JP2013219089A5 - - Google Patents

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Publication number
JP2013219089A5
JP2013219089A5 JP2012085893A JP2012085893A JP2013219089A5 JP 2013219089 A5 JP2013219089 A5 JP 2013219089A5 JP 2012085893 A JP2012085893 A JP 2012085893A JP 2012085893 A JP2012085893 A JP 2012085893A JP 2013219089 A5 JP2013219089 A5 JP 2013219089A5
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JP
Japan
Prior art keywords
optical element
optical
optical system
cylindrical surface
curvature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012085893A
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English (en)
Japanese (ja)
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JP2013219089A (ja
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Publication date
Application filed filed Critical
Priority to JP2012085893A priority Critical patent/JP2013219089A/ja
Priority claimed from JP2012085893A external-priority patent/JP2013219089A/ja
Priority to KR1020130032659A priority patent/KR20130112753A/ko
Priority to CN201310105985XA priority patent/CN103364963A/zh
Priority to TW102112172A priority patent/TW201344378A/zh
Publication of JP2013219089A publication Critical patent/JP2013219089A/ja
Publication of JP2013219089A5 publication Critical patent/JP2013219089A5/ja
Pending legal-status Critical Current

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JP2012085893A 2012-04-04 2012-04-04 光学系、露光装置、およびデバイス製造方法 Pending JP2013219089A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012085893A JP2013219089A (ja) 2012-04-04 2012-04-04 光学系、露光装置、およびデバイス製造方法
KR1020130032659A KR20130112753A (ko) 2012-04-04 2013-03-27 광학계, 노광 장치 및 디바이스 제조 방법
CN201310105985XA CN103364963A (zh) 2012-04-04 2013-03-29 光学系统、曝光装置以及设备制造方法
TW102112172A TW201344378A (zh) 2012-04-04 2013-04-03 光學系統、曝光裝置、及元件製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012085893A JP2013219089A (ja) 2012-04-04 2012-04-04 光学系、露光装置、およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2013219089A JP2013219089A (ja) 2013-10-24
JP2013219089A5 true JP2013219089A5 (enrdf_load_stackoverflow) 2015-05-28

Family

ID=49366682

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012085893A Pending JP2013219089A (ja) 2012-04-04 2012-04-04 光学系、露光装置、およびデバイス製造方法

Country Status (4)

Country Link
JP (1) JP2013219089A (enrdf_load_stackoverflow)
KR (1) KR20130112753A (enrdf_load_stackoverflow)
CN (1) CN103364963A (enrdf_load_stackoverflow)
TW (1) TW201344378A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105549327B (zh) * 2014-10-29 2018-03-02 上海微电子装备（集团）股份有限公司 曝光装置的调整装置及调整方法
CN106292188B (zh) 2015-05-24 2019-01-18 上海微电子装备（集团）股份有限公司 曝光装置
JP7075302B2 (ja) * 2018-07-23 2022-05-25 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP2023004358A (ja) 2021-06-25 2023-01-17 キヤノン株式会社 投影光学系、露光装置、および物品の製造方法
WO2023081041A1 (en) * 2021-11-02 2023-05-11 Corning Incorporated Magnification adjustable projection system using movable lens plates

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1184287A (ja) * 1997-09-08 1999-03-26 Ricoh Co Ltd 光走査装置
EP1231513A1 (en) * 2001-02-08 2002-08-14 Asm Lithography B.V. Lithographic projection apparatus with adjustable focal surface
JP4211272B2 (ja) * 2002-04-12 2009-01-21 株式会社ニコン 露光装置及び露光方法
JP2008166650A (ja) * 2007-01-05 2008-07-17 Nikon Corp 走査型露光装置、デバイスの製造方法及びマスク
TWI426295B (zh) * 2007-03-05 2014-02-11 尼康股份有限公司 反射折射投影光學系統、投影光學裝置以及掃描型曝光裝置
JP2010039347A (ja) * 2008-08-07 2010-02-18 Mejiro Precision:Kk 投影露光装置
TWI531872B (zh) * 2008-09-22 2016-05-01 Ａｓｍｌ荷蘭公司 微影裝置、可程式化圖案化器件及微影方法

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