JP2013161485A5 - - Google Patents

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Publication number
JP2013161485A5
JP2013161485A5 JP2013036386A JP2013036386A JP2013161485A5 JP 2013161485 A5 JP2013161485 A5 JP 2013161485A5 JP 2013036386 A JP2013036386 A JP 2013036386A JP 2013036386 A JP2013036386 A JP 2013036386A JP 2013161485 A5 JP2013161485 A5 JP 2013161485A5
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Japan
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target
runtime
frame
displacement
area
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JP2013036386A
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Japanese (ja)
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JP2013161485A (ja
JP5864455B2 (ja
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Priority claimed from US13/368,306 external-priority patent/US8855399B2/en
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JP2013036386A 2012-02-07 2013-02-07 Ｃａｄベースの位置合わせのためのシステム、方法、及びコンピュータプログラム製品 Active JP5864455B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/368,306 US8855399B2 (en) 2012-02-07 2012-02-07 System, a method and a computer program product for CAD-based registration
US13/368,306 2012-02-07

Publications (3)

Publication Number Publication Date
JP2013161485A JP2013161485A (ja) 2013-08-19
JP2013161485A5 true JP2013161485A5 (enExample) 2015-06-11
JP5864455B2 JP5864455B2 (ja) 2016-02-17

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JP2013036386A Active JP5864455B2 (ja) 2012-02-07 2013-02-07 Ｃａｄベースの位置合わせのためのシステム、方法、及びコンピュータプログラム製品

Country Status (4)

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US (2) US8855399B2 (enExample)
JP (1) JP5864455B2 (enExample)
KR (2) KR101551753B1 (enExample)
TW (1) TWI519801B (enExample)

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KR102330732B1 (ko) * 2014-04-02 2021-11-23 케이엘에이 코포레이션 마스크들을 위한 고밀도 레지스트레이션 맵들을 생성하기 위한 방법, 시스템 및 컴퓨터 프로그램 제품
GB2526359B (en) * 2014-05-23 2020-07-22 Advanced Risc Mach Ltd Graphics processing systems
US9715724B2 (en) * 2014-07-29 2017-07-25 Applied Materials Israel Ltd. Registration of CAD data with SEM images
US10012689B2 (en) 2015-03-25 2018-07-03 Applied Materials Israel Ltd. Method of inspecting a specimen and system thereof
US10018571B2 (en) * 2015-05-28 2018-07-10 Kla-Tencor Corporation System and method for dynamic care area generation on an inspection tool
US10545490B2 (en) 2015-06-01 2020-01-28 Applied Materials Israel Ltd. Method of inspecting a specimen and system thereof
US10127651B2 (en) * 2016-01-15 2018-11-13 Kla-Tencor Corporation Defect sensitivity of semiconductor wafer inspectors using design data with wafer image data
US11010886B2 (en) 2016-05-17 2021-05-18 Kla-Tencor Corporation Systems and methods for automatic correction of drift between inspection and design for massive pattern searching
US10161882B1 (en) * 2016-07-28 2018-12-25 Applied Materials Israel Ltd. Method of examining locations in a wafer with adjustable navigation accuracy and system thereof
KR101893823B1 (ko) 2016-10-04 2018-08-31 주식회사 고영테크놀러지 기판 검사장치 및 이를 이용한 기판의 왜곡 보상 방법
US10190991B2 (en) 2016-11-03 2019-01-29 Applied Materials Israel Ltd. Method for adaptive sampling in examining an object and system thereof
JP6805028B2 (ja) * 2017-03-07 2020-12-23 東京エレクトロン株式会社 液滴吐出装置、液滴吐出方法、プログラム及びコンピュータ記憶媒体
US10600177B2 (en) * 2017-08-09 2020-03-24 Kla-Tencor Corporation Nuisance reduction using location-based attributes
US11060981B2 (en) 2018-03-20 2021-07-13 Applied Materials Israel Ltd. Guided inspection of a semiconductor wafer based on spatial density analysis
KR102538785B1 (ko) * 2018-07-27 2023-05-31 삼성전자주식회사 컴퓨터 지원 설계(cad) 파일로부터 웨이퍼 이미지를 생성하는 방법 및 시스템
US10902620B1 (en) 2019-04-18 2021-01-26 Applied Materials Israel Ltd. Registration between an image of an object and a description
JP7404009B2 (ja) * 2019-09-19 2023-12-25 キオクシア株式会社 加工情報管理システム及び加工情報管理方法

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