JP2013149928A5 - - Google Patents

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Publication number
JP2013149928A5
JP2013149928A5 JP2012011558A JP2012011558A JP2013149928A5 JP 2013149928 A5 JP2013149928 A5 JP 2013149928A5 JP 2012011558 A JP2012011558 A JP 2012011558A JP 2012011558 A JP2012011558 A JP 2012011558A JP 2013149928 A5 JP2013149928 A5 JP 2013149928A5
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JP
Japan
Prior art keywords
substrate
measurement
rotation mechanism
lithography
lithographic apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2012011558A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013149928A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2012011558A priority Critical patent/JP2013149928A/ja
Priority claimed from JP2012011558A external-priority patent/JP2013149928A/ja
Priority to US13/739,196 priority patent/US20130188165A1/en
Publication of JP2013149928A publication Critical patent/JP2013149928A/ja
Publication of JP2013149928A5 publication Critical patent/JP2013149928A5/ja
Abandoned legal-status Critical Current

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JP2012011558A 2012-01-23 2012-01-23 リソグラフィー装置および物品を製造する方法 Abandoned JP2013149928A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012011558A JP2013149928A (ja) 2012-01-23 2012-01-23 リソグラフィー装置および物品を製造する方法
US13/739,196 US20130188165A1 (en) 2012-01-23 2013-01-11 Lithography apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012011558A JP2013149928A (ja) 2012-01-23 2012-01-23 リソグラフィー装置および物品を製造する方法

Publications (2)

Publication Number Publication Date
JP2013149928A JP2013149928A (ja) 2013-08-01
JP2013149928A5 true JP2013149928A5 (https=) 2015-03-05

Family

ID=48796959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012011558A Abandoned JP2013149928A (ja) 2012-01-23 2012-01-23 リソグラフィー装置および物品を製造する方法

Country Status (2)

Country Link
US (1) US20130188165A1 (https=)
JP (1) JP2013149928A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014045041A (ja) * 2012-08-24 2014-03-13 Sharp Corp 露光装置、露光方法、および電子デバイス製造方法
EP3161854A4 (en) * 2014-06-25 2018-05-30 Intel Corporation Techniques for forming a compacted array of functional cells
JP6791051B2 (ja) * 2017-07-28 2020-11-25 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5151750A (en) * 1989-04-14 1992-09-29 Nikon Corporation Alignment apparatus
JPH04304615A (ja) * 1991-04-01 1992-10-28 Hitachi Ltd 荷電粒子線描画装置及び方法
US6225012B1 (en) * 1994-02-22 2001-05-01 Nikon Corporation Method for positioning substrate
JPH08227839A (ja) * 1995-02-20 1996-09-03 Nikon Corp 移動鏡曲がりの計測方法
US5648854A (en) * 1995-04-19 1997-07-15 Nikon Corporation Alignment system with large area search for wafer edge and global marks
KR100525521B1 (ko) * 1996-10-21 2006-01-27 가부시키가이샤 니콘 노광장치및노광방법
JP4366031B2 (ja) * 2001-09-17 2009-11-18 キヤノン株式会社 位置検出装置及び方法並びに露光装置、デバイスの製造方法

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