JP2013232531A5 - - Google Patents

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Publication number
JP2013232531A5
JP2013232531A5 JP2012103832A JP2012103832A JP2013232531A5 JP 2013232531 A5 JP2013232531 A5 JP 2013232531A5 JP 2012103832 A JP2012103832 A JP 2012103832A JP 2012103832 A JP2012103832 A JP 2012103832A JP 2013232531 A5 JP2013232531 A5 JP 2013232531A5
Authority
JP
Japan
Prior art keywords
charged particle
region
substrate
data
particle beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2012103832A
Other languages
English (en)
Japanese (ja)
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JP2013232531A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2012103832A priority Critical patent/JP2013232531A/ja
Priority claimed from JP2012103832A external-priority patent/JP2013232531A/ja
Priority to US13/869,483 priority patent/US20130288181A1/en
Publication of JP2013232531A publication Critical patent/JP2013232531A/ja
Publication of JP2013232531A5 publication Critical patent/JP2013232531A5/ja
Abandoned legal-status Critical Current

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JP2012103832A 2012-04-27 2012-04-27 描画装置及び物品の製造方法 Abandoned JP2013232531A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012103832A JP2013232531A (ja) 2012-04-27 2012-04-27 描画装置及び物品の製造方法
US13/869,483 US20130288181A1 (en) 2012-04-27 2013-04-24 Drawing apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012103832A JP2013232531A (ja) 2012-04-27 2012-04-27 描画装置及び物品の製造方法

Publications (2)

Publication Number Publication Date
JP2013232531A JP2013232531A (ja) 2013-11-14
JP2013232531A5 true JP2013232531A5 (enExample) 2015-06-18

Family

ID=49477603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012103832A Abandoned JP2013232531A (ja) 2012-04-27 2012-04-27 描画装置及び物品の製造方法

Country Status (2)

Country Link
US (1) US20130288181A1 (enExample)
JP (1) JP2013232531A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2014314B1 (en) * 2014-02-21 2016-07-19 Mapper Lithography Ip Bv Proximity effect correction in a charged particle lithography system.
JP6316052B2 (ja) * 2014-03-26 2018-04-25 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
JP6890373B2 (ja) * 2014-07-10 2021-06-18 アイエムエス ナノファブリケーション ゲーエムベーハー 畳み込みカーネルを使用する粒子ビーム描画機における結像偏向の補償
KR102179130B1 (ko) * 2015-07-17 2020-11-18 아이엠에스 나노패브릭케이션 게엠베하 하전 입자 멀티빔 노출 툴의 결함 빔렛 보상
JP6755764B2 (ja) * 2016-09-27 2020-09-16 株式会社Ｓｃｒｅｅｎホールディングス 位置計測装置および位置計測方法
JP7206830B2 (ja) * 2018-11-15 2023-01-18 大日本印刷株式会社 荷電マルチビーム描画装置の描画データ作成方法
US10748744B1 (en) 2019-05-24 2020-08-18 D2S, Inc. Method and system for determining a charged particle beam exposure for a local pattern density
US20230124768A1 (en) 2019-05-24 2023-04-20 D2S, Inc. Method and system for determining a charged particle beam exposure for a local pattern density
US11756765B2 (en) 2019-05-24 2023-09-12 D2S, Inc. Method and system for determining a charged particle beam exposure for a local pattern density

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6035113A (en) * 1998-01-05 2000-03-07 International Business Machines Corporation Electron beam proximity correction method for hierarchical design data
US6610989B1 (en) * 1999-05-31 2003-08-26 Fujitsu Limited Proximity effect correction method for charged particle beam exposure
JP4017935B2 (ja) * 2002-07-30 2007-12-05 株式会社日立ハイテクノロジーズ マルチビーム型電子線描画方法及び装置

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