JP2013517627A - 露出導電性グリッドを有する耐湿分性光電池デバイス - Google Patents
露出導電性グリッドを有する耐湿分性光電池デバイス Download PDFInfo
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- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
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Abstract
Description
本非仮特許出願は、35U.S.C.§119(e)に基づいて、Eloweらにより2010年1月14日に出願された「露出導電性グリッドを有する耐湿分性光電池デバイス」(MOISTURE RESISTANT PHOTOVOLTAIC DEVICE WITH EXPOSED CONDUCTIVE GRID)という発明の名称である出願番号第61/294,878号の米国仮特許出願の優先権を主張する。その仮特許出願の全体を参照により本明細書中に取り込む。
本発明は外部電気接続の形成を容易にする導電性収集グリッドを取り込んだタイプの光電池デバイスに関し、より詳細には、ヘテロ接合光電池デバイス、特に、このようなグリッドとデバイスの他の構成要素との間に改良された接着力を有し、その改良された接着力が改良された耐湿分性を有するデバイスを提供するのを助けるカルコゲン系光電池デバイスに関する。
n-型カルコゲニド組成物及び/又はp-型カルコゲニド組成物の両方は、ヘテロ接合光電池デバイスの成分中に取り込まれてきた。p-型カルコゲニド組成物はこれらのデバイスの光電池アブソーバ領域として使用されてきた。例示のp-型光電池活性カルコゲニド組成物は、しばしば、アルミニウム(Al)、銅(Cu)、インジウム(In)及び/又はガリウム(Ga)のうちの1つ以上の硫化物及び/又はセレン化物を含む。より典型的には、Cu、In及びGaの少なくとも2つ又はさらには3つすべてが存在する。このような材料はCIS、CIAS、CISS、CIGS及び/又はCIGSS組成物など呼ばれる(以下に、包括的にCIGS組成物と呼ぶ)。
本発明は透明導電性酸化物、導電性グリッド材料及び誘電性バリア層のうちの2つ以上の層の間の接着力を改良するための方策を提供する。結果として、その方策はカルコゲニド系太陽電池などのヘテロ接合太陽電池の製造に特に有用である。得られる電池は離層、破壊及び/又は湿分浸入に対して、より耐性である。本発明の方策により保護されたデバイスは向上された使用可能寿命を有することが期待される。驚くべきことに、本発明の発明者は、もしバリアが形成され、その後に、バリア内のビアにグリッドを適用するならば、バリアをグリッド上又はその周囲に形成する場合と比較して、構造は向上された耐湿分性を有するということを発見した。グリッド材料及び誘電性バリア材料が協働してデバイス上に密封シールを提供し、それにより、水浸入による損傷を含む環境条件により誘導される損傷に対して保護することができる程度に接着力は改良される。これにより、収集グリッドは誘電性バリア上に少なくとも部分的に露出され、デバイスに電気接続を形成することが容易になる。
a)光入射表面及び裏面を有し、そして少なくとも1つの光電池アブソーバ、好ましくはカルコゲニド含有光電池アブソーバを含む基材であって、アブソーバと光入射表面との間に配置された少なくとも1つの透明導電性酸化物層を含む基材、
b)透明導電性酸化物層上に配置された誘電性バリア層、
c)誘電性バリア層に存在し、デバイス中のある位置を終端とする少なくとも1つのビアであって、該ビアが透明導電性酸化物層全体を通して貫通せずに、誘電性バリア層を通して透明導電性酸化物層に開放連通を提供するようになっている少なくとも1つのビア、及び、
d)透明導電性酸化物層に電気的に接続された電気接触部であって、ビア内に形成されたベース及び誘電性バリア層より上に突出したキャップを含む電気接触部、
を含む、光電池デバイスを提供する。
a)光入射表面及び裏面を有し、そして少なくとも1つの光電池アブソーバ、好ましくはカルコゲニド含有光電池アブソーバを含む基材であって、アブソーバと光入射表面との間に配置された少なくとも1つの透明導電性酸化物層を含む基材、
b)透明導電性酸化物層上に配置された誘電性バリア層、
c)誘電性バリア層に存在し、デバイス中のある位置を終端とする少なくとも1つのビアであって、該ビアが透明導電性酸化物層全体を通して貫通せずに、誘電性バリア層を通して透明導電性酸化物層に開放連通を提供するようになっている少なくとも1つのビア、及び、
d)透明導電性酸化物層に電気的に接続された電気接触部であって、ビア内に形成されたベース、及び、ビアの少なくとも一部よりも少なくとも1つの方向で広い、誘電性バリア層より上に突出したキャップを含む電気接触部、
を含む、光電池デバイスに関する。
a)光入射表面及び裏面を有し、そして少なくとも1つの光電池アブソーバ、好ましくはカルコゲニド含有光電池アブソーバを含む基材であって、アブソーバと光入射表面との間に配置された少なくとも1つの透明導電性酸化物層を含む基材を提供すること、
b)透明導電性酸化物層上に誘電性バリア層を配置させること、
c) デバイス中のある位置を終端とする少なくとも1つのビアを誘電性バリア層に存在させ、該ビアが透明導電性酸化物層全体を通して貫通せずに、誘電性バリア層を通して透明導電性酸化物層に開放連通を提供するようにすること、及び、
d)透明導電性酸化物層に電気的に接続された電気接触部であって、ビア内に形成されたベース及び誘電性バリア層より上に突出したキャップを含む電気接触部を形成させること、
の工程を含む。
本発明の上記及び他の利点ならびその達成方法は添付の図面と組み合わせて本発明の実施形態の以下の説明を参照することにより、より明らかになりそして発明自体がより良好に理解されるであろう。
下記に示す本発明の実施形態は発明が以下の詳細な説明に開示されるまさにその形態に尽くされ又は限定されることを意図しない。むしろ、当業者が本発明の原理及び実施を評価しそして理解することができるように実施形態を選択しそして記載している。本明細書中に引用するすべての特許、係属中の特許出願、公開特許出願及び技術文献をすべての目的でそれぞれの全体を参照により本明細書中に取り込む。
例1
ソーダライムガラスの1”×1”片の上に、アルミニウムのスパッタリング蒸着薄膜(約30nm)を含む基材を調製し、次いで、130nmの厚さのインジウムスズオキシド(ITO)層を調製した。100mm直径の5mm厚さのITOセラミックターゲット(90wt%In203、10wt%Sn02)から慣用のRFマグネトロンスパッタリングチャンバーを用い、質量流量コントローラを用いて制御されたアルゴン(14sccm)及び酸素(2sccm)のガス流を用い、操作ガス圧力2.8mTorrを達成させて、インジウムスズオキシド(ITO)膜を調製した。堆積の間に基材温度を150℃に維持した。Kaptonテープ(1mm×5mm)のストリップをサンプルのある領域をマスキングするために適用した。178nmの厚さの窒化ケイ素の層をITO及びテープ上にスパッタリング蒸着した。窒化ケイ素はホウ素でドープしたシリコンターゲット及び50:50Ar:N2 ガス比を用いて反応性スパッタリングにより堆積した。堆積の間の圧力は4.0mTorrに制御し、出力は140Wに設定し、そしてチャンバー平板は回転モードであった。基材に対するターゲットの距離は75mmであった。窒化ケイ素膜の堆積速度は約40Å/分であった。堆積の前に、システムをベース圧力9×10−6Torrにポンプで減圧した。その後、テープを注意深く取り除き、窒化ケイ素の下の裸のITO層を露出させた。露出したITOよりも若干大きい長方形表面(ボイド)を除いて、全体のサンプルを被覆するようにマスクを適用した。
3つのソーダライムガラスの1”×1”片の上に、アルミニウムの薄膜(約30nm)をスパッタリング蒸着した。Kaptonテープ(1mm×5mm)のストリップを各サンプルのある領域をマスキングするために適用した。150nmの厚さの窒化ケイ素の層を、各サンプルにつき、例1に記載した条件と同一の条件を用いてアルミニウム及びテープ上にスパッタリング蒸着した。その後、テープのストリップを注意深く取り除き、窒化ケイ素の下の裸のアルミニウム層を露出させた。各サンプルにつき、露出したアルミニウムよりも若干大きい長方形表面を除いて、全体の基材を被覆するようにマスクを適用した。合計の厚さが約1600nmであるNi、次いでAgの層を例1に記載した条件を用いてマスク上に蒸着し、それにより、露出したアルミニウムを完全に覆った導電性グリッドを堆積した。
ソーダライムガラスの1”×1”(約2.5cm×2.5cm)片の上に、アルミニウムの薄膜(約30nm)をスパッタリング蒸着し、次いで、130nmの厚さのインジウムスズオキシド(ITO)層をスパッタリング蒸着した。Kaptonテープ(各1mm×5mm)の2つのストリップをサンプルの2つの明確な領域をマスキングするために適用した。150nmの厚さの窒化ケイ素の層をITO及び両方のテープストリップの上に例1に記載したのと同一のチャンバー及び条件を用いてスパッタリング蒸着した。その後、ストリップを注意深く取り除き、窒化ケイ素の下の裸のITO層を露出させた。1つの露出したITO領域よりも若干大きい1つの長方形表面を除いて、全体のサンプルを被覆するようにマスクを適用した。合計の厚さが1600nmであるNi、次いでAgの順次の層をマスク上に例1に記載した条件下に蒸着し、それにより、1つのITOの露出領域を完全に覆った導電性グリッドを堆積した。
電気接続 抵抗率
グリッド−グリッド 0.5(<1)Ω・cm
ITO−ITO 5.3〜6.3Ω・cm
グリッド−SiNx 導電性無し
グリッド−ITO 3.8〜4.5Ω・cm
Claims (15)
- a)光入射表面及び裏面を有し、そして少なくとも1つの光電池アブソーバを含む基材であって、前記アブソーバと前記光入射表面との間に配置された少なくとも1つの透明導電性酸化物層を含む基材を提供すること、
b)前記透明導電性酸化物層上に誘電性バリア層を配置させること、
c)デバイス中のある位置を終端とする少なくとも1つのビアを前記誘電性バリア層に存在させ、該ビアが前記透明導電性酸化物層全体を通して貫通せずに、前記誘電性バリア層を通して前記透明導電性酸化物層に開放連通を提供するようにすること、及び、
d)前記透明導電性酸化物層に電気的に接続された電気接触部であって、前記ビア内に形成されたベース及び前記誘電性バリア層より上に突出したキャップを含む電気接触部を形成させること、
の工程を含む、光電池デバイスの製造方法。 - 前記電気接触部と、前記ビア及び前記透明導電性酸化物層の少なくとも1つとの間に、ニッケルを含む導電性膜を配置させる工程をさらに含む、請求項1記載の方法。
- 前記電気接触部と、前記ビア及び前記透明導電性酸化物の少なくとも1つとの間に、接着向上性導電性膜を配置させる工程をさらに含む、先行の請求項のいずれか1記載の方法。
- 前記デバイス中に少なくとも1つの追加のバリア層を取り込ませる工程をさらに含む、先行の請求項のいずれか1項記載の方法。
- 前記誘電性バリア層及び前記電気接触部を覆う少なくとも1つの追加のバリア層を取り込ませる工程をさらに含む、先行の請求項のいずれか1項記載の方法。
- 前記少なくとも1つの光電池アブソーバはカルコゲニド含有アブソーバである、先行の方法請求項のいずれか1項記載の方法。
- 前記電気接触部のキャップは少なくとも1つの方向で前記電気接触部のベースよりも広い、先行の方法請求項のいずれか1項記載の方法。
- 前記電気接触部のキャップは少なくとも1つの方向で前記ビアよりも広い、先行の方法請求項のいずれか1項記載の方法。
- 前記アブソーバと前記光入射表面との間にバッファー層を配置させる工程をさらに含む、請求項6〜8のいずれか1項記載の方法。
- 工程(b)は約100℃以下の温度で、少なくともケイ素及び窒素を含む誘電性層を形成することを含む、先行の方法請求項のいずれか1項記載の方法。
- 前記誘電性層は式SiOyNz(式中、yは約0.05未満であり、zは約1.1〜約1.4の範囲にある)を有するケイ素化合物を含む、先行の請求項のいずれか1項記載の方法。
- 前記透明導電性酸化物はインジウム、亜鉛、スズ及びアルミニウムのうちの少なくとも1つを含む、先行の請求項のいずれか1項記載の方法。
- 前記誘電性バリア層は厚さが約10〜約1000nmの範囲にある、先行の方法請求項のいずれか1項記載の方法。
- 前記電気接続部はAg、Al、Cu、Cr、Ni及びTiのうちの少なくとも1つを含む、先行の方法請求項のいずれか1項記載の方法。
- 先行の請求項のいずれか1項記載の方法により製造されるヘテロ接合光電池デバイス。
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- 2011-01-12 CN CN201180006069XA patent/CN102742018A/zh active Pending
- 2011-01-12 EP EP11701904A patent/EP2524398A2/en not_active Withdrawn
- 2011-01-12 WO PCT/US2011/020979 patent/WO2011088114A2/en active Application Filing
- 2011-01-12 MX MX2012008210A patent/MX2012008210A/es not_active Application Discontinuation
- 2011-01-12 US US13/005,426 patent/US8921148B2/en not_active Expired - Fee Related
- 2011-01-12 JP JP2012549027A patent/JP5746216B2/ja not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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CN102742018A (zh) | 2012-10-17 |
WO2011088114A3 (en) | 2012-06-28 |
TWI514608B (zh) | 2015-12-21 |
TW201214736A (en) | 2012-04-01 |
US8921148B2 (en) | 2014-12-30 |
JP5746216B2 (ja) | 2015-07-08 |
KR20120120295A (ko) | 2012-11-01 |
EP2524398A2 (en) | 2012-11-21 |
US20110168243A1 (en) | 2011-07-14 |
US20150107666A1 (en) | 2015-04-23 |
WO2011088114A2 (en) | 2011-07-21 |
MX2012008210A (es) | 2012-11-06 |
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