JP2013511128A5 - - Google Patents

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Publication number
JP2013511128A5
JP2013511128A5 JP2012538809A JP2012538809A JP2013511128A5 JP 2013511128 A5 JP2013511128 A5 JP 2013511128A5 JP 2012538809 A JP2012538809 A JP 2012538809A JP 2012538809 A JP2012538809 A JP 2012538809A JP 2013511128 A5 JP2013511128 A5 JP 2013511128A5
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JP
Japan
Prior art keywords
plasma
residue
ion
gas
predetermined condition
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JP2012538809A
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English (en)
Japanese (ja)
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JP5827235B2 (ja
JP2013511128A (ja
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Priority claimed from US12/616,662 external-priority patent/US20110108058A1/en
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Publication of JP2013511128A publication Critical patent/JP2013511128A/ja
Publication of JP2013511128A5 publication Critical patent/JP2013511128A5/ja
Application granted granted Critical
Publication of JP5827235B2 publication Critical patent/JP5827235B2/ja
Expired - Fee Related legal-status Critical Current
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JP2012538809A 2009-11-11 2010-11-12 残留物を清浄する方法および装置 Expired - Fee Related JP5827235B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/616,662 US20110108058A1 (en) 2009-11-11 2009-11-11 Method and apparatus for cleaning residue from an ion source component
US12/616,662 2009-11-11
PCT/US2010/002969 WO2011059504A2 (en) 2009-11-11 2010-11-12 Method and apparatus for cleaning residue from an ion source component

Publications (3)

Publication Number Publication Date
JP2013511128A JP2013511128A (ja) 2013-03-28
JP2013511128A5 true JP2013511128A5 (https=) 2015-07-02
JP5827235B2 JP5827235B2 (ja) 2015-12-02

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ID=43735816

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012538809A Expired - Fee Related JP5827235B2 (ja) 2009-11-11 2010-11-12 残留物を清浄する方法および装置

Country Status (7)

Country Link
US (2) US20110108058A1 (https=)
EP (1) EP2499653A2 (https=)
JP (1) JP5827235B2 (https=)
KR (1) KR101741405B1 (https=)
CN (1) CN102612731B (https=)
TW (1) TWI500064B (https=)
WO (1) WO2011059504A2 (https=)

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