JP2013522823A5 - - Google Patents

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Publication number
JP2013522823A5
JP2013522823A5 JP2012557036A JP2012557036A JP2013522823A5 JP 2013522823 A5 JP2013522823 A5 JP 2013522823A5 JP 2012557036 A JP2012557036 A JP 2012557036A JP 2012557036 A JP2012557036 A JP 2012557036A JP 2013522823 A5 JP2013522823 A5 JP 2013522823A5
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JP
Japan
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controlled
flow
waveforms
stable
droplet
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JP2012557036A
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English (en)
Japanese (ja)
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JP2013522823A (ja
JP6403362B2 (ja
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Priority claimed from US12/721,317 external-priority patent/US8158960B2/en
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JP2012557036A 2010-03-10 2011-03-01 レーザ生成プラズマｅｕｖ光源 Active JP6403362B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/721,317 2010-03-10
US12/721,317 US8158960B2 (en) 2007-07-13 2010-03-10 Laser produced plasma EUV light source
PCT/US2011/000374 WO2011112235A1 (en) 2010-03-10 2011-03-01 Laser produced plasma euv light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017237953A Division JP6557716B2 (ja) 2010-03-10 2017-12-12 レーザ生成プラズマｅｕｖ光源

Publications (3)

Publication Number Publication Date
JP2013522823A JP2013522823A (ja) 2013-06-13
JP2013522823A5 true JP2013522823A5 (enExample) 2018-08-23
JP6403362B2 JP6403362B2 (ja) 2018-10-10

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JP2012557036A Active JP6403362B2 (ja) 2010-03-10 2011-03-01 レーザ生成プラズマｅｕｖ光源
JP2017237953A Active JP6557716B2 (ja) 2010-03-10 2017-12-12 レーザ生成プラズマｅｕｖ光源

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JP2017237953A Active JP6557716B2 (ja) 2010-03-10 2017-12-12 レーザ生成プラズマｅｕｖ光源

Country Status (7)

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US (1) US8158960B2 (enExample)
EP (1) EP2544766B1 (enExample)
JP (2) JP6403362B2 (enExample)
KR (2) KR101887104B1 (enExample)
CN (1) CN102791331B (enExample)
TW (1) TWI479955B (enExample)
WO (1) WO2011112235A1 (enExample)

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JP6864096B2 (ja) 2016-12-19 2021-04-21 エーエスエムエル ネザーランズ ビー．ブイ． 計測センサ、リソグラフィ装置および内でのデバイス製造方法
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