JP2013208521A - Method for applying coating liquid and method for producing member for display - Google Patents

Method for applying coating liquid and method for producing member for display Download PDF

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JP2013208521A
JP2013208521A JP2012079370A JP2012079370A JP2013208521A JP 2013208521 A JP2013208521 A JP 2013208521A JP 2012079370 A JP2012079370 A JP 2012079370A JP 2012079370 A JP2012079370 A JP 2012079370A JP 2013208521 A JP2013208521 A JP 2013208521A
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coating liquid
coating
nozzle
period
discharge
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Yasuki Shimizu
泰樹 清水
Tatsuya Miyagawa
辰哉 宮川
Hiroshi Ogawa
博史 小川
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Toray Industries Inc
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Toray Industries Inc
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Abstract

PROBLEM TO BE SOLVED: To provide an applying method capable of stably applying a film thickness in an effective range adjacent to a non-effective range even to a substrate/base material in which the non-effective range narrows in a display member.SOLUTION: In a method for applying making a nozzle 30 having a gas space 36 and a coating liquid storing part 35 contacting the space and member to be coated face and come closer each other, and forming a coated film by relatively moving the nozzle 30 and the member to be coated while discharging a coating liquid stored in the coating liquid storing part 35 by pressurizing the space by gas controlled to a predetermined discharge pressure, the speed of the movement is continuously deceleratingly controlled and the discharge pressure is continuously decompressively controlled near the completion of applying, a first deceleration period and a second deceleration period decelerating at different accelerations are arranged during the period carrying out the deceleration control, they are switched during the period carrying out the deceleration control, a first decompression period and a second decompression period decompressing at different ratios are arranged during the period carrying out the decompression control, and they are switched during the period carrying out the decompression control.

Description

本発明は、ガラス基板、ウエハーなど、ノズルを用いて塗液を枚葉塗布する際の塗液の塗布方法に関するものであり、特に、プラズマディスプレイパネル(以下、PDPと略称することもある)、液晶ディスプレイ用カラーフィルター(以下、LCMと略称することもある)、有機ELディスプレイ、フレキシブルディスプレイ、光学フィルター、プリント基板、集積回路、半導体等の製造分野に使用されるものである。   The present invention relates to a method for applying a coating liquid when a coating liquid is applied by using a nozzle, such as a glass substrate or a wafer, and in particular, a plasma display panel (hereinafter sometimes abbreviated as PDP), It is used in the field of manufacturing liquid crystal display color filters (hereinafter also abbreviated as LCM), organic EL displays, flexible displays, optical filters, printed circuit boards, integrated circuits, semiconductors, and the like.

ガラス基板やウエハー等、ノズルを用いて基板に塗液を枚葉に塗布し所定の厚みで機能性のある表層を形成する場合に、ノズルはこの表層が形成される前記基板の表面と一定のクリアランスを保ち、基板の表面とノズルの吐出孔が対向するように配置され、ノズルと基板を相対移動させることがほとんどである。ここで用いられるノズルは、一つの平面に全ての吐出孔の縁部が臨むように形成されていることが多い。 When a coating liquid is applied to a substrate using a nozzle such as a glass substrate or a wafer to form a functional surface layer with a predetermined thickness, the nozzle is fixed to the surface of the substrate on which the surface layer is formed. In most cases, the clearance is maintained and the surface of the substrate and the discharge hole of the nozzle are opposed to each other, and the nozzle and the substrate are relatively moved. In many cases, the nozzles used here are formed so that the edges of all the discharge holes face one plane.

このような塗布を行う装置として、多くの場合において、X軸、Y軸およびZ軸の3軸を有するステージからなる塗布装置が用いられる。そして、3軸を駆動させることにより、ノズルの吐出孔面を前記表層を形成する基板の表面に所定のクリアランスでもって精度良く近接させた後、基板とノズルを相対移動させながら、吐出孔から塗液を吐出することにより、基板表面に前記表層の形成がおこなわれる。以下、近年開発が進み市場を形成しているPDPの技術を例として説明する。   In many cases, as a device for performing such coating, a coating device including a stage having three axes of an X axis, a Y axis, and a Z axis is used. Then, by driving the three axes, the discharge hole surface of the nozzle is brought close to the surface of the substrate on which the surface layer is formed with a predetermined clearance with high precision, and then the substrate and the nozzle are moved relative to each other while the substrate and the nozzle are relatively moved. The surface layer is formed on the surface of the substrate by discharging the liquid. Hereinafter, the PDP technology, which has been developed in recent years and has formed a market, will be described as an example.

PDPは大型で薄型軽量化が可能であり、その構成・発光機能は前面板と背面板の間に形成された放電空間内で放電を生じさせ、この放電によりキセノンガスから波長147nmを中心とする紫外線が生じて、この紫外線が蛍光体を励起することによって表示が可能となる。赤(R)、緑(G)、青(B)に発光する蛍光体を塗り分けた放電セルを駆動回路によって発光させることにより、フルカラー表示に対応できる。   The PDP is large, thin and lightweight, and its structure and light emitting function cause discharge in the discharge space formed between the front plate and the back plate, and this discharge generates ultraviolet rays centered on a wavelength of 147 nm from xenon gas. As a result, the ultraviolet rays excite the phosphor to enable display. Full-color display can be supported by causing the driving circuit to emit light by separately emitting discharge cells in which phosphors emitting red (R), green (G), and blue (B) are separately applied.

交流(AC)型PDPは、表示電極/誘電体層/保護層を形成した前面ガラス板と、アドレス電極/誘電体層/隔壁層/蛍光体層を形成した背面ガラス板とを貼り合わせ、ストライプ状あるいは格子状の隔壁で仕切られた放電空間内にHe−Xe、または、Ne−Xeの混合ガスを封入した構造を有している。R、G、Bの各蛍光体層は、粉末状の蛍光体粒子を主成分とする蛍光体が、背面板に形成された色毎に一方向に延びる隔壁、またはこのような隔壁とこれに直交する補助隔壁により井桁状に形成された凹部に充填されてなる。蛍光体層は蛍光体粉末および有機成分を含む塗液(蛍光体ペースト)を上述の隔壁、または隔壁および補助隔壁によって井桁状に形成された凹部に塗布し、乾燥し、必要に応じ焼成することによって形成される。このような構造のものを高い生産性と高品質で製造するには、塗液(蛍光体ペースト)を一定のパターン状に塗り分ける塗布技術が重要となる。
塗液(蛍光体ペースト)を所定の隔壁間に塗布する方法としては、スクリーン印刷法、ディスペンサー法(ノズル法と呼ばれる場合もある)があり、近年では材料ロスの少ないディスペンサー法が注目されつつある。
An alternating current (AC) type PDP is formed by laminating a front glass plate on which display electrodes / dielectric layers / protective layers are formed and a rear glass plate on which address electrodes / dielectric layers / partition layers / phosphor layers are formed. He-Xe or Ne-Xe mixed gas is enclosed in a discharge space partitioned by a grid-like or grid-like partition. Each of the phosphor layers of R, G, and B includes a phosphor having powdery phosphor particles as a main component, a partition extending in one direction for each color formed on the back plate, or such a partition and It is filled in a concave portion formed like a cross beam by orthogonal auxiliary partition walls. For the phosphor layer, a coating liquid (phosphor paste) containing phosphor powder and an organic component is applied to the above-mentioned barrier ribs, or the concave portions formed in a grid pattern by the barrier ribs and the auxiliary barrier ribs, dried, and fired as necessary. Formed by. In order to manufacture a product having such a structure with high productivity and high quality, a coating technique in which a coating liquid (phosphor paste) is applied in a certain pattern is important.
As a method for applying a coating liquid (phosphor paste) between predetermined partitions, there are a screen printing method and a dispenser method (sometimes called a nozzle method), and in recent years, a dispenser method with little material loss has been attracting attention. .

ディスペンサー法における塗液(蛍光体ペースト)の吐出は、ノズル内の塗液溜り部の塗液に圧力を加えて吐出孔より押し出すことにより行う。   The discharge of the coating liquid (phosphor paste) in the dispenser method is performed by applying pressure to the coating liquid in the coating liquid reservoir in the nozzle and pushing it out from the discharge hole.

塗液溜り部の塗液に加圧する方法としては、塗液溜り部とポンプなどを接続し、ポンプから塗液を定量送液することによる方法も考えられるが、塗液が高粘度である場合、ノズル内部や配管などの接液部での圧力損失が大きくなるため、応答の遅れが顕著となり、塗布時の塗液(蛍光体ペースト)の吐出制御が困難となるだけでなく、ノズルと、ノズルとポンプを接続している配管などの機器の耐圧も高くしなければならず、装置が高価になるため適当ではない。   As a method of pressurizing the coating liquid in the coating liquid reservoir, a method by connecting the coating liquid reservoir and a pump, etc., and feeding the coating liquid from the pump in a certain amount can be considered, but the coating liquid has a high viscosity. In addition, the pressure loss at the wetted part such as the inside of the nozzle and the pipe becomes large, so the delay in response becomes remarkable, and not only the discharge control of the coating liquid (phosphor paste) at the time of application becomes difficult, The pressure resistance of equipment such as piping connecting the nozzle and the pump must be increased, which is not appropriate because the apparatus becomes expensive.

そのため、ノズル内部に塗液溜り部および塗液溜り部の上方に空間部を有するマニホールドを形成し、この空間部に吐出制御用気体(圧縮空気)を供給することにより、塗液溜り部にある塗液を加圧して吐出孔より押し出すディスペンサー法が用いられることが多い。   For this reason, a coating liquid reservoir and a manifold having a space above the coating liquid reservoir are formed inside the nozzle, and a discharge control gas (compressed air) is supplied to the space so as to be in the coating liquid reservoir. In many cases, a dispenser method is used in which the coating liquid is pressurized and pushed out from the discharge holes.

この吐出制御用気体(圧縮空気)を用いたディスペンサー法による、塗液(蛍光体ペースト)塗布方法を示した模式図を図3に示す。ディスペンサー法は、内部に蛍光体ペースト41が貯留する塗液溜り部35と空間部36を持ったノズル30を、被塗布部材である基板9に対向させて配置し、ノズル30と基板9を所定のクリアランスを保って相対移動させながら、空間部36に接続された配管24を通して圧力を制御された圧縮空気を導入することで吐出孔33から蛍光体ペースト41を吐出し、隔壁37の間にペーストを充填する塗布方法である。   FIG. 3 is a schematic diagram showing a coating liquid (phosphor paste) coating method by a dispenser method using this discharge control gas (compressed air). In the dispenser method, a nozzle 30 having a coating liquid reservoir 35 and a space 36 in which the phosphor paste 41 is stored is disposed so as to face the substrate 9 that is a member to be coated. The phosphor paste 41 is discharged from the discharge holes 33 by introducing the compressed air whose pressure is controlled through the pipe 24 connected to the space portion 36 while maintaining the clearance of the paste, and the paste is interposed between the partition walls 37. It is the coating method which fills.

この方法における塗布装置の構成としては、例えば特許文献1に示すような、ノズルと、吐出バルブ、吐出制御用気体源、ノズル内のマニホールドと吐出バルブを接続する配管、吐出バルブと吐出制御用気体源を接続する配管、および吐出バルブを制御するコントローラからなるものが知られている。この構成の塗布装置におけるノズルの吐出孔からの塗液の吐出は、ノズル内の塗液溜り部の上方に位置する空間部と吐出制御用気体源が連通するように吐出バルブをコントローラで動作させることにより、吐出制御用気体源から吐出バルブおよび配管を介してノズル内の空間部に吐出制御用気体を供給し、塗液に圧力を加えて吐出孔より塗液を押し出すことで行われる。なお、ノズル内の空間部の容積は、吐出毎に、空間部への吐出制御用気体(圧縮空気)の供給を開始してから空間部に吐出制御用気体(圧縮空気)が充填供給されて塗液を吐出するまでの時間を均一にするために、一定に保つ必要がある。そのため、吐出後は常に空間の容積が所定量になるまで塗液をノズル内の塗液溜り部に補給する。   As a configuration of the coating apparatus in this method, for example, as shown in Patent Document 1, a nozzle, a discharge valve, a discharge control gas source, a pipe connecting a manifold and a discharge valve in the nozzle, a discharge valve and a discharge control gas There are known pipes that connect a source and a controller that controls a discharge valve. In the coating apparatus configured as described above, the discharge of the coating liquid from the discharge hole of the nozzle is performed by operating the discharge valve with a controller so that the space portion located above the coating liquid reservoir in the nozzle and the gas source for discharge control communicate with each other. Thus, the discharge control gas is supplied from the discharge control gas source to the space in the nozzle through the discharge valve and the pipe, and pressure is applied to the coating liquid to push out the coating liquid from the discharge hole. Note that the volume of the space in the nozzle is such that the discharge control gas (compressed air) is supplied to the space after the discharge control gas (compressed air) is supplied to the space for each discharge. In order to make the time until the coating liquid is discharged uniform, it is necessary to keep it constant. Therefore, after discharge, the coating liquid is always supplied to the coating liquid reservoir in the nozzle until the volume of the space reaches a predetermined amount.

この様なディスペンサー法による蛍光体ペーストの塗布は、枚葉間欠塗布であることが多く、1枚の基板を塗布する間に吐出開始と吐出終了がある。枚葉間欠塗布においては、塗布開始部は吐出開始部であり、塗布終了部は吐出終了部となるため、相対移動速度や吐出圧力などが過渡的状態である。よってディスペンサー法に限らず、塗布開始終了部(塗布端部とも言う)での塗布膜厚を均質に、所定膜厚値に維持するのがなかなか難しく、そのため様々な改良がなされてきている。   The application of the phosphor paste by such a dispenser method is often a single-wafer intermittent application, and there are a discharge start and a discharge end while a single substrate is applied. In the single wafer intermittent application, the application start part is a discharge start part and the application end part is a discharge end part, so that the relative movement speed, the discharge pressure, and the like are in a transient state. Therefore, it is difficult to maintain the coating film thickness not only in the dispenser method but at the coating start / end part (also referred to as coating end part) uniformly and at a predetermined film thickness value, and various improvements have been made.

例えば特許文献2には、枚葉塗布における塗布開始端および/または終了端のかすれた形状、途切れた形状、あるいは後を引いた形状となることを解消するための方法が示されている。ここにある塗布速度の変更は、塗布端の形状維持に関与するものであるが、実際の速度切替には加減速領域(時間)が生じること、および生産効率向上のため、塗布工程では基板に対して一度の走査で塗布を完了する大型ノズルが使用されることがほとんどであり、この大型ノズルの場合には塗布開始・終了時の圧力応答領域(時間)が膜厚に大きな影響を与える。よって特許文献2に示されている塗布速度の変更だけで塗布端の膜厚を維持させるのは難しいのが現状である。   For example, Patent Document 2 discloses a method for eliminating a faint shape, a discontinuous shape, or a subtracted shape at the coating start end and / or end end in single-wafer coating. The change in the coating speed here is related to maintaining the shape of the coating edge, but the actual speed switching causes an acceleration / deceleration area (time) and improves the production efficiency. On the other hand, a large nozzle that completes coating in one scan is used in most cases, and in the case of this large nozzle, the pressure response region (time) at the start and end of coating greatly affects the film thickness. Therefore, at present, it is difficult to maintain the film thickness at the coating end only by changing the coating speed shown in Patent Document 2.

また特許文献3には、塗布開始、終了部の不良膜厚領域を最大限に縮小する手段として、定容量ポンプから塗布器への塗布液供給量を段階的に増減させ、塗布開始、終了時の塗布速度をそれ以外の時の塗布速度よりも低くする方法が示されている。しかしながらディスペンサー法による塗布は、ノズル内の空間部にある塗液面を圧縮空気にて直接加圧して吐出するため、特許文献3内に記載されているような供給ホースの膨張による遅れなどは生じない。よってディスペンサー法でもって段階的増減をおこなうことは吐出圧力を段階的に増減させることであり、その場合には吐出量が直接変動してしまうため、塗布膜厚も段階的厚み変化を持つという不具合が生じる。また速度を低くしているが移動が停止するわけではないため、塗布終了端部での塗液のかすれた形状、途切れた形状、あるいは後を引いた形状等が生じてしまう。   In Patent Document 3, as a means for maximally reducing the defective film thickness region at the start and end of application, the supply amount of the application liquid from the constant capacity pump to the applicator is increased or decreased step by step. A method is shown in which the coating speed is lower than the coating speed at other times. However, since the application by the dispenser method is performed by directly pressurizing and discharging the coating liquid surface in the space in the nozzle with compressed air, a delay due to the expansion of the supply hose as described in Patent Document 3 occurs. Absent. Therefore, to increase or decrease step by step with the dispenser method is to increase or decrease the discharge pressure step by step. In this case, the discharge amount fluctuates directly, so the coating film thickness also has a step thickness change. Occurs. Further, although the speed is reduced, the movement does not stop, and therefore, a faint shape, a discontinuous shape, a trailing shape, or the like of the coating liquid at the end portion of application is generated.

また特許文献4には、塗布開始部の塗膜の膜厚プロファイルを微細に調整できる手段として、定容量ポンプから塗布器に至る経路中で塗布時の圧力を検知し、検知した塗布時の圧力波形形状が所望の形状になるよう圧力を制御して塗布する方法が示されている。ところがこの塗布方法をディスペンサー法の塗布終了部に適用してみたところ、以下の不具合が発生した。   In Patent Document 4, as a means for finely adjusting the film thickness profile of the coating film at the coating start portion, the pressure at the time of coating is detected in the path from the constant capacity pump to the applicator, and the detected pressure at the time of coating is detected. A method is shown in which the pressure is controlled so that the corrugated shape becomes a desired shape. However, when this application method was applied to the application end part of the dispenser method, the following problems occurred.

図4は、ディスペンサー法の塗布終了部で圧力波形を制御した場合の圧力時間線図であり、図5は図4の制御を行った基板の塗布終了部を観察した画像の模式図である。図4の通り精密な圧力の制御をおこなっているが、図5に示す通り塗布終了端近傍では塗布不良があり、膜厚が不均一で塗布面は途切れた形状となってしまった。これは塗液の性質にも依存するが、吐出量と圧力の関係が一定ではないため、低圧へ移行するに従い吐出量の変化(減少)が大きくなるため生じるものであり、圧力制御の傾きが一定では不十分であることを示唆する。   4 is a pressure time diagram when the pressure waveform is controlled at the application end portion of the dispenser method, and FIG. 5 is a schematic diagram of an image obtained by observing the application end portion of the substrate subjected to the control of FIG. Although precise pressure control was performed as shown in FIG. 4, there was a coating failure near the end of coating, as shown in FIG. 5, the coating thickness was uneven and the coating surface was cut off. This depends on the properties of the coating liquid, but the relationship between the discharge rate and pressure is not constant, and the change (decrease) in the discharge rate increases as the pressure shifts to low pressure. It suggests that constant is not enough.

また、被塗布部材である基板には図6に示すような有効域/非有効域が設けられており、塗布領域を塗布方向両端の非有効域内に収めつつ、有効域内の膜厚が所定の値内で均一になるよう塗布する事が求められる。有効域/非有効域は、その対象により表示域/非表示域と呼ばれることもあり、有効域には高品質が求められる。しかしながら近年は、材料効率や最終製品のデザイン性の観点から、テレビをはじめとする表示機器では、表示画面外の枠部が狭い「狭枠化」が進み、これに伴って被塗布部材である基板などでは、塗布端に設けられている非有効域が物理的に狭くなりつつある。これは言い換えれば塗布端部膜厚への要求が厳しくなってきた事を意味している。「狭枠化」により基板の端部における領域が変更され、従来は非有効域に収まって潜在化していた基板端部の膜厚不良部が、有効域に侵入して顕在化する事態が起こりうるのである。塗布端部膜厚の維持は従来から難しい技術を要してきたが、この「狭枠化」に対応する基板への対応は容易ではなく、既存の技術で対処するのは、その厳しい品質要求と物理的制限から、困難な状態になりつつある。   Further, an effective area / ineffective area as shown in FIG. 6 is provided on the substrate which is a member to be applied, and the film thickness in the effective area is set to a predetermined value while keeping the application area within the ineffective area at both ends in the application direction. Application is required to be uniform within the value. The effective area / non-effective area is sometimes called a display area / non-display area depending on the object, and high quality is required for the effective area. However, in recent years, from the viewpoint of material efficiency and final product design, in display devices such as televisions, the frame portion outside the display screen has become narrower, and accordingly, it is a member to be coated. In a substrate or the like, the ineffective area provided at the coating end is physically narrowing. In other words, this means that the demand for the coating end film thickness has become stricter. The area at the edge of the substrate has been changed due to “narrowing the frame”, and a defective film thickness portion at the edge of the substrate that has been hidden in the ineffective area in the past has entered the effective area and becomes apparent. It's ugly. Maintaining the coating end film thickness has traditionally required difficult technology, but it is not easy to handle substrates that support this "narrow frame". It is becoming difficult due to physical limitations.

特再2002−053297号公報Japanese Patent Publication No. 2002-053297 特開2001−269612号公報JP 2001-269612 A 特開2002−086044号公報Japanese Patent Laid-Open No. 2002-086044 特開2005−288387号公報JP 2005-288387 A

本発明は、上記を鑑みてなされたものであり、製品の狭枠化に伴い非有効域が狭くなった基板に対しても、非有効域に隣接する有効域内膜厚を安定して塗布することができて、高品位が要求されるディスプレイ部材への塗液の塗布方法を提供することを目的とする。
The present invention has been made in view of the above, and stably coats the film thickness in the effective area adjacent to the ineffective area even on a substrate whose ineffective area has become narrow due to the narrowing of the product. An object of the present invention is to provide a method of applying a coating liquid to a display member that can be used and has high quality.

上記目的を達成するために、本発明は、気体空間と該気体空間に接する塗液貯留部を有するノズルでもって、前記ノズルと被塗布部材を対向配置し、所定の吐出圧力に制御された気体により前記気体空間を加圧することによって前記塗液貯留部に貯留された塗液を吐出しながら、前記ノズルと前記被塗布部材を相対的に移動させて、前記被塗布部材上に塗膜を形成する塗布方法であって、塗布終了近傍においては前記移動の速度を連続的に減速制御するとともに、前記吐出圧力を連続的に減圧制御し、前記減速制御を行う期間には異なる加速度でもって減速する第1減速期間と第2減速期間を設けて、前記減速制御を行う期間の途中で切替えるとともに、前記減圧制御を行う期間には異なる割合でもって減圧する第1減圧期間と第2減圧期間を設けて、前記減圧制御を行う期間の途中で切替えることを特徴とする塗液の塗布方法を提供する。   In order to achieve the above object, the present invention provides a gas having a gas space and a coating liquid reservoir that is in contact with the gas space, the nozzle and the member to be coated facing each other, and a gas controlled to a predetermined discharge pressure. By forming the coating film on the coated member by relatively moving the nozzle and the coated member while discharging the coating liquid stored in the coating liquid reservoir by pressurizing the gas space In the application method, near the end of application, the speed of movement is controlled to continuously reduce, and the discharge pressure is controlled to continuously decrease, and the period of deceleration control is reduced with different accelerations. A first deceleration period and a second deceleration period are provided, and are switched in the middle of the period during which the deceleration control is performed, and the first decompression period and the second decompression period during which the decompression control is performed at different rates. Provided, a method of coating the coating liquid and switches in the middle of the period for the pressure reduction control.

また、前記第1減速期間から前記第2減速期間への切替え及び前記第1減圧期間から前記第2減圧期間への切替えは、前記ノズルと前記被塗布部材との相対移動による塗布位置が、前記被塗布部材に設けられた有効域と非有効域の境界位置で行うことが好ましい。本発明において有効域とは、被塗布部材において良好な品質が求められる領域範囲のことであり、非有効域は、被塗布部材における有効域と比べて低品質が許容される領域範囲のことである。   In addition, the switching from the first deceleration period to the second deceleration period and the switching from the first decompression period to the second decompression period are such that the application position by relative movement between the nozzle and the member to be coated is It is preferable to carry out at the boundary position between the effective area and the ineffective area provided on the member to be coated. In the present invention, the effective area is an area range in which good quality is required in the member to be coated, and the non-effective area is an area range in which low quality is allowed compared to the effective area in the member to be coated. is there.

また、前記第2減速期間の終了とともに前記相対移動を停止させることが好ましい。   Moreover, it is preferable to stop the relative movement with the end of the second deceleration period.

また、前記第2減速期間における相対移動は、前記非有効域内で行うことが好ましい。   The relative movement during the second deceleration period is preferably performed within the ineffective range.

また、前記第2減圧期間の終了とともに、前記気体空間を大気開放することが好ましい。   Further, it is preferable that the gas space is opened to the atmosphere with the end of the second decompression period.

また、上記いずれかに記載の塗布方法を用いてディスプレイ用部材を製造することが好ましい。   Moreover, it is preferable to manufacture the member for a display using the coating method in any one of the said.

本発明によれば、気体空間と該気体空間に接する塗液貯留部を有するノズルでもって、前記ノズルと被塗布部材を対向配置させ、所定の吐出圧力に制御された気体により前記気体空間を加圧することによって前記ペースト貯留部に貯留された塗液を吐出しながら、前記ノズルと前記被塗布部材を相対的に移動させて、前記被塗布部材上に塗膜を形成する塗布方法であって、塗布終了近傍においては前記移動の速度を連続的に減速制御するとともに、前記吐出圧力を連続的に減圧制御し、前記減速制御を行う期間には異なる加速度でもって減速する第1減速期間と第2減速期間を設けて、前記減速制御を行う期間の途中で切替えるとともに、前記減圧制御を行う期間には異なる割合でもって減圧する第1減圧期間と第2減圧期間を設けて、前記減圧制御を行う期間の途中で切替えることにより、減速減圧領域で速度と圧力の変化を任意に組み合わせることができるようになり、膜厚の制御が難しい塗布終了部にて良好な膜厚となる塗布方法が得られる。   According to the present invention, a nozzle having a gas space and a coating liquid reservoir that is in contact with the gas space is arranged so that the nozzle and the member to be coated face each other, and the gas space is added by a gas controlled to a predetermined discharge pressure. While discharging the coating liquid stored in the paste reservoir by pressing, the nozzle and the member to be coated are moved relatively to form a coating film on the member to be coated, In the vicinity of the end of the application, the speed of movement is continuously reduced and controlled, the discharge pressure is continuously reduced, and the first deceleration period and the second period during which the deceleration control is performed with different accelerations. A deceleration period is provided and is switched in the middle of the period for performing the deceleration control, and a period for performing the decompression control is provided with a first decompression period and a second decompression period for decompressing at different ratios, By switching in the middle of the period during which pressure control is performed, it becomes possible to arbitrarily combine speed and pressure changes in the decelerating and depressurizing region, and coating that achieves good film thickness at the coating end where film thickness control is difficult A method is obtained.

また、前記第1減速期間から前記第2減速期間への切替え及び前記第1減圧期間から前記第2減圧期間への切替えは、前記ノズルと前記被塗布部材との相対移動による塗布位置が、前記被塗布部材に設けられた有効域と非有効域の境界位置で行うことで、被塗布部材の有効域までの膜厚を良好に保つことができる。さらには制御が難しくなる低速・低圧の領域を、被塗布部材である基板の、品質への影響が少ない非有効域に収めることができる。   In addition, the switching from the first deceleration period to the second deceleration period and the switching from the first decompression period to the second decompression period are such that the application position by relative movement between the nozzle and the member to be coated is By performing at the boundary position between the effective area and the non-effective area provided on the member to be coated, the film thickness up to the effective area of the member to be coated can be kept good. Furthermore, the low-speed and low-pressure regions that are difficult to control can be accommodated in the ineffective region of the substrate to be coated having little influence on the quality.

また、前記第2減速期間の終了とともに前記相対移動を停止させることで、塗布終了端部でのペーストの不要な引きずりを抑制することができる。   Further, by stopping the relative movement with the end of the second deceleration period, it is possible to suppress unnecessary drag of the paste at the coating end end.

また、前記第2減速期間における相対移動は、前記非有効域内で行うことで、ペーストの不要な引きずりを抑制しつつ、被塗布部材内に塗布終了端部を収めることができる。   In addition, the relative movement in the second deceleration period is performed in the ineffective region, so that the application end edge can be accommodated in the application target member while suppressing unnecessary drag of the paste.

また、前記第2減圧期間の終了とともに前記気体空間を大気開放することで、難易度の高い低圧領域での圧力の制御を省くことができるので、容易な制御構成でもって塗布することができる。   Further, by opening the gas space to the atmosphere at the end of the second decompression period, it is possible to omit the control of the pressure in the low pressure region where the degree of difficulty is high, so that the coating can be performed with an easy control configuration.

また、本発明における塗布方法をディスプレイ用部材の製造に適用することにより、高品位が要求されるディスプレイ部材に良好な膜厚を保った被塗布部材を提供することができる。   Further, by applying the coating method of the present invention to the production of a display member, it is possible to provide a coated member that maintains a good film thickness for a display member that requires high quality.

本発明のペースト塗布方法における一実施例に用いた塗布装置を、概略的に示した概略斜視図である。It is the schematic perspective view which showed schematically the coating device used for one Example in the paste coating method of this invention. 本発明のペースト塗布方法における一実施例に用いた塗布装置の、吐出に係る部分の構成とノズルの断面構造を示した模式図である。It is the schematic diagram which showed the structure of the part which concerns on discharge, and the cross-sectional structure of a nozzle of the coating device used for one Example in the paste application | coating method of this invention. ディスペンサー法による蛍光体ペースト塗布方法を示した模式図である。It is the schematic diagram which showed the fluorescent substance paste coating method by the dispenser method. 圧力制御式塗布における吐出圧力と塗布速度の相関を示す時間線図である。It is a time diagram which shows the correlation of the discharge pressure and application | coating speed in pressure control type application | coating. 図4の条件下で塗布した基板の塗布終了端部塗布面状態模式図である。FIG. 5 is a schematic diagram of a coated end state coated surface state of a substrate coated under the conditions of FIG. 4. 基板に設けられる有効域/非有効域を概略的に示した模式図である。It is the schematic diagram which showed roughly the effective area / ineffective area provided in a board | substrate. 本発明のペースト塗布方法における、速度圧力相関を示す時間線図である。It is a time diagram which shows speed-pressure correlation in the paste application | coating method of this invention. 本発明の塗布方法で塗布した基板の塗布終了端部塗布面状態模式図であるFIG. 3 is a schematic diagram of a coating end state coating surface state of a substrate coated by the coating method of the present invention. 比較例1に示した塗布方法における、速度圧力制御チャート図である。5 is a speed / pressure control chart in the coating method shown in Comparative Example 1. FIG. 比較例2に示した塗布方法における、速度圧力制御チャート図である。10 is a speed / pressure control chart in the coating method shown in Comparative Example 2. FIG. 本発明の塗布方法における、速度圧力制御チャート図である。It is a speed pressure control chart figure in the coating method of the present invention. 本発明のペースト塗布方法における一実施例に用いた塗布装置を、概略的に示した別概略斜視図である。It is another schematic perspective view which showed schematically the coating device used for one Example in the paste coating method of this invention. 本発明のペースト塗布方法における一実施例に用いた塗布装置の、吐出に係る部分の構成とノズルの断面構造を示した別構成図である。It is another block diagram which showed the structure of the part which concerns on discharge, and the cross-sectional structure of a nozzle of the coating device used for one Example in the paste application | coating method of this invention.

以下、本発明の好ましい実施の形態について図面を参照して説明する。但し、本発明はこれに限定されるものではない。   Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. However, the present invention is not limited to this.

まず、本発明に係る塗液の塗布方法を実施するための塗布装置の全体構成、特に凹凸基板(例えばPDP用部材)への塗液の塗布装置の全体構成の例について説明する。図1は、本発明の一実施態様に係る塗布装置1の全体斜視図、図2は塗布装置1における吐出に係る部分の構成とノズルの断面構造を示した模式図である。   First, an overall configuration of a coating apparatus for carrying out the coating liquid coating method according to the present invention, particularly an example of the overall configuration of a coating liquid coating apparatus for an uneven substrate (for example, a member for PDP) will be described. FIG. 1 is an overall perspective view of a coating apparatus 1 according to an embodiment of the present invention, and FIG. 2 is a schematic diagram showing a configuration of a portion related to ejection in the coating apparatus 1 and a sectional structure of a nozzle.

図1において、被塗布材9はテーブル2の上に載置され、テーブル2に設けた吸着装置(図示しない)により吸着して固定される。テーブル2はその中心を軸として、回転位置決めを可能とするθ軸部材3(破線で示す)により支持されている。このθ軸部材3はY方向の位置決めを可能にするY軸調整部4に搭載され、Y軸調整部4はX軸搬送部5に設けられた一対のY軸ガイドレール4a,4bに沿って機台6のY方向に移動する。X軸搬送部5は、機台6に設けられた一対のX軸ガイドレール5a,5bに沿ってX方向に移動する。このX方向、Y方向は直交するように調整されている。X軸搬送部5は基板9に塗液を塗布するための相対移動手段であって、塗布動作においてテーブル2をX方向に移動させる。   In FIG. 1, the material 9 to be coated is placed on the table 2 and is adsorbed and fixed by an adsorption device (not shown) provided on the table 2. The table 2 is supported by a θ-axis member 3 (shown by a broken line) that enables rotational positioning with its center as an axis. The θ-axis member 3 is mounted on a Y-axis adjustment unit 4 that enables positioning in the Y direction, and the Y-axis adjustment unit 4 extends along a pair of Y-axis guide rails 4 a and 4 b provided on the X-axis transport unit 5. It moves in the Y direction of the machine base 6. The X-axis transport unit 5 moves in the X direction along a pair of X-axis guide rails 5 a and 5 b provided on the machine base 6. The X direction and Y direction are adjusted to be orthogonal. The X-axis transport unit 5 is a relative movement unit for applying the coating liquid to the substrate 9 and moves the table 2 in the X direction in the application operation.

このX軸搬送部は駆動軸(図示しない)の精密な制御により、任意の位置で任意の加速度にて移動速度を変更させられる速度制御がおこなわれる。   The X-axis transport unit performs speed control that can change the moving speed at an arbitrary acceleration at an arbitrary position by precise control of a drive shaft (not shown).

機台6の中央部上方には、X軸搬送部5によって移動されるテーブル2が通過するように門型の支持台7が、X軸と直交する形で設けられている。支持台7のX軸方向奥側(以下、下流側と称する)側面のY軸方向両サイド付近には、テーブル2の面に対して垂直方向に移動するZ軸移動部8a,8bが設けられ、Z軸移動部8a,8bには塗液を吐出するノズル30が機台6のY方向中央を基準にして取り付けられる。ノズル30は着脱式で、テーブル2のX方向に直交するように、Z軸移動部8a,8bに設けたチャック(図示しない)により固定される。
これらの構成によって、ノズル30とテーブル及び基板は、XYZ3方向への相対移動が可能となる構成である。
A gate-shaped support base 7 is provided above the center of the machine base 6 so as to pass through the table 2 moved by the X-axis transport section 5 so as to be orthogonal to the X-axis. Z-axis moving portions 8 a and 8 b that move in the direction perpendicular to the surface of the table 2 are provided in the vicinity of both sides in the Y-axis direction on the side surface in the X-axis direction (hereinafter referred to as the downstream side) of the support base 7. The nozzle 30 for discharging the coating liquid is attached to the Z-axis moving parts 8a and 8b with reference to the center in the Y direction of the machine base 6. The nozzle 30 is detachable and is fixed by chucks (not shown) provided on the Z-axis moving portions 8a and 8b so as to be orthogonal to the X direction of the table 2.
With these configurations, the nozzle 30, the table, and the substrate can be moved relative to each other in the XYZ3 directions.

ノズルは、塗布する基板のサイズに合わせて選択され、その基板に形成された全ての溝に対して1回の塗布動作で塗布を完了するために、好ましくは複数の吐出孔が略一直線状に配列して設けられる。例えば、塗布する基板がプラズマディスプレイの背面板の場合は、R、G、B何れか1色の蛍光体粉末を含んだ塗液を塗布することが好ましく、その場合、ノズルにはその塗布する溝に対応した数、ピッチで吐出孔が略一直線状に設けられる。   The nozzle is selected according to the size of the substrate to be coated, and in order to complete the coating with a single coating operation for all the grooves formed on the substrate, the plurality of discharge holes are preferably substantially straight. Arranged and provided. For example, when the substrate to be applied is a back plate of a plasma display, it is preferable to apply a coating liquid containing phosphor powder of any one color of R, G, or B. The discharge holes are provided in a substantially straight line with a number and a pitch corresponding to.

ここでノズルは、1回の塗布動作で基板1枚への塗布を完了するものが一般的だが、場合によっては吐出孔の数を減らして複数回の塗布動作で基板1枚への塗布を完了するものであってもよい。つまり、短尺型のノズルや、吐出孔のピッチを広げたものであってもよい。また、1色の塗液を塗布する場合について詳細に言及したが、R、G、B3色の塗液を同時に塗布する場合にも本発明は適用できる。   Here, it is common for the nozzle to complete application to one substrate in one application operation, but in some cases, the number of ejection holes is reduced and application to one substrate is completed in multiple application operations. You may do. That is, it may be a short nozzle or a nozzle having a wider pitch of discharge holes. Further, although the case where the coating liquid of one color is applied has been described in detail, the present invention can also be applied to the case where the coating liquids of R, G, and B colors are applied simultaneously.

図1および図2に示すノズル30は、略一直線状に配列された吐出孔33と、内部に塗液貯留部である塗液溜り部35と塗液溜り部35の上方に位置する気体空間である空間部36を有するマニホールド34、塗液をマニホールド34内に補給するための入口となる塗液ポート31、空間部36での吐出制御用気体の供給と排出をするための通路となる気体通過口32からなる。この気体通過口32は、空間部36の上方に開口していて、吐出孔33が略一直線状に配列する方向において空間部36の端近傍に配されているのが好ましい。   The nozzle 30 shown in FIG. 1 and FIG. 2 is a gas space located above the discharge holes 33 arranged substantially linearly, a coating liquid reservoir 35 serving as a coating liquid reservoir, and a coating liquid reservoir 35. A manifold 34 having a space 36, a coating liquid port 31 serving as an inlet for supplying the coating liquid into the manifold 34, and a gas passage serving as a passage for supplying and discharging a discharge control gas in the space 36. It consists of a mouth 32. It is preferable that the gas passage port 32 is opened above the space portion 36 and is arranged near the end of the space portion 36 in the direction in which the discharge holes 33 are arranged in a substantially straight line.

ノズル30への塗液の補給に係る部分について説明する。ノズル30には、マニホールド34内に塗液を補給するための配管13が塗液ポート31に接続され、この配管13の反対側先は、塗液の補給を制御する開閉バルブ12を介して、塗液を貯蔵する塗液容器11が接続されている。開閉バルブ12は、コントローラ40によりその開閉が制御される。塗液容器11には、塗液を押し出してノズル30に補給するための供給制御用気体を供給する配管28が接続され、この配管28の反対側先には、減圧弁27を介して、吐出制御用気体源29に接続されている。減圧弁27は、吐出制御用気体源29の供給制御用気体を塗液の補給に必要な圧力に調整することができる。   A portion relating to replenishment of the coating liquid to the nozzle 30 will be described. The nozzle 30 is connected to a coating liquid port 31 for supplying a coating liquid into the manifold 34, and the opposite end of the piping 13 is connected via an opening / closing valve 12 that controls the supply of the coating liquid. A coating liquid container 11 for storing the coating liquid is connected. The opening / closing valve 12 is controlled to be opened and closed by the controller 40. A pipe 28 for supplying a supply control gas for extruding the coating liquid and replenishing the nozzle 30 is connected to the coating liquid container 11, and the other side of the pipe 28 is discharged via a pressure reducing valve 27. A control gas source 29 is connected. The pressure reducing valve 27 can adjust the supply control gas from the discharge control gas source 29 to a pressure necessary for replenishment of the coating liquid.

次に、ノズル30からの塗液の吐出に係る部分について説明する。ノズル30内の空間部36に開口し、吐出制御用気体の供給と排出をするための通路となる気体通過口32には、配管24が接続され、この配管24の反対側先は、吐出バルブ22が接続されている。吐出バルブ22は三方弁となっており、一方が減圧弁23を介して吐出制御用気体源29に接続する配管26が接続し、もう一方は大気に開放されている。減圧弁23は、吐出制御用気体源29の吐出制御用気体をノズル30からの塗液の吐出に必要な圧力に調整することができる。減圧弁23は圧力調整制御が容易であるように、電気信号で圧力を無段階に制御できるような電空変換器を用いることが好ましい。吐出バルブ22は、ノズル30内の空間部36が吐出制御用気体源29と大気のどちらと連通するかを切り換えることができ、その切り換えはコントローラ40にて制御される。   Next, the part which concerns on discharge of the coating liquid from the nozzle 30 is demonstrated. A pipe 24 is connected to a gas passage port 32 that opens into a space 36 in the nozzle 30 and serves as a passage for supplying and discharging the discharge control gas. 22 is connected. The discharge valve 22 is a three-way valve, one of which is connected to a pipe 26 connected to a discharge control gas source 29 via a pressure reducing valve 23, and the other is open to the atmosphere. The pressure reducing valve 23 can adjust the discharge control gas from the discharge control gas source 29 to a pressure necessary for discharging the coating liquid from the nozzle 30. The pressure reducing valve 23 is preferably an electropneumatic converter that can control the pressure steplessly with an electric signal so that pressure adjustment control is easy. The discharge valve 22 can switch whether the space 36 in the nozzle 30 communicates with the discharge control gas source 29 or the atmosphere, and the switching is controlled by the controller 40.

なお、気体通過口32は1個でなく複数でも良く、好ましくはノズル30の両端部に左右対称にそれぞれ1個設置するのがよい。気体通過口を複数設置する場合は、それぞれの気体通過口を通る吐出制御用気体の出入りを個別に制御できるように配管系を構成するのが好ましい。   The number of gas passage ports 32 may be plural instead of one. Preferably, one gas passage 32 is provided at both end portions of the nozzle 30 symmetrically. When installing a plurality of gas passages, it is preferable to configure the piping system so that the discharge control gas passing through the gas passages can be individually controlled.

図1および図2の塗布装置1において、気体通過口を通じて吐出制御用気体の供給と排出を制御するための通過切換手段として、三方弁である1つの切換バルブ22を用いているが、通過切換手段は複数の切換バルブであってもよく、ここに示す限りではない。また、通過切換手段として用いる切換バルブはどのような構造のものであっても構わないが、基板に塗液を塗布する際に、塗布端の膜厚を精度良くするために、吐出孔からの塗液の吐出と停止を迅速に行えるよう、コントローラ40からの指令に対して応答性の良いものが好ましい。また、ノズルから塗液を吐出するための吐出制御用気体の圧力に耐えうるものであることが好ましい。さらに、塗布を繰り返すための耐久性を兼ね備えているものが好ましい。また減圧弁23は所定の圧力設定に正確に追従するものであれば良いが、電気的制御指令に精度良く追従するものが好ましい。この減圧弁23についても、吐出制御用気体の圧力に耐えうるもの、耐久性を備えているものが好ましい。   In the coating apparatus 1 shown in FIGS. 1 and 2, a single switching valve 22 that is a three-way valve is used as a passage switching means for controlling the supply and discharge of the discharge control gas through the gas passage port. The means may be a plurality of switching valves and is not limited to that shown here. The switching valve used as the passage switching means may be of any structure, but when applying the coating liquid to the substrate, in order to improve the film thickness at the coating end, In order to quickly discharge and stop the coating liquid, it is preferable to have a good response to a command from the controller 40. Moreover, it is preferable that it can withstand the pressure of the discharge control gas for discharging the coating liquid from the nozzle. Furthermore, what has the durability for repeating application | coating is preferable. Further, the pressure reducing valve 23 may be any one that accurately follows a predetermined pressure setting, but preferably one that accurately follows an electrical control command. The pressure reducing valve 23 is preferably one that can withstand the pressure of the discharge control gas and that has durability.

図1および図2に示す塗布装置1にて、塗布を実施する場合について説明する。
まず、塗液容器11からノズル30のマニホールド34内に塗液を補給する。ノズル30への塗液の補給は、開閉バルブ12を開くことにより行われ、補給が完了した後には開閉バルブ12を閉じる。
A case where application is performed by the application apparatus 1 shown in FIGS. 1 and 2 will be described.
First, the coating liquid is supplied from the coating liquid container 11 into the manifold 34 of the nozzle 30. Replenishment of the coating liquid to the nozzle 30 is performed by opening the opening / closing valve 12, and after the replenishment is completed, the opening / closing valve 12 is closed.

このとき塗液は、ノズル30のマニホールド34内に、空間部36を残す形で所定量に貯えられる。マニホールド34内の塗液の量は、吐出毎に、空間部36への吐出制御用気体の供給を開始してから空間部36内に吐出制御用気体が充填されて吐出孔33より塗液を吐出するまでの時間を均一にするために、常に一定に保つ必要がある。そのため、塗液を吐出した後は常に空間部36の容積が所定量になるまで塗液をマニホールド34内の塗液溜り部35に補給する。そのため、本発明の塗布装置1においては、ノズル30内の塗液量を検出する塗液量検出手段39を有することが好ましく、塗液の汚染を防ぐために非接触であることがさらに好ましい。非接触の塗液量検出手段39は、レーザー式、超音波式、重量検知式等、非接触で検出できるセンサであればいずれのものであっても適用できる。   At this time, the coating liquid is stored in a predetermined amount so as to leave a space 36 in the manifold 34 of the nozzle 30. The amount of the coating liquid in the manifold 34 is such that the discharge control gas is filled into the space 36 after the discharge control gas is supplied to the space 36 for each discharge, and the coating liquid is applied from the discharge holes 33. In order to make the time to discharge uniform, it is necessary to keep it constant. Therefore, after the coating liquid is discharged, the coating liquid is always supplied to the coating liquid reservoir 35 in the manifold 34 until the volume of the space 36 reaches a predetermined amount. Therefore, the coating apparatus 1 of the present invention preferably has a coating liquid amount detection means 39 for detecting the coating liquid amount in the nozzle 30 and more preferably non-contact in order to prevent contamination of the coating liquid. The non-contact coating liquid amount detection means 39 can be applied to any sensor that can detect non-contact such as laser type, ultrasonic type, weight detection type and the like.

次に、基板搭載に移る。テーブル2を支持台7のX軸方向手前側(上流側)端部に移動し、テーブル面のほぼ中央に外部移載機などにより塗布する基板9を搭載し、吸着固定する。この動作はノズル30への塗液補給と並行して行うことが可能である。   Next, it moves to substrate mounting. The table 2 is moved to the front side (upstream side) end of the support base 7 in the X-axis direction, and a substrate 9 to be applied is mounted and fixed by an external transfer machine or the like substantially at the center of the table surface. This operation can be performed in parallel with the supply of the coating liquid to the nozzle 30.

次に基板位置決めを行う。テーブル2を移動させて、カメラ17,19にて基板9の位置を計測し、さらにカメラ18にて基板9の基準溝を観測して、溝の中心位置を判断し、テーブル2をY軸方向に移動することで、ノズル30の基準孔と基板9の基準溝中心とのY軸方向の位置を合わせる。なお、ノズル30の基準孔は、カメラ20により、予め計測しておく。カメラ17、19、および18は、支持台7のY軸方向に独立して移動可能なY1搬送部14、Y3搬送部16、Y2搬送部15に取り付けられている。このY1〜Y3搬送部は一対のガイドレール7a,7bによって、Y方向に移動した場合においてもテーブル面からの高さが一定になるよう調整されている。なお、これらのカメラは複数組有していても良い。   Next, substrate positioning is performed. The table 2 is moved, the position of the substrate 9 is measured by the cameras 17 and 19, the reference groove of the substrate 9 is observed by the camera 18, the center position of the groove is determined, and the table 2 is moved in the Y-axis direction. The position of the reference hole of the nozzle 30 and the reference groove center of the substrate 9 are aligned in the Y-axis direction. The reference hole of the nozzle 30 is measured in advance by the camera 20. The cameras 17, 19, and 18 are attached to a Y 1 transport unit 14, a Y 3 transport unit 16, and a Y 2 transport unit 15 that can move independently in the Y-axis direction of the support base 7. The Y1-Y3 transport unit is adjusted by the pair of guide rails 7a and 7b so that the height from the table surface is constant even when it is moved in the Y direction. A plurality of these cameras may be provided.

基板位置決めが終わると塗液塗布の動作に移る。ノズル30のマニホールド34内への塗液補給が完了していることを確認し(未完の場合は待ち)、さらに、ノズル30の下面をクリーナー10にて清掃した後に、テーブル2をX軸方向に沿って基板9の位置決め位置から下流方向に予めプログラムした速度で移動させ、あらかじめ設定された位置と加速度にて、移動速度が変更制御される構成である。例えば塗布開始は低速移動とし、その後速度切替位置にて所定の加速度で速度を高速に変更し、さらに減速開始位置から所定の加速度で減速を開始し、移動停止位置にて相対移動を停止する。このような基板とノズルの相対移動を行い、この移動中にノズル30から塗液の吐出を行うことで基板への塗布を行う。   When the substrate positioning is completed, the operation moves to the coating liquid application operation. After confirming that the replenishment of the coating liquid into the manifold 34 of the nozzle 30 is completed (waiting if not completed), and further cleaning the lower surface of the nozzle 30 with the cleaner 10, the table 2 is moved in the X-axis direction. The substrate 9 is moved in the downstream direction from the positioning position of the substrate 9 at a preprogrammed speed, and the moving speed is changed and controlled at a preset position and acceleration. For example, the start of application is a low-speed movement, and then the speed is changed to a high speed at a predetermined acceleration at the speed switching position, the deceleration is started at a predetermined acceleration from the deceleration start position, and the relative movement is stopped at the movement stop position. Such a relative movement between the substrate and the nozzle is performed, and the coating liquid is discharged from the nozzle 30 during the movement, so that the application to the substrate is performed.

ノズル30からの塗液の吐出は、ノズル30と吐出制御用気体源29が連通するように吐出バルブ22を切り換えて、ノズル30のマニホールド34内の塗液溜り部35の上方に位置する空間部36に吐出制御用気体を供給することにより、吐出孔33から塗液を押し出すことで行われる。また、ノズル30からの塗液の吐出の完全な停止は、吐出バルブ22を切り換えて空間部36が大気に開放されるようにすることで、吐出制御用気体の供給を完全停止し、空間部36から吐出制御用気体を排出することで行われる。塗液の吐出の完全停止前に、減圧弁23の圧力を連続的に減圧させることで、速度の減速と合わせた変化を行うことが好ましい。これら切り換えや連続的な減圧は、コントローラ40にて制御され、X軸移動中に所定の位置で動作するよう制御されるのが好ましい。吐出の完全停止前の減圧手段は、異なる圧力に設定した複数の減圧弁と切替弁の動作によって行っても良い。   The discharge of the coating liquid from the nozzle 30 is performed by switching the discharge valve 22 so that the nozzle 30 and the discharge control gas source 29 communicate with each other, and a space portion located above the coating liquid reservoir 35 in the manifold 34 of the nozzle 30. By supplying the discharge control gas to 36, the coating liquid is pushed out from the discharge holes 33. Further, the complete stop of the discharge of the coating liquid from the nozzle 30 is performed by switching the discharge valve 22 so that the space portion 36 is opened to the atmosphere, thereby completely stopping the supply of the discharge control gas. The discharge control gas is discharged from 36. It is preferable to perform a change in combination with the speed reduction by continuously reducing the pressure of the pressure reducing valve 23 before completely stopping the discharge of the coating liquid. These switching and continuous decompression are preferably controlled by the controller 40 so as to operate at a predetermined position during the X-axis movement. The pressure reducing means before the complete stop of the discharge may be performed by operation of a plurality of pressure reducing valves and switching valves set to different pressures.

吐出が終われば塗布が終了となり、基板排出に移る。基板9の排出はテーブル2を下流端に移動し、吸着した基板9を解除し、外部移載機などにより取り出す。基板9を排出した時点で一連の動作が終了する。連続して基板に塗布する場合は、塗液の補給から開始する。   When the discharge is finished, the coating is finished and the substrate is discharged. The substrate 9 is discharged by moving the table 2 to the downstream end, releasing the adsorbed substrate 9, and taking it out by an external transfer machine or the like. When the substrate 9 is discharged, a series of operations is completed. In the case of continuous application to the substrate, it starts with replenishment of the coating liquid.

なお、ノズル30への塗液の補給および吐出孔33からの塗液の吐出の制御は、ノズル30内の塗液量検出手段39、開閉バルブ12、吐出バルブ22,および減圧弁23が繋がれたコントローラ(制御部)40により制御される。   The supply of the coating liquid to the nozzle 30 and the control of the discharge of the coating liquid from the discharge hole 33 are connected to the coating liquid amount detecting means 39, the opening / closing valve 12, the discharge valve 22, and the pressure reducing valve 23 in the nozzle 30. It is controlled by a controller (control unit) 40.

図1および図2に示すような塗布装置1による基板への塗布の一連の工程は、ノズル30のマニホールド34内に塗液を補給する工程と、ノズル30と基板9とを相対的に移動しながら基板9へ塗液を吐出して塗布する工程とを有する。枚葉の基板に1度に塗布したり、基板を複数回に分けて塗布したりするような、所定の長さの塗液の塗布を複数回行う場合には、この2つの工程を交互に繰り返すことが好ましい。なぜなら、マニホールド内に塗液溜り部と塗液溜り部の上方に空間部を有し、この空間部に吐出制御用気体を供給し、その圧力で塗液を吐出孔より吐出するノズルには、所定の長さの塗布で使用した塗液の量と同量の塗液をマニホールド内へ補給する必要があるため、生産性を考えれば、ノズルのマニホールド内への塗液の補給と、基板への塗布は交互に繰り返すことが好ましい。   A series of steps of coating the substrate by the coating apparatus 1 as shown in FIGS. 1 and 2 is a step of replenishing the coating liquid in the manifold 34 of the nozzle 30 and relatively moving the nozzle 30 and the substrate 9. However, it has a process of discharging and applying a coating liquid to the substrate 9. When applying a coating liquid of a predetermined length a plurality of times, such as applying to a single substrate at a time or applying the substrate in a plurality of times, the two steps are alternately performed. It is preferable to repeat. This is because a nozzle that has a coating liquid reservoir and a space above the coating liquid reservoir in the manifold, supplies a discharge control gas to the space, and discharges the coating liquid from the discharge hole at that pressure, Since it is necessary to replenish the manifold with the same amount of coating liquid that was used for the application of the specified length, considering productivity, replenishment of the coating liquid into the nozzle manifold and to the substrate It is preferable to repeat application | coating of alternately.

ついで、塗布終了部の好ましい形態を以下にて説明する。これは「狭枠化」の影響で非有効域が狭められた基板に対応できるものであるが、従来の基板に適用しても何ら支障はない。   Next, a preferable form of the application end portion will be described below. This can cope with a substrate whose ineffective area is narrowed due to the influence of “narrowing the frame”, but there is no problem even if it is applied to a conventional substrate.

図1および図2に示す塗布装置1において、ノズル30からの塗液の吐出は、まず、ノズル30への塗液の補給を完了させ、開閉バルブ12を閉じておく。それから、ノズル30と吐出制御用気体源29が連通するように吐出バルブ22を切り換えることで、吐出制御用気体源29に連通した気体通過口32を通じて、ノズル30内の空間部36に吐出制御用気体を供給することにより吐出孔33より塗液を押し出して、吐出する。このとき、ノズル30と基板9とを相対的に移動させて、基板9に所定の長さの塗液の塗布を行う。   In the coating apparatus 1 shown in FIGS. 1 and 2, the discharge of the coating liquid from the nozzle 30 first completes the replenishment of the coating liquid to the nozzle 30 and closes the open / close valve 12. Then, by switching the discharge valve 22 so that the nozzle 30 and the discharge control gas source 29 communicate with each other, the discharge control gas is supplied to the space portion 36 in the nozzle 30 through the gas passage 32 communicating with the discharge control gas source 29. By supplying gas, the coating liquid is pushed out from the discharge hole 33 and discharged. At this time, the nozzle 30 and the substrate 9 are relatively moved to apply a predetermined length of coating liquid to the substrate 9.

塗布終了部における相対移動速度については、あらかじめ定めた位置から減速を始め連続的に減速制御を行う期間を設けることが必要であり、減速制御を行う期間の終了とともに相対移動を停止するよう制御するのが好ましい。本発明においては、異なる加速度でもって減速する第1減速期間と第2減速期間を設け、減速の途中のあらかじめ定めた位置にて減速割合を変更した速度に切替変更することが必要であり、その後相対移動を停止させるのが好ましい。   With respect to the relative movement speed at the application end portion, it is necessary to provide a period during which deceleration control is started continuously from a predetermined position, and the relative movement is controlled to stop at the end of the period during which deceleration control is performed. Is preferred. In the present invention, it is necessary to provide a first deceleration period and a second deceleration period in which deceleration is performed with different accelerations, and to switch to a speed at which the deceleration rate is changed at a predetermined position during deceleration. It is preferable to stop the relative movement.

また塗布終了部における吐出孔33からの塗液の吐出の停止は、あらかじめ定めた位置から減圧弁23の減圧制御を開始し、連続的に減圧制御を行う期間を設けることが必要であり、ノズル30内の空間部36への吐出制御用気体の供給圧力を連続的に減圧して行う。   Further, the stop of the discharge of the coating liquid from the discharge hole 33 at the application end portion needs to start the pressure reduction control of the pressure reducing valve 23 from a predetermined position and to provide a period for continuously performing the pressure reduction control. This is performed by continuously reducing the supply pressure of the discharge control gas to the space 36 in the space 30.

さらには、減圧制御を行う期間には異なる割合でもって減圧する第1減圧期間と第2減圧期間を設けることが必要であり、前記減圧制御を行う期間の途中のあらかじめ定めた位置にて、空間部36の圧力が大気に開放されるように吐出バルブ22を切り換えることで、空間部36より吐出制御用気体を大気に開放することがより好ましい。   Furthermore, it is necessary to provide a first decompression period and a second decompression period in which decompression is performed at different rates in the period in which decompression control is performed, and a space is provided at a predetermined position in the middle of the period in which decompression control is performed. More preferably, the discharge control gas is opened to the atmosphere from the space portion 36 by switching the discharge valve 22 so that the pressure of the portion 36 is released to the atmosphere.

減速割合の変更位置と吐出バルブ22を切り換えて空間部36の圧力を大気に開放する位置は略同じ位置であることが組み合わせとしては好ましいが、塗布装置の各動作には遅れがあることを考慮し、塗布された基板の膜厚や塗布面の状態を見ながら、両位置を微調整するのがより好ましい。   Although it is preferable as a combination that the position where the deceleration rate is changed and the position where the pressure of the space portion 36 is released to the atmosphere by switching the discharge valve 22 are substantially the same, it is considered that each operation of the coating apparatus has a delay. It is more preferable to finely adjust both positions while observing the thickness of the coated substrate and the state of the coated surface.

基板への塗布が一旦終了し、次の塗布を開始するまでの間は、ノズル30への塗液の補給や、塗布が終了した基板の搬出、次の基板の搬入、基板とノズル30の位置合わせなどを行う。   Until the application to the substrate is once completed and the next application is started, the supply of the coating liquid to the nozzle 30, the unloading of the substrate after the application, the next substrate loading, and the positions of the substrate and the nozzle 30 are performed. Perform alignment.

その後次の基板の塗布を行い、以後この動作を繰り返して複数枚の塗布を行う。   Thereafter, the next substrate is coated, and thereafter, this operation is repeated to coat a plurality of sheets.

図12および図13は、本発明の塗液の塗布方法を実現するための塗液の塗布装置の別例である。 図1および図2との違いは、配管24の気体通過口32に近いところに開放専用弁42を設けたことであり、その他構成は図1、図2と同じものである。開放専用弁42は二方弁となっており、一方が配管24と接続され、もう一方は大気に開放されている。そしてその動作は吐出バルブ22と連動するよう制御される。つまりノズル30と吐出制御用気体源29が連通するように吐出バルブ22が切り換えられ、空間部36に吐出制御用気体が供給される場合には、開放専用弁42は閉塞し吐出制御用気体による吐出孔33から塗液の吐出を阻害しないよう動作する。一方吐出バルブ22が切り換わって空間部36が大気に開放される際は、開放専用弁42を通じても空間部36が大気に開放されるよう動作する。   12 and 13 show another example of a coating liquid coating apparatus for realizing the coating liquid coating method of the present invention. The difference from FIG. 1 and FIG. 2 is that an opening-only valve 42 is provided near the gas passage port 32 of the pipe 24, and the other configurations are the same as those in FIGS. The open-only valve 42 is a two-way valve, one of which is connected to the pipe 24 and the other is opened to the atmosphere. The operation is controlled so as to interlock with the discharge valve 22. That is, when the discharge valve 22 is switched so that the nozzle 30 and the discharge control gas source 29 communicate with each other and the discharge control gas is supplied to the space 36, the opening dedicated valve 42 is closed and the discharge control gas is used. It operates so as not to impede the discharge of the coating liquid from the discharge hole 33. On the other hand, when the discharge valve 22 is switched and the space 36 is opened to the atmosphere, the space 36 is also opened to the atmosphere through the opening dedicated valve 42.

図12および図13を用いた塗布終了部の好ましい形態を以下にて説明する。これは「狭枠化」の影響で非有効域が狭められた基板に対応できるものであるが、従来の基板に適用しても何ら支障はない。   The preferable form of the application | coating end part using FIG. 12 and FIG. 13 is demonstrated below. This can cope with a substrate whose ineffective area is narrowed due to the influence of “narrowing the frame”, but there is no problem even if it is applied to a conventional substrate.

図12および図13に示す塗布装置1において、ノズル30からの塗液の吐出は、まず、事前にノズル30への塗液の補給を完了させ、開閉バルブ12を閉じておく。それから、ノズル30と吐出制御用気体源29が連通するように吐出バルブ22を切り換えることで、吐出制御用気体源29に連通した気体通過口32を通じて、ノズル30内の空間部36に吐出制御用気体を供給することにより吐出孔33より塗液を押し出して吐出する。このとき、開放専用弁42は閉塞し、塗液の押し出しを阻害しない。またこのとき、ノズル30と基板9とを相対的に移動させて、基板9に所定の長さの塗液の塗布を行う。   In the coating apparatus 1 shown in FIGS. 12 and 13, the discharge of the coating liquid from the nozzle 30 first completes the replenishment of the coating liquid to the nozzle 30 in advance and closes the opening / closing valve 12. Then, by switching the discharge valve 22 so that the nozzle 30 and the discharge control gas source 29 communicate with each other, the discharge control gas is supplied to the space portion 36 in the nozzle 30 through the gas passage 32 communicating with the discharge control gas source 29. By supplying gas, the coating liquid is pushed out and discharged from the discharge hole 33. At this time, the open-only valve 42 is closed and does not hinder the extrusion of the coating liquid. At this time, the nozzle 30 and the substrate 9 are relatively moved to apply a predetermined length of coating liquid to the substrate 9.

塗布終了部における相対移動速度については、あらかじめ定めた位置から減速を始め、塗布の最後には相対移動を停止するよう制御するのが好ましい。さらには、その減速の途中のあらかじめ定めた位置にて減速割合を変更した速度に切替変更し、その後相対移動を停止させるのが好ましい。   The relative movement speed at the application end portion is preferably controlled to start decelerating from a predetermined position and stop the relative movement at the end of application. Furthermore, it is preferable to switch to a speed at which the deceleration rate is changed at a predetermined position during the deceleration, and then stop the relative movement.

また塗布終了部における吐出孔33からの塗液の吐出の停止は、あらかじめ定めた位置から減圧弁23を減圧制御し、ノズル30内の空間部36への吐出制御用気体の供給圧力を連続的に減圧して行われるのが好ましい。さらには、この減圧の途中のあらかじめ定めた位置にて、空間部36の圧力が大気に開放されるように吐出バルブ22を切り換えると同時に、開放専用弁42を切り換えることで、開放専用弁42を通じても大気への開放をおこない、空間部36より吐出制御用気体を短時間で大気に開放することが好ましい。開放専用弁42は吐出バルブと連動し同時に作動するよう制御される。   Further, the stop of the discharge of the coating liquid from the discharge hole 33 at the application end portion is performed by controlling the pressure reducing valve 23 to be depressurized from a predetermined position, and continuously supplying the discharge control gas supply pressure to the space 36 in the nozzle 30. It is preferable to carry out under reduced pressure. Further, at the predetermined position in the middle of the pressure reduction, the discharge valve 22 is switched so that the pressure in the space 36 is released to the atmosphere, and at the same time, the opening dedicated valve 42 is switched, so that However, it is preferable to release the gas for discharge control from the space 36 to the atmosphere in a short time. The open-only valve 42 is controlled to operate simultaneously with the discharge valve.

減速割合の変更位置と吐出バルブ22、開放専用弁42を切り換えて空間部36の圧力を大気に開放する位置は略同じ位置であることが組み合わせとしては好ましいが、塗布装置の動作には遅れがあることを考慮し、塗布された基板の膜厚状態を見ながら、両位置を微調整するのがより好ましい。   It is preferable as a combination that the position at which the deceleration rate is changed and the position at which the pressure in the space 36 is released to the atmosphere by switching the discharge valve 22 and the opening dedicated valve 42 are substantially the same position, but there is a delay in the operation of the coating apparatus. In consideration of the fact, it is more preferable to finely adjust both positions while observing the film thickness state of the coated substrate.

開放専用弁42により吐出制御用気体を短時間で大気に開放できることから、減速割合変更後の相対移動の停止時間も短くすることができて好ましい。   Since the discharge control gas can be opened to the atmosphere in a short time by the opening dedicated valve 42, the relative movement stop time after changing the deceleration rate can be shortened, which is preferable.

ここでは、開放専用弁42として二方弁を用いているが、大気への開放と閉塞を切り換えできればどんな構造、構成のものであってもよく、ここに示す限りではない。例えば三方弁の3つあるポートのうちの1つを閉塞させ、二方弁と同じ機能として用いてもよい。開放専用弁は吐出バルブ22との連動性、制御のしやすさを考慮し選択するのが好ましいが、吐出バルブと同様コントローラからの指令に対して応答性の良いものが好ましく、吐出制御用気体の圧力に耐えうるものであり、さらに耐久性を備えているものが好ましい。   Here, a two-way valve is used as the opening-only valve 42, but any structure and configuration may be used as long as the opening and closing to the atmosphere can be switched. For example, one of the three ports of the three-way valve may be closed and used as the same function as the two-way valve. The open-only valve is preferably selected in consideration of the linkage with the discharge valve 22 and the ease of control. However, like the discharge valve, a valve having good responsiveness to a command from the controller is preferable. It is preferable that it can withstand this pressure and has durability.

基板への塗布が一旦終了し、次の塗布を開始するまでの間は、ノズル30への塗液の補給や、塗布が終了した基板の搬出、次の基板の搬入、基板とノズル30の位置合わせなどを行う。   Until the application to the substrate is once completed and the next application is started, the supply of the coating liquid to the nozzle 30, the unloading of the substrate after the application, the next substrate loading, and the positions of the substrate and the nozzle 30 are performed. Perform alignment.

その後次の基板の塗布を行い、以後この動作を繰り返して複数枚の基板に塗布を行う。   Thereafter, the next substrate is applied, and thereafter, this operation is repeated to apply to a plurality of substrates.

図1、図2、図12、図13に示す塗布装置1において、ノズル30の吐出孔33の大きさは、塗液を塗布する幅や、塗布する塗液の量に応じて、その孔径を選定すればよく、特に凹凸基板(例えば、プラズマディスプレイパネル用部材)への塗液の塗布の場合では、10μmから500μmの間に設定することが好ましい。なお、吐出孔33の形状や数は特に限定されるものではなく、塗布する目的によって、如何なる形状であってもよい。たとえば、塗液をシート状に吐出する場合は、吐出開口部を吐出孔ではなく、ノズルの幅方向に長い開口部(スリット)を有する形状にしてもよい。   In the coating apparatus 1 shown in FIG. 1, FIG. 2, FIG. 12, and FIG. 13, the size of the discharge hole 33 of the nozzle 30 is determined depending on the width of the coating liquid applied and the amount of the coating liquid applied. What is necessary is just to select, and in the case of application | coating of the coating liquid especially to an uneven | corrugated board | substrate (for example, member for plasma display panels), it is preferable to set between 10 micrometers and 500 micrometers. The shape and number of the ejection holes 33 are not particularly limited, and may be any shape depending on the purpose of application. For example, when the coating liquid is discharged in the form of a sheet, the discharge opening may have a shape having an opening (slit) that is long in the width direction of the nozzle instead of the discharge hole.

これまで、一種類の塗液を基板の表面に形成されたストライプ状の凹部に塗布する場合について詳しく述べたが、赤、青、緑等の3色の蛍光体を同時に塗布する場合にも本発明は適用でき、また、前記被塗布材の表面に形成された格子状の凹部に塗布する場合にも適用できる。   Up to now, the case where one kind of coating liquid is applied to the stripe-shaped recess formed on the surface of the substrate has been described in detail, but the present invention is also applicable to the case of simultaneously applying phosphors of three colors such as red, blue and green. The present invention can be applied, and can also be applied to a case where the material is applied to a lattice-shaped recess formed on the surface of the material to be coated.

使用できる塗布条件として、塗布速度はいかなる速度であってもよいが、好ましくは0.1〜10m/分、より好ましくは、0.5〜8m/分である。   As coating conditions that can be used, the coating speed may be any speed, but is preferably 0.1 to 10 m / min, and more preferably 0.5 to 8 m / min.

次に、本発明の実施の形態に従って、ディスプレイ用部材特にプラズマディスプレイ背面板に塗液を塗布した場合の実施例を示す。   Next, according to the embodiment of the present invention, an example in which a coating liquid is applied to a display member, particularly a plasma display back plate will be described.

実施例1
枚葉の基板であるプラズマディスプレイ背面板は、サイズ990×600mm、被塗布面に高さ0.12mmで頂部の幅0.05mmのリブが、ピッチ0.3mmで3097本形成されており、これにより隣り合うリブとの距離(溝幅)が0.25mm、溝の数が3096本のものを用いた。また、塗液は粘度50Pa・sの緑色の蛍光体粉末を含む蛍光体ペーストを使用した。
Example 1
The plasma display back plate, which is a single-wafer substrate, has 3097 ribs with a size of 990 × 600 mm, a height of 0.12 mm and a top width of 0.05 mm on the coated surface, with a pitch of 0.3 mm. Therefore, the distance between adjacent ribs (groove width) was 0.25 mm and the number of grooves was 3096. The coating liquid used was a phosphor paste containing a green phosphor powder having a viscosity of 50 Pa · s.

この基板に塗布する塗布装置として、図12および図13に示す本発明に係る塗布装置1、ノズル30を用いた。   As the coating device for coating on the substrate, the coating device 1 and the nozzle 30 according to the present invention shown in FIGS. 12 and 13 were used.

ノズル30は、孔径が0.12mm、孔数が1032孔、孔のピッチが0.9mmの吐出孔33が略一直線状に配列しており、その配列方向におけるノズル30の幅が1000mm、材質はステンレス鋼製(SUS304)のものを用いた。また、マニホールド34内に吐出制御用気体の供給と排出をするための通路となる気体通過口32は、内径5mmの円筒形状のものを用いた。さらに、塗液を補給するための塗液ポート31は、内径8mmの円筒形状のものを用いた。   The nozzle 30 has a hole diameter of 0.12 mm, a number of holes of 1032 holes, and discharge holes 33 having a hole pitch of 0.9 mm arranged in a substantially straight line. The width of the nozzle 30 in the arrangement direction is 1000 mm, and the material is The one made of stainless steel (SUS304) was used. The gas passage 32 serving as a passage for supplying and discharging the discharge control gas into the manifold 34 is a cylindrical one having an inner diameter of 5 mm. Further, the coating liquid port 31 for replenishing the coating liquid was a cylindrical one having an inner diameter of 8 mm.

ノズル30の気体通過口32と接続し、ノズル30と吐出制御用気体源29をつなぐ配管24、配管25、配管26、配管28は全て、内径6mmのナイロンチューブを使用した。また、配管24の長さは700mmにした。吐出制御用気体としては、圧縮空気を用いた。   The piping 24, the piping 25, the piping 26, and the piping 28 that are connected to the gas passage port 32 of the nozzle 30 and connect the nozzle 30 and the gas source 29 for discharge control are all nylon tubes having an inner diameter of 6 mm. The length of the pipe 24 was 700 mm. Compressed air was used as the discharge control gas.

複数回の塗布を行う中で、各回の塗布で吐出/排気の切換をする吐出バルブ22は、三方弁の働きをする電磁弁を用いた。開放専用弁42については、動作の連動性を考慮して吐出バルブ22と同一型式の三方弁を選択し、1つのポートを閉塞することで、二方弁の機能となる構造にして用いた。配管24を気体通過口32に近いところ分岐し、開放専用弁42に接続した。   The discharge valve 22 that switches between discharge / exhaust in each application during the application a plurality of times was an electromagnetic valve that functions as a three-way valve. For the open-only valve 42, a three-way valve of the same type as that of the discharge valve 22 is selected in consideration of the interlocking of the operation, and one port is closed to use a structure that functions as a two-way valve. The pipe 24 was branched near the gas passage 32 and connected to the open-only valve 42.

塗液である蛍光体ペーストを吐出するためにノズル30に付与する圧力は、減圧弁23により圧力0.85MPaに設定した。この場合の減圧弁23には、電気的信号によって圧力の設定制御ができる電空変換器を用いた。コントローラからの連続的に変化する電気的信号を電空変換器に与え、所定の減圧を行った。減圧途中で吐出バルブ22および開放専用弁42を切り換えることで、ノズル30内の空間部36の圧力を大気へ開放した。   The pressure applied to the nozzle 30 to discharge the phosphor paste as the coating liquid was set to a pressure of 0.85 MPa by the pressure reducing valve 23. In this case, as the pressure reducing valve 23, an electropneumatic converter capable of controlling pressure setting by an electrical signal was used. A continuously changing electrical signal from the controller was applied to the electropneumatic converter to perform a predetermined pressure reduction. By switching the discharge valve 22 and the opening dedicated valve 42 during the decompression, the pressure in the space 36 in the nozzle 30 was released to the atmosphere.

塗液容器11には、減圧弁27により圧力0.35MPaに調整された圧縮空気が付与されている。また、塗液容器11からノズル30に塗液の補給を制御するための開閉バルブ12は、ダイアフラムバルブを用いた。   The coating liquid container 11 is provided with compressed air adjusted to a pressure of 0.35 MPa by the pressure reducing valve 27. Moreover, the opening / closing valve 12 for controlling supply of the coating liquid from the coating liquid container 11 to the nozzle 30 is a diaphragm valve.

ノズル30のマニホールド34内の蛍光体ペースト41は、液面の高さが吐出孔33から25mmの高さで管理される。したがって、ノズル30より蛍光体ペーストを吐出した後は、開閉バルブ12の開閉の制御により、液面高さが25mmになるまで、蛍光体ペーストがノズル30に補給される。   The phosphor paste 41 in the manifold 34 of the nozzle 30 is managed so that the liquid level is 25 mm from the discharge hole 33. Therefore, after the phosphor paste is discharged from the nozzle 30, the phosphor paste is replenished to the nozzle 30 by controlling the opening / closing of the opening / closing valve 12 until the liquid level becomes 25 mm.

上記の条件にて、図12および図13に示す塗布装置1で、図11のチャート図となるよう、ノズル30内の空間部36の圧力と相対移動速度をコントローラ40で設定制御しながら、塗布条件を調整した。ここで吐出圧力を大気開放する位置と塗布速度を減速停止に向けて切替る位置(図11のE点)は、図11の溝模式図に相当する位置に設定した。適宜コントローラへ入力する設定位置を変更し、塗布速度と吐出の圧力を変化させながら条件を調整した結果、最終的に塗布終了部においては図7に示すような塗布速度と圧力の相関の下、図8に示す模式図のような均一な塗布面を得られた。この条件下にて、基板200枚に塗布を行った。この200枚の塗布中、適宜基板の塗布終了部近傍の塗布面状態を塗布装置1に設けてあるカメラ17〜19及び目視で確認したところ、塗布面に異常な斑や後を引いた形状は存在せず、良好な塗布面が得られていた。   Under the above-described conditions, the application apparatus 1 shown in FIGS. 12 and 13 applies the application while controlling the pressure and the relative movement speed of the space 36 in the nozzle 30 with the controller 40 so as to be the chart of FIG. The conditions were adjusted. Here, the position where the discharge pressure is released to the atmosphere and the position where the coating speed is switched toward deceleration stop (point E in FIG. 11) are set to positions corresponding to the groove schematic diagram of FIG. As a result of changing the setting position appropriately input to the controller and adjusting the conditions while changing the application speed and the discharge pressure, finally, in the application end portion, under the correlation between the application speed and the pressure as shown in FIG. A uniform coated surface as shown in the schematic diagram of FIG. 8 was obtained. Under these conditions, coating was performed on 200 substrates. During the application of 200 sheets, the state of the application surface in the vicinity of the application end portion of the substrate was checked with the cameras 17 to 19 provided in the application apparatus 1 and the visual observation. It was not present, and a good coated surface was obtained.

蛍光体ペーストが塗布された200枚の基板を乾燥すると、隔壁による凹部に蛍光体層が形成された基板が得られた。この蛍光体層が形成された基板に、波長254nmの紫外線ランプを照射して蛍光体層を発光させ、目視で1枚づつ発光状態を確認したところ、いずれの基板についても、塗布終了端近傍が均一に発光しており、塗布斑がないことを確認した。
比較例1
次に、図9のチャート図となるよう、ノズル30内の空間部36の圧力と相対移動速度をコントローラ40で設定制御しながら、基板への塗布を実施した。なお、基板や塗液、ノズル30における孔径、孔数、孔ピッチ、気体通過口や塗液ポート、吐出バルブ、減圧弁、開放専用弁などは図12および図13の塗布装置1と同じものを用いたが、減圧弁23の圧力は一定に維持し、吐出バルブ22及び開放専用弁42の切り換えにより、ノズル30内の空間部36の圧力を大気開放する制御を行った。
When 200 substrates on which the phosphor paste was applied were dried, a substrate in which a phosphor layer was formed in the recesses formed by the partition walls was obtained. The phosphor layer was irradiated with an ultraviolet lamp having a wavelength of 254 nm to cause the phosphor layer to emit light, and the light emission state was visually confirmed one by one. It was confirmed that light was emitted uniformly and there were no coating spots.
Comparative Example 1
Next, application to the substrate was performed while setting and controlling the pressure and relative movement speed of the space 36 in the nozzle 30 with the controller 40 so as to be the chart of FIG. 9. The substrate, the coating liquid, the hole diameter, the number of holes, the hole pitch, the gas passage port, the coating liquid port, the discharge valve, the pressure reducing valve, the open-only valve, etc. in the nozzle 30 are the same as those in the coating apparatus 1 in FIGS. Although used, the pressure of the pressure reducing valve 23 was kept constant, and control was performed to release the pressure of the space portion 36 in the nozzle 30 to the atmosphere by switching between the discharge valve 22 and the opening dedicated valve 42.

吐出バルブ22と開放専用弁42からの圧力の大気開放であるため、圧力は自然排気となった。減圧開始位置と減速開始位置の組み合わせを様々に変更したが、移動速度と圧力の変化が乖離しており、とうとう一定膜厚が得られる条件が見出せなかった。塗布された基板の塗布終了部を詳細に観察すると、塗液となるペーストのかすれた形状、途切れた形状、あるいは後を引いた形状が発生しており不良であったため、塗布を中断した。   Since the pressure from the discharge valve 22 and the opening dedicated valve 42 was released to the atmosphere, the pressure was natural exhaust. Although the combination of the decompression start position and the deceleration start position was changed in various ways, the movement speed and the change in pressure were different from each other, and the condition for finally obtaining a constant film thickness could not be found. When the application end portion of the applied substrate was observed in detail, the application was interrupted because the paste, which was the coating liquid, had a faint shape, a discontinuous shape, or a trailing shape, which was defective.

この方法で塗布した基板を乾燥して、凹部に蛍光体層が形成された基板を発光させたところ、所定の溝に均一に塗布形成されておらず、不良品となった。
比較例2
次に、図10のチャート図となるよう、ノズル30内の空間部36の圧力と相対移動速度をコントローラ40で設定制御しながら、基板への塗布を実施した。なお、基板や塗液、ノズル30における孔径、孔数、孔ピッチ、気体通過口や塗液ポート、吐出バルブ、減圧弁などは図12および図13の塗布装置1と同じものを用いて、減圧弁23の圧力は段階的に変化させた。吐出バルブ22、開放専用弁42の切り換えによるノズル30内の空間部36の圧力の大気への開放は行わなかった。
When the substrate coated by this method was dried and the substrate with the phosphor layer formed in the recesses was caused to emit light, the substrate was not uniformly coated and formed in the predetermined groove, resulting in a defective product.
Comparative Example 2
Next, application to the substrate was performed while setting and controlling the pressure and relative movement speed of the space 36 in the nozzle 30 with the controller 40 so as to be the chart of FIG. Note that the substrate, the coating liquid, the hole diameter, the number of holes, the hole pitch, the gas passage port, the coating liquid port, the discharge valve, the pressure reducing valve, etc. in the nozzle 30 are the same as those in the coating apparatus 1 in FIGS. The pressure of the valve 23 was changed stepwise. The pressure in the space 36 in the nozzle 30 was not released to the atmosphere by switching the discharge valve 22 and the opening-only valve 42.

その結果、圧力を段階的に制御したことで吐出されたペーストの量も段階的になり、基板には帯状の斑が発生した。また速度を低くしているが移動は停止していないため、塗布終了端部での塗液のかすれた形状、途切れた形状、あるいは後を引いた形状等が生じ、一定膜厚が得られる条件が見出せないため、塗布を中断した。   As a result, by controlling the pressure stepwise, the amount of paste discharged was also stepwise, and band-like spots were generated on the substrate. Also, since the speed is reduced but the movement is not stopped, the coating liquid at the end of coating has a faint shape, a discontinuous shape, or a shape with a trailing edge, etc. Was not found, so application was interrupted.

塗布後の基板を乾燥して、凹部に蛍光体層が形成された基板を発光させたところ、帯状となる明暗の斑が発生しており、所定に溝に均一に塗布形成されていないため、不良品となった。
比較例3
次に、図4に示した速度圧力制御下にて、基板への塗布を実施した。なお、基板や塗液、ノズル30における孔径、孔数、孔ピッチ、気体通過口や塗液ポート、吐出バルブ、減圧弁、開放専用弁などは、図12および図13の塗布装置1と同じものを用いた。
When the substrate after application was dried and the substrate with the phosphor layer formed in the recesses was caused to emit light, light and dark spots were formed in a band shape, and it was not uniformly formed in the groove, It became defective.
Comparative Example 3
Next, the application | coating to a board | substrate was implemented under speed-pressure control shown in FIG. The substrate, the coating liquid, the hole diameter, the number of holes, the hole pitch, the gas passage port, the coating liquid port, the discharge valve, the pressure reducing valve, the open-only valve, etc. in the nozzle 30 are the same as those in the coating apparatus 1 in FIGS. Was used.

圧力を大気へ開放することなく、最後まで圧力制御した結果、先述の図5へ示したのと同様、塗液となるペーストのかすれた形状、途切れた形状等が発生し、一定膜厚が得られる条件が見出せないため、塗布を中断した。   As a result of controlling the pressure to the end without releasing the pressure to the atmosphere, as shown in FIG. 5 described above, a faint shape, a discontinuous shape, etc. of the paste as the coating liquid occur, and a constant film thickness is obtained. Application was interrupted because the required conditions could not be found.

塗布後の基板を乾燥して、凹部に蛍光体層が形成された基板を発光させたところ、所定の溝に均一に塗布形成されておらず、不良品となった。   When the substrate after application was dried and the substrate with the phosphor layer formed in the recesses was allowed to emit light, it was not uniformly applied and formed in the predetermined groove, resulting in a defective product.

本発明は、プラズマディスプレイパネルの塗布装置に限らず、液晶ディスプレイ用カラーフィルターの塗布装置などにも応用することができ、その応用範囲がこれらに限られるものではない。   The present invention can be applied not only to a plasma display panel coating apparatus but also to a liquid crystal display color filter coating apparatus, and its application range is not limited thereto.

1 塗布装置
2 テーブル
3 θ軸部材
4 Y軸調整部
4a、4b Y軸ガイドレール
5 X軸搬送部
5a、5b X軸ガイドレール
6 機台
7 支持台
7a、7b ガイドレール
8a、8b Z軸移動部
9 基板
10 クリーナー
11 塗液容器
12 開閉バルブ
13 配管
14 Y1搬送部
15 Y2搬送部
16 Y3搬送部
17 カメラ
18 カメラ
19 カメラ
20 カメラ
22 吐出バルブ(吐出/排気切り換え弁)
23 減圧弁(電空変換器)
24 配管
25 配管
26 配管
27 減圧弁
28 配管
29 吐出制御用気体源
30 ノズル
31 塗液ポート
32 気体通過口
33 吐出孔
34 マニホールド
35 塗液溜り部
36 空間部
37 隔壁
39 塗液量検出手段
40 コントローラ
41 蛍光体ペースト
42 開放専用弁
DESCRIPTION OF SYMBOLS 1 Coating device 2 Table 3 (theta) axis | shaft member 4 Y-axis adjustment part 4a, 4b Y-axis guide rail 5 X-axis conveyance part 5a, 5b X-axis guide rail 6 Machine base 7 Support stand 7a, 7b Guide rail 8a, 8b Z-axis movement Section 9 Substrate 10 Cleaner 11 Coating liquid container 12 Opening / closing valve 13 Pipe 14 Y1 transport section 15 Y2 transport section 16 Y3 transport section 17 Camera 18 Camera 19 Camera 20 Camera 22 Discharge valve (discharge / exhaust switching valve)
23 Pressure reducing valve (electro-pneumatic converter)
24 Piping 25 Piping 26 Piping 27 Pressure reducing valve 28 Piping 29 Discharge control gas source 30 Nozzle 31 Coating liquid port 32 Gas passage port 33 Discharging hole 34 Manifold 35 Coating liquid reservoir 36 Space part 37 Partition 39 Coating liquid amount detecting means 40 Controller 41 Phosphor paste 42 Open-only valve

Claims (6)

気体空間と該気体空間に接する塗液貯留部を有するノズルでもって、前記ノズルと被塗布部材を対向配置し、所定の吐出圧力に制御された気体により前記気体空間を加圧することによって前記塗液貯留部に貯留された塗液を吐出しながら、前記ノズルと前記被塗布部材を相対的に移動させて、前記被塗布部材上に塗膜を形成する塗布方法であって、塗布終了近傍においては前記移動の速度を連続的に減速制御するとともに、前記吐出圧力を連続的に減圧制御し、前記減速制御を行う期間には異なる加速度でもって減速する第1減速期間と第2減速期間を設けて、前記減速制御を行う期間の途中で切替えるとともに、前記減圧制御を行う期間には異なる割合でもって減圧する第1減圧期間と第2減圧期間を設けて、前記減圧制御を行う期間の途中で切替えることを特徴とする塗液の塗布方法。 A nozzle having a gas space and a coating liquid reservoir that is in contact with the gas space, wherein the nozzle and the member to be coated are arranged to face each other, and the gas space is pressurized with a gas controlled to a predetermined discharge pressure, thereby applying the coating liquid. A coating method for forming a coating film on the coated member by relatively moving the nozzle and the coated member while discharging the coating liquid stored in the reservoir, The movement speed is continuously decelerated, the discharge pressure is continuously depressurized, and a first deceleration period and a second deceleration period for decelerating with different accelerations are provided in the period during which the deceleration control is performed. The period during which the deceleration control is performed is switched, and the period during which the decompression control is performed is provided by providing a first decompression period and a second decompression period during which the decompression control is performed at different rates. Coating solution method for coating, characterized in that the switched. 前記第1減速期間から前記第2減速期間への切替え及び前記第1減圧期間から前記第2減圧期間への切替えは、前記ノズルと前記被塗布部材との相対移動による塗布位置が、前記被塗布部材に設けられた有効域と非有効域の境界位置で行うことを特徴とする請求項1に記載の塗液の塗布方法。 In the switching from the first deceleration period to the second deceleration period and the switching from the first decompression period to the second decompression period, the coating position by the relative movement of the nozzle and the member to be coated is the coating target. 2. The coating liquid coating method according to claim 1, wherein the coating is performed at a boundary position between an effective area and an ineffective area provided on the member. 前記第2減速期間の終了とともに前記相対移動を停止させることを特徴とする請求項2に記載の塗液の塗布方法。 3. The coating liquid application method according to claim 2, wherein the relative movement is stopped with the end of the second deceleration period. 前記第2減速期間における相対移動は、前記非有効域内で行うことを特徴とする請求項3に記載の塗液の塗布方法。 The method for applying a coating liquid according to claim 3, wherein the relative movement in the second deceleration period is performed within the ineffective range. 前記第2減圧期間の終了とともに前記気体空間を大気開放することを特徴とする請求項4に記載の塗液の塗布方法。 5. The coating liquid coating method according to claim 4, wherein the gas space is opened to the atmosphere with the end of the second decompression period. 請求項1〜5のいずれかに記載の塗布方法を用いてディスプレイ用部材を製造することを特徴とするディスプレイ用部材の製造方法。 A display member is manufactured using the coating method according to claim 1, wherein the display member is manufactured.
JP2012079370A 2012-03-30 2012-03-30 Method for applying coating liquid and method for producing member for display Pending JP2013208521A (en)

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CN110548954A (en) * 2018-05-31 2019-12-10 株式会社电装天 Coating device and coating method
CN113663877A (en) * 2021-10-11 2021-11-19 启东市旭能电子科技有限公司 Dispensing device is used in processing of PCB circuit board
CN114833035A (en) * 2022-05-19 2022-08-02 深圳市昌富祥智能科技有限公司 Multifunctional glue dispensing mechanism and use method thereof
CN115709152A (en) * 2016-12-14 2023-02-24 杜尔系统股份公司 Coating method and corresponding coating device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115709152A (en) * 2016-12-14 2023-02-24 杜尔系统股份公司 Coating method and corresponding coating device
CN110548954A (en) * 2018-05-31 2019-12-10 株式会社电装天 Coating device and coating method
CN113663877A (en) * 2021-10-11 2021-11-19 启东市旭能电子科技有限公司 Dispensing device is used in processing of PCB circuit board
CN114833035A (en) * 2022-05-19 2022-08-02 深圳市昌富祥智能科技有限公司 Multifunctional glue dispensing mechanism and use method thereof
CN114833035B (en) * 2022-05-19 2024-01-09 深圳市昌富祥智能科技有限公司 Multifunctional dispensing mechanism and application method thereof

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