JP2013109055A5 - - Google Patents

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Publication number
JP2013109055A5
JP2013109055A5 JP2011252374A JP2011252374A JP2013109055A5 JP 2013109055 A5 JP2013109055 A5 JP 2013109055A5 JP 2011252374 A JP2011252374 A JP 2011252374A JP 2011252374 A JP2011252374 A JP 2011252374A JP 2013109055 A5 JP2013109055 A5 JP 2013109055A5
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JP
Japan
Prior art keywords
light
wavelength
reflective film
substrate
optical paths
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Application number
JP2011252374A
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English (en)
Japanese (ja)
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JP2013109055A (ja
JP5786672B2 (ja
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Priority to JP2011252374A priority Critical patent/JP5786672B2/ja
Priority claimed from JP2011252374A external-priority patent/JP5786672B2/ja
Publication of JP2013109055A publication Critical patent/JP2013109055A/ja
Publication of JP2013109055A5 publication Critical patent/JP2013109055A5/ja
Application granted granted Critical
Publication of JP5786672B2 publication Critical patent/JP5786672B2/ja
Expired - Fee Related legal-status Critical Current
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JP2011252374A 2011-11-18 2011-11-18 分光測定装置 Expired - Fee Related JP5786672B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011252374A JP5786672B2 (ja) 2011-11-18 2011-11-18 分光測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011252374A JP5786672B2 (ja) 2011-11-18 2011-11-18 分光測定装置

Publications (3)

Publication Number Publication Date
JP2013109055A JP2013109055A (ja) 2013-06-06
JP2013109055A5 true JP2013109055A5 (cg-RX-API-DMAC7.html) 2015-01-08
JP5786672B2 JP5786672B2 (ja) 2015-09-30

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ID=48705898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011252374A Expired - Fee Related JP5786672B2 (ja) 2011-11-18 2011-11-18 分光測定装置

Country Status (1)

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JP (1) JP5786672B2 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6255992B2 (ja) 2013-12-27 2018-01-10 セイコーエプソン株式会社 分光測定システム、分光モジュール、及び、位置ズレ検出方法
JP2016011932A (ja) 2014-06-30 2016-01-21 セイコーエプソン株式会社 分光画像撮像装置、分光画像撮像方法
JP6467801B2 (ja) 2014-07-31 2019-02-13 セイコーエプソン株式会社 分光画像取得装置、及び受光波長取得方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10170444A (ja) * 1996-12-06 1998-06-26 Hamamatsu Photonics Kk 光測定装置
JP2001311662A (ja) * 2000-04-28 2001-11-09 Horiba Ltd 分光装置
JP2003240638A (ja) * 2002-02-13 2003-08-27 Nikon Corp 検査装置
EP1995576B1 (de) * 2007-05-23 2011-04-20 InfraTec GmbH Anordnung für die Detektion von Stoffen und/oder Stoffkonzentrationen mit durchstimmbarem Fabry-Perot-Interferometer
JP5657517B2 (ja) * 2008-03-20 2015-01-21 コーニンクレッカ フィリップス エヌ ヴェ 光検出器及び光を測定する方法
JP5446110B2 (ja) * 2008-03-31 2014-03-19 セイコーエプソン株式会社 受光装置
JP2010249808A (ja) * 2009-03-24 2010-11-04 Olympus Corp 分光透過率可変素子を備えた分光イメージング装置及び分光イメージング装置における分光透過率可変素子の調整方法
JP5569002B2 (ja) * 2010-01-21 2014-08-13 セイコーエプソン株式会社 分析機器および特性測定方法
CN103608654A (zh) * 2011-06-21 2014-02-26 奥林巴斯株式会社 分光图像拍摄装置

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