JP2013094737A - Ultraviolet irradiation apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an ultraviolet irradiation apparatus capable of enlarging the area of an irradiation area by suppressing a fall in ultraviolet illuminance in an end region of a substrate processing part.SOLUTION: The ultraviolet irradiation apparatus includes a substrate treating section 1 on which a substrate A to be treated with ultraviolet rays is arranged, and an ultraviolet irradiation section 2 having a plurality of ultraviolet irradiation units 21 arranged in grated shape to face the substrate treating section 1. The ultraviolet irradiation section 2 includes first ultraviolet irradiation units 21A, and second ultraviolet irradiation units 21B high in the peak value P of ultraviolet illuminance in the position of the substrate treating section 1 and narrow in irradiation area S of irradiating at least the 50% value of the peak value P in comparison with the first ultraviolet irradiation units 21A. The first ultraviolet irradiation units 21A are arranged in a center region in at least partial rows or columns in the array of the ultraviolet irradiation section 2, and the second ultraviolet irradiation units 21B are arranged in the end region.

Description

  Embodiments described herein relate generally to an ultraviolet irradiation device.

  The ultraviolet irradiation device is used for ultraviolet treatment, for example, ink drying for printing, fine exposure for semiconductor devices, curing of adhesives for liquid crystals, formation of light distribution films for liquid crystals, and the like. In recent years, the size of the substrate to be treated with ultraviolet light has been increased, and there has been a demand for an increase in the ultraviolet irradiation area of the ultraviolet irradiation device.

  This type of ultraviolet irradiation device has a plurality of ultraviolet irradiation units arranged in a lattice pattern in the plane direction, and irradiates ultraviolet rays emitted from these ultraviolet irradiation units onto a substrate disposed at a predetermined distance. This is a configuration for performing processing.

  In this type of UV irradiation device, the UV illuminance distribution from adjacent UV irradiation units is synthesized to improve the uniformity of UV illuminance on the substrate processing unit where the substrate is installed. In the upper end region, photosynthesis is insufficient, and the ultraviolet illuminance decreases. Therefore, in the end region on the ultraviolet irradiation part, the ultraviolet illuminance or uniformity required for substrate processing cannot be satisfied, and a large substrate cannot be processed.

JP 2011-76033 A

  The problem to be solved by the present invention is to provide an ultraviolet irradiation device capable of increasing the irradiation area by suppressing a decrease in ultraviolet illuminance in the end region of the substrate processing unit.

  In order to achieve the above object, an ultraviolet irradiation apparatus according to an embodiment includes a substrate processing unit on which a substrate to be subjected to ultraviolet processing is arranged, and a plurality of ultraviolet irradiation units arranged in a grid so as to face the substrate processing unit. An ultraviolet irradiation device comprising: a first ultraviolet irradiation unit; and an ultraviolet illuminance peak at a position of the substrate processing unit with respect to the first ultraviolet irradiation unit. And a second ultraviolet irradiation unit having a small irradiation area S for irradiating 50% or more of the peak value P with a high value P, and in at least some rows or columns of the arrangement of the ultraviolet irradiation units The first ultraviolet irradiation unit is arranged in the central region, and the second ultraviolet irradiation unit is arranged in the end region.

It is a disassembled perspective view for demonstrating 1st Embodiment regarding an ultraviolet irradiation device. It is an external appearance perspective view for demonstrating the assembly state of FIG. It is a figure for demonstrating sectional drawing of the ultraviolet irradiation unit of FIG. 1 and FIG. 2, and distribution of ultraviolet illuminance. It is a figure for demonstrating sectional drawing of the y direction in the ultraviolet irradiation device of FIG. 2, and distribution of ultraviolet illuminance. It is sectional drawing of the x direction in the ultraviolet irradiation device of FIG. 2, and a figure for demonstrating distribution of ultraviolet illuminance. It is a top view of the ultraviolet irradiation device for demonstrating arrangement | positioning of an ultraviolet irradiation unit about 2nd Embodiment regarding an ultraviolet irradiation device. It is a top view of the ultraviolet irradiation device for demonstrating arrangement | positioning of an ultraviolet irradiation unit about 3rd Embodiment regarding an ultraviolet irradiation device. FIG. 8 is a cross-sectional view in the y direction and a diagram for explaining the distribution of ultraviolet illuminance in the ultraviolet irradiation device of FIG. It is a disassembled perspective view for demonstrating the structure of the ultraviolet irradiation unit of FIG. 7 and FIG. It is a figure for demonstrating sectional drawing of the ultraviolet irradiation unit of FIG. 7 and FIG. 8, and distribution of ultraviolet illuminance. It is a top view of the ultraviolet irradiation device for demonstrating arrangement | positioning of an ultraviolet irradiation unit about 4th Embodiment regarding an ultraviolet irradiation device. It is a figure for demonstrating the cross section of the x direction in the ultraviolet irradiation device of FIG. 11, and distribution of ultraviolet illuminance. It is a top view of the ultraviolet irradiation device for demonstrating the other example of arrangement | positioning of an ultraviolet irradiation unit.

  Hereinafter, embodiments for carrying out the invention will be described.

(First embodiment)
The ultraviolet irradiation apparatus of 1st Embodiment is demonstrated with reference to drawings. 1 is an exploded perspective view, FIG. 2 is an external perspective view of the assembled state of FIG. 1, FIG. 3 is a cross-sectional view of the ultraviolet irradiation unit used in FIGS. FIG. 5 is a cross-sectional view of the ultraviolet irradiation device and a distribution of ultraviolet illuminance.

  In FIG. 1 and FIG. 2, reference numeral 100 denotes an ultraviolet irradiation device that performs ultraviolet processing such as ink-drying related to printing, fine exposure related to a semiconductor device, curing of an adhesive related to liquid crystal, and formation of a light distribution film of liquid crystal. . The ultraviolet irradiation apparatus 100 includes a substrate processing unit 1 on which a substrate A to be subjected to ultraviolet processing is disposed and irradiated with ultraviolet rays, and an ultraviolet irradiation that is disposed facing the substrate processing unit 1 and irradiates the substrate A with ultraviolet rays. Part 2.

  The substrate processing unit 1 includes a substrate placement unit 11 on which a substrate A can be placed. The substrate placement unit 11 is, for example, a stainless steel rectangular parallelepiped stage having a width X1 of 300 mm to 3000 mm and a length Y1 of 3000 mm to 3500 mm. The substrate placement unit 11 is provided with, for example, a plurality of holes 12, and an internal transfer unit 13 that can move up and down and can hold the substrate A by point contact is provided in the holes 12. Has been.

  The substrate A is supplied to the upper surface of the substrate placement unit 11 by, for example, an external transfer mechanism that supplies the substrate A from the outside with the internal transfer unit 13 protruding upward from the substrate placement unit 11 as shown in FIG. This is performed by transferring the substrate A to (not shown) and then moving the internal transfer unit 13 holding the substrate A downward. On the other hand, the unloading of the substrate A after the ultraviolet treatment is performed by moving the internal transfer unit 13 upward from the substrate placement unit 11 to lift the substrate A and then in the gap between the substrate A and the substrate placement unit 11. After the substrate holding part of the transport mechanism is inserted and the substrate A is delivered, the substrate A is carried out by the external transport mechanism.

  For example, a plurality of ultraviolet irradiation units 21 are arranged in a lattice pattern in the plane direction above the substrate placement unit 11 of the substrate processing unit 1 at a distance L1 of 800 mm to 1500 mm.

  The structure of the ultraviolet irradiation unit 21 will be described with reference to FIG. The ultraviolet irradiation unit 21 includes, for example, a pair of reflectors 212a and 212b, an ultraviolet light source 213 disposed in a space between the reflectors 212a and 212b, and an ultraviolet light source 213 in a metal casing 211 such as stainless steel or aluminum. And a lighting circuit 215 for turning on the ultraviolet light source 213 and an irradiating section 214 for taking out the ultraviolet rays from the reflector and the ultraviolet rays reflected by the reflectors 212a and 212b.

  The ultraviolet light source 213 is an ultraviolet transmissive cylindrical bulb made of, for example, quartz glass, and, for example, an inert gas and a discharge medium mainly composed of mercury and iron are enclosed in the light emission space of the bulb. . The outer diameter φ of the lamp is about 15 ± 1 mm, and the length L is about 240 mm. The lighting circuit 215 at this time uses, for example, a magnetron that irradiates microwaves with a frequency of 2.45 GHz, and guides the microwaves to the ultraviolet light source 213, whereby the discharge medium enclosed in the bulb is discharged, and the wavelength 180 It is the structure which generate | occur | produces a ~ 400 nm ultraviolet-ray.

  The reflectors 212a and 212b are, for example, flat plate-like reflectors configured by a pair of glass plates having a reflective film formed on the surface so as to reflect ultraviolet rays from the ultraviolet light source 213 and pass microwaves.

  The irradiation unit 214 can have, for example, an optical function of diffusing or condensing light from the ultraviolet light source 213 and a function of blocking noise generated from the ultraviolet light source 213 or the lighting circuit 215. In order to simplify the apparatus configuration, it is possible to omit the installation of the above-described members and to have a configuration in which an opening is provided in the housing 211.

  The light distribution characteristics of the ultraviolet irradiation unit 21 can be adjusted, for example, by changing the angle α between the reflectors 212a and 212b. As an example, changes in the distribution of ultraviolet illuminance when the angle α is changed to three types of 90 °, 100 °, and 110 ° will be described with reference to FIG.

  As shown in FIG. 3A, the distribution of the ultraviolet illuminance in the y-direction in the tube diameter direction of the ultraviolet light source 213 increases the peak value P of the ultraviolet illuminance as the angle α decreases. The length in the y direction for irradiating 50% or more of the value becomes shorter.

  On the other hand, in the tube axis direction of the ultraviolet light source 213, the distribution of the ultraviolet illuminance in the x direction, as shown in FIG. 3B, the peak value P of the ultraviolet illuminance increases as the angle α decreases. The length in the x direction for irradiating 50% or more of P hardly changes.

  FIG. 3C shows a range in which 50% of the peak value P of each ultraviolet illuminance is irradiated at each angle α. The internal area of this range is an irradiation area S that can irradiate 50% or more of the peak value P, and the smaller the angle α, the narrower the light distribution distribution.

  In the ultraviolet irradiation apparatus 100 of FIG. 1 and FIG. 2, two types, a first ultraviolet irradiation unit 21A having an angle α of 110 ° and a second ultraviolet irradiation unit 21B having an angle α of 100 °, are used. As described above, the light distribution characteristic of the second ultraviolet irradiation unit 21B is higher than the light distribution characteristic of the first ultraviolet irradiation unit 21A, and the peak value P of ultraviolet illuminance is high, and the peak value P of ultraviolet illuminance. The irradiation area S which can irradiate 50% or more of the value is narrow.

  These ultraviolet irradiation units 21A and 21B are arranged in a grid of 6 columns x and 6 rows y, the second ultraviolet irradiation unit 21B is arranged on the entire outer periphery, and the other central region. 21A of 1st ultraviolet irradiation units are arrange | positioned. Further, the gap distances d1 to d5 in the x direction and the gap distances k1 to k5 in the y direction of the respective ultraviolet irradiation units 21A and 21B are adjusted to be substantially constant.

  These ultraviolet irradiation units 21A and 21B are installed on an installation plate 22, for example, a stainless steel substrate. An opening 23 is provided at a position corresponding to the irradiation unit 214 of each of the ultraviolet irradiation units 21A and 21B on the installation plate 22, and ultraviolet rays from the respective ultraviolet irradiation units 21A and 21B are transmitted through these openings 23. To the substrate processing unit 1.

  For example, external reflectors 24a, 24b, 24c, and 24d are disposed around the lower portion of the installation plate 22 in order to reduce the amount of ultraviolet rays leaking to the surroundings. The external reflectors 24a, 24b, 24c, and 24d are made of, for example, stainless steel, and the surface on the inner side is subjected to surface treatment for increasing the reflectance of ultraviolet rays. The angle between the external reflectors 24a, 24b, 24c, 24d and the installation plate 22 is, for example, a configuration inclined at 90 ° to 120 °, and reflects the light of the ultraviolet irradiation units 21A, 21B, so that the substrate processing unit The illuminance and uniformity of UV above 1 are improved.

  FIG. 4 shows a cross-sectional view of the ultraviolet irradiation device 100 in the y direction in the row x = 3 and the distribution of ultraviolet illuminance on the substrate processing unit 1. The ultraviolet illuminance distribution of the first embodiment is indicated by a solid line B1. For comparison, the dotted line C1 shows the distribution of ultraviolet illuminance when all y = 1 to 6 are used as the first ultraviolet irradiation unit 21A. In the first embodiment, the peak value P of the ultraviolet illuminance is higher than that of the first ultraviolet irradiation unit 21A disposed in the center region at both ends in the y direction, and is 50% of each peak value P. By arranging the second ultraviolet irradiation unit 21B having a small irradiation area S for irradiating the above, the ultraviolet illuminance at both ends can be increased. As a result, the width WB1 of the region capable of ensuring the ultraviolet illuminance D1 and uniformity required for the ultraviolet treatment of the substrate A can be made larger than the comparative WC1.

  FIG. 5 shows a cross-sectional view of the ultraviolet irradiation device in the x direction at row y = 3 and the distribution of ultraviolet illuminance on the substrate processing unit 1. In the first embodiment, the peak value P of the ultraviolet illuminance is higher than the first ultraviolet irradiation unit 21A arranged in the center at both ends in the x direction, and more than 50% of each peak value P is greater than the peak value P. By arranging the second ultraviolet irradiation unit 21B having a small irradiation area S to be irradiated, the ultraviolet illuminance at both ends can be increased. As a result, the width WB1 of the region capable of ensuring the ultraviolet illuminance D1 and uniformity required for the ultraviolet treatment of the substrate A can be made larger than the comparative WC1.

  As described above, the ultraviolet irradiation device 100 according to the first embodiment suppresses a decrease in the ultraviolet illuminance in the end region on the substrate processing unit 1 where the substrate A is installed, and the ultraviolet illuminance D1 required for the ultraviolet processing and The area where the uniformity can be ensured can be expanded, and the substrate A can be made larger.

(Second Embodiment)
FIG. 6 is a top view of the ultraviolet irradiation device 100 for explaining a second embodiment related to the ultraviolet irradiation device and for explaining another arrangement example of the ultraviolet irradiation unit 21. About each part of this 2nd Embodiment, the same part as each part of the ultraviolet irradiation device of 1st Embodiment is shown with the same code | symbol.

  The basic configuration of the ultraviolet irradiation device 100 of the second embodiment is the same as that of the first embodiment, but the arrangement of the first ultraviolet irradiation unit 21A and the second ultraviolet irradiation unit 21B is different.

  6A, the second ultraviolet irradiation unit 21B is arranged in two columns of row y = 1 and row y = 6, and the first ultraviolet irradiation unit 21A is arranged in four columns of rows y = 2 to 5 therebetween. It is the structure which arranged. FIG. 6B shows a configuration in which the second ultraviolet irradiation unit 21B is disposed only at the four corners of the lattice, and the other is the first ultraviolet irradiation unit 21A.

  In the second embodiment described above, as in the first embodiment, in the case where the first ultraviolet irradiation unit 21A is all disposed, in the end region on the substrate processing unit 1 where the substrate A is installed. Decrease in UV illuminance can be suppressed. As a result, it is possible to expand the region in which the ultraviolet illuminance and uniformity required for the ultraviolet treatment can be ensured, and the substrate A can be made larger. Moreover, adjustment of ultraviolet illuminance can be omitted by reducing the number of second ultraviolet irradiation units 21B.

(Third embodiment)
FIGS. 7 and 8 are for explaining a third embodiment relating to the ultraviolet irradiation device. FIG. 7 is a top view of the ultraviolet irradiation device 100 showing the arrangement of the ultraviolet irradiation unit, and FIG. It is a figure for demonstrating the figure and distribution of ultraviolet illuminance.

  In the third embodiment, ultraviolet irradiation units 21D, 21E, and 21F having three types of ultraviolet illuminance distribution are used.

  FIG. 9 is a diagram for explaining an exploded perspective view of the ultraviolet irradiation unit 21. The ultraviolet irradiation unit 21 includes a lighting substrate 215a in which a number of UV-LEDs are mounted as the ultraviolet light source 213 and electrically wired in a housing 211, and a lighting circuit 215b that supplies light to the lighting substrate to control light emission. It is the housed configuration. The UV-LED that is the ultraviolet light source 213 includes an LED chip substrate 213a, a light emitting unit 213b mounted on the LED chip substrate, and a lens 213c that covers the light emitting unit 213b. The distribution of ultraviolet illuminance of the ultraviolet irradiation unit 21 is, for example, an LED chip that reflects the shape of the lens 213c of the UV-LED or the light of the light emitting unit 213b in addition to the adjustment of the number and arrangement interval of the UV-LEDs. It can be adjusted by forming it integrally with the substrate 213a and changing its reflection shape.

  The distribution of ultraviolet illuminance of the three types of ultraviolet irradiation units 21D, 21E, and 21F used in the third embodiment is shown in FIG. The distribution of the ultraviolet illuminance of the first ultraviolet irradiation unit 21D has the same distribution of the ultraviolet illuminance in the x direction and the y direction. In the illuminance distribution of the second ultraviolet irradiation unit 21E, the peak value P of the ultraviolet illuminance is increased with respect to the ultraviolet irradiation unit 21D by the adjustment method described above, and more than 50% of each peak value P is irradiated. The distribution is such that the length in the x direction is maintained and the length in the y direction is shortened. The illuminance distribution of the third ultraviolet irradiation unit 21F is a distribution obtained by rotating the illuminance distribution of the ultraviolet irradiation unit 21E by 90 ° in the xy direction and condensing only in the x direction.

  As shown in FIG. 7, these ultraviolet irradiation units 21D, 21E, and 21F are arranged in a grid pattern with six columns x and six rows y.

  In the row x = 2 to 5, the first ultraviolet irradiation unit 21D is arranged in the central region y = 2 to 5 of each row, and the first ultraviolet irradiation unit 21D is arranged in the end regions y = 1 and y = 6. In contrast, a second ultraviolet irradiation unit 21E having a high ultraviolet peak value P and a small irradiation area S for irradiating 50% or more of each peak value P is disposed. In the columns x = 1 and x = 6, the third ultraviolet irradiation unit 21F is arranged in the central region y = 2 to 5 of each column, and the second ultraviolet irradiation is performed in the end regions y = 1 and y = 6. Although the unit 21E is disposed, all of the light condensing directions are different, but the ultraviolet ray peak value P and the irradiation area S for irradiating 50% or more of each peak value P are the same.

  On the other hand, in the row y = 2 to 5, the first ultraviolet irradiation unit 21D is arranged in the central region x = 2 to 5 of each row, and the first ultraviolet irradiation unit is arranged in the end regions x = 1 and x = 6. A third ultraviolet irradiation unit 21F having a high ultraviolet peak value P and a small irradiation area S for irradiating 50% or more of each peak value P with respect to 21D is arranged. In the rows y = 1 and y = 6, the second ultraviolet irradiation device 21E is used, and the ultraviolet irradiation peak value P and the irradiation area S for irradiating 50% or more of each peak value P are the same.

  The gap distance in the x direction of each ultraviolet irradiation unit 21 is set so that the gaps d1 and d5 at both ends in the x direction are shorter than the gaps d2, d3, and d4 at the center. On the other hand, the gap interval in the y direction is set so that the intervals k1 and k5 at both ends in the y direction are shorter than the intervals k2, k3, and k4 in the central portion.

  FIG. 8 shows a cross-sectional view of the ultraviolet irradiation device 100 in the y direction in the row x = 3 and the distribution of ultraviolet illuminance on the substrate placement portion 11. The ultraviolet illuminance distribution of the third embodiment is indicated by a solid line B2. For comparison, the ultraviolet irradiation units 21D and 21E have the same type and arrangement, and the ultraviolet illuminance distribution when the gap intervals d1 to d5 and the gap intervals k1 to k5 are all the same is indicated by a dotted line C2. .

  In 3rd Embodiment, the 2nd ultraviolet irradiation unit 21E which has the distribution of the condensed ultraviolet illuminance was arrange | positioned in the both ends x = 1 and 6 of 1st ultraviolet irradiation unit 21D of the center y = 2-5. In addition, since the distances k1 and k5 between the first ultraviolet irradiation unit 21D and the second ultraviolet irradiation unit 21E at both ends are smaller than the central distances k2 to k4, the uniformity of ultraviolet illuminance is improved. I can do it. On the other hand, in the x direction, although not shown, the same effect as in FIG. 8 can be obtained and the uniformity of ultraviolet illuminance can be improved.

  As described above, the ultraviolet irradiation device 100 according to the third embodiment suppresses a decrease in ultraviolet illuminance in the end region on the substrate processing unit 1 where the substrate A is installed, and reduces the ultraviolet illuminance D2 necessary for the ultraviolet processing. The optical uniformity can be improved while expanding the area WB2 that can be secured.

(Fourth embodiment)
11 and 12 are for explaining a fourth embodiment relating to the ultraviolet irradiation device. FIG. 11 is a top view of the ultraviolet irradiation device 100 showing the arrangement of the ultraviolet irradiation unit 21, and FIG. It is sectional drawing and a figure for demonstrating distribution of ultraviolet illuminance.

  In the fourth embodiment, as the ultraviolet irradiation unit 21 having the same configuration, for example, a first ultraviolet unit 21D shown in FIG. 10 is used. Here, the ultraviolet irradiation unit 21 having the same configuration has the same design, but means that electrical or optical characteristic variation of the ultraviolet irradiation unit 21 due to factors such as material variation or manufacturing variation is allowed. Yes.

  As shown in FIG. 11, the first ultraviolet irradiation unit 21 </ b> D is arranged in a lattice shape with four columns x and four rows y. As for the gap distance of the first ultraviolet irradiation unit 21D, the gap gaps d1 and d3 at both ends are made shorter than the gap gap d2 at the center in the x direction, and the gap gaps k1 and k3 at both ends are made smaller in the y direction. The center gap interval k2 is shortened.

  FIG. 12 shows a cross-sectional view of the ultraviolet irradiation device 100 in the x direction in row y = 2 and the distribution of ultraviolet illuminance on the substrate processing unit 1. The ultraviolet illuminance distribution of the fourth embodiment is indicated by a solid line B3. In addition, a distribution of ultraviolet illuminance when the first ultraviolet irradiation unit 21D is used for comparison and the gap intervals d1 to d3 and the gap intervals k1 to k3 are all the same is indicated by a dotted line C3.

  In the fourth embodiment, by reducing the gap distance between both ends d1 and d3 or k1 and k3 with respect to the gap distance d2 or k2 at the center, the ultraviolet illuminance at the center is reduced, The distribution can improve the ultraviolet illuminance at both ends.

The fourth embodiment can be used in a process that requires ultraviolet treatment only around the substrate A, for example, in an ultraviolet curing process of a sealing material that bonds the periphery of two substrates in manufacturing a liquid crystal panel. Further, when separate ultraviolet treatments are performed simultaneously at the center and the outer periphery of the substrate A, for example, the above-described sealing process is performed at the outer periphery of the substrate A, and the liquid crystal light distribution film is formed at the center of the substrate A. It can also be used for simultaneous processing in the process of forming. In this case, the UV illuminance required for the former process is required to have a higher UV illuminance distribution than that of the latter process, so this can be accommodated and a large substrate A can be installed. It becomes. Further, since it is not necessary to increase the lighting power of some of the ultraviolet irradiation units 21D used in the ultraviolet irradiation device 100 in order to obtain the above-described ultraviolet illuminance distribution, it is possible to save power and extend the life of the ultraviolet irradiation device 100. It becomes.
The present invention is not limited to the above embodiment, and various modifications are possible.

  In addition to holding the substrate A by surface contact, the substrate placement unit 11 of the substrate processing unit 1 may adopt a configuration of holding the substrate A by line contact or point contact, for example. The substrate A may be supplied from the front surface of the ultraviolet irradiation apparatus 100 by a forklift method, or may be a method of moving the substrate A from the front to the rear by a walking beam method or a belt method, for example. it can.

  The ultraviolet light source 213 used for the ultraviolet irradiation unit 21 may be any light source that can emit ultraviolet light in a wavelength range suitable for performing the ultraviolet treatment of the substrate A. Therefore, a metal halide lamp, a low-pressure mercury lamp, an intermediate-pressure lamp It can be replaced with a high-pressure lamp, an HID lamp, or a laser diode.

  The lighting circuit 215 can have a configuration suitable for each light source, and all or part of the lighting circuit 215 can be disposed outside the housing 211 of the ultraviolet irradiation unit 21.

  In addition to the angles of the reflectors 212a and 212b, the method of adjusting the light distribution characteristics of the ultraviolet irradiation unit 21 includes, for example, providing an optical sheet or the like at the arrangement position of the ultraviolet light source 213 or the irradiation unit 214 of the ultraviolet irradiation unit 21. A method of changing the configuration to a diffusion sheet or a light collecting sheet can be adopted.

  In addition to separately preparing the ultraviolet irradiation unit 21 having different light distribution characteristics, for example, the ultraviolet irradiation unit 21 provided with an adjustment mechanism that can adjust the arrangement positions of the reflectors 212a and 212b and the ultraviolet light source 213 with the same basic configuration. May be used. Further, a control means that can electronically control these adjustment mechanisms may be provided outside to automatically control the light distribution.

  The number of the ultraviolet irradiation units 21 arranged is 4 columns and 4 rows, 6 columns and 6 rows, but the number of columns and rows can be changed according to the size of the substrate A. it can. In addition, the number of columns and the number of rows do not need to be the same, and an arrangement in which one of them is increased can be employed.

  Although two types and three types of examples of the ultraviolet irradiation unit 21 used in the ultraviolet irradiation unit 2 have been shown, the types can be more than that.

  Moreover, although the structural example which has arrange | positioned two types of ultraviolet irradiation units in the same row or column was shown, for example, as shown in FIG. 13, three types of ultraviolet irradiation units 21A, 21B, It is also possible to arrange 21C. In this case, the first ultraviolet irradiation unit 21A is arranged at the center, and the peak value P of the ultraviolet illuminance is higher than that of the first ultraviolet irradiation unit 21A at both ends, and more than 50% of the peak value P. The second ultraviolet irradiation unit 21B having a small irradiation area S for irradiating is disposed. At both ends of the second ultraviolet irradiation unit 21B, an irradiation area where the peak value P of the ultraviolet illuminance is higher than that of the second ultraviolet irradiation unit 21B, and the irradiation value is 50% or more of the peak value P. The third ultraviolet irradiation unit 21C having a narrow S is arranged. Furthermore, four or more types of ultraviolet irradiation units can also be used.

  The number of changing the gap distances d and k of the ultraviolet irradiation unit 21 has been shown as two examples, but it can be more than that and the same arrangement means can be provided.

  The ultraviolet irradiation unit 21, for example, provides an opening for introducing and discharging air into the casing 211 in a part of the casing 211, and circulates air in the casing 211 by an exhaust or intake blower. Thus, a configuration in which the ultraviolet light source 213 and the lighting circuit 215 are air-cooled is also possible.

  Although several embodiments of the present invention have been described, these embodiments are presented by way of example and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other forms, and various omissions, replacements, and changes can be made without departing from the scope of the invention. These embodiments and modifications thereof are included in the scope and gist of the invention, and are included in the invention described in the claims and the equivalents thereof.

DESCRIPTION OF SYMBOLS 100 Ultraviolet processing apparatus 1 Substrate processing part 11 Substrate arrangement part 12 Hole 13 Internal conveyance part 2 Ultraviolet irradiation part 21 Ultraviolet irradiation unit 21A 1st ultraviolet irradiation unit 21B 2nd ultraviolet irradiation unit 21C 3rd ultraviolet irradiation unit 212a, 212b Reflector 213 Ultraviolet light source 215 Lighting circuit 22 Installation plate 23 Openings 24a to 24d External reflector A substrate

Claims (3)

In an ultraviolet irradiation apparatus comprising: a substrate processing unit on which a substrate to be processed with ultraviolet rays is disposed; and an ultraviolet irradiation unit having a plurality of ultraviolet irradiation units arranged in a grid so as to face the substrate processing unit.
The ultraviolet irradiation unit has a first ultraviolet irradiation unit and a peak value P of ultraviolet illuminance at the position of the substrate processing unit higher than that of the first ultraviolet irradiation unit, and a value that is 50% of the peak value P. A second ultraviolet irradiation unit having a narrow irradiation area S for irradiating the above, and in the row or column of at least a part of the arrangement of the ultraviolet irradiation units, the first ultraviolet irradiation unit in the central region thereof, An ultraviolet irradiation device in which the second ultraviolet irradiation units are arranged in an end region.   The said ultraviolet irradiation part is further arranged so that the space | interval of an adjacent ultraviolet irradiation unit may become narrow as it goes to an edge part area | region from the center area | region in the row | line | column or column of at least one part. UV irradiation equipment. In an ultraviolet irradiation apparatus comprising: a substrate processing unit on which a substrate to be processed with ultraviolet rays is disposed; and an ultraviolet irradiation unit having a plurality of ultraviolet irradiation units arranged in a grid so as to face the substrate processing unit.
The ultraviolet irradiation unit is an ultraviolet irradiation device arranged so that the interval between the adjacent ultraviolet irradiation units becomes narrower as it goes from the central region to the end region in at least a part of the row or column.

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