JP2013048202A - レーザシステム - Google Patents

レーザシステム Download PDF

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Publication number
JP2013048202A
JP2013048202A JP2011256489A JP2011256489A JP2013048202A JP 2013048202 A JP2013048202 A JP 2013048202A JP 2011256489 A JP2011256489 A JP 2011256489A JP 2011256489 A JP2011256489 A JP 2011256489A JP 2013048202 A JP2013048202 A JP 2013048202A
Authority
JP
Japan
Prior art keywords
support
mount
support portion
frame
module
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011256489A
Other languages
English (en)
Japanese (ja)
Inventor
Yasufumi Kawasuji
康文 川筋
Osamu Wakabayashi
理 若林
Junichi Fujimoto
准一 藤本
Hideo Iwase
日出男 岩瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gigaphoton Inc
Original Assignee
Gigaphoton Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gigaphoton Inc filed Critical Gigaphoton Inc
Priority to JP2011256489A priority Critical patent/JP2013048202A/ja
Priority to TW101100815A priority patent/TWI577099B/zh
Priority to US13/809,584 priority patent/US8855164B2/en
Priority to KR1020137024538A priority patent/KR20140039170A/ko
Priority to PCT/JP2012/054477 priority patent/WO2012132675A1/en
Priority to EP12712376.8A priority patent/EP2692028A1/en
Publication of JP2013048202A publication Critical patent/JP2013048202A/ja
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/004—Manual alignment, e.g. micromanipulators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2316—Cascaded amplifiers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lasers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2011256489A 2011-03-30 2011-11-24 レーザシステム Pending JP2013048202A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2011256489A JP2013048202A (ja) 2011-03-30 2011-11-24 レーザシステム
TW101100815A TWI577099B (zh) 2011-03-30 2012-01-09 Laser devices and frames
US13/809,584 US8855164B2 (en) 2011-03-30 2012-02-17 Laser apparatus
KR1020137024538A KR20140039170A (ko) 2011-03-30 2012-02-17 레이저 장치
PCT/JP2012/054477 WO2012132675A1 (en) 2011-03-30 2012-02-17 Laser apparatus
EP12712376.8A EP2692028A1 (en) 2011-03-30 2012-02-17 Laser apparatus

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2011076294 2011-03-30
JP2011076294 2011-03-30
JP2011160656 2011-07-22
JP2011160656 2011-07-22
JP2011256489A JP2013048202A (ja) 2011-03-30 2011-11-24 レーザシステム

Publications (1)

Publication Number Publication Date
JP2013048202A true JP2013048202A (ja) 2013-03-07

Family

ID=45930935

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011256489A Pending JP2013048202A (ja) 2011-03-30 2011-11-24 レーザシステム

Country Status (5)

Country Link
EP (1) EP2692028A1 (ko)
JP (1) JP2013048202A (ko)
KR (1) KR20140039170A (ko)
TW (1) TWI577099B (ko)
WO (1) WO2012132675A1 (ko)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013215880A (ja) * 2012-04-05 2013-10-24 Boeing Co:The 較正基準のためのマウント
WO2016171158A1 (ja) * 2015-04-20 2016-10-27 三菱電機株式会社 レーザ装置及び極端紫外光生成装置
JPWO2015075838A1 (ja) * 2013-11-25 2017-03-16 ギガフォトン株式会社 レーザ装置、及びレーザ装置にチャンバを増設する方法
WO2018150530A1 (ja) * 2017-02-17 2018-08-23 ギガフォトン株式会社 極端紫外光生成装置
JP7499627B2 (ja) 2020-07-06 2024-06-14 住友重機械工業株式会社 レーザ装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06120587A (ja) * 1992-10-07 1994-04-28 Komatsu Ltd レーザ装置
JPH09232649A (ja) * 1996-09-12 1997-09-05 Komatsu Ltd レーザ発振装置
JPH1065235A (ja) * 1997-06-25 1998-03-06 Komatsu Ltd レーザ発振装置
JP2003218432A (ja) * 2002-01-18 2003-07-31 Komatsu Ltd ガスレーザ装置
JP2009099786A (ja) * 2007-10-17 2009-05-07 Komatsu Ltd レーザ装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5821890A (ja) * 1981-08-03 1983-02-08 Nippon Telegr & Teleph Corp <Ntt> 半導体レ−ザと光フアイバとの結合装置
JPH0369183A (ja) * 1989-08-08 1991-03-25 Toshiba Corp レーザー増幅装置
US7016388B2 (en) * 2002-05-07 2006-03-21 Cymer, Inc. Laser lithography light source with beam delivery
CN100462762C (zh) * 2002-07-31 2009-02-18 佳能株式会社 保持器,曝光装置及设备的制造方法
US20060045151A1 (en) * 2004-08-30 2006-03-02 Daryoosh Vakhshoori External cavity wavelength stabilized Raman lasers insensitive to temperature and/or external mechanical stresses, and Raman analyzer utilizing the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06120587A (ja) * 1992-10-07 1994-04-28 Komatsu Ltd レーザ装置
JPH09232649A (ja) * 1996-09-12 1997-09-05 Komatsu Ltd レーザ発振装置
JPH1065235A (ja) * 1997-06-25 1998-03-06 Komatsu Ltd レーザ発振装置
JP2003218432A (ja) * 2002-01-18 2003-07-31 Komatsu Ltd ガスレーザ装置
JP2009099786A (ja) * 2007-10-17 2009-05-07 Komatsu Ltd レーザ装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013215880A (ja) * 2012-04-05 2013-10-24 Boeing Co:The 較正基準のためのマウント
JPWO2015075838A1 (ja) * 2013-11-25 2017-03-16 ギガフォトン株式会社 レーザ装置、及びレーザ装置にチャンバを増設する方法
WO2016171158A1 (ja) * 2015-04-20 2016-10-27 三菱電機株式会社 レーザ装置及び極端紫外光生成装置
JPWO2016171158A1 (ja) * 2015-04-20 2017-07-13 三菱電機株式会社 レーザ装置及び極端紫外光生成装置
US10211589B2 (en) 2015-04-20 2019-02-19 Mitsubishi Electric Corporation Laser apparatus and extreme ultraviolet light generation apparatus
WO2018150530A1 (ja) * 2017-02-17 2018-08-23 ギガフォトン株式会社 極端紫外光生成装置
JPWO2018150530A1 (ja) * 2017-02-17 2019-12-12 ギガフォトン株式会社 極端紫外光生成装置
US10716198B2 (en) 2017-02-17 2020-07-14 Gigaphoton Inc. Extreme ultraviolet light generation apparatus
JP7499627B2 (ja) 2020-07-06 2024-06-14 住友重機械工業株式会社 レーザ装置

Also Published As

Publication number Publication date
TW201244307A (en) 2012-11-01
EP2692028A1 (en) 2014-02-05
KR20140039170A (ko) 2014-04-01
TWI577099B (zh) 2017-04-01
WO2012132675A1 (en) 2012-10-04

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