JP2013514542A5 - - Google Patents

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Publication number
JP2013514542A5
JP2013514542A5 JP2012543872A JP2012543872A JP2013514542A5 JP 2013514542 A5 JP2013514542 A5 JP 2013514542A5 JP 2012543872 A JP2012543872 A JP 2012543872A JP 2012543872 A JP2012543872 A JP 2012543872A JP 2013514542 A5 JP2013514542 A5 JP 2013514542A5
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JP
Japan
Prior art keywords
diffraction
grating
frequencies
layer
grooves
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JP2012543872A
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English (en)
Japanese (ja)
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JP6005522B2 (ja
JP2013514542A (ja
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Priority claimed from FR0959157A external-priority patent/FR2954524B1/fr
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Publication of JP2013514542A5 publication Critical patent/JP2013514542A5/ja
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JP2012543872A 2009-12-17 2010-12-13 最適化された反射誘電体回折格子 Active JP6005522B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0959157 2009-12-17
FR0959157A FR2954524B1 (fr) 2009-12-17 2009-12-17 Reseau de diffraction reflechissant dielectrique optimise
PCT/FR2010/052684 WO2011073554A1 (fr) 2009-12-17 2010-12-13 Réseau de diffraction réfléchissant diélectrique optimisé

Publications (3)

Publication Number Publication Date
JP2013514542A JP2013514542A (ja) 2013-04-25
JP2013514542A5 true JP2013514542A5 (enExample) 2016-07-28
JP6005522B2 JP6005522B2 (ja) 2016-10-12

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JP2012543872A Active JP6005522B2 (ja) 2009-12-17 2010-12-13 最適化された反射誘電体回折格子

Country Status (7)

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US (1) US20120300302A1 (enExample)
EP (1) EP2513688A1 (enExample)
JP (1) JP6005522B2 (enExample)
KR (1) KR101759213B1 (enExample)
CN (1) CN102812388A (enExample)
FR (1) FR2954524B1 (enExample)
WO (1) WO2011073554A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102314040B (zh) * 2011-09-05 2013-04-17 青岛大学 一种宽光谱金属介质膜光栅及其优化方法
CN102313920B (zh) * 2011-09-05 2013-06-05 青岛大学 一种基于非规整膜层结构的宽光谱金属介质膜光栅
CN103592714B (zh) * 2013-10-17 2015-07-08 同济大学 一种易于制备的反射式多通道滤光元件的设计方法
CN104777532B (zh) * 2015-04-03 2017-02-22 中国科学院上海光学精密机械研究所 基于级联光栅结构的超窄带te偏振光谱选择性吸收器
US11112618B2 (en) 2015-09-03 2021-09-07 Asml Netherlands B.V. Beam splitting apparatus
US10241244B2 (en) * 2016-07-29 2019-03-26 Lumentum Operations Llc Thin film total internal reflection diffraction grating for single polarization or dual polarization
US11333807B2 (en) 2017-06-08 2022-05-17 Lawrence Livermore National Security, Llc Metal-overcoated grating and method
CN111356943A (zh) * 2017-11-06 2020-06-30 阿尔托大学基金会 场增强装置
JP2019120500A (ja) * 2017-12-28 2019-07-22 株式会社ミツトヨ スケールおよびその製造方法
US11747528B2 (en) * 2018-08-31 2023-09-05 Samsung Electronics Co., Ltd. Diffraction grating device, method of manufacturing the same, and optical apparatus including the diffraction grating device
DE102018220629A1 (de) * 2018-11-29 2020-06-04 Carl Zeiss Smt Gmbh Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel
CN111366999B (zh) * 2020-03-26 2021-11-26 合肥工业大学 一种基于三氧化钼渐变光栅的宽带极化敏感吸收器
EP4193201A4 (en) * 2020-08-07 2024-09-11 Ram Photonics Industrial, LLC METHOD AND SYSTEM FOR HIGH BANDWIDTH IMMERSION NETWORK
CN114460676B (zh) * 2022-03-03 2024-01-09 福建睿创光电科技有限公司 一种1030nm正弦型介质光栅及其制作方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5907436A (en) * 1995-09-29 1999-05-25 The Regents Of The University Of California Multilayer dielectric diffraction gratings
AT410732B (de) * 1999-07-07 2003-07-25 Femtolasers Produktions Gmbh Dispersiver mehrschichtiger spiegel
US6400509B1 (en) * 2000-04-07 2002-06-04 Zolo Technologies, Inc. Apparatus and method for the reduction of polarization sensitivity in diffraction gratings used in fiber optic communications devices
JP2002098820A (ja) * 2000-09-21 2002-04-05 Nippon Sheet Glass Co Ltd 反射型回折格子
EP1576356B1 (de) * 2002-12-19 2009-10-28 Oerlikon Trading AG, Trübbach Vorrichtung und Verfahren ZUR ERZEUGUNG ELEKTROMAGNETISCHER FELDVERTEILUNGEN
CN100526918C (zh) * 2003-02-18 2009-08-12 住友电气工业株式会社 衍射光栅元件
CN100476476C (zh) * 2004-03-24 2009-04-08 Enablence有限公司 平面波导反射衍射光栅
JP5050594B2 (ja) * 2007-03-20 2012-10-17 旭硝子株式会社 分光装置
JP5311757B2 (ja) * 2007-03-29 2013-10-09 キヤノン株式会社 反射光学素子、露光装置およびデバイス製造方法
US8116002B2 (en) * 2007-08-27 2012-02-14 Lumella Inc. Grating device with adjusting layer

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