JP2013171925A - 荷電粒子線装置、それを用いた物品の製造方法 - Google Patents

荷電粒子線装置、それを用いた物品の製造方法 Download PDF

Info

Publication number
JP2013171925A
JP2013171925A JP2012034066A JP2012034066A JP2013171925A JP 2013171925 A JP2013171925 A JP 2013171925A JP 2012034066 A JP2012034066 A JP 2012034066A JP 2012034066 A JP2012034066 A JP 2012034066A JP 2013171925 A JP2013171925 A JP 2013171925A
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
radiation source
radiation
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2012034066A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013171925A5 (enExample
Inventor
Ichiro Tanaka
一郎 田中
Akira Miyake
明 三宅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012034066A priority Critical patent/JP2013171925A/ja
Priority to US13/771,388 priority patent/US8981323B2/en
Publication of JP2013171925A publication Critical patent/JP2013171925A/ja
Publication of JP2013171925A5 publication Critical patent/JP2013171925A5/ja
Abandoned legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP2012034066A 2012-02-20 2012-02-20 荷電粒子線装置、それを用いた物品の製造方法 Abandoned JP2013171925A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012034066A JP2013171925A (ja) 2012-02-20 2012-02-20 荷電粒子線装置、それを用いた物品の製造方法
US13/771,388 US8981323B2 (en) 2012-02-20 2013-02-20 Charged particle beam apparatus, and article manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012034066A JP2013171925A (ja) 2012-02-20 2012-02-20 荷電粒子線装置、それを用いた物品の製造方法

Publications (2)

Publication Number Publication Date
JP2013171925A true JP2013171925A (ja) 2013-09-02
JP2013171925A5 JP2013171925A5 (enExample) 2015-04-09

Family

ID=48982524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012034066A Abandoned JP2013171925A (ja) 2012-02-20 2012-02-20 荷電粒子線装置、それを用いた物品の製造方法

Country Status (2)

Country Link
US (1) US8981323B2 (enExample)
JP (1) JP2013171925A (enExample)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2231352B1 (en) 2008-01-03 2013-10-16 Arcam Ab Method and apparatus for producing three-dimensional objects
WO2011008143A1 (en) 2009-07-15 2011-01-20 Arcam Ab Method and apparatus for producing three-dimensional objects
WO2013098135A1 (en) 2011-12-28 2013-07-04 Arcam Ab Method and apparatus for manufacturing porous three-dimensional articles
WO2013098054A1 (en) 2011-12-28 2013-07-04 Arcam Ab Method and apparatus for detecting defects in freeform fabrication
CN104428866A (zh) 2012-05-14 2015-03-18 迈普尔平版印刷Ip有限公司 带电粒子光刻系统和射束产生器
US11348756B2 (en) 2012-05-14 2022-05-31 Asml Netherlands B.V. Aberration correction in charged particle system
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator
GB2522388B (en) 2012-12-17 2017-08-23 Arcam Ab Additive manufacturing method and apparatus
US9550207B2 (en) 2013-04-18 2017-01-24 Arcam Ab Method and apparatus for additive manufacturing
US9676031B2 (en) 2013-04-23 2017-06-13 Arcam Ab Method and apparatus for forming a three-dimensional article
US9676033B2 (en) 2013-09-20 2017-06-13 Arcam Ab Method for additive manufacturing
US10434572B2 (en) 2013-12-19 2019-10-08 Arcam Ab Method for additive manufacturing
US9802253B2 (en) 2013-12-16 2017-10-31 Arcam Ab Additive manufacturing of three-dimensional articles
US10130993B2 (en) 2013-12-18 2018-11-20 Arcam Ab Additive manufacturing of three-dimensional articles
US9789563B2 (en) 2013-12-20 2017-10-17 Arcam Ab Method for additive manufacturing
US9789541B2 (en) 2014-03-07 2017-10-17 Arcam Ab Method for additive manufacturing of three-dimensional articles
US20150283613A1 (en) 2014-04-02 2015-10-08 Arcam Ab Method for fusing a workpiece
US9837254B2 (en) 2014-08-12 2017-12-05 Lam Research Corporation Differentially pumped reactive gas injector
US9341467B2 (en) 2014-08-20 2016-05-17 Arcam Ab Energy beam position verification
US20160052056A1 (en) * 2014-08-22 2016-02-25 Arcam Ab Enhanced electron beam generation
US20160052079A1 (en) * 2014-08-22 2016-02-25 Arcam Ab Enhanced additive manufacturing
US9406535B2 (en) * 2014-08-29 2016-08-02 Lam Research Corporation Ion injector and lens system for ion beam milling
US10825652B2 (en) 2014-08-29 2020-11-03 Lam Research Corporation Ion beam etch without need for wafer tilt or rotation
US9536748B2 (en) 2014-10-21 2017-01-03 Lam Research Corporation Use of ion beam etching to generate gate-all-around structure
US20160167303A1 (en) 2014-12-15 2016-06-16 Arcam Ab Slicing method
US9721755B2 (en) 2015-01-21 2017-08-01 Arcam Ab Method and device for characterizing an electron beam
US11014161B2 (en) 2015-04-21 2021-05-25 Arcam Ab Method for additive manufacturing
US10807187B2 (en) 2015-09-24 2020-10-20 Arcam Ab X-ray calibration standard object
US10583483B2 (en) 2015-10-15 2020-03-10 Arcam Ab Method and apparatus for producing a three-dimensional article
US10525531B2 (en) 2015-11-17 2020-01-07 Arcam Ab Additive manufacturing of three-dimensional articles
US10610930B2 (en) 2015-11-18 2020-04-07 Arcam Ab Additive manufacturing of three-dimensional articles
US9779955B2 (en) 2016-02-25 2017-10-03 Lam Research Corporation Ion beam etching utilizing cryogenic wafer temperatures
US11247274B2 (en) 2016-03-11 2022-02-15 Arcam Ab Method and apparatus for forming a three-dimensional article
US11325191B2 (en) 2016-05-24 2022-05-10 Arcam Ab Method for additive manufacturing
US10549348B2 (en) 2016-05-24 2020-02-04 Arcam Ab Method for additive manufacturing
US10525547B2 (en) 2016-06-01 2020-01-07 Arcam Ab Additive manufacturing of three-dimensional articles
US10792757B2 (en) 2016-10-25 2020-10-06 Arcam Ab Method and apparatus for additive manufacturing
US10987752B2 (en) 2016-12-21 2021-04-27 Arcam Ab Additive manufacturing of three-dimensional articles
US11059123B2 (en) 2017-04-28 2021-07-13 Arcam Ab Additive manufacturing of three-dimensional articles
US11292062B2 (en) 2017-05-30 2022-04-05 Arcam Ab Method and device for producing three-dimensional objects
US20190099809A1 (en) 2017-09-29 2019-04-04 Arcam Ab Method and apparatus for additive manufacturing
US10847374B2 (en) 2017-10-31 2020-11-24 Lam Research Corporation Method for etching features in a stack
US10529070B2 (en) 2017-11-10 2020-01-07 Arcam Ab Method and apparatus for detecting electron beam source filament wear
US11072117B2 (en) 2017-11-27 2021-07-27 Arcam Ab Platform device
US10821721B2 (en) 2017-11-27 2020-11-03 Arcam Ab Method for analysing a build layer
US11517975B2 (en) 2017-12-22 2022-12-06 Arcam Ab Enhanced electron beam generation
US12350754B2 (en) 2017-12-22 2025-07-08 Arcam Ab Electron beam source and the use of the same
US10361092B1 (en) 2018-02-23 2019-07-23 Lam Research Corporation Etching features using metal passivation
US11267051B2 (en) 2018-02-27 2022-03-08 Arcam Ab Build tank for an additive manufacturing apparatus
US10800101B2 (en) 2018-02-27 2020-10-13 Arcam Ab Compact build tank for an additive manufacturing apparatus
US11400519B2 (en) 2018-03-29 2022-08-02 Arcam Ab Method and device for distributing powder material
CN113519071B (zh) 2019-02-28 2025-04-22 朗姆研究公司 利用侧壁清洁的离子束蚀刻
US11177114B1 (en) * 2020-09-15 2021-11-16 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electrode arrangement, contact assembly for an electrode arrangement, charged particle beam device, and method of reducing an electrical field strength in an electrode arrangement
WO2025201803A1 (en) * 2024-03-28 2025-10-02 Asml Netherlands B.V. Charged particle-optical module
DE102024204310A1 (de) * 2024-05-08 2025-11-13 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Strahlbearbeitung einer optischen Komponente

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003211559A1 (en) * 2002-03-01 2003-09-16 Nikon Corporation Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, exposure device, program, and device manufacturing method
JP3834271B2 (ja) 2002-07-16 2006-10-18 キヤノン株式会社 マルチ荷電ビームレンズ及びこれを用いた荷電粒子線露光装置ならびにデバイス製造方法
JP2010155367A (ja) 2008-12-26 2010-07-15 Yamaha Motor Co Ltd 真空成形機および真空成形品の製造方法

Also Published As

Publication number Publication date
US8981323B2 (en) 2015-03-17
US20130216959A1 (en) 2013-08-22

Similar Documents

Publication Publication Date Title
JP2013171925A (ja) 荷電粒子線装置、それを用いた物品の製造方法
US7598499B2 (en) Charged-particle exposure apparatus
JP7094752B2 (ja) 荷電粒子ビーム照射装置
JP5709535B2 (ja) 電子ビーム描画装置、およびそれを用いた物品の製造方法
EP4376047A2 (en) Particle beam system
KR20150010993A (ko) 하전 입자 리소그래피 시스템 및 빔 생성기
WO2006088141A1 (ja) 電子線装置
KR20190115074A (ko) 향상된 진공 자외선(vuv) 스펙트럼 방사 플럭스를 위해 구성된 장치 및 그 장치를 갖는 시스템
KR20220058662A (ko) 다수의 하전 입자 빔들을 사용하는 장치
US8563950B2 (en) Energy beam drawing apparatus and method of manufacturing device
US10211023B2 (en) Aperture set for multi-beam and multi-charged particle beam writing apparatus
JP2019062069A (ja) 荷電粒子ビーム照射装置及び基板の帯電低減方法
US8686378B2 (en) Charged particle beam drawing apparatus, and method of manufacturing article
US8987692B2 (en) High brightness electron gun, system using the same, and method of operating thereof
EP4439621A1 (en) Shield arrangement for electron-optical module
EP4576159A1 (en) Charged particle system and method of baking out a charged particle system
JP5969336B2 (ja) 検査装置
US20250232943A1 (en) Multiple particle beam system with prolonged maintenance interval
JP5430703B2 (ja) 描画装置、および物品の製造方法
JP2025540570A (ja) 荷電粒子光学デバイス、評価装置、サンプルの評価方法
US20140065549A1 (en) Drawing apparatus and method of manufacturing article
JP4477433B2 (ja) 電子ビーム露光装置及びマルチビーム電子光学系
JP2025121831A (ja) 光電子源、マルチ光電子源及びマルチビーム照射装置
WO2025098867A1 (en) Charged particle system and method of baking out a charged particle system
WO2024110489A1 (en) Charged particle optical device, assessment apparatus, method of assessing a sample

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150220

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150220

A762 Written abandonment of application

Free format text: JAPANESE INTERMEDIATE CODE: A762

Effective date: 20151105