ニコン 露光方法
US6671294B2 (en) 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6853653B2 (en) 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US6393037B1 (en) 1999-02-03 2002-05-21 Lambda Physik Ag Wavelength selector for laser with adjustable angular dispersion
US6496528B2 (en) * 1999-09-03 2002-12-17 Cymer, Inc. Line narrowing unit with flexural grating mount
JP2001258406A (ja) * 2000-03-22 2001-09-25 Kubota Corp 農用膜体の剥取り装置
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KR100624081B1 (ko) 2002-01-31 2006-09-19 캐논 가부시끼가이샤 레이저장치, 노광장치 및 노광방법
US6816535B2 (en) * 2002-09-17 2004-11-09 Northrop Grumman Corporation Co-alignment of time-multiplexed pulsed laser beams to a single reference point
US7256893B2 (en) * 2003-06-26 2007-08-14 Cymer, Inc. Method and apparatus for measuring bandwidth of an optical spectrum output of a very small wavelength very narrow bandwidth high power laser
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US7643522B2 (en) * 2004-11-30 2010-01-05 Cymer, Inc. Method and apparatus for gas discharge laser bandwidth and center wavelength control
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Also Published As

Publication number Publication date
WO2011126992A1 (en) 2011-10-13
TWI538329B (zh) 2016-06-11
CN102834988A (zh) 2012-12-19
JP2013524533A (ja) 2013-06-17
EP2556569A4 (en) 2018-01-17
US8837536B2 (en) 2014-09-16
KR20130093486A (ko) 2013-08-22
EP2556569A1 (en) 2013-02-13
SG184081A1 (en) 2012-10-30
JP6097213B2 (ja) 2017-03-15
CN102834988B (zh) 2015-01-14
JP2017046013A (ja) 2017-03-02
TW201143235A (en) 2011-12-01
US20110249691A1 (en) 2011-10-13

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